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    • 63. 发明公开
    • METHOD FOR MANUFACTURING GERMANIUM BASED THIN FILM SOLAR CELLS WITH IMPROVED LIGHT INDUCED DEGRADATION PROPERTIES
    • HERSTELLUNGSVERFAHREN VON GERMANIUMBASIERTENDÜNNSCHICHTSOLARZELLENMIT VERBESSERTEN LICHTINDUZIERTEN DEGRADIERUNGSEIGENSCHAFTEN
    • EP3125305A1
    • 2017-02-01
    • EP15306246.8
    • 2015-07-30
    • L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
    • Goyal, PrabalHong, JunegieUrrejola, Ellias
    • H01L31/0376H01L31/075H01L31/076H01L31/20
    • H01L31/03767H01L21/02532H01L21/02592H01L21/0262H01L31/075H01L31/076H01L31/204Y02E10/548Y02P70/521
    • Method of forming an amorphous-silicon - germanium single layer to be applied in single, multi or tandem junction thin film solar cells, the method comprising at least the steps of:
      - a) setting a substrate on a substrate holder inside a reactor chamber between an upper high frequency electrode and a bottom high frequency electrode, where the substrate is under high frequency power and differential of potential or voltage bias between both electrodes, where inter electrode distance is between 5mm to 50mm, preferably 11 mm;
      - b) entering reaction gases comprising at least monosilane and hydrogen, with the addition of disilane and germanium, including:
      ∘ adjusting pressure values between 133 Pa to 1333 Pa, preferably 266 Pa of said chamber,
      ∘ supplying a high radio frequency of 13.56 MHz to 70 MHz for plasma ignition between upper and bottom electrodes of said chamber,
      ∘ creating an electrical discharge between both electrodes of said chamber, due to the applied high frequency power;

      - c) applying a trigger power of high frequency plasma having a discharge power density of 400W/m 2 to 2020 W/m 2 to said electrodes for a short time of 1 to 15 seconds to ignite the plasma; and
      - d) applying a lower power of high frequency plasma having a discharge power density of 40W/m 2 to 405W/m 2 to said electrodes for a good plasma cloud formation and thin film deposition.
    • 形成应用于单层,多层或串联结薄膜太阳能电池中的非晶硅 - 锗单层的方法,该方法至少包括以下步骤:a)将反应室内的衬底保持器上的衬底设置在 上部高频电极和底部高频电极,其中基板处于高频功率和两个电极之间的电位或电压偏压的差异,其中电极间距离在5mm至50mm之间,优选为11mm; - b)加入至少含有甲硅烷和氢的反应气体,加入乙硅烷和锗,包括:调节所述室的133Pa至1333Pa,优选266Pa的压力值,以提供高的射频 13.56MHz至70MHz用于所述室的上部和底部电极之间的等离子体点火,由于所施加的高频功率,在所述室的两个电极之间产生放电; - c)将具有400W / m 2的放电功率密度的高频等离子体的触发功率施加到所述电极的时间为1至15秒的短时间为2020W / m 2以点燃所述等离子体; 以及 - d)向所述电极施加放电功率密度为40W / m 2至405W / m 2的高功率等离子体的较低功率,用于良好的等离子体云形成和薄膜沉积。