会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明公开
    • PHOTOLITHOGRAPHIC PATTERNING OF ELECTRONIC DEVICES
    • 电子器件的光刻成像
    • EP3238288A1
    • 2017-11-01
    • EP15873765.0
    • 2015-12-23
    • Orthogonal Inc.
    • ROBELLO, Douglas, RobertO'TOOLE, Terrence, RobertBYRNE, Frank, XavierFREEMAN, Diane, Carol
    • H01L51/56H01L21/027
    • A method of patterning a device includes forming a fluorinated photopolymer layer over a device substrate. The photopolymer layer has a lower portion proximate the device substrate and an upper portion distal the device substrate. The fluorinated photopolymer layer includes a radiation-absorbing dye and a fluorinated photopolymer having a solubility-altering reactive group. The photopolymer layer is exposed to patterned radiation to form exposed and unexposed areas in accordance with the patterned radiation and a developed structure is formed by removing unexposed areas using a developing agent that includes a first fluorinated solvent. The lower portion of the exposed area of the photopolymer layer has a dissolution rate in the developing agent that is at least 5 times higher than a dissolution rate for the upper portion.
    • 图案化器件的方法包括在器件衬底上形成氟化光聚合物层。 光聚合物层具有靠近器件衬底的下部和远离器件衬底的上部。 氟化光聚合物层包括辐射吸收染料和具有溶解度改变反应性基团的氟化光聚合物。 根据图案化的辐射,光敏聚合物层暴露于图案化的辐射以形成曝光区域和未曝光区域,并且通过使用包含第一氟化溶剂的显影剂除去未曝光区域形成显影结构。 光聚合物层的曝光区域的下部在显影剂中的溶解速率比上部的溶解速率高至少5倍。