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    • 51. 发明公开
    • Method of manufacturing a graphene monolayer on insulating substrates
    • Verfahren zur Herstellung einer Grapheneinzelschicht auf Isolationssubstraten
    • EP2679540A1
    • 2014-01-01
    • EP12174322.3
    • 2012-06-29
    • Graphenea, S.A.
    • Zurutuza Elorza, AmaiaCenteno Perez, AlbaAlonso Rodriguez, BeatrizPesquera Rodriguez,, Amaia
    • C01B31/04
    • C01B31/0484B82Y30/00B82Y40/00C01B32/186C01B32/194C01B2204/02Y10T428/31786
    • A method of manufacturing a graphene monolayer on insulating substrates from CVD graphene synthesis, wherein a metal foil (3) catalyst with a top graphene layer (1) and a bottom graphene layer (2) is obtained, by comprising the steps of:
      - Applying an adhesive tape (4) to the bottom graphene layer (2) deposited at the bottom of the metal foil (3) in the CVD graphene synthesis by a roller,
      - detaching the adhesive tape (4) and the bottom graphene layer (2) from the copper foil (3) via the application of heat, from 1°C up to 5°C higher than the release temperature of the adhesive tape (4) so that the adhesive layer (4) with the bottom graphene layer (2) can be removed, obtaining a metal foil (3) with a top graphene layer (2) sample, and
      - transfer the top graphene layer (1) onto a substrate (6) via a sacrificial protective layer (5).
    • 一种通过CVD石墨烯合成在绝缘基板上制造石墨烯单层的方法,其中通过以下步骤获得具有顶部石墨烯层(1)和底部石墨烯层(2)的金属箔(3)催化剂: - 应用 通过辊在CVD石墨烯合成中沉积在金属箔(3)的底部的底部石墨烯层(2)的粘合带(4), - 分离粘合带(4)和底部石墨烯层(2) 通过施加热量从铜箔(3)上升到高于粘合带(4)的释放温度的1℃至5℃,使得具有底部石墨烯层(2)的粘合剂层(4) 可以去除,获得具有顶部石墨烯层(2)样品的金属箔(3),以及 - 经由牺牲保护层(5)将顶部石墨烯层(1)转移到基底(6)上。