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    • 6. 发明公开
    • PROCÉDÉ DE RÉPARATION LOCALE DE BARRIÈRES THERMIQUES
    • VERFAHREN ZUR LOKALEN REPARATUR VONWÄRMESPERREN
    • EP3077570A1
    • 2016-10-12
    • EP14827467.3
    • 2014-12-01
    • Office National d'Etudes et de Recherches Aérospatiales (ONERA)
    • BACOS, Marie-PierreLAVIGNE, OdileRIO, CatherineVIDAL-SETIF, Marie-HélèneROUSSEAU, FrédéricMORVAN, Daniel
    • C23C18/00F01D5/00F01D5/28C23C26/00C23C28/00
    • F01D5/005C23C4/01C23C4/02C23C4/06C23C4/11C23C4/134F01D5/28F05D2220/32F05D2230/80F05D2230/90F05D2300/502F05D2300/611F23R3/002Y02T50/671
    • The invention relates to a method for repairing a thermal barrier of a component comprising a substrate coated with such a thermal barrier, said substrate being made of a high-performance alloy, said thermal barrier being adhered to the alloy and having lower thermal conductivity than the alloy, the thermal barrier including at least one ceramic, one region of the thermal barrier being a region to be repaired, wherein said method includes the following steps: a) defining the region to be repaired, using a mask which protects the other regions of the thermal barrier; b) injecting a carrier gas loaded with droplets of ceramic precursor into a plasma discharge inside a plasma chamber of a plasma reactor containing the component to be repaired, while making the concentration of ceramic precursor in the carrier gas dependent on at least one parameter of the reactor selected from among: the pressure of the plasma chamber, the power of the plasma generator and the diameter of the precursor droplets, in order to control the state — liquid, gel or solid — of the ceramic precursor having an effect on the region to be repaired; c) injecting a gas not loaded with ceramic precursor into a plasma discharge within the plasma chamber, steps b) and c) being repeated.
    • 本发明涉及一种用于修复包括涂覆有这种热障的基底的部件的热障的方法,所述基底由高性能合金制成,所述热障粘附在合金上并具有比 合金,所述热障包括至少一个陶瓷,所述热障壁的一个区域是要修复的区域,其中所述方法包括以下步骤:a)使用保护其它区域的掩模来限定待修复的区域 热障; b)将装载有陶瓷前体液滴的载气注入含有待修复组分的等离子体反应器的等离子体室内的等离子体放电中,同时使载体气体中的陶瓷前体的浓度取决于载体的至少一个参数 反应器,其选自:等离子体室的压力,等离子体发生器的功率和前体液滴的直径,以便控制对该区域具有影响的陶瓷前体的状态 - 液体,凝胶或固体 被修理 c)将未装载陶瓷前体的气体注入到等离子体室内的等离子体放电中,重复步骤b)和c)。