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1. 发明授权

EP2250131B1 TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME 有权转让
标题翻译：含TIO2的硅玻璃和用于EUV光刻的光学元件使用相同的材料
公开(公告)号：EP2250131B1
公开(公告)日：2018-05-09
申请号：EP09714364.8
申请日：2009-02-27
申请人： Asahi Glass Company, Limited
发明人： KOIKE, Akio , IWAHASHI, Yasutomi , KIKUGAWA, Shinya , TACHIBANA, Yuko
IPC分类号： C03B19/14 , C03C3/06 , C03C4/00 , C03C3/076 , G03F1/24 , G03F7/20
CPC分类号： C03B19/1453 , B82Y10/00 , B82Y40/00 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , G03F1/24 , G03F7/70958 , Y02P40/57
摘要： The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.

2. 发明授权

EP2165986B1 Glas und Verwendung eines Glases für Glas-Metall-Verbindungen 有权
标题翻译： Glas und Verwendung eines GlainfürGlas-Metall-Verbindungen
公开(公告)号：EP2165986B1
公开(公告)日：2017-03-15
申请号：EP09010080.1
申请日：2009-08-04
申请人： Schott AG
发明人： Collignon, Johann, Dr. , Tratzky, Stephan, Dr. , Dick, Erhard , Zettl, Wolfgang
IPC分类号： C03C3/118 , C03C4/00 , C03C4/10 , C03C27/02
CPC分类号： C03C27/02 , C03C3/118 , C03C4/0085 , C03C4/10 , F24S10/45 , Y02E10/44

3. 发明授权

EP2414872B1 OPTISCHES FILTERMATERIAL AUS GALLIUM-DOTIERTEN QUARZGLAS, FILTERBAUTEIL SOWIE VERFAHREN ZUR BESTRAHLUNG MITTELS EINER UV-STRAHLENQUELLE 有权
标题翻译：光学滤光片材料掺镓石英玻璃，滤波器组件及其使用方法辐射UV辐射源
公开(公告)号：EP2414872B1
公开(公告)日：2016-05-11
申请号：EP10707539.2
申请日：2010-03-11
申请人： Heraeus Quarzglas GmbH & Co. KG
发明人： NEUMANN, Christian
IPC分类号： G02B5/20 , C03C3/06 , G02B5/22
CPC分类号： G02B5/208 , C03C3/06 , C03C4/0085 , C03C2201/30 , C03C2201/42 , C03C2203/10 , G02B5/226

4. 发明公开

EP2890651A1 NIOBIUM DOPED SILICA TITANIA GLASS AND METHOD OF PREPARATION 有权
标题翻译：铌掺杂的二氧化硅-TITAN - 玻璃及其制造方法
公开(公告)号：EP2890651A1
公开(公告)日：2015-07-08
申请号：EP13759399.2
申请日：2013-08-28
申请人： Corning Incorporated
发明人： ANNAMALAI, Sezhian , DAWES, Steven Bruce , HRDINA, Kenneth Edward
IPC分类号： C03C3/06 , C03C3/076 , C03C3/095 , C03C3/097 , C03C4/00
CPC分类号： C03C3/097 , C03B19/12 , C03B2201/075 , C03B2201/23 , C03B2201/40 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C3/095 , C03C4/0085 , C03C2201/23 , C03C2201/40 , C03C2201/42 , C03C2203/34 , C03C2203/42 , C03C2203/50
摘要： This disclosure is directed to a silica-titania-niobia glass and to a method for making the glass. The composition of the silica-titania-niobia (SiO
2 -TiO
2 -Nb
2 O
5 ) glass, determined as the oxides, is Nb
2 O
5 in an amount in the range of 0.005 wt.% to 1.2 wt.% TiO
2 , in an amount in the range of 5 wt.% to 10 wt.%, and the remainder of glass is SiO
2 . In the method, the STN glass precursor is consolidated into a glass by heating to a temperature of 1600°C to 1700°C in flowing helium for 6 hours to 10 hours. When this temperature is reached, the helium flow can be replaced by argon for the remainder of the time. Subsequently the glass is cooled to approximately 1050°C, and then from 1050°C to 700°C followed by turning off the furnace and cooling the glass to room temperature at the natural cooling rate of the furnace.

5. 发明公开

EP2463250A4 METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL 有权转让
标题翻译：用于生产TIO2 -SiO 2玻璃体，处理对TIO2 -SiO 2玻璃体，TIO2 SIO2杯体热处理和Visual Basic EUVL
公开(公告)号：EP2463250A4
公开(公告)日：2013-07-24
申请号：EP10774919
申请日：2010-05-11
申请人： ASAHI GLASS CO LTD
发明人： KOIKE AKIO , MITSUMORI TAKAHIRO , IWAHASHI YASUTOMI , OGAWA TOMONORI
IPC分类号： C03B19/14 , C03B32/00 , C03C3/06 , C03C3/076 , G03F1/24
CPC分类号： C03B19/1453 , B82Y10/00 , B82Y40/00 , C03B32/00 , C03B2201/42 , C03C3/06 , C03C4/0085 , C03C2201/42 , C03C2203/52 , G03F1/24

6. 发明公开

EP2070883A4 FUSED QUARTZ GLASS AND PROCESS FOR PRODUCING THE SAME 有权转让
标题翻译： QUARZGUTGLAS及其制造方法
公开(公告)号：EP2070883A4
公开(公告)日：2012-09-12
申请号：EP07807048
申请日：2007-09-11
申请人： TOSOH CORP , TOSOH SGM CORP
发明人： ARAI KAZUYOSHI , TAKAHATA TSUTOMU , HASIMOTO SHINKICHI , UCHIDA MASATO , YAMADA NOBUSUKE , HARADA YOSHINORI , HORIKOSHI HIDEHARU
IPC分类号： C03B20/00 , C03B19/06 , C03C3/06 , C03C4/00 , C03C4/10
CPC分类号： C03C4/0085 , C03B19/066 , C03B20/00 , C03B2201/03 , C03B2201/04 , C03C3/06 , C03C4/10 , C03C2201/23 , C03C2201/50 , C03C2201/54 , Y02P40/57

7. 发明公开

EP2038230A2 REDUCED STRIAE LOW EXPANSION GLASS AND ELEMENTS, AND A METHOD FOR MAKING SAME 有权
标题翻译： STRETCH ARM和玻璃元素对于制造还原条纹和过程
公开(公告)号：EP2038230A2
公开(公告)日：2009-03-25
申请号：EP07777346.3
申请日：2007-05-31
申请人： Corning Incorporated
发明人： MAXON, John E. , ROSCH, William R.
IPC分类号： C03C3/06 , C03B19/14
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1484 , C03B2201/42 , C03C4/0071 , C03C4/0085 , C03C2201/42 , C03C2203/42 , C03C2203/50 , Y02P40/57
摘要： The invention is directed to a low expansion glass with reduced striae, the glass have a point-to-point variation in titania content is 0.1 wt % or less through its thickness and a CTE of 0±3 ppb/° C. in the temperature range 5-35° C. The invention is further directed to a method for producing the low expansion glass by using a method in which the time for repetition of the oscillation patterns used in the process are 10 minutes or less. In addition, the low expansion glass of the invention can have striae further reduced by heat-treating the glass at temperatures above 1600° C. for a time in the range of 48-160 hours.

8. 发明公开

EP1982963A1 Verfahren zur Herstellung eines optischen Bauteils aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Rohling zur Herstellung des Bauteils 有权
标题翻译：一种用于具有增加的耐辐射性制造光学合成石英玻璃部件，以及空白的制造过程组件
公开(公告)号：EP1982963A1
公开(公告)日：2008-10-22
申请号：EP08154312.6
申请日：2008-04-10
申请人： Heraeus Quarzglas GmbH & Co. KG
发明人： KUEHN, Bodo , KAISER, Steffen , KASSUBE, Denis , MERGET, Kerstin
IPC分类号： C03B20/00 , C03B32/00 , C03C3/06 , C03C4/00
CPC分类号： C03B25/02 , C03B19/1453 , C03B32/00 , C03B2201/075 , C03B2201/21 , C03C3/06 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/42 , C03C2203/52 , Y02P40/57
摘要： Um ein optisches Bauteil aus synthetischem Quarzglas, bei dem ein Quarzglasrohling einer mehrstufigen Temperbehandlung unterzogen wird, hinsichtlich Kompaktierung und zentraler Doppelbrechung zu optimieren, wird erfindungsgemäß ein Verfahren vorgeschlagen, das folgende Verfahrensschritte umfasst:
(a) eine erste Behandlungsphase, während der der Quarzglasrohling in einem oberen Temperaturbereich zwischen 1130 °C und 1230 °C behandelt wird,
(b) ein Abkühlen des Quarzglasrohlings mit einer ersten, - höheren - mittleren Abkühlrate auf eine Abschrecktemperatur unterhalb von 1100 °C, wobei sich im Quarzglas eine fiktive Temperatur mit einem hohen Mittelwert von 1100 °C oder mehr einstellt,
(c) eine zweite Behandlungsphase, die ein Abkühlen des Quarzglasrohlings mit einer zweiten - niedrigeren - mittleren Abkühlrate umfasst, und bei der der Quarzglasrohling in einem unteren Temperaturbereich zwischen 950 °C und 1100 °C derart behandelt wird, dass sich im Quarzglas eine fiktive Temperatur mit einem niedrigen Mittelwert einstellt, der um mindestens 50 °C niedriger liegt als der hohe Mittelwert der fiktiven Temperatur gemäß Verfahrensschritt (b).
摘要翻译：为了优化，其中的多级退火的石英玻璃坯料相对于压实和中央双折射进行光学合成石英玻璃部件，提出一种方法，用本发明，包括以下步骤：（a）第一处理阶段，在此期间石英玻璃坯料中 1130℃与1230℃之间的更高温度范围进行处理，（b）冷却该石英玻璃坯料与第一， - 高 - 平均冷却速率低于1100℃的淬火温度，其中所述二氧化硅玻璃具有高平均值的假想温度 1100℃或更多组，（c）第二处理阶段，所述石英玻璃的冷却坯件与第二 - 下 - 包括平均冷却速度，并且其中，所述石英玻璃坯料是在较低的温度范围内以这样的方式处理的950℃和1100℃之间的是，在石英玻璃具有假想Ť emperature套具有低平均值至少是50℃比在处理步骤（b）的假想温度的高平均值低。

9. 发明公开

EP1979279A1 SYNTHETIC QUARTZ GLASS WITH FAST AXES OF BIREFRINGENCE DISTRIBUTED IN CONCENTRIC-CIRCLE TANGENT DIRECTIONS AND PROCESS FOR PRODUCING THE SAME 审中-公开
标题翻译：根据方向快速双折射萨克森合成石英玻璃切线分布式同心圆，及其制造方法
公开(公告)号：EP1979279A1
公开(公告)日：2008-10-15
申请号：EP07708003.4
申请日：2007-01-30
申请人： Asahi Glass Co., Ltd.
发明人： AGATA, Noriyuki , TAKATA, Masaaki , OGAWA, Tomonori , IWATA, Kei
IPC分类号： C03B19/14 , C03C3/06 , C03C4/00
CPC分类号： C03B19/1453 , C03B2201/02 , C03B2201/04 , C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/23 , C03C2203/44 , Y02P40/57 , Y10T428/2982
摘要： The present invention provides a synthetic quartz glass having a diameter of 100 mm or more for using in an optical apparatus comprising a light source emitting a light having a wavelength of 250 nm or less, the synthetic quartz glass having, in a region located inward from the periphery thereof by 10 mm or more in a plane perpendicular to the optical axis of the synthetic quartz glass: a birefringence of 0.5 nm or less per thickness of 1 cm with respect to a light having a wavelength of 193 nm; an OH group concentration of 60 ppm or less; an averaged differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of -8 to +60 ppm,- and an unbiased standard deviation of a differential OH group concentration from the center of the synthetic quartz glass toward a peripheral direction thereof, normalized with respect to the radius of the synthetic quartz glass, of 10 ppm or less.

10. 发明公开

EP1963234A1 DEUTEROXYL-DOPED SILICA GLASS, OPTICAL MEMBER AND LITHOGRAPHIC SYSTEM COMPRISING SAME AND METHOD OF MAKING SAME 有权转让
标题翻译： DEUTEROXYLDOTIERTES二氧化硅，光学元件与本系统和含光刻工艺用于生产
公开(公告)号：EP1963234A1
公开(公告)日：2008-09-03
申请号：EP06827356.4
申请日：2006-11-01
申请人： CORNING INC.
发明人： BOOKBINDER, Dana, C. , FIACCO, Richard, M. , NEUKIRCH, Ulrich
IPC分类号： C03C3/06 , C03C4/00 , C03B19/06 , C03B19/14
CPC分类号： C03C3/06 , C03B19/06 , C03B19/066 , C03B19/12 , C03B19/14 , C03B19/1453 , C03B20/00 , C03B32/00 , C03B2201/07 , C03B2201/075 , C03B2201/08 , C03B2201/12 , C03B2201/22 , C03B2201/23 , C03B2201/32 , C03B2201/42 , C03C4/0085 , C03C2201/11 , C03C2201/12 , C03C2201/22 , C03C2201/23
摘要： What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-dopes synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.

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