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1. 发明公开

EP3077569A1 PROCEDE ET SYSTEME DE DEPÔT D'OXYDE SUR UN COMPOSANT POREUX 有权
标题翻译： VERFAHREN UND系统ZUR OXIDABLAGERUNG AUF EINERPORÖSENSUBSTANZ
公开(公告)号：EP3077569A1
公开(公告)日：2016-10-12
申请号：EP14825399.0
申请日：2014-12-01
申请人： Office National d'Etudes et de Recherches Aérospatiales (ONERA)
发明人： BACOS, Marie-Pierre , ROUSSEAU, Frédéric , MORVAN, Daniel
IPC分类号： C23C18/00 , F01D5/00 , F01D5/28 , C23C26/00 , C23C28/00 , C23C16/40 , C23C10/04 , C23C16/04 , C23C16/455 , F01D5/18 , B05B15/04 , C25D5/02 , B05D3/04 , B05D1/32
CPC分类号： C23C4/11 , B23P2700/06 , C23C4/01 , C23C4/134 , C23C16/455 , C23C16/50 , C23C16/52 , F01D5/005 , F01D5/186 , F01D5/288 , F05D2230/312 , F05D2230/314 , F05D2230/80 , F05D2240/35 , F05D2260/202 , F05D2300/175 , F05D2300/20 , F05D2300/2112 , F05D2300/2118 , Y02T50/671
摘要： The invention relates to a method and system for forming a layer of oxide on a pervious component made of a material or a stack of materials that are stable at 400 °C, said component including an outer surface to be coated and at least one pore with a diameter of 50 to 1000 μm leading onto said outer surface. Said method includes the following steps: a) injecting a carrier gas loaded with droplets of at least one precursor of the oxide into a low-pressure plasma inside an enclosure of a plasma reactor housing the component to be coated, and injecting a fluid passing through the pervious component and flowing in gaseous state through said at least one pore with a flow opposite to that of the carrier gas in the plasma chamber in order to avoid the clogging of the pore, the pressure and the mass flow of said fluid upstream of the pervious component being such that the pressure of the gas at the outlet of the at least one pore is higher than the pressure in the plasma chamber, and the injection mass flow of the fluid passing through the pervious component is: α) less than or equal to the mass flow of the carrier gas loaded with precursors of the oxide injected into the plasma chamber; and β) greater than or equal to the product of the mass flow of the carrier gas loaded with precursors of the oxide injected into the plasma chamber by the ratio between the total surface of the open pores of the pervious component and the surface of the passage section of the plasma chamber; thus, the speed of the gas at the outlet of the at least one pore is no lower than the intake speed of the carrier gas loaded with at least one precursor of the oxide in, non-preferentially, the liquid, gel or solid state thereof, on the outer surface of the component; b) injecting a carrier gas not loaded with a precursor of the oxide into a plasma inside the plasma chamber, wherein the injection of the fluid passing through the pervious component is maintained and steps a) and b) are repeated, such as to form said oxide on the outer surface, the diameter of the at least one pore being preserved.
摘要翻译：本发明涉及一种用于在由在400℃下稳定的材料或一堆材料制成的可渗透部件上形成氧化物层的方法和系统，所述部件包括待涂覆的外表面和至少一个孔直径为50至1000μm，通向所述外表面。所述方法包括以下步骤：a）将负载有至少一种氧化物前体的液滴的载气注入到容纳待涂覆的组分的等离子体反应器的外壳内的低压等离子体中，并注入通过的流体所述渗透组分以气态流过所述至少一个孔，其流动与所述等离子体室中的所述载气的流动相反，以避免所述流体在所述等离子体室上游的所述孔，所述压力和所述流体的质量流量堵塞渗透成分使得至少一个孔的出口处的气体的压力高于等离子体室中的压力，并且通过可透过组分的流体的喷射质量流量为：α）小于或等于与负载注入到等离子体室中的氧化物的前体的载气的质量较低，以及β）大于或等于装载有前体的载气的质量流量的乘积通过透水部件的开放孔的总表面与等离子体室的通道部分的表面之间的比例注入等离子体室，因此，至少一个孔的出口处的气体的速度为不低于装载有至少一种氧化物的载体的载气的吸入速度，其非常优选为液体，凝胶或固态，在组分的外表面上; b）注入未载有前体载体的载气

2. 发明公开

EP3077570A1 PROCÉDÉ DE RÉPARATION LOCALE DE BARRIÈRES THERMIQUES 有权
标题翻译： VERFAHREN ZUR LOKALEN REPARATUR VONWÄRMESPERREN
公开(公告)号：EP3077570A1
公开(公告)日：2016-10-12
申请号：EP14827467.3
申请日：2014-12-01
申请人： Office National d'Etudes et de Recherches Aérospatiales (ONERA)
发明人： BACOS, Marie-Pierre , LAVIGNE, Odile , RIO, Catherine , VIDAL-SETIF, Marie-Hélène , ROUSSEAU, Frédéric , MORVAN, Daniel
IPC分类号： C23C18/00 , F01D5/00 , F01D5/28 , C23C26/00 , C23C28/00
CPC分类号： F01D5/005 , C23C4/01 , C23C4/02 , C23C4/06 , C23C4/11 , C23C4/134 , F01D5/28 , F05D2220/32 , F05D2230/80 , F05D2230/90 , F05D2300/502 , F05D2300/611 , F23R3/002 , Y02T50/671
摘要： The invention relates to a method for repairing a thermal barrier of a component comprising a substrate coated with such a thermal barrier, said substrate being made of a high-performance alloy, said thermal barrier being adhered to the alloy and having lower thermal conductivity than the alloy, the thermal barrier including at least one ceramic, one region of the thermal barrier being a region to be repaired, wherein said method includes the following steps: a) defining the region to be repaired, using a mask which protects the other regions of the thermal barrier; b) injecting a carrier gas loaded with droplets of ceramic precursor into a plasma discharge inside a plasma chamber of a plasma reactor containing the component to be repaired, while making the concentration of ceramic precursor in the carrier gas dependent on at least one parameter of the reactor selected from among: the pressure of the plasma chamber, the power of the plasma generator and the diameter of the precursor droplets, in order to control the state — liquid, gel or solid — of the ceramic precursor having an effect on the region to be repaired; c) injecting a gas not loaded with ceramic precursor into a plasma discharge within the plasma chamber, steps b) and c) being repeated.
摘要翻译：本发明涉及一种用于修复包括涂覆有这种热障的基底的部件的热障的方法，所述基底由高性能合金制成，所述热障粘附在合金上并具有比合金，所述热障包括至少一个陶瓷，所述热障壁的一个区域是要修复的区域，其中所述方法包括以下步骤：a）使用保护其它区域的掩模来限定待修复的区域热障; b）将装载有陶瓷前体液滴的载气注入含有待修复组分的等离子体反应器的等离子体室内的等离子体放电中，同时使载体气体中的陶瓷前体的浓度取决于载体的至少一个参数反应器，其选自：等离子体室的压力，等离子体发生器的功率和前体液滴的直径，以便控制对该区域具有影响的陶瓷前体的状态 - 液体，凝胶或固体被修理 c）将未装载陶瓷前体的气体注入到等离子体室内的等离子体放电中，重复步骤b）和c）。

3. 发明授权

EP3077570B1 PROCÉDÉ DE RÉPARATION LOCALE DE BARRIÈRES THERMIQUES 有权
标题翻译：局部修复热障的方法
公开(公告)号：EP3077570B1
公开(公告)日：2017-10-11
申请号：EP14827467.3
申请日：2014-12-01
申请人： Office National d'Etudes et de Recherches Aérospatiales (ONERA)
发明人： BACOS, Marie-Pierre , LAVIGNE, Odile , RIO, Catherine , VIDAL-SETIF, Marie-Hélène , ROUSSEAU, Frédéric , MORVAN, Daniel
IPC分类号： C23C18/00 , F01D5/00 , F01D5/28 , C23C26/00 , C23C28/00
CPC分类号： F01D5/005 , C23C4/01 , C23C4/02 , C23C4/06 , C23C4/11 , C23C4/134 , F01D5/28 , F05D2220/32 , F05D2230/80 , F05D2230/90 , F05D2300/502 , F05D2300/611 , F23R3/002 , Y02T50/671

4. 发明授权

EP3077569B1 PROCEDE ET SYSTEME DE DEPÔT D'OXYDE SUR UN COMPOSANT POREUX 有权
标题翻译： PROCEDE ET SYSTEME DEDEPÔTD'OXYDE SUR UN COMPOSANT POREUX
公开(公告)号：EP3077569B1
公开(公告)日：2017-08-16
申请号：EP14825399.0
申请日：2014-12-01
申请人： Office National d'Etudes et de Recherches Aérospatiales (ONERA)
发明人： BACOS, Marie-Pierre , ROUSSEAU, Frédéric , MORVAN, Daniel
IPC分类号： C23C18/00 , F01D5/00 , F01D5/28 , C23C26/00 , C23C28/00 , C23C16/40 , C23C10/04 , C23C16/04 , C23C16/455 , F01D5/18 , B05B15/04 , C25D5/02 , B05D3/04 , B05D1/32
CPC分类号： C23C4/11 , B23P2700/06 , C23C4/01 , C23C4/134 , C23C16/455 , C23C16/50 , C23C16/52 , F01D5/005 , F01D5/186 , F01D5/288 , F05D2230/312 , F05D2230/314 , F05D2230/80 , F05D2240/35 , F05D2260/202 , F05D2300/175 , F05D2300/20 , F05D2300/2112 , F05D2300/2118 , Y02T50/671

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