专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明公开

EP2154711A4 VAPORIZING APPARATUS AND FILM FORMING APPARATUS PROVIDED WITH VAPORIZING APPARATUS 有权
标题翻译：膨胀装置和与膨胀设备EQUIPPED成膜装置
公开(公告)号：EP2154711A4
公开(公告)日：2011-11-16
申请号：EP08752777
申请日：2008-05-15
申请人： WATANABE M & CO LTD , TODA MASAYUKI
发明人： TODA MASAYUKI , KUSUHARA MASAKI , UMEDA MASARU , FUKAGAWA MITSURU
IPC分类号： H01L21/205 , C23C16/448
CPC分类号： C23C16/407 , C23C16/4486
摘要： Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.

2. 发明公开

EP1533835A1 VAPORIZER, VARIOUS APPARATUSES INCLUDING THE SAME AND METHOD OF VAPORIZATION 审中-公开
标题翻译： VERDAMPFER，VERSCHIEDENE，DIESEN ENTHALTENDE VORRICHTUNGEN UND VERDAMPFUNGSVERFAHREN
公开(公告)号：EP1533835A1
公开(公告)日：2005-05-25
申请号：EP03733161.8
申请日：2003-05-29
申请人： KABUSHIKI KAISHA WATANABE SHOKO , Toda, Masayuki
发明人： TODA, Masayuki , UMEDA, Masaru, KABUSHIKI KAISHA WATANABE SHOKO
IPC分类号： H01L21/205
CPC分类号： C23C16/40 , C23C16/4481 , C23C16/4486 , H01L21/6708
摘要： There is provided a vaporizer which can be used for a long period of time without being clogged and can supply a raw material stably to a reaction section. An object of the present invention is to provide a vaporizer which can supply a raw material adjusted to a stoichiometric ratio continuously and stably and has an effect of decreasing the quantity of residual carbon in a formed film, a disperser, a film forming apparatus, and a vaporizing method, and a dispersing method and a film forming method. The vaporizer for vaporizing a raw material solution contained in a carrier gas is characterized in that means for containing a solvent for the raw material solution in the carrier gas before containing the raw material solution is provided.
摘要翻译：提供了一种长时间使用而不被堵塞并可将原料稳定地供应到反应段的蒸发器。本发明的目的是提供一种蒸发器，其能够连续稳定地供给调整为化学计量比的原料，并且具有减少成形膜，分散器，成膜装置中的残留碳量的效果蒸发法，分散方法和成膜方法。用于汽化包含在载气中的原料溶液的蒸发器的特征在于，在包含原料溶液之前，提供了用于在载气中含有原料溶液的溶剂的装置。

3. 发明公开

EP0889515A4 METHOD AND APPARATUS FOR CONVEYING THIN SHEET-LIKE SUBSTRATE 失效
标题翻译：方法和设备运送片状的T0
公开(公告)号：EP0889515A4
公开(公告)日：2004-10-20
申请号：EP97912528
申请日：1997-11-21
申请人： NIPPON OXYGEN CO LTD , TODA MASAYUKI , OHMI TADAHIRO
发明人： TODA MASAYUKI , OHMI TADAHIRO , ISHIHARA YOSHIO
IPC分类号： B65G49/00 , B65G49/07 , H01L21/677 , H01L21/68 , H01L21/00
CPC分类号： H01L21/67126 , H01L21/67724 , H01L21/67736
摘要： When a thin sheet-like substrate S is conveyed between conveying chambers (2) equipped with a processing apparatus (1) and kept in an inert gas atmosphere by using a conveying robot (30) equipped with an accommodation chamber (3) capable of accommodating the thin sheet-like substrate (S) in an inert gas atmosphere, a connection chamber (4) is interposed between the accommodation chamber (3) and the conveying chamber (2) when the thin sheet-like substrate (S) is transferred between the accommodation chamber (3) of the conveying robot (30) and the conveying chamber (2) on the side of the processing apparatus (1), and is vacuumized, and then an inert gas is introduced. Thereafter, gate valves (GV1 and GV2) of the accommodation chamber (3) and the conveying chamber (2) are opened and the thin sheet-like substrate (S) is carried in and out.

4. 发明公开

EP1363320A1 FERROELECTRIC THIN FILM, METAL THIN FILM OR OXIDE THIN FILM, AND METHOD AND APPARATUS FOR PREPARATION THEREOF, AND ELECTRIC OR ELECTRONIC DEVICE USING SAID THIN FILM 审中-公开
标题翻译： “FERRO ELECTRIC薄膜金属薄膜的氧化物薄膜和方法以及制造装置技术ITS和电气或电子元件WITH THIN FILM”
公开(公告)号：EP1363320A1
公开(公告)日：2003-11-19
申请号：EP02715794.0
申请日：2002-01-18
申请人： KABUSHIKI KAISHA WATANABE SHOKO , Toda, Masayuki
发明人： YAMOTO, Hisayoshi, WACOM ELECTRIC CO., LTD , TODA, Masayuki , FUKAGAWA, Mitsuru, WACOM ELECTRIC CO, LTD , UMEDA, Masaru, KABUSHIKI KAISHA WATANABE SHOKO , FUKAGAWA, Mitsuru, c/o WACOM ELECTRIC CO., LTD
IPC分类号： H01L21/316 , H01L21/31
CPC分类号： H01L27/11502 , C23C16/40 , C23C16/4486 , H01L21/31691 , H01L27/11507 , H01L28/55
摘要： The object of the present invention is to provide a ferroelectric thin film that has the best range of the composition where an excellent remanent polarization characteristic is obtained and, at the same time, has a bismuth type layered crystal structure with high reliability.
The ferroelectric thin film of the present invention is a ferroelectric thin film of layered crystal structure comprising at least-tantalum and oxygen (O) among carbon, Strontium (Sr), bismuth (Bi), tantalum (Ta), and niobium (Nb), characterized by assuming the composition formula to be SrBi y Ta 2 O 9±d or Sr x Bi y (Ta,Nb) 2 O 9±d (provided that, 0.90≦x
摘要翻译：本发明的目的是提供一种铁电薄膜确实具有这样优异的保持性偏振特性得到，并且同时，具有可靠性高的铋型层状晶体结构的组合物的最佳范围内。的本发明的强电介质薄膜是层状晶体结构的铁电薄膜，其含有碳中的至少 - 钽和氧（O），锶（Sr），铋（Bi），钽（Ta）和铌（Nb），通过假设组成式为SrBiyTa2O9 +/- d或SrxBiy（钽，铌）2O9 +/-ð表征（条件是，0.90

5. 发明公开

EP1005076A1 FLOATING APPARATUS OF SUBSTRATE 失效
标题翻译： SUBSTRATSCHWIMMVORRICHTUNG
公开(公告)号：EP1005076A1
公开(公告)日：2000-05-31
申请号：EP98907223.6
申请日：1998-03-13
申请人： KABUSHIKI KAISHA WATANABE SHOKO , Toda, Masayuki
发明人： TODA, Masayuki , UMEDA, Masaru, K. Kaisha Watanabe Shoko , KANNO, Yoichi , OHMI, Tadahiro
IPC分类号： H01L21/68 , B23Q3/08
CPC分类号： H01L21/6838
摘要： It is an object of the present invention to provide a substrate body floating apparatus which insures a stable floating state of a substrate body with less vibration of a rotation axis or a surface thereof and a heater and a film-forming apparatus capable of forming a homogeneous film without losing cleanliness of a surface of a substrate body and with small temperature gradation on a surface of a substrate body as well as small density gradation of a raw material used for forming a film on a substrate body in a wide area.
The substrate body floating apparatus according to the present invention has a floating unit for floating and rotating a disk-shaped substrate body by blowing an air flow to a rear surface of the substrate body, said floating unit comprising a group of fine pores for floating the substrate body, a group of fine pores for fixing the substrate body at a center of the apparatus, a group of fine pores for rotating the substrate body at a center of the apparatus, and a group of auxiliary fine pores for suppressing vibration of the substrate body when the substrate body is rotated at a high speed. Also the substrate body floating type of heater and film-forming apparatus have the floating unit described above respectively.
摘要翻译：本发明的目的是提供一种基板体浮动装置，其确保基板主体的稳定的浮动状态，其具有较少的旋转轴线或其表面的振动，以及加热器和能够形成均匀的膜形成装置薄膜，而不损害基板表面的清洁度，并且在基板主体的表面上具有较小的温度梯度，以及在广泛区域中用于在基板主体上形成薄膜的原料的小密度等级。根据本发明的基板体浮置装置具有浮动单元，用于通过向基板主体的后表面吹送空气流来浮动和旋转盘形基板主体，所述浮动单元包括一组用于浮动的基板基板主体，用于将基板固定在设备的中心的一组细孔，用于使基板主体在设备的中心旋转的一组细孔和一组用于抑制基板的振动的辅助细孔当基板主体高速旋转时，基板体浮动式的加热器和成膜装置也分别具有上述浮动单元。

6. 发明公开

EP0889515A1 METHOD AND APPARATUS FOR CONVEYING THIN SHEET-LIKE SUBSTRATE 失效
标题翻译： VERFAHREN UND VORRICHTUNG ZUM TRANSPORTIEREN VONBLATTFÖRMIGENGEGENSTANDEN
公开(公告)号：EP0889515A1
公开(公告)日：1999-01-07
申请号：EP97912528.3
申请日：1997-11-21
申请人： NIPPON SANSO CORPORATION , Toda, Masayuki , OHMI, Tadahiro
发明人： TODA, Masayuki , OHMI, Tadahiro , ISHIHARA, Yoshio, Nippon Sanso Corporation
IPC分类号： H01L21/68
CPC分类号： H01L21/67126 , H01L21/67724 , H01L21/67736
摘要： The present invention uses a transportation robot furnished with a storage chamber 3 that can store substrate wafers S under an inert gas atmosphere, and when transporting substrate wafers S between transportation chambers 2 installed on processing apparatus 1 and holding an inert gas atmosphere, connection chamber 4 is disposed between storage chamber 3 and transportation chamber 2 when placing and removing substrate wafers S between storage chamber 3 of transportation robot 30 and the transportation chamber 2 of processing apparatus 1, and after introducing inert gas into the connection chamber 4 at low pressure, opening the gate valves GV1 and GV2 between storage chamber 3 and transportation chamber 2.
摘要翻译：本发明使用具有可在惰性气体环境下存储基板S的储存室3的输送机器人，并且当在安装在处理装置1上的输送室2和保持惰性气体气氛之间输送基板S时，连接室4 在运送机器人30的储存室3和处理装置1的运送室2之间放置和移除基板晶片S时，在将惰性气体以低压，开放的方式引入连接室4之后，设置在储存室3和输送室2之间存储室3和运送室2之间的闸阀GV1和GV2。

7. 发明公开

EP2154711A1 VAPORIZING APPARATUS AND FILM FORMING APPARATUS PROVIDED WITH VAPORIZING APPARATUS 有权
标题翻译： VERDAMPFUNGSVORRICHTUNG MIT VERDAMPFUNGSVORRICHTUNG AUSGESTATTETE FILMBILDUNGSVORRICHTUNG
公开(公告)号：EP2154711A1
公开(公告)日：2010-02-17
申请号：EP08752777.6
申请日：2008-05-15
申请人： Kabushiki Kaisha Watanabe Shoko , Toda, Masayuki
发明人： TODA, Masayuki , KUSUHARA, Masaki , UMEDA, Masaru , FUKAGAWA, Mitsuru
IPC分类号： H01L21/205 , C23C16/448
CPC分类号： C23C16/407 , C23C16/4486
摘要： Because an evaporating apparatus for use in an MOCVD film deposition system has a structure in which a plurality of gas passages brings in a gas from the upper direction, the apparatus has a difficulty to position a jet nozzle, and the apparatus is incapable of accurately controlling the pressure and flow rate of a carrier gas mixed with a raw material solution to be issued into an evaporating unit, and it is thus difficult to highly accurately control the composition of MOCVD films. A plurality of gas passages is arranged on a flat, disk-shaped plate. With this configuration, the accurate positioning of the jet nozzle can be made easier, and the composition of MOCVD films can be controlled highly accurately.
摘要翻译：由于用于MOCVD膜沉积系统的蒸发装置具有多个气体通道从上方引入气体的结构，所以该装置难以定位喷嘴，并且该装置不能精确地控制与要发放到蒸发单元中的原料溶液混合的载气的压力和流速，因此难以高精度地控制MOCVD膜的组成。多个气体通道设置在平坦的盘形板上。利用这种结构，可以使喷嘴的精确定位变得更容易，并且可以高精度地控制MOCVD膜的组成。

8. 发明公开

EP1905500A4 OIL FILTER, SYSTEM AND METHOD FOR DETERIORATION CONTROL 审中-公开
标题翻译：油过滤器，干扰控制系统及方法
公开(公告)号：EP1905500A4
公开(公告)日：2010-02-10
申请号：EP06756448
申请日：2006-05-22
申请人： TAKAHASHI TOSHIAKI , SEATTLE CATALYZER LAB KABUSHIK , TODA MASAYUKI
发明人： TAKAHASHI JUNKO , FUKUSHIMA SHUTA
IPC分类号： B01D35/02 , B01D24/00 , B01D24/18 , B01D24/20 , F01M11/03
CPC分类号： C10M175/0091 , B01D24/04 , B01D24/165 , F01M11/03
摘要： To provide a deterioration control oil filter capable of increasing an effect for purifying pollutants, floating matters, or the like in a lubricating oil or a hydraulic oil as well as increasing an effect for suppressing the oxidation of the lubricating oil or the hydraulic oil. A long filtration functioning distance using mineral particles 30 can be secured, since an oil inlet pipe 24 for discharging the lubricating oil or the hydraulic oil into the casing 29 is connected to a bottom center of the casing which is isolated from the atmosphere, an oil outlet pipe 25 is connected to a bottom of the casing 29, and the mineral particles 30 are provided in the casing 29 interspacially at an upper portion of the casing, thereby allowing the lubricating oil to circulate in the casing in an up-and-down direction.

9. 发明公开

EP2682980A4 VAPORIZER, CENTER ROD USED THEREIN, AND METHOD FOR VAPORIZING MATERIAL CARRIED BY CARRIER GAS 审中-公开
标题翻译：蒸发器，中心杆体和方法的车辆由气体带菌材料膨胀
公开(公告)号：EP2682980A4
公开(公告)日：2014-11-26
申请号：EP12752383
申请日：2012-02-27
申请人： WATANABE M & CO LTD , TODA MASAYUKI
发明人： TODA MASAYUKI , UMEDA MASARU
IPC分类号： H01L21/31 , C23C16/448
CPC分类号： C23C16/4481
摘要： To obtain a vaporizer in which a plurality of thin film-forming raw material solutions are stably and reliably carried by a carrier gas while being reliably separated within the dispersion unit body and the plurality of thin film-forming raw material solutions are stably vaporized in the subsequent vaporization unit, a center rod used in the vaporizer, and a method for vaporizing raw materials entrained by a carrier gas. A carrier gas introduction bore is formed in the center axis direction of the dispersion unit body. A center rod 10 is inserted in the carrier gas introduction bore so that the interspace between the inner wall of the carrier gas introduction bore and the outer wall of the center rod forms a gas passage. Thin film-forming material supply units formed at multiple points situated midway of the gas passage of the dispersion unit body and supplying thin film-forming materials are provided. The center rod has sealing members 11a and 11b provided in the longitudinal direction of the center rod.

10. 发明授权

EP1361610B1 VAPORIZER AND DEPOSITION DEVICE USING THE SAME 有权
标题翻译：蒸发器和BESCHICTUNGSVORRICHTUNG与蒸发器
公开(公告)号：EP1361610B1
公开(公告)日：2011-11-30
申请号：EP02715811.2
申请日：2002-01-18
申请人： KABUSHIKI KAISHA WATANABE SHOKO , Toda, Masayuki
发明人： Toda, Masayuki , Kusuhara, Masaki c/o KABUSHIKI KAISHA WATANABE SHOKO , UMEDA, Masaru c/o KABUSHIKI KAISHA WATANABE SHOKO , FUKAGAWA, Mitsuru, c/o WACOM ELECTRIC CO., LTD
IPC分类号： H01L23/31 , C23C16/40 , B01B1/00 , B01F3/04 , B01D1/16
CPC分类号： H01L27/11502 , B01B1/005 , B01D3/346 , B01F3/04021 , B01F5/0646 , B01F5/0653 , B01F5/0656 , B01F5/0671 , B01F5/0676 , C23C16/40 , C23C16/409 , C23C16/4486 , H01L21/31691 , H01L27/11507 , H01L28/55 , Y10S261/65
摘要： A carburetor usable for long period without causing a clogging and capable of stably feeding raw material to a reaction part, comprising a diffusion part (8) having a gas passage (2) formed inside a diffusion part body (1), a gas inlet (4) for leading pressurized carrier gas (3) into the gas passage (2), a means (6) for feeding raw material solution (5) into the carrier gas passing through the gas passage (2), a gas outlet (7) for feeding the carrier gas including the diffused raw material solution (5) to a vaporization part (22), and a means (18) for cooling the carrier gas flowing through the inside of the gas passage (2), and a radiation prevention part (102) having a vaporization tube (20) connected to the reaction part of a device and the gas outlet (7) of the diffusion part (8), a heater (21) for heating the vaporization tube (20), a vaporization part (22) for heating and vaporizing the carrier gas having raw material solution distributed therein, and a small hole (101) provided on the outside of the gas outlet (7).

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式