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1. 发明授权

EP1566695B1 Lithographic apparatus 有权
公开(公告)号：EP1566695B1
公开(公告)日：2007-10-31
申请号：EP05010345.6
申请日：2001-08-23
申请人： ASML Netherlands B.V.
发明人： Van der Werf, Jan Evert , Kroon, Mark , Keur, Wilhelmus Cornelius , Banine, Vadim Yevgenyevich , Van der Laan, Hans , Moors, Johannes Hubertus Josephina , Loopstra, Erik Roelof
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F7/7085 , G03F7/70916

2. 发明公开

EP1480083A2 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译：光刻设备和器件制造方法
公开(公告)号：EP1480083A2
公开(公告)日：2004-11-24
申请号：EP04020373.9
申请日：2002-06-11
申请人： ASML Netherlands B.V.
发明人： Kroon, Mark , van der Werf, Jan Evert , Kok, Haico Victor
IPC分类号： G03F7/20
CPC分类号： G03F9/7088 , G03F7/706 , G03F7/707 , G03F7/70708 , G03F7/70716 , G03F7/7085
摘要： A lithographic projection apparatus comprising a radiation system (Ex,IL) projection beam (PB) of radiation; a support structure (MT) for supporting patterning means (MA), the patterning means serving to pattern the projection beam according to a desired pattern; a substrate table (WT) for holding a substrate (W); a projection system (PL) for projecting the patterned beam onto a target portion (C) of the substrate; and an image sensing device for measuring a pattern in the patterned projection beam. The image sensing device comprises a slab (101,102) provided with at least one radiation-sensitive sensor (111) on a first side of the slab, said sensor being an integral part of said slab and being sensitive to the radiation of the projection beam; and a film of a material (104) that is non-transparent to the radiation of the projection beam, the film being provided on the first side of the slab over said sensor and being provided with a patterned segment (113) above said sensor to selectively pass radiation of the projection beam to said sensor. The said slab is mounted with a second surface opposing the first surface on a slab-bearing surface of an intermediate plate.
摘要翻译：一种光刻投影设备，包括辐射的辐射系统（Ex，IL）投影光束（PB）用于支撑图案形成装置（MA）的支撑结构（MT），所述图案形成装置用于根据期望的图案图案化投影光束; 衬底台（WT），用于保持衬底（W）;衬底台投影系统（PL），用于将图案化的光束投影到衬底的目标部分（C）上; 以及用于测量图案化投影束中的图案的图像感测装置。所述图像感测装置包括板（101,102），所述板（101,102）在所述板的第一侧上设置有至少一个辐射敏感传感器（111），所述传感器是所述板的整体部分并且对所述投影束的辐射敏感; 以及对投影光束的辐射不透明的材料膜（104），所述膜设置在所述传感器上方的所述平板的第一侧上，并且在所述传感器上方设置有图案化片段（113）选择性地将投影光束的辐射传递到所述传感器。所述板坯安装有与第一表面相对的第二表面，在中间板的板坯支承表面上。

3. 发明授权

EP1475671B1 Method of making a lithographic apparatus 有权
标题翻译：一种用于制造光刻设备处理
公开(公告)号：EP1475671B1
公开(公告)日：2009-03-18
申请号：EP04252674.9
申请日：2004-05-07
申请人： ASML Netherlands B.V.
发明人： Dams, Johannes Adrianus Antonius Theodorus , Kroon, Mark , Voorma, Harm-Jan , Spee, Carolus Ida Maria Antonius
IPC分类号： G03F7/20
CPC分类号： G03F7/70983 , G03F7/70916

4. 发明公开

EP1510870A1 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译：光刻设备和器件制造方法
公开(公告)号：EP1510870A1
公开(公告)日：2005-03-02
申请号：EP04254910.5
申请日：2004-08-16
申请人： ASML Netherlands B.V.
发明人： Sengers, Timotheus Franciscus , van de Kerkhof, Marcus Adrianus , Kroon, Mark , van Weert, Kees
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/7088 , G03F7/70341 , G03F7/70483 , G03F7/707 , G03F7/7085
摘要： A lithographic apparatus comprising an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate (W), and a sensor (20) at substrate level comprising a radiation-receiving element, a transmissive plate supporting said radiation-receiving element, and a radiation-detecting means, wherein said sensor at substrate level is arranged to avoid loss of radiation between said radiation-receiving element (18) and the final element (40) of said radiation-detecting means.
摘要翻译：一种光刻设备，包括：配置成调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在辐射束的横截面上赋予图案以形成图案化的辐射束; 衬底台，构造成保持衬底; 被配置为将图案化的辐射束投影到衬底（W）的目标部分上的投影系统以及衬底级上的传感器（20），该传感器包括辐射接收元件，支撑所述辐射接收元件的透射板和辐射 - 检测装置，其中所述基底层上的传感器被设置为避免所述辐射接收元件（18）和所述辐射检测装置的最终元件（40）之间的辐射损失。

5. 发明授权

EP1429189B1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：EP1429189B1
公开(公告)日：2008-10-08
申请号：EP03257692.8
申请日：2003-12-08
申请人： ASML Netherlands B.V.
发明人： Van Beek, Michael Cornelis , Bakker, Levinus Pieter , Bisschops, Theodorus Hubertus Josephus , Jonkers, Jeroen , Kroon, Mark , Wolters, Robertus Adrianus Maria , Maas, Adrianus Johannes Henricus
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , B08B7/0057

6. 发明公开

EP1566695A1 Lithographic apparatus 有权
标题翻译：石版画家Apparat
公开(公告)号：EP1566695A1
公开(公告)日：2005-08-24
申请号：EP05010345.6
申请日：2001-08-23
申请人： ASML Netherlands B.V.
发明人： Van der Werf, Jan Evert , Kroon, Mark , Keur, Wilhelmus Cornelius , Banine, Vadim Yevgenyevich , Van der Laan, Hans , Moors, Johannes Hubertus Josephina , Loopstra, Erok Roelof
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F7/7085 , G03F7/70916
摘要： A lithographic projection apparatus comprises a radiation system (Ex,IL) for providing a projection beam (PB) of radiation having a wavelength λ 1 smaller than 50 nm; a support structure (MT) for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern; a substrate table (WT) for holding a substrate (W); and a projection system (PL) for projecting the patterned beam onto a target portion of the substrate. The apparatus comprises further a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ 1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.
摘要翻译：光刻投影装置包括用于提供波长λ1小于50nm的辐射的投射光束（PB）的辐射系统（Ex，IL）; 用于支撑图案形成装置的支撑结构（MT），所述图案形成装置用于根据期望的图案对投影光束进行图案化; 用于保持衬底（W）的衬底台（WT）; 以及用于将图案化的光束投影到基板的目标部分上的投影系统（PL）。该装置还包括辐射传感器，其被定位成能够接收来自投影束的辐射，所述传感器包括将波长λ1的入射辐射转换成次级辐射的辐射敏感材料; 以及能够检测从所述层出射的所述次级辐射的感测装置。

7. 发明公开

EP1486828A3 Lithographic apparatus and device manufacturing method 有权
标题翻译： Lithographischer Apparat和Verfahren zur Herstellung einer Vorrichtung
公开(公告)号：EP1486828A3
公开(公告)日：2005-08-10
申请号：EP04253354.7
申请日：2004-06-04
申请人： ASML Netherlands B.V.
发明人： Lof, Joeri , Bijlaart, Erik Theodorus Maria , Butler, Hans , Donders, Sjoerd Nicolaas Lamburtus , Hoogendam, Christiaan Alexander , Kolesnychenko, Aleksey , Loopstra, Erik Roelof , Meijer, Hendricus Johannes Maria , Mertens, Jeroen Johannes Sophia Maria , Van de Kerkhof, Marcus Adrianus , Mulkens, Johannes Catharinus Hubertus , Ritsema, Roelof Aeiko Siebrand , Van Schaik, Frank , Sengers, Timotheus Franciscus , Simon, Klaus , De Smit, Joannes Theodoor , Straaijer, Alexander , Streefkerk, Bob , Van Santen, Helmar , Kroon, Mark , Den Boef, Arie Jeffrey , Ottens, Joost Jeroen
IPC分类号： G03F7/20
CPC分类号： G03F9/7088 , G03F7/70341 , G03F7/707 , G03F7/7085
摘要： A lithographic projection apparatus is disclosed in which the space between the final element of the projection system and a sensor is filled with a liquid.
摘要翻译：公开了一种光刻投影装置，其中投影系统的最终元件和传感器之间的空间被填充有液体。

9. 发明公开

EP1939690A1 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译： Lithographischer Apparat和Verfahren zur Herstellung einer Vorrichtung
公开(公告)号：EP1939690A1
公开(公告)日：2008-07-02
申请号：EP08005292.1
申请日：2003-12-08
申请人： ASML Netherlands B.V.
发明人： Van Beek, Michael Cornelis , Bakker, Levinus Pieter , Bisschops, Theodorus Hubertus Josephus , Jonkers, Jeroen , Kroon, Mark , Wolters, Robertus Adrianus Maria , Maas, Adrianus Johannes Henricus
IPC分类号： G03F7/20
CPC分类号： G03F7/70925 , B08B7/0057
摘要： The use of a downstream radical source 10 to produce a beam 7 of radicals for cleaning contaminants from a surface 8.
摘要翻译：使用下游自由基源10产生用于从表面8清洁污染物的自由基束7。

10. 发明授权

EP1182511B1 Lithographic apparatus 有权
公开(公告)号：EP1182511B1
公开(公告)日：2006-02-01
申请号：EP01307169.1
申请日：2001-08-23
申请人： ASML Netherlands B.V.
发明人： Van Der Werf, Jan Evert , Kroon, Mark , Keur, Wilhelmus Cornelis , Banine, Vadim Yevgenyevich , Van Der Laan, Hans , Moors, Johannes Hubertus Josephina , Loopstra, Erok Roelof
IPC分类号： G03F7/20
CPC分类号： G03F7/70558 , G03F7/7085 , G03F7/70916

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