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    • 86. 发明公开
    • A semiconductor laser and a method for producing the same
    • 一种半导体激光器及其制造方法
    • EP0785602A1
    • 1997-07-23
    • EP97100683.8
    • 1997-01-17
    • SHARP KABUSHIKI KAISHA
    • Ikeda, HiroakiOhbayashi, Ken
    • H01S3/19
    • H01S5/2231H01S5/204H01S5/209H01S5/222H01S5/2227H01S5/32316
    • A semiconductor laser device according to the present invention includes: a semiconductor substrate having a first conductivity type; and a semiconductor multilayer structure provided on the semiconductor substrate, the semiconductor multilayer structure including an active layer. The semiconductor multilayer structure includes: a lower cladding layer provided below the active layer, the lower cladding layer having the first conductivity type; an upper cladding structure provided above the active layer, the upper cladding structure having a second conductivity type; and a cap layer provided above the upper cladding structure. A ridge is formed in the upper cladding structure, and a width of a lower face of the cap layer is larger than a width of an upper face of the ridge.
    • 根据本发明的半导体激光装置包括:具有第一导电类型的半导体衬底; 以及设置在所述半导体衬底上的半导体多层结构,所述半导体多层结构包括有源层。 该半导体多层结构包括:设置在有源层下方的下覆层,下覆层具有第一导电类型; 设置在所述有源层上方的上覆层结构,所述上覆层结构具有第二导电类型; 以及设置在上部包层结构上方的盖层。 在上部覆盖结构中形成脊,并且覆盖层的下表面的宽度大于脊的上表面的宽度。
    • 88. 发明公开
    • Semiconductor laser with AlInP or AlGaInP burying layer and fabrication method thereof
    • Halbleiterlaser mit AlInP oder AlGaInP vergrabenes Schicht und Herstellungsverfahren。
    • EP0664592A1
    • 1995-07-26
    • EP95300427.2
    • 1995-01-24
    • NEC Corporation
    • Kobayashi, Ryuji, c/o NEC Corp.Kobayashi, Kenichi, c/o NEC Corp.Hotta, Hitoshi, c/o NEC Corp.
    • H01S3/19
    • H01S5/2231H01S5/2209H01S5/221H01S5/222H01S5/32325H01S2304/04
    • A semiconductor laser having improved reliability. The laser contains an AIGalnP first cladding layer of a first conductivity type, an AIGalnP second cladding layer of a second conductivity type that forms a mesa stripe, an active layer made of an undoped GaInP layer, an undoped AlGaInP layer, or a quantum well layer of an undoped GaInP sublayer and an undoped AlGaInP sublayer. The laser further contains a burying layer made of an Al x In 1-x P or (Al y Ga 1- y ) x In 1-x P layer, which is placed at both sides of the mesa stripe to bury the stripe. The burying layer is larger in energy band gap than the active layer and smaller in refractive index than the second cladding layer. The burying layer has first regions that are contacted with and extend along respective side faces of the mesa stripe. An AI composition x of the first regions is set so that the first regions are lattice-matched to GaAs. The burying layer has second regions that are joined with respective bottom ends of the first regions and extend along the active layer. An AI composition x of the second regions is set so that the second regions are lattice-matched or are not lattice-matched to GaAs.
    • 一种提高可靠性的半导体激光器。 激光器包括第一导电类型的AlGaInP第一包层,形成台面条的第二导电类型的AlGaInP第二包覆层,由未掺杂的GaInP层制成的有源层,未掺杂的AlGaInP层或量子阱层 的未掺杂的GaInP子层和未掺杂的AlGaInP子层。 激光还包含由AlxIn1-xP或(AlyGa1-y)xIn1-xP层制成的掩埋层,其被放置在台面条的两侧以埋置条纹。 掩埋层的能带隙比有源层大,折射率小于第二覆层。 掩埋层具有与台面条的相应侧面接触并延伸的第一区域。 设置第一区域的Al组分x,使得第一区域与GaAs晶格匹配。 掩埋层具有与第一区域的相应底端连接并沿着有源层延伸的第二区域。 设置第二区域的Al组分x,使得第二区域晶格匹配或不与GaAs晶格匹配。