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71. 发明授权

EP0848688B1 METHOD FOR MAKING AN ARTICLE HAVING A GRADIENT OF COMPOSITION 失效
标题翻译：方法生产的对象与GRADIENTZUSAMMENSETZUNG
公开(公告)号：EP0848688B1
公开(公告)日：2002-03-06
申请号：EP96927354.9
申请日：1996-08-07
申请人： CORNING INCORPORATED
发明人： PRASSAS, Michel , KERDONCUFF, Alain , GILLE, Claude, François, Maurice
IPC分类号： C03B17/06 , C03B13/10 , C03B32/00
CPC分类号： C03B37/01268 , C03B17/02 , C03B17/025 , C03B32/00 , Y02P40/57 , Y10T428/1086 , Y10T428/31601
摘要： According to the invention, a) at least the first and second compositions of this material in the fluid phase are prepared, b) a sheet (61) of the first composition is poured continuously onto a flat support (4), c) a sheet (62) of the second composition is poured continuously onto sheet (61) of the first composition, and d) the thermal interdiffusion of the materials of the two sheets is ensured so as to obtain the desired gradient of composition in the cooled bar.

72. 发明公开

EP1018490A4 METHOD FOR PRODUCING AIR-QUENCH TOUGHENED GLASS PLATE 审中-公开
标题翻译：用于生产风干GLASS
公开(公告)号：EP1018490A4
公开(公告)日：2001-12-19
申请号：EP99926943
申请日：1999-07-06
申请人： NIPPON SHEET GLASS CO LTD
发明人： AKAI CHIHIRO , KIKUTA MASASHI , MAENAKA MASAYUKI
IPC分类号： C03B27/04 , C03B27/044 , C03B32/00 , C03C23/00
CPC分类号： C03C23/007 , C03B27/04 , C03B27/0413 , C03B27/0417 , C03B27/044 , C03B32/00 , Y02P40/57
摘要： In a production process for air-quench toughened glass plates, a failed glass plate containing nickel sulfide (NiS) is removed through subjecting it to an effective forced fracture. Such forced fracture is carried out during batchwise soaking treatment after a toughening step, or in a toughening step after causing cracks to occur in an annealing step before the toughening step, or in a toughening step after causing cracks to occur in a pretreatment step before the toughening step, or during continuous annealing after a toughening step. This method can be used for producing a high quality toughened glass plate free of NiS.

73. 发明授权

EP0711736B1 Pure transparent quartz glass and process for production thereof 失效
标题翻译：其制备高纯度的透明石英玻璃和过程
公开(公告)号：EP0711736B1
公开(公告)日：2001-06-06
申请号：EP95116181.9
申请日：1995-10-13
申请人： TOSOH CORPORATION , NIPPON SILICA GLASS CO., LTD.,
发明人： Orii, Koichi, c/o Nitto Chem. Ind. Co. Ltd. , Hara, Yukinobu, c/o Nitto Chem. Ind. Co. Ltd. , Akiyama, Tomoyuki , Tsukuma, Koji , Kikuchi, Yoshikazu
IPC分类号： C03C3/06 , C03B19/09 , C03B20/00 , C03B32/00
CPC分类号： C03C3/06 , C03B19/06 , C03B19/066 , C03B20/00 , C03B32/02 , C03B2201/03 , C03B2201/04 , C03C2201/23 , C03C2203/10

74. 发明公开

EP0897113A3 Procédé de détection de sulfures de nickel dans des substrats de verre 失效
标题翻译：一种用于在玻璃基板检测方法Nickelsulphiden
公开(公告)号：EP0897113A3
公开(公告)日：2000-10-25
申请号：EP98401634.5
申请日：1998-07-01
申请人： SAINT-GOBAIN VITRAGE
发明人： Bordeaux, Frédéric , Kasper, Andreas
IPC分类号： C03B32/00
CPC分类号： C03B32/00
摘要： L'invention a pour but un procédé de détection de sulfure de nickel dans des substrats en verre consistant en un traitement thermique, ledit traitement thermique comportant un palier d'une durée supérieure à une heure, dans une ambiance maintenue à une température inférieure à 250°C.

75. 发明公开

EP1020413A1 Silica glass article and manufacturing method therefor 有权
标题翻译： Quarzglasgegenstand und dessen Herstellung
公开(公告)号：EP1020413A1
公开(公告)日：2000-07-19
申请号：EP99126222.1
申请日：1999-12-30
申请人： SUMITOMO ELECTRIC INDUSTRIES, LTD.
发明人： Urano, Akira, Yokohama Works of Sumitomo Electric , Mogi, Masaharu, Yokohama Work of Sumitomo Electric , Shishido, Yasuhiko, Yokohama Work of Sumitomo El. , Ohga, Yuichi, Yokohama Works of Sumitomo Electric
IPC分类号： C03C3/06 , C03C4/00 , C03C13/04 , C03C23/00 , C03C25/62 , C03B32/00 , C03B37/14 , C03B37/15
CPC分类号： C03B37/01446 , C03B19/1453 , C03B32/00 , C03B37/15 , C03B2201/12 , C03B2201/21 , C03C3/06 , C03C4/0085 , C03C13/045 , C03C23/0025 , C03C25/6208 , C03C2201/21 , C03C2203/50 , Y02P40/57
摘要： A method of manufacturing a silica glass article comprising: (1) placing a starting silica glass article in an atmosphere containing hydrogen molecules to introduce hydrogen molecules into said starting silica glass article at a concentration of not lower than 1 x 10 16 molecules/cm 3 ; (2) taking said hydrogen-introduced silica glass article out of the atmosphere containing hydrogen molecules; and (3) irradiating said silica glass article with at least 10 6 pulses of an excimer laser beam having an energy of 10 mJ per pulse within a period in which the concentration of hydrogen molecules remaining in said silica glass article is not lower than 1 x 10 16 molecules/cm 3 , to obtain a processed silica glass article which causes substantially no increase in its light absorption in an ultraviolet region. Also disclosed are silica glass articles and optical fiber processed employing the above method.
摘要翻译：一种制造石英玻璃制品的方法，包括：（1）将起始石英玻璃制品放置在含有氢分子的气氛中，以不低于1×10 16分子/分钟的浓度将氢分子引入所述起始石英玻璃制品中，厘米<3>; （2）将含氢引入石英玻璃制品从含有氢分子的气氛中取出; 和（3）在剩余在所述石英玻璃制品中的氢分子的浓度不低于该时间内的脉冲中，每脉冲具有10mJ能量的准分子激光束的至少10 6脉冲照射所述石英玻璃制品 1×10 16分子/ cm 3，以获得在紫外线区域基本上不增加其光吸收的经处理的二氧化硅玻璃制品。还公开了采用上述方法处理的石英玻璃制品和光纤。

76. 发明公开

EP1017642A1 METHOD OF MAKING GLASS HAVING POLARIZING AND NON-POLARIZING REGIONS 失效
标题翻译：用于生产玻璃，偏光和非偏光区域
公开(公告)号：EP1017642A1
公开(公告)日：2000-07-12
申请号：EP98918233.2
申请日：1998-04-16
申请人： CORNING INCORPORATED
发明人： BORRELLI, Nicholas, F. , SMITH, Dennis, W.
IPC分类号： C03C15/00 , C03B27/012 , C03B32/00 , C03B37/00
CPC分类号： C03C21/001 , C03C3/11 , C03C14/006 , C03C21/005 , C03C23/002 , C03C23/007 , C03C2214/08 , C03C2214/16 , C03C2214/30
摘要： Method is disclosed for making glass having both polarizing and non-polarizing regions integral thereto by either ion-exchange or by exposure to light and heat. The polarizing regions of the resulting glass is effective in polarizing light radiation, that is, the glass exhibits permanent dichroic behavior and has at least some polarizing effect in the wavelength range of 400 to 700 nm. The base glass composition contains Cu, Ag and at least one halide such that the resulting precipitated crystal phase consists of a halide.

77. 发明公开

EP1015393A1 PROCEDE D'IDENTIFICATION D'UN VITRAGE TRAITE THERMIQUEMENT 有权
标题翻译：用于识别通过一种“热浸泡试验”热处理玻璃
公开(公告)号：EP1015393A1
公开(公告)日：2000-07-05
申请号：EP99929435.8
申请日：1999-07-08
申请人： SAINT-GOBAIN VITRAGE
发明人： DAUBA, Henry , BEYRLE, André , CHAUNAC, Michel
IPC分类号： C03B32/00
CPC分类号： C03B32/00
摘要： The invention concerns a method for identifying a glazing which has been subjected to a heat soak test which consists in fixing at its surface and/or at an edge a substance, the substance optical characteristic being modified at a temperature reached during the heat soak test.

78. 发明公开

EP0905098A1 Method for thermal treatment of a refractory dielectric body, such as glass, using plasma 有权
$Method for thermal treatment of a refractory dielectric body, such as glass, using plasma$
标题翻译：一种用于耐火介电体的热处理过程中，例如由玻璃制成的，通过等离子体的手段
公开(公告)号：EP0905098A1
公开(公告)日：1999-03-31
申请号：EP98307668.8
申请日：1998-09-22
申请人： LUCENT TECHNOLOGIES INC.
发明人： Fleming, James William, Jr. , Pafchek, Robert M.
IPC分类号： C03B37/012 , C03B29/02 , C03B32/00 , C03C23/00 , C04B41/00
CPC分类号： C03C25/6293 , C03B29/02 , C03B37/01237 , C03B37/0148 , C03B37/01493 , C03B2201/03 , C03B2201/04 , C03C23/006
摘要： A refractory dielectric body, such as glass, is heated with a plasma fireball at conditions which do not result in substantial removal of a surface portion of the body (i.e. ≤0.1mm from the surface of the body), yet which are sufficient to reduce both surface and bulk impurities. Typically such conditions entail ensuring that the plasma heats the body to a surface temperature in the range of 1800 to 2300°C. Typically, the body is treated with the plasma in the absence of simultaneous deposition of material onto the body. The body may be solid or hollow, such as a rod or a tube, and the surface heated by the plasma may be the inside surface or the outer surface of the body. Advantageously, an isothermal, oxygen or oxygen-containing plasma is utilized. The invention is useful for reducing chlorine impurities by at least about 30% to a depth of at least about 10µm, with accompanying reduction of hydroxyl impurities. The invention thus provides a useful method for reducing the concentration of impurities that contribute to imperfections during the process of drawing fiber from an optical fiber preform, without requiring substantial removal of the surface of the preform.
摘要翻译：的耐火介电体，颜色：例如玻璃，用等离子体火球在不导致在基本上除去体的（从主体的表面即≤0.1mm）的表面部分的条件下被加热，但这些都足以减少两个表面和体杂质。典型地搜索条件要求保证确实的等离子体加热体在1800范围内的表面温度至2300℃。通常，身体治疗与在不存在材料的同时沉积的到主体等离子体。所述主体可以是实心或空心,:诸如杆或管，以及由等离子体加热可以是内表面或所述主体的所述外表面的表面。有利的是，在等温，氧或含氧的等离子体被利用。本发明是用于通过在至少约30％减少氯杂质的至少约10微米的深度处，伴随减少羟基杂质有用的。因此，本发明提供了用于减少杂质的浓度从在光纤预制件拉制光纤的过程中，也有助于缺陷，而不需要大量的去除预成型体的表面的一种有用的方法。

79. 发明公开

EP0822167A2 Heat treatment of silica based glasses 失效
标题翻译： Thermische Behandlung vonQuartzgläsern
公开(公告)号：EP0822167A2
公开(公告)日：1998-02-04
申请号：EP97110641.4
申请日：1997-06-30
申请人： CORNING INCORPORATED
发明人： Antos, Alfred Joseph , Chu, Polly
IPC分类号： C03B37/014 , C03B32/00 , C03B37/018
CPC分类号： C03C13/045 , C03B32/00 , C03B37/0124 , C03B37/01413 , C03B37/01446 , C03B37/01466 , C03B37/01853 , C03B2201/31 , C03B2201/32 , C03B2201/36 , C03B2203/22 , C03C2201/32 , G02B6/03611 , H01S3/06716 , H01S3/0672
摘要： A sintered dense glass, alumina-doped optical fiber preform is stretched and is then heated to a temperature of 1490-1495°C to remove bubbles without causing crystallization. Thereafter, the stretched glass body is either drawn directly into an optical fiber or overclad and then drawn into a fiber.
摘要翻译：将烧结致密玻璃，掺铒光纤预制棒拉伸，然后加热至1490-1495℃的温度以除去气泡而不引起结晶。此后，将拉伸的玻璃体直接拉入光纤或外包层中，然后拉成纤维。

80. 发明授权

EP0546196B1 SYNTHETIC QUARTZ GLASS OPTICAL MEMBER FOR EXCIMER LASER AND PRODUCTION THEREOF 失效
标题翻译：合成光学元件由石英玻璃准分子激光器及其制造
公开(公告)号：EP0546196B1
公开(公告)日：1997-05-02
申请号：EP92913798.2
申请日：1992-06-29
申请人： SHIN-ETSU QUARTZ PRODUCTS CO., LTD.
发明人： NISHIMURA, Hiroyuki, Shin-Etsu Quartz Co.Ltd. , FUJINOKI, Akira, Shin-Etsu Quartz Co.Ltd Sekieigi , MATSUYA, Toshikatsu, Shin-Etsu Quartz Co.Ltd.Seki , INAKI, Kyoichi, Shin-Etsu Quartz Products Co.Ltd. , KATO, Toshiyuki, Shin-Etsu Quartz Products Co.Ltd , SHIMADA, Atsushi, Shin-Etsu Quartz Co. Ltd.
IPC分类号： C03C3/06 , C03B8/04 , C03B20/00 , G02B1/02 , C03C4/00 , C03C23/00 , G02B1/00 , C03B32/00
CPC分类号： C03B37/014 , C03B19/1415 , C03B19/1453 , C03B2201/02 , C03B2201/07 , C03B2201/075 , C03B2201/20 , C03B2201/21 , C03B2201/23 , C03B2203/22 , C03B2207/32 , C03C3/06 , C03C2201/11 , C03C2201/21 , C03C2201/23 , C03C2203/40 , G03F7/70958 , Y02P40/57 , Y10S65/08 , Y10S501/90
摘要： A synthetic quartz glass optical member for an ultraviolet laser, suitably applicable as a stepper lens of a lithographer using an excimer laser beam and other optical members, wherein the quartz glass has a hydroxyl content of 10 to 100 ppm, a chlorine content of 200 ppm or less, a hydrogen content of 1 x 1016 molecules/cm3 or less, a homogeneity of refractive index of 5 x 10-6 or less in terms of Δn, and a birefringence of 5 nm/cm or less. The optical member can be produced by subjecting a volatile silicon compound to flame hydrolysis with oxyhydrogen flame, depositing the formed particulate silica on a heat-resistant support to prepare a porous silica matrix, heating the matrix in a vacuum as high as 1 x 10-2 Torr or above to a temperature of 1,400 °C or above to effect dehydration and degassing, homogenizing the resultant transparent quartz glass into highly homogeneous quartz glass free from striae in at least one direction, molding the highly homogeneous quartz glass, and annealing the molded glass.

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