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    • 7. 发明公开
    • IMPROVED NON-DESTRUCTIVELY READ FERROELECTRIC MEMORY CELL
    • VERBESSERTE,ZERSTÖRUNGSFREILESBARE FERROELEKTRISCHE SPEICHERZELLE
    • EP0815596A4
    • 1998-06-03
    • EP96908703
    • 1996-03-09
    • RADIANT TECHNOLOGIES INC
    • EVANS JOSEPH TATE JRWARREN WILLIAM LTUTTLE BRUCE A
    • H01L21/8247H01L21/8242H01L27/10H01L27/108H01L29/51H01L29/788H01L29/792H01L29/78
    • H01L29/516G11C11/223
    • An improved ferroelectric FET structure (10) in which the ferroelectric layer (14) is doped to reduce retention loss. A ferroelectric FET according to the present invention includes a semiconductor layer (16) having first and second contacts (18, 19) thereon, the first and second contacts being separated from one another. The ferroelectric FET also includes a bottom electrode (12) and a ferroelectric layer (14) which is sandwiched between the semiconductor layer (16) and the bottom electrode (12). The ferroelectric layer (14) is constructed from a perovskite structure of the chemical composition ABO3 wherein the B site comprises first and second elements and a dopant element that has an oxidation state greater than +4 in sufficient concentration to impede shifts in the resistance measured between the first and second contacts with time. The ferroelectric FET structure preferably comprises Pb in the A-site. The first and second elements are preferably Zr and Ti, respectively. The preferred B-site dopants are Niobium, Tantalum, and Tungsten at concentration between 1 % and 8 %.
    • 改进的铁电FET结构,其中掺杂铁电层以减少保留损耗。 根据本发明的铁电FET包括其上具有第一和第二触点的半导体层,第一和第二触点彼此分离。 铁电FET还包括夹在半导体层和底部电极之间的底部电极和铁电体层。 铁电层由化学组成ABO 3的钙钛矿结构构成,其中B位置包含第一和第二元素以及具有足够浓度的大于+4的氧化态的掺杂剂元素,以阻止在第一和第二元素之间测量的电阻的偏移 第二次接触时间。 铁电FET结构优选在A位置包含Pb。 第一和第二元素分别优选为Zr和Ti。 优选的B位掺杂剂是浓度在1%和8%之间的铌,钽和钨。