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1. 发明公开

EP4255123A1 LIGHT SOURCE APPARATUS 审中-实审
公开(公告)号：EP4255123A1
公开(公告)日：2023-10-04
申请号：EP22212095.8
申请日：2022-12-08
申请人： Ushio Denki Kabushiki Kaisha
发明人： TERAMOTO, Yusuke
IPC分类号： H05G2/00
摘要： A light source apparatus (1), in which an energy beam (EB) transforms a liquid raw material into plasma to extract radiation, includes a rotation body (50), a raw material supply section, and a layer thickness adjustment section. The rotation body (50) is disposed at a position onto which the energy beam (EB) is incident, and includes a groove (55) overlapping with an incident area of the energy beam (EB). The raw material supply section supplies the groove (55) with the liquid raw material. The layer thickness adjustment section adjusts a layer thickness of the liquid raw material such that a front surface of the liquid raw material forms a concave surface in response to the groove (55) in the incident area of the energy beam (EB).

2. 发明公开

EP4213228A1 INFRARED LED ELEMENT 审中-实审
公开(公告)号：EP4213228A1
公开(公告)日：2023-07-19
申请号：EP21879713.2
申请日：2021-07-27
申请人： Ushio Denki Kabushiki Kaisha
发明人： ISHIHARA, Kuniaki
IPC分类号： H01L33/22 , H01L33/30 , H01L33/36
摘要： Provided is an infrared LED element that has an emission wavelength of 1000 nm or more and exhibits high light extraction efficiency while being allowed to be manufactured through a simple process. The infrared LED element has a peak wavelength in a range from 1000 nm to 2000 nm inclusive and includes: an InP substrate that has a semi-insulating property; a first semiconductor layer of a conduction type that is a p-type or an n-type, the first semiconductor layer being formed on top of the InP substrate; an active layer formed on top of the first semiconductor layer; a second semiconductor layer of a conduction type different from the conduction type of the first semiconductor layer, the second semiconductor layer being formed on top of the active layer; a first electrode formed on top of the first semiconductor layer, the first electrode being in an area in which the active layer is not formed; and a second electrode formed on top of the second semiconductor layer, the second electrode being disposed at a place apart from the first electrode in a direction parallel to a surface of the InP substrate.

3. 发明公开

EP4212611A1 MICROFLUIDIC DEVICE AND METHOD FOR USING MICROFLUIDIC DEVICE 审中-实审
公开(公告)号：EP4212611A1
公开(公告)日：2023-07-19
申请号：EP21877355.4
申请日：2021-09-21
申请人： Ushio Denki Kabushiki Kaisha
发明人： TAKAHASHI,Seiichiro
IPC分类号： C12M3/00 , B01J19/00 , B81B1/00 , C12Q1/02 , G01N37/00
摘要： Disclosed herein are a microfluidic device that has a simple structure and is capable of performing perfusion culture and forming a cell layer barrier keeping a uniform cell density and a method for using such a microfluidic device. A microfluidic device 1 includes a first substrate 10, a second substrate 20 partially bonded to the first substrate 10, a first channel 25, a second channel 26, and a third channel 27 which extend between the first substrate 10 and the second substrate 20, first channel ports 21 and 22 connected to the first channel 25, at least one second channel port 23 connected to the second channel 26, and at least one third channel port 24 connected to the third channel 27, wherein a principal surface 20b-side wall surface 25d of the first channel 25 is closer to a principal surface 20b than a principal surface 20b-side wall surface 26d of the second channel 26 and a principal surface 20b-side wall surface 27d of the third channel 27.

4. 发明公开

EP4210087A1 ULTRAVIOLET IRRADIATION DEVICE 审中-实审
公开(公告)号：EP4210087A1
公开(公告)日：2023-07-12
申请号：EP23158382.4
申请日：2020-10-05
申请人： Ushio Denki Kabushiki Kaisha
发明人： YAGYU, Hideaki
IPC分类号： H01J65/00 , A61L2/10 , B01J19/12 , H01J61/16 , H01J65/04
摘要： Provide a compact ultraviolet irradiation device in which a degree of an adverse effect on the human body is suppressed. The ultraviolet irradiation device includes:
a lamp house (2) on at least one surface of which a light extraction surface (10) is formed;
an excimer lamp (3) accommodated in the lamp house (2) in a position separated from the light extraction surface (10) in a first direction (X), the excimer lamp (3) that emits ultraviolet light (L1), a main emission wavelength of which belongs to a first wavelength band of 190-225 nm;
a first electrode arranged in contact with an outer surface of an luminous tube of the excimer lamp (3);
a second electrode arranged in contact with the outer surface of the luminous tube of the excimer lamp (3);
an optical filter (21) that is arranged on the light extraction surface (10) and substantially transmits the ultraviolet light (L1) in the first wavelength band and does not substantially transmit ultraviolet light (L1) of a wavelength of 240-300 nm; and
a reflecting surface (31) that is located outside the luminous tube of the excimer lamp (3) and away from the luminous tube in a third direction (Z) orthogonal to the first direction (X) and a second direction (Y) parallel to a tube axis of the excimer lamp (3), the reflecting surface (31) being inclined to the light extraction surface (10) as seen in the second direction and exhibiting reflectivity with respect to the ultraviolet light (L1) in the first wavelength band.

5. 发明公开

EP4199660A1 EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE AND PROTECTION METHOD FOR RECEIVING PLATE MEMBER 审中-实审
公开(公告)号：EP4199660A1
公开(公告)日：2023-06-21
申请号：EP21879728.0
申请日：2021-08-05
申请人： Ushio Denki Kabushiki Kaisha
发明人： YABUTA, Hironobu , MIYAGAWA, Nobuaki
IPC分类号： H05H1/24 , G03F1/62 , G03F7/20 , H05G2/00
摘要： The invention improves corrosion resistance of the receiving surface of a receiving plate member that receives plasma raw material or debris. An extreme ultraviolet light source apparatus (1) includes a light source part (2) for generating a plasma that emits extreme ultraviolet light with use of excitation of a raw material for emitting extreme ultraviolet light; a storage vessel (4) for storing a melt of the raw material and debris that is emitted from the plasma; a receiving plate member (18) for receiving the melt of the raw material and the debris emitted from the plasma and for guiding the melt of the raw material and the debris into the storage vessel (4); and a corrosion-resistant member (P1) disposed on a receiving surface of the receiving plate member (18), the corrosion-resistant member being more corrosion-resistant to the melt of the raw material and the debris than the receiving plate member.

6. 发明授权

EP4071303B1 FRÄSWALZENKASTENEINHEIT 有权
公开(公告)号：EP4071303B1
公开(公告)日：2023-06-14
申请号：EP22163954.5
申请日：2022-03-23
发明人： Thelen, Thomas
IPC分类号： E01C23/088 , E01C23/12

7. 发明公开

EP4184233A1 INACTIVATING DEVICE AND OPTICAL FILTER 审中-实审
公开(公告)号：EP4184233A1
公开(公告)日：2023-05-24
申请号：EP22206664.9
申请日：2022-11-10
申请人： Ushio Denki Kabushiki Kaisha
发明人： YAGYU, Hideaki
IPC分类号： G02B19/00 , A61L2/00 , A61L2/10 , G02B5/20
摘要： An inactivating device (1) includes: an ultraviolet light source (30) to emit ultraviolet light (Lx), a main light-emission wavelength band of the ultraviolet light (Lx) being at least partly included in a range from 200 nm to 230 nm inclusive; and an optical filter (20b) including a multilayer dielectric film, wherein with respect to the ultraviolet light (Lx) incident at an incidence angle of 0 degrees, the optical filter (20b) has a band in which the ultraviolet light (Lx) in a range of wavelengths from 190 nm to 235 nm inclusive is transmitted, and a wavelength λ5 at which transmittance of the optical filter (20b) indicates 5% is longer than or equal to 236 nm and shorter than 245 nm.

8. 发明公开

EP4178322A1 EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE 审中-实审
公开(公告)号：EP4178322A1
公开(公告)日：2023-05-10
申请号：EP21858070.2
申请日：2021-07-09
申请人： Ushio Denki Kabushiki Kaisha
发明人： ASHIZAWA, Noritaka , YABUTA, Hironobu
IPC分类号： H05H1/24 , G03F7/20 , H05G2/00
摘要： An extreme ultraviolet light source apparatus includes a light source part configured to generate a plasma that emits extreme ultraviolet light; a vacuum housing located between the light source part and a utilizing apparatus in which the extreme ultraviolet light is utilized; a debris trap located inside the vacuum housing to deflect traveling directions of debris particles emitted from the plasma toward the utilizing apparatus from a ray direction of the extreme ultraviolet light; a heat shield panel structure located inside the vacuum housing and located between the plasma and the debris trap; and a cooling mechanism for cooling the heat shield panel structure. The heat shield panel structure has a first heat shield panel and a second heat shield panel overlapping the first heat shield panel, the first heat shield panel and the second heat shield panel being disposed at an interval. The second heat shield panel is disposed between the first heat shield panel and the plasma. The first heat shield panel is cooled by the cooling mechanism.

9. 发明公开

EP4177401A1 TANDEMWALZE ZUR VERDICHTUNG EINES BODENUNTERGRUNDES 有权
公开(公告)号：EP4177401A1
公开(公告)日：2023-05-10
申请号：EP22201534.9
申请日：2022-10-14
申请人： BOMAG GmbH
发明人： Kreutz, Tobias , Klein, Thomas
IPC分类号： E01C19/26
摘要： Die Erfindung betrifft eine Tandemwalze zur Verdichtung eines Bodenuntergrundes, umfassend einen von einer vorderen und einer hinteren Verdichtungsbandage getragenen Maschinenrahmen und einen Fahrstand mit einem in die Fahrrichtung ausgerichteten Fahrersitz, der mittels einer Verstelleinrichtung von einer Mitte des Fahrstandes in Richtung wenigstens einer Seite der Tandemwalze quer zur Maschinenlängsrichtung zu wenigstens einer definierten ersten Bedienposition und in dieselbe Richtung zu wenigstens einer definierten zweiten Bedienposition verschiebbar ist. Die Tandemwalze weist wenigstens zwei Peilungsmarkierungen (22,23) auf, wobei die erste Peilungsmarkierung der definierten ersten Bedienposition und die zweite Peilungsmarkierung der definierten zweiten Bedienposition zugeordnet ist, derart, dass die erste Peilungsmarkierung für einen im sich in der ersten Bedienposition befindlichen Fahrersitz sitzenden Bediener und die zweite Peilungsmarkierung für den im sich in der zweiten Bedienposition befindlichen Fahrersitz sitzenden Bediener jeweils einen Bodenpunkt in Sichtverlängerung vom Fahrersitz aus angeben, der jeweils parallel zur Fahrrichtung gesehen in linearer Verlängerung zum stirnseitigen Bodenaufstandspunkt derjenigen Stirnseite der in Fahrrichtung vorderen Verdichtungsbandage liegt, die in Richtung der Verstellrichtung des Fahrersitzes von der definierten ersten Bedienposition in Richtung der zweiten definierten Bedienposition das Fahrersitzes lokalisiert ist.

10. 发明授权

EP4071302B1 SELBSTFAHRENDE BODENFRÄSMASCHINE 有权
公开(公告)号：EP4071302B1
公开(公告)日：2023-05-03
申请号：EP22163953.7
申请日：2022-03-23
发明人： Muders, Nils
IPC分类号： E01C23/088 , E01C23/12

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