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    • 6. 发明公开
    • PROCEDE ET SYSTEME DE DEPÔT D'OXYDE SUR UN COMPOSANT POREUX
    • VERFAHREN UND系统ZUR OXIDABLAGERUNG AUF EINERPORÖSENSUBSTANZ
    • EP3077569A1
    • 2016-10-12
    • EP14825399.0
    • 2014-12-01
    • Office National d'Etudes et de Recherches Aérospatiales (ONERA)
    • BACOS, Marie-PierreROUSSEAU, FrédéricMORVAN, Daniel
    • C23C18/00F01D5/00F01D5/28C23C26/00C23C28/00C23C16/40C23C10/04C23C16/04C23C16/455F01D5/18B05B15/04C25D5/02B05D3/04B05D1/32
    • C23C4/11B23P2700/06C23C4/01C23C4/134C23C16/455C23C16/50C23C16/52F01D5/005F01D5/186F01D5/288F05D2230/312F05D2230/314F05D2230/80F05D2240/35F05D2260/202F05D2300/175F05D2300/20F05D2300/2112F05D2300/2118Y02T50/671
    • The invention relates to a method and system for forming a layer of oxide on a pervious component made of a material or a stack of materials that are stable at 400 °C, said component including an outer surface to be coated and at least one pore with a diameter of 50 to 1000 μm leading onto said outer surface. Said method includes the following steps: a) injecting a carrier gas loaded with droplets of at least one precursor of the oxide into a low-pressure plasma inside an enclosure of a plasma reactor housing the component to be coated, and injecting a fluid passing through the pervious component and flowing in gaseous state through said at least one pore with a flow opposite to that of the carrier gas in the plasma chamber in order to avoid the clogging of the pore, the pressure and the mass flow of said fluid upstream of the pervious component being such that the pressure of the gas at the outlet of the at least one pore is higher than the pressure in the plasma chamber, and the injection mass flow of the fluid passing through the pervious component is: α) less than or equal to the mass flow of the carrier gas loaded with precursors of the oxide injected into the plasma chamber; and β) greater than or equal to the product of the mass flow of the carrier gas loaded with precursors of the oxide injected into the plasma chamber by the ratio between the total surface of the open pores of the pervious component and the surface of the passage section of the plasma chamber; thus, the speed of the gas at the outlet of the at least one pore is no lower than the intake speed of the carrier gas loaded with at least one precursor of the oxide in, non-preferentially, the liquid, gel or solid state thereof, on the outer surface of the component; b) injecting a carrier gas not loaded with a precursor of the oxide into a plasma inside the plasma chamber, wherein the injection of the fluid passing through the pervious component is maintained and steps a) and b) are repeated, such as to form said oxide on the outer surface, the diameter of the at least one pore being preserved.
    • 本发明涉及一种用于在由在400℃下稳定的材料或一堆材料制成的可渗透部件上形成氧化物层的方法和系统,所述部件包括待涂覆的外表面和至少一个孔 直径为50至1000μm,通向所述外表面。 所述方法包括以下步骤:a)将负载有至少一种氧化物前体的液滴的载气注入到容纳待涂覆的组分的等离子体反应器的外壳内的低压等离子体中,并注入通过的流体 所述渗透组分以气态流过所述至少一个孔,其流动与所述等离子体室中的所述载气的流动相反,以避免所述流体在所述等离子体室上游的所述孔,所述压力和所述流体的质量流量堵塞 渗透成分使得至少一个孔的出口处的气体的压力高于等离子体室中的压力,并且通过可透过组分的流体的喷射质量流量为:α)小于或等于 与负载注入到等离子体室中的氧化物的前体的载气的质量较低,以及β)大于或等于装载有前体的载气的质量流量的乘积 通过透水部件的开放孔的总表面与等离子体室的通道部分的表面之间的比例注入等离子体室,因此,至少一个孔的出口处的气体的速度为 不低于装载有至少一种氧化物的载体的载气的吸入速度,其非常优选为液体,凝胶或固态,在组分的外表面上; b)注入未载有前体载体的载气