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1. 发明授权

EP2129809B1 WEAR RESISTANT HARD COATING FOR A WORKPIECE AND METHOD FOR PRODUCING THE SAME 有权转让
公开(公告)号：EP2129809B1
公开(公告)日：2020-12-02
申请号：EP08717335.7
申请日：2008-03-03
申请人： Oerlikon Trading AG, Trübbach
发明人： LECHTHALER, Markus , REITER, Andreas
IPC分类号： C23C4/12 , C23C28/04 , C23C30/00 , B23B27/00 , C23C14/34 , C23C4/137 , C23C14/06 , C23C28/00

2. 发明公开

EP2872665A1 HOCHLEISTUNGSIMPULSBESCHICHTUNGSMETHODE 有权转让
标题翻译： - 高功率脉冲涂法
公开(公告)号：EP2872665A1
公开(公告)日：2015-05-20
申请号：EP13732096.6
申请日：2013-06-24
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , KURAPOV, Denis
IPC分类号： C23C14/34 , H01J37/34
CPC分类号： C23C14/3485 , C23C14/345 , C23C14/3464 , H01J37/3405 , H01J37/3467 , H01J2237/332
摘要： The invention relates to a method for coating substrates by sputtering of target material, the method comprising the following steps: - applying a first sputtering target made of a first material in a coating chamber to a power pulse by which, during a first time interval, a first amount of energy is transmitted to the sputtering target, wherein the maximum power density exceeds 50W/cm
2 and preferably 500W/cm
2 ; - applying a second sputtering target made of a second material that is different from the first material in the coating chamber to a power pulse by which, during a second time interval, a second amount of energy is transmitted to the sputtering target, wherein the maximum power density exceeds 50W/cm
2 and preferably 500W/cm
2 , characterized in that the first amount of energy differs from the second amount of energy.

3. 发明公开

EP2868768A1 Shutter system 有权转让
标题翻译： Verschlussvorrichtung
公开(公告)号：EP2868768A1
公开(公告)日：2015-05-06
申请号：EP13005128.7
申请日：2013-10-29
申请人： Oerlikon Trading AG, Trübbach
发明人： Kurapov, Denis
IPC分类号： C23C14/22 , C23C14/50
CPC分类号： C23C14/50 , C23C14/22 , C23C14/505
摘要： The present invention relates to an apparatus for treating and/or coating substrate surfaces having a substrate shutter system which allows a better economical utilization of the apparatus as well as a more versatile buildup of multilayer coating structures. The apparatus according to the present invention is characterized by comprising at least one substrate holding system (3) that comprises at least one shutter system comprising at least one movable shutter element (1) to be arranged around of at least a portion of the holder system for shielding at least some of the substrates arranged in the holding system in such a manner that the surface of the shielded substrates cannot be treated during the execution of the one or more surface treatments or at least during a part of the execution of the one or more surface treatments because the movable shutter element interrupts at least partially or avoid completely the surface treatment of the shielded substrates.
摘要翻译：本发明涉及一种用于处理和/或涂覆基材表面的设备，该设备具有基板快门系统，其允许更好地经济地利用设备以及多功能多层涂层结构的积累。根据本发明的装置的特征在于包括至少一个基板保持系统（3），该基板保持系统（3）包括至少一个快门系统，该快门系统包括至少一个活动快门元件（1），该活动快门元件围绕至少一部分保持器系统用于屏蔽布置在保持系统中的至少一些基板，使得屏蔽基板的表面在执行一个或多个表面处理期间不能被处理，或者至少在执行一个或多个表面处理的一部分期间更多的表面处理是因为可移动快门元件至少部分地中断或完全避免了屏蔽基板的表面处理。

4. 发明授权

EP2732068B1 VERFAHREN ZUR VERBESSERUNG DER VERSCHLEISSBESTÄNDIGKEIT VON EINGEFÄRBTEN CHIRURGISCHEN INSTRUMENTEN 有权
标题翻译：改善碎石外科器械耐磨性的方法
公开(公告)号：EP2732068B1
公开(公告)日：2015-03-04
申请号：EP12738397.4
申请日：2012-07-10
申请人： Oerlikon Trading AG, Trübbach
发明人： JANSSEN, Albert Peter Gerhard , SINICCO, Gabriella
IPC分类号： C23C14/08 , C23C14/58 , C23C14/00 , A61B1/00 , A61L31/08
CPC分类号： C23C14/0641 , A61L31/022 , A61L31/088 , C23C14/0015 , C23C14/025 , C23C14/083 , C23C14/5853

5. 发明公开

EP2789006A1 REAKTIVER SPUTTERPROZESS 有权转让
标题翻译：反应溅射
公开(公告)号：EP2789006A1
公开(公告)日：2014-10-15
申请号：EP12810067.4
申请日：2012-11-23
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried
IPC分类号： H01J37/34 , C23C14/00 , C23C14/34
CPC分类号： C23C14/3485 , C23C14/0094 , H01J37/3467 , H01J37/3485
摘要： The invention relates to a method for reactive sputtering in which, by means of ion bombardment, material is ejected from the surface of a first target and undergoes transition to the gas phase, wherein negative voltage is applied pulsewise to the target in such a way that an electric current having a current density of greater than 0.5A/cm
2 occurs at the target surface, such that the material undergoing transition to the gas phase is at least partly ionized, and in which a reactive gas flow is established and reactive gas reacts with the material of the target surface, characterized in that the duration of a voltage pulse is chosen such that, during the voltage pulse, the target surface, at the location or locations at which the current flows, most of the time is covered at least partly with a compound composed of reactive gas and target material and, consequently, the target surface is in a first intermediate state, and this covering is smaller at the end of the voltage pulse than at the start of the voltage pulse and, consequently, the target surface is in a second intermediate state at the end of the voltage pulse.

6. 发明公开

EP2777061A1 HIPIMS-SCHICHTEN 有权转让
公开(公告)号：EP2777061A1
公开(公告)日：2014-09-17
申请号：EP12794175.5
申请日：2012-10-26
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , LECHTHALER, Markus
IPC分类号： H01J37/34 , C23C14/34
CPC分类号： C23C14/35 , C23C14/345 , C23C14/3485 , H01J37/3467
摘要： The present invention relates to a method for the vapour deposition of PVD layer systems by means of sputtering on at least one substrate, wherein the layer system comprises at least a first layer, characterized in that, at least in one step of the method, a HIPIMS method is used with a power density of at least 250 W/cm
2 , wherein a pulse length with a duration of at least 5 ms is used while a substrate bias is applied to the substrate.
摘要翻译：本发明涉及一种用于通过溅射在至少一个衬底上蒸镀PVD层体系的方法，其中该层体系至少包括第一层，其特征在于，该方法的至少一个步骤中， HIPIMS方法以至少250W / cm 2的功率密度使用，其中在将衬底偏压施加到衬底时使用持续时间至少5ms的脉冲长度。

7. 发明授权

EP2062443B1 FARBRAD 有权转让
标题翻译：色轮
公开(公告)号：EP2062443B1
公开(公告)日：2014-08-27
申请号：EP07786286.0
申请日：2007-07-24
申请人： Oerlikon Trading AG, Trübbach
发明人： CUSICK, Mike , MILBOURNE, Mike , MANN, Allen
IPC分类号： H04N9/31 , G02B7/00
CPC分类号： H04N9/3111 , G02B7/006 , G02B7/008 , G02B26/008 , H04N9/3114

8. 发明授权

EP2018653B1 ARCQUELLE UND MAGNETANORDNUNG 有权
标题翻译：弧源和磁装置
公开(公告)号：EP2018653B1
公开(公告)日：2014-08-06
申请号：EP07728997.3
申请日：2007-05-10
申请人： Oerlikon Trading AG, Trübbach
发明人： KRASSNITZER, Siegfried , HAGMANN, Juerg , GWEHENBERGER, Juergen
IPC分类号： H01J37/32 , C23C14/32 , C23C14/56
CPC分类号： H01J37/3266 , C23C14/325 , C23C14/564 , H01J37/32055 , H01J37/32614 , H01J37/345 , H01J37/3452 , H01J37/3458

9. 发明公开

EP2732068A1 VERFAHREN ZUR VERBESSERUNG DER VERSCHLEISSBESTÄNDIGKEIT VON EINGEFÄRBTEN CHIRURGISCHEN INSTRUMENTEN 有权
标题翻译：方法来提高有色手术器械的耐磨性
公开(公告)号：EP2732068A1
公开(公告)日：2014-05-21
申请号：EP12738397.4
申请日：2012-07-10
申请人： Oerlikon Trading AG, Trübbach
发明人： JANSSEN, Albert Peter Gerhard , SINICCO, Gabriella
IPC分类号： C23C14/08 , C23C14/58 , C23C14/00 , A61B1/00 , A61L31/08
CPC分类号： C23C14/0641 , A61L31/022 , A61L31/088 , C23C14/0015 , C23C14/025 , C23C14/083 , C23C14/5853
摘要： The present invention relates to a method for improving the wear resistance of dyed surgical instruments having a vacuum-resistant material as the main body which, over the course of a vacuum coating step, is coated with a thin layer of titanium, and the coated surface is subjected to anodic oxidation. The method is characterized in that, over the course of the vacuum coating step, prior to coating with the layer of titanium, at least parts of the main body are coated with a layer of hard material which improves the wear protection.

10. 发明公开

EP2695298A1 NÄHERUNGSSENSOR 有权转让
标题翻译：接近传感器
公开(公告)号：EP2695298A1
公开(公告)日：2014-02-12
申请号：EP12708497.8
申请日：2012-03-02
申请人： Oerlikon Trading AG, Trübbach
发明人： KECKES, Antal , SCHULER, Peter , HERMANN, Thomas
IPC分类号： H03K17/955 , C03C17/34
CPC分类号： H01L31/0203 , H01L31/18 , H03K17/955 , H03K2217/960755
摘要： The present invention relates to an electronic proximity sensor having a decorative surface, characterized in that the decorative surface comprises a semiconductor layer, the thickness of which is between 10 nm and 100 nm. This coating imparts a desired metallic appearance to the proximity sensor, without the property thereof as a proximity sensor being lost.

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