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1. 发明公开

EP3238288A1 PHOTOLITHOGRAPHIC PATTERNING OF ELECTRONIC DEVICES 有权
标题翻译：电子器件的光刻成像
公开(公告)号：EP3238288A1
公开(公告)日：2017-11-01
申请号：EP15873765.0
申请日：2015-12-23
申请人： Orthogonal Inc.
发明人： ROBELLO, Douglas, Robert , O'TOOLE, Terrence, Robert , BYRNE, Frank, Xavier , FREEMAN, Diane, Carol
IPC分类号： H01L51/56 , H01L21/027
摘要： A method of patterning a device includes forming a fluorinated photopolymer layer over a device substrate. The photopolymer layer has a lower portion proximate the device substrate and an upper portion distal the device substrate. The fluorinated photopolymer layer includes a radiation-absorbing dye and a fluorinated photopolymer having a solubility-altering reactive group. The photopolymer layer is exposed to patterned radiation to form exposed and unexposed areas in accordance with the patterned radiation and a developed structure is formed by removing unexposed areas using a developing agent that includes a first fluorinated solvent. The lower portion of the exposed area of the photopolymer layer has a dissolution rate in the developing agent that is at least 5 times higher than a dissolution rate for the upper portion.
摘要翻译：图案化器件的方法包括在器件衬底上形成氟化光聚合物层。光聚合物层具有靠近器件衬底的下部和远离器件衬底的上部。氟化光聚合物层包括辐射吸收染料和具有溶解度改变反应性基团的氟化光聚合物。根据图案化的辐射，光敏聚合物层暴露于图案化的辐射以形成曝光区域和未曝光区域，并且通过使用包含第一氟化溶剂的显影剂除去未曝光区域形成显影结构。光聚合物层的曝光区域的下部在显影剂中的溶解速率比上部的溶解速率高至少5倍。

2. 发明公开

EP2681781A2 PROCESS FOR PATTERNING MATERIALS IN THIN-FILM DEVICES 审中-公开
标题翻译：方法用于薄膜组件结构化材料
公开(公告)号：EP2681781A2
公开(公告)日：2014-01-08
申请号：EP12752927.9
申请日：2012-02-24
申请人： Orthogonal Inc.
发明人： DEFRANCO, John , MILLER, Mike , HOLT, Fox
IPC分类号： H01L51/56
CPC分类号： H01L51/0018 , G03F7/0046 , G03F7/095 , G03F7/11 , G03F7/203 , G03F7/405 , H01L23/50 , H01L51/0016 , H01L51/0017 , H01L51/0541 , H01L51/0545 , H01L51/0558 , H01L51/102 , H01L51/5012 , H01L51/5206 , H01L51/5221 , H01L51/56 , H01L2924/0002 , H01L2924/00
摘要： A method for forming a device includes providing a substrate; depositing a single fluorinated photo-patternable layer over the substrate; forming a first and a second active layer over the substrate; and applying the photo-patternable layer to form a first pattern within the first active layer and a second, different pattern within the second active layer. Particular examples disclosed in the present disclosure can be employed to form thin film electronics devices, including OLED devices and TFTs with a reduced number of photolithographic steps.

3. 发明授权

EP3175495B1 PHOTOLITHOGRAPHIC PATTERNING OF DEVICES 有权
公开(公告)号：EP3175495B1
公开(公告)日：2020-01-01
申请号：EP15826514.0
申请日：2015-07-31
申请人： Orthogonal Inc.
发明人： O'TOOLE, Terrence Robert , DEFRANCO, John Andrew , BYRNE, Frank Xavier
IPC分类号： G03F7/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/32 , G03F7/40 , H01L51/00 , H01L51/56

4. 发明公开

EP3068836A4 BRANCHED FLUORINATED PHOTOPOLYMERS 审中-公开
标题翻译： VERZWEIGTE FLUORIERTE PHOTOPOLYMERE
公开(公告)号：EP3068836A4
公开(公告)日：2017-08-02
申请号：EP14862385
申请日：2014-11-12
申请人： ORTHOGONAL INC
发明人： ROBELLO DOUGLAS ROBERT , WRIGHT CHARLES WARREN , FREEMAN DIANE CAROL , BYRNE FRANK XAVIER , DEFRANCO JOHN ANDREW , RUBSAM SANDRA , O'TOOLE TERRENCE ROBERT
IPC分类号： C08L33/16 , C08F220/22 , C08F265/06 , C08J3/02 , C08L51/00 , G03F7/004 , G03F7/038 , G03F7/039 , G03F7/32
CPC分类号： G03F7/038 , G03F7/0045 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/0397 , G03F7/325
摘要： A fluorinated photopolymer composition is disclosed having a branched copolymer provided in a fluorinated solvent. The copolymer includes a branching unit, a first repeating unit having a fluorine-containing group, and a second repeating unit having a solubility-altering reactive group. The branched fluorinated photopolymer composition is particularly suited for the fabrication of organic electronic and bioelectronic devices, or other devices having sensitive active organic materials.
摘要翻译：公开了一种含氟光聚合物组合物，其具有在氟化溶剂中提供的支化共聚物。该共聚物包括支化单元，具有含氟基团的第一重复单元和具有改变溶解度的反应性基团的第二重复单元。该支化氟化光聚合物组合物特别适用于制造有机电子和生物电子器件或具有敏感活性有机材料的其他器件。

5. 发明公开

EP3175495A1 PHOTOLITHOGRAPHIC PATTERNING OF DEVICES 有权
标题翻译：器件的光刻图案设计
公开(公告)号：EP3175495A1
公开(公告)日：2017-06-07
申请号：EP15826514.0
申请日：2015-07-31
申请人： Orthogonal Inc.
发明人： O'TOOLE, Terrence Robert , DEFRANCO, John Andrew , BYRNE, Frank Xavier
IPC分类号： H01L51/56 , H01L21/027
摘要： A method of patterning a device is disclosed using a resist precursor structure having at least two fluoropolymer layers. A first fluoropolymer layer includes a first fluoropolymer material having a fluorine content of at least 50% by weight and is substantially soluble in a first hydrofluoroether solvent or in a first perfluorinated solvent, but substantially less soluble in a second hydrofluoroether solvent relative to both the first hydrofluoroether and the first perfluorinated solvent. The second fluoropolymer layer includes a second fluoropolymer material having a fluorine content less than that of the first fluoropolymer material and is substantially soluble in the first or second hydrofluoroether solvents, but substantially less soluble in the first perfluorinated solvent relative to both the first and second hydrofluoroether solvents.
摘要翻译：公开了使用具有至少两个氟聚合物层的抗蚀剂前体结构来图案化器件的方法。第一含氟聚合物层包括含氟量至少为50重量％的第一含氟聚合物材料并且基本上可溶于第一氢氟醚溶剂或第一全氟溶剂中，但相对于第一含氟聚合物材料的第一氢氟醚溶剂氢氟醚和第一种全氟化溶剂。第二氟聚合物层包括含氟量低于第一含氟聚合物材料的第二含氟聚合物材料，并且基本上溶于第一或第二氢氟醚溶剂中，但相对于第一和第二氢氟醚二者在第一全氟溶剂中可溶性要低得多溶剂。

6. 发明公开

EP3175491A4 PHOTOLITHOGRAPHIC PATTERNING OF ORGANIC ELECTRONIC DEVICES 审中-公开
公开(公告)号：EP3175491A4
公开(公告)日：2018-08-01
申请号：EP15826346
申请日：2015-07-31
申请人： ORTHOGONAL INC
发明人： DEFRANCO JOHN ANDREW , O'TOOLE TERRENCE ROBERT
IPC分类号： G03F7/00 , H01L51/56
CPC分类号： H01L51/0016 , G03F7/0046 , G03F7/3021 , G03F7/322 , G03F7/325 , G03F7/40 , G03F7/426 , H01L51/0018 , H01L51/5012 , H01L51/5056 , H01L51/5064 , H01L51/5072 , H01L51/508 , H01L51/5096 , H01L51/5203 , H01L51/56
摘要： A method of patterning an organic device includes depositing a first organic functional layer over a device substrate to form a first intermediate structure, the first organic functional layer having a first function such as hole transport or electron transport. The first intermediate structure is coated with a fluoropolymer and treated in a processing agent comprising a fluorinated solvent in which the fluoropolymer is soluble to form a processed intermediate structure. A second organic functional layer is deposited over at least a portion of the first organic functional layer, the second organic functional layer also having the first function.

7. 发明公开

EP3175496A4 PHOTOLITHOGRAPHIC PATTERNING OF ORGANIC ELECTRONIC DEVICES 有权
公开(公告)号：EP3175496A4
公开(公告)日：2018-07-18
申请号：EP15828065
申请日：2015-07-31
申请人： ORTHOGONAL INC
发明人： DEFRANCO JOHN ANDREW , O'TOOLE TERRENCE ROBERT , BYRNE FRANK XAVIER , FREEMAN DIANE CAROL
IPC分类号： H01L51/56 , H01L21/027 , H01L27/32
CPC分类号： H01L51/56 , H01L27/3211 , H01L27/3218 , H01L51/0016 , H01L51/0018 , H01L51/5016 , H01L51/5056 , H01L51/5072 , H01L51/5092 , H01L51/5096 , H01L51/5203
摘要： A method of making an OLED device includes providing a first undercut lift-off structure over the device substrate having a first array of bottom electrodes. Next, one or more first organic EL medium layers including at least a first light-emitting layer are deposited over the first undercut lift-off structure and over the first array of bottom electrodes. The first undercut lift-off structure and overlying first organic EL medium layer(s) are removed by treatment with a first lift-off agent comprising a fluorinated solvent to form a first intermediate structure. The process is repeated using a second undercut lift-off structure to deposit one or more second organic EL medium layers over a second array of bottom electrodes. After removal of the second undercut lift-off structure, a common top electrode is provided in electrical contact with the first and second organic EL medium layers.

8. 发明公开

EP2681781A4 PROCESS FOR PATTERNING MATERIALS IN THIN-FILM DEVICES 审中-公开
标题翻译：方法用于薄膜组件结构化材料
公开(公告)号：EP2681781A4
公开(公告)日：2014-09-03
申请号：EP12752927
申请日：2012-02-24
申请人： ORTHOGONAL INC
发明人： DEFRANCO JOHN , MILLER MIKE , HOLT FOX
IPC分类号： H01L51/56 , H01L51/05
CPC分类号： H01L51/0018 , G03F7/0046 , G03F7/095 , G03F7/11 , G03F7/203 , G03F7/405 , H01L23/50 , H01L51/0016 , H01L51/0017 , H01L51/0541 , H01L51/0545 , H01L51/0558 , H01L51/102 , H01L51/5012 , H01L51/5206 , H01L51/5221 , H01L51/56 , H01L2924/0002 , H01L2924/00

9. 发明授权

EP3238288B1 PHOTOLITHOGRAPHIC PATTERNING OF ELECTRONIC DEVICES 有权
公开(公告)号：EP3238288B1
公开(公告)日：2020-07-29
申请号：EP15873765.0
申请日：2015-12-23
申请人： Orthogonal Inc.
发明人： ROBELLO, Douglas, Robert , O'TOOLE, Terrence, Robert , BYRNE, Frank, Xavier , FREEMAN, Diane, Carol
IPC分类号： G03F7/004 , G03F7/32 , G03F7/038 , G03F7/039 , H01L21/027 , H01L51/00 , C09D4/00

10. 发明公开

EP3175497A1 PHOTOLITHOGRAPHIC PATTERNING OF DEVICES 审中-公开
标题翻译：器件的光刻图案设计
公开(公告)号：EP3175497A1
公开(公告)日：2017-06-07
申请号：EP15828244.2
申请日：2015-07-31
申请人： Orthogonal Inc.
发明人： DEFRANCO, John Andrew , WRIGHT, Charles Warren , ROBELLO, Douglas Robert , BYRNE, Frank Xavier , FREEMAN, Diane Carol , O'TOOLE, Terrence Robert
IPC分类号： H01L51/56 , H01L21/027
CPC分类号： H01L51/0018 , G03F7/094 , G03F7/40 , H01L21/0272 , H01L21/0274 , H01L51/0016 , H01L51/56 , Y02E10/549 , Y02P70/521
摘要： A method of making a device includes providing a fluorinated material layer over the device substrate having one or more target areas for patterning. One or more lift-off structures are formed at least in part by developing a first pattern of one or more open areas in the fluorinated material layer in alignment with the one or more target areas by contact with a developing agent including a fluorinated solvent which dissolves the fluorinated material at a first rate. After patterning, the lift-off structures are removed by contact with a lift-off agent including a fluorinated solvent wherein the lift-off agent dissolves the fluorinated material at a second rate that is at least 150 nm/sec and higher than the first rate.
摘要翻译：制造器件的方法包括在具有用于图案化的一个或多个目标区域的器件衬底上提供氟化材料层。一个或多个剥离结构至少部分地通过使氟化材料层中的一个或多个开放区域的第一图案显影以与一个或多个目标区域对准，所述一个或多个开放区域通过与包含氟化溶剂的显影剂接触而溶解以第一速度氟化材料。在图案化之后，剥离结构通过与包含氟化溶剂的剥离剂接触而被去除，其中剥离剂以至少150nm / sec且高于第一速率的第二速率溶解氟化材料。

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