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    • 60. 发明公开
    • Method of producing photoelectric conversion device by liquid phase deposition
    • 通过液相沉积生产光电转换装置的方法
    • EP2352172A3
    • 2017-06-07
    • EP11152059.9
    • 2011-01-25
    • Fujifilm Corporation
    • Kawano, TetsuoKoike, Takashi
    • H01L31/0336H01L31/032H01L31/18H01L31/0392H01L21/368C23C18/16C25D11/00C23C18/12
    • H01L31/0336H01L31/0323H01L31/03923H01L31/03925H01L31/0749H01L31/18Y02E10/541Y02P70/521
    • A method of producing a photoelectric conversion device (1) having a multilayer structure formed on a substrate, the multilayer structure including a lower electrode (20), a photoelectric conversion layer (30) made of a compound semiconductor layer, an n-type buffer layer (40) made of a compound semiconductor layer, and a transparent conductive layer (60), is disclosed. A reaction solution, which is an aqueous solution containing an n-type dopant element, at least one of ammonia and an ammonium salt, and thiourea, is prepared, the n-type dopant is diffused into the photoelectric conversion layer (30) by immersing the substrate (10) including the photoelectric conversion layer (30) in the reaction solution (90) controlled to a temperature in the range from 20°C to 45°C; and the buffer layer (40) is deposited on the photoelectric conversion layer (30) by immersing the substrate (10) including the photoelectric conversion layer (30) subjected to the diffusion step in the reaction solution (90) controlled to a temperature in the range from 70°C to 95°C.
    • 一种制造在基板上形成的具有多层结构的光电转换装置的方法,所述多层结构包括下电极(20),由化合物半导体层制成的光电转换层(30),n型缓冲层 公开了由化合物半导体层构成的层(40)和透明导电层(60)。 制备反应溶液,其是含有n型掺杂元素,氨和铵盐中的至少一种以及硫脲的水溶液,通过浸渍将n型掺杂剂扩散到光电转换层(30)中 在反应溶液(90)中包括光电转换层(30)的基板(10)被控制在20℃至45℃范围内的温度; 并且通过将经受扩散步骤的包括光电转换层(30)的基板(10)浸入反应溶液(90)中并将温度控制在所述反应溶液(90)中的温度,从而在光电转换层(30)上沉积缓冲层(40) 范围从70°C到95°C。