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    • 2. 发明公开
    • Refrigerating machine with defrosting unit
    • Kühlmaschinemit Enteisungseinheit
    • EP2006622A2
    • 2008-12-24
    • EP08158472.4
    • 2008-06-18
    • Gaggelli, Niccolo'Rosi, Alessandro
    • Gaggelli, Niccolo'Rosi, Alessandro
    • F25D21/06
    • F25D21/06F25B21/04
    • A refrigerating machine comprising a refrigeration system, a chamber (1) to be refrigerated, a freezing-defrosting subchamber (2), a fan (3) with which the air of the chamber to be refrigerated is pushed and made to circulate through the freezing-defrosting subchamber (2), which is provided with a thermoelectric Peltier-effect refrigerating device (4), whose normally warm part is in contact with evaporator of the refrigeration assembly and whose normally cold part is combined with the freezing-defrosting surface (6), and wherein the electric power source is provided with a switching and adjustment assembly (5) by means of which the surface (6) is switched from cold to warm and its temperature is adjusted.
    • 一种制冷机,包括制冷系统,要冷藏的室(1),冷冻除霜室(2),用于冷却的室的空气被推动并使其冷冻循环的风扇(3) (2),其设有热电帕尔贴效应冷冻装置(4),其常温部分与制冷组件的蒸发器接触,其常冷部分与冷冻除霜表面(6 ),并且其中所述电源设置有切换和调节组件(5),通过所述切换和调整组件,所述表面(6)从所述切换和调整组件(5)转换为冷至暖并且其温度被调节。
    • 7. 发明公开
    • A process for producing a matrix for realising a tile
    • 一种用于生产模具用于模制过程瓦
    • EP2085248A1
    • 2009-08-05
    • EP08425063.8
    • 2008-02-04
    • Rosi, StefanoForacchia, Mattia AlbertoGibertini, Ivan
    • Rosi, StefanoForacchia, Mattia AlbertoGibertini, Ivan
    • B44C5/04E04F13/08E04F15/02
    • E04F13/0871B44F7/00E04F15/02
    • A process for realising a matrix for realising a tile, comprising the stages of: forming a base structure (15) exhibiting an in-view surface (17); forming, at the in-view surface (17), a plurality of projecting reliefs (18), each exhibiting a respective crest (18a) being substantially equidistanced from the base structure (15) in order to define a single treading plane. The forming of the reliefs (18) comprises the stages of: forming a first zone having substantially parallel and equidistant reliefs (18); and forming a second zone having reliefs (18) orientated transversally with respect to the reliefs (18) of the first zone. The reliefs (18) of the second zone are distanced to a different amount than a distance between the reliefs (18) of the first zone.
    • 一种用于真正伊辛矩阵为真实伊辛瓦片,其包括以下阶段:形成一基底结构(15)表现出视表面(17); 形成,在所述可视面(17),投影的浮雕(18),每个的表现出respectivement波峰(18A)的多个数据块基本上从所述基部结构(15)面,以限定单一的踩踏等距离。 浮雕的形成(18)包括以下阶段:形成具有基本平行的且等距的凸起(18)的第一区; 和形成第二区具有凸纹(18)相对于所述第一区域的浮雕(18)横向地定向。 第二区域的浮雕(18)间隔开,以不同量的比所述第一区域的浮雕(18)之间的距离。