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41. 发明公开

EP1973671A4 WATER DISPERSIBLE SILANES AS CORROSION-PROTECTION COATINGS AND PAINT PRIMERS FOR METAL PRETREATMENT 审中-公开
标题翻译：水溶性硅烷作为金属处理防腐蚀涂料与油漆底漆
公开(公告)号：EP1973671A4
公开(公告)日：2012-03-21
申请号：EP07748933
申请日：2007-01-17
申请人： NALCO CO
发明人： CUI JI
IPC分类号： B05D3/02 , B32B19/00 , C07F7/18 , C09D5/00 , C09D183/14
CPC分类号： C09D183/14 , B05D5/00 , B05D2202/25 , C07F7/1836 , C09D5/002 , C09D5/08

42. 发明授权

EP2305754B1 Epoxy-containing polymer photo-curable resin composition, patterning process and electric/electronic part protective film 有权
标题翻译： Epoxydhaltiges聚合物，光固化性树脂组合物的图案化工艺和用于电气/电子部件的保护膜
公开(公告)号：EP2305754B1
公开(公告)日：2012-01-25
申请号：EP10251635.8
申请日：2010-09-23
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Takeda, Takanobu , Kato, Hideto
IPC分类号： C08L83/06 , C09D183/06 , C08L83/14 , C09D183/14 , H01L21/312 , G03F7/075
CPC分类号： C08L83/06 , C08G77/14 , C08G77/80 , C08L83/14 , C09D183/06 , C09D183/14 , G03F7/0045 , G03F7/0757 , H01L21/02118 , H01L21/312 , Y10T428/24802 , C08L2666/14

43. 发明授权

EP1923434B1 Coating Composition 有权
公开(公告)号：EP1923434B1
公开(公告)日：2011-02-02
申请号：EP07120741.9
申请日：2007-11-15
申请人： Shin-Etsu Chemical Company, Ltd.
发明人： Koike, Noriyuki c/o Silicone-Electronics Materials Research , Yamane, Yuji c/o Silicone-Electronics Materials Research
IPC分类号： C09D5/16 , C09D171/02 , C09D183/08 , C09D183/12 , C09D183/14 , C08K5/095
CPC分类号： C09D5/165 , C08G65/007 , C08G2650/48 , C08K5/095 , C08L2205/05 , C09D5/1675 , C09D171/02 , C09D183/08 , C09D183/12 , C09D183/14 , C08L83/00 , C08L2666/32

44. 发明公开

EP2276819A1 EMULSIONS OF DILATANT ORGANOPOLYSILOXANES 审中-公开
标题翻译：胀有机聚硅氧烷乳液
公开(公告)号：EP2276819A1
公开(公告)日：2011-01-26
申请号：EP09731880.2
申请日：2009-04-13
申请人： Dow Corning Corporation
发明人： CAUVIN, Severine , LILES, Donald , ROBSON, Steven , STAMMER, Andreas
IPC分类号： C09D183/06 , C09D183/14 , C08J3/03
CPC分类号： C08J3/05 , C08J2383/06 , C08J2383/14 , C09D183/06 , C09D183/14 , Y10T428/249921 , C08L83/00
摘要： Emulsions are disclosed of dilatant boron crosslinked organopolysiloxanes, coatings prepared from the emulsions, and various substrates impregnated with these coatings. The emulsions may be coated or impregnated onto fabrics to provide an energy absorbing material in Active Protection Systems.

45. 发明公开

EP2254934A1 BOROSILOXANE COMPOSITION, BOROSILOXANE ADHESIVE, COATED AND LAMINATED SUBSTRATES 审中-公开
标题翻译：硼硅氧烷组合物，硼硅氧烷粘合剂，涂层和层压基材
公开(公告)号：EP2254934A1
公开(公告)日：2010-12-01
申请号：EP09716874.4
申请日：2009-02-23
申请人： Dow Corning Corporation
发明人： ZHU, Bizhong
IPC分类号： C08G77/56 , C08L83/14 , C09D183/14 , C09J183/14
CPC分类号： C08G77/56 , C08L83/14 , C09D183/14 , Y10T428/28 , Y10T428/2848 , Y10T428/2852 , Y10T428/31504 , Y10T428/31663 , C08L83/00
摘要： A borosiloxane composition comprising a borosiloxane having an average of at least two alkenyl groups per molecule, an organosilicon compound having an average of at least two silicon-bonded hydrogen atoms per molecule, and a hydrosilylation catalyst; a borosiloxane adhesive comprising a cured product of at least one borosiloxane; and a coated substrate and a laminated substrate, each comprising the borosiloxane adhesive.
摘要翻译：一种硼硅氧烷组合物，其包含每分子平均具有至少两个烯基的硼硅氧烷，每分子平均具有至少两个与硅键合的氢原子的有机硅化合物和氢化硅烷化催化剂; 包含至少一种硼硅氧烷的固化产物的硼硅氧烷粘合剂; 以及各自包含硼硅氧烷粘合剂的经涂覆的基材和层压基材。

46. 发明公开

EP2204399A3 Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same 有权
标题翻译：树脂底涂剂组合物和制造半导体集成电路装置，使得的方法
公开(公告)号：EP2204399A3
公开(公告)日：2010-09-08
申请号：EP09180744.6
申请日：2009-12-24
申请人： Cheil Industries Inc.
发明人： Cho, Hyeon-Mo , Kim, Sang-Kyun , Woo, Chang-Soo , Kim, Mi-Young , Koh, Sang-Ran , Yun, Hiu-Chan , Lee, Woo-Jin , Kim, Jong-Seob
IPC分类号： C08G77/50 , C08G77/52 , C08L83/04 , C08L83/14 , C09D183/04 , C09D183/14 , C08K5/09 , C08K5/19 , C08K5/42 , G03F7/11 , H01L21/027 , H01L21/312
CPC分类号： G03F7/0752 , C08G77/12 , C08G77/14 , C08G77/16 , C08G77/18 , C08G77/20 , C08G77/24 , C08G77/26 , C08G77/50 , C08G77/52 , C08G77/70 , C08K5/0008 , C08L83/04 , C08L83/14 , C09D183/04 , C09D183/14 , G03F7/0757 , G03F7/09 , G03F7/091 , G03F7/094 , G03F7/11 , G03F7/30 , G03F7/36
摘要： Disclosed is a resist underlayer composition that includes
(i) an organosilane condensation polymerization product obtained from at least one of the compounds of the Chemical Formula 1 and 2, and at least one of the compounds of the Chemical Formula 3 to 5; or
(ii) an organosilane condensation polymerization product including a repeating unit represented by the Chemical Formula 6; and
a solvent:

[Chemical Formula 1] [R 1 ] 3 Si-[Ph 1 ] l -Si[R 2 ] 3

[Chemical Formula 2] [R 1 ] 3 Si-[Ph 1 ] m -Ph 2

[Chemical Formula 3] [R 1 ] 3 Si- CH 2n -R 3

[Chemical Formula 4] [R 1 ] 3 Si-R 4

[Chemical Formula 5] [R 1 ] 3 Si-X-Si[R 2 ] 3

[Chemical Formula 6] (SiO 1.5 -[Ph 1 ] l -SiO 1.5 ) a (Ph 2 -[Ph 1 ] m -SiO 1.5 ) b (R 3 - CH 2n -SiO 1.5 ) c (R 4 -SiO 1.5 ) d SiO 1.5 -X-SiO 1.5 ) e ,

wherein 0≤a≤0.99, 0≤b≤0.99, 0.01≤a+b≤0.99, and 0≤c≤0.99, 0≤d≤0.99, 0≤e≤0.99, 0.01≤c+d+e≤0.99, a+b+c+d+e=1.
In the above Chemical Formula 1 to 6, Ph 1 , Ph 2 , R 1 to R 4 , X, I, m, and n are the same as in the specification.

47. 发明公开

EP2216357A1 Water-repellent fine particles and making method 有权
标题翻译： Feine，wasserabweisende Partikel und Herstellungsverfahren
公开(公告)号：EP2216357A1
公开(公告)日：2010-08-11
申请号：EP10250208.5
申请日：2010-02-08
申请人： Shin-Etsu Chemical Co., Ltd.
发明人： Inokuchi, Yoshinori , Horiguchi, Ryuji
IPC分类号： C08G77/04 , C08G77/38 , C08J3/14 , C09D183/14 , A61K8/891 , C08K5/5419
CPC分类号： C08G77/38 , A61K8/891 , A61K2800/412 , A61Q1/02 , C08G77/04 , C08J3/245 , C08J7/047 , C08J2383/04 , C09D183/14
摘要： Silicone elastomer spherical particles having a volume mean particle size of 0.1-100 µm are coated with a polyorganosilsesquioxane and washed with alcohol or a mixture of alcohol and water. The coated fine particles are water repellent so that they are non-dispersible in water and float on water.
摘要翻译：用聚有机倍半硅氧烷涂覆体积平均粒度为0.1-100μm的硅氧烷弹性体球形颗粒，并用醇或醇和水的混合物洗涤。涂覆的微粒是防水的，使得它们不分散在水中并漂浮在水上。

48. 发明授权

EP1194475B1 WATERBORNE SILICONE ADHESIVES, SEALANTS AND COATINGS 有权
标题翻译：水基的有机硅粘合剂，密封剂和-BESCHICHTUNGSZUSAMMENSETZUNGEN
公开(公告)号：EP1194475B1
公开(公告)日：2010-08-04
申请号：EP00942734.5
申请日：2000-06-09
申请人： Momentive Performance Materials Inc.
发明人： HUANG, Misty, Weiyu , WALDMAN, Bruce, A. , COOKE, Jeff, A.
IPC分类号： C08G77/50 , C08L83/14 , C09D183/14 , C08L83/04 , C08J3/03
CPC分类号： C08J3/241 , C08G77/045 , C08G77/16 , C08G77/18 , C08G77/20 , C08G77/50 , C08G77/70 , C08J2383/04 , C08L83/04 , C08L83/14 , C08L83/16 , C09D4/00 , C09D7/00 , C09D183/06 , C09D183/08 , C09D183/14 , C09J5/02 , C09J11/06 , C09J2483/00 , C09K3/10 , C09K3/1021 , C09K2200/0494 , C09K2200/0625 , C08L2666/28 , C08L2666/52 , C08G77/04
摘要： Novel hindered alkoxy siloxane compounds and compositions containing hindered alkoxy siloxane compounds are provided. The compositions include a polymer/crosslinking system which is composed of a self crosslinking resin comprised of a silicone fluid modified with pendant or terminal silanes containing hindered alkoxy groups, or a silanol fluid and a crosslinking compound, of a mixture thereof. These components are first emulsified and then formulated into a latex sealant by blending with a separate emulsion of an appropriate catalyst. Crosslinking occurs upon drying of the emulsion.

49. 发明公开

EP2208222A1 METHODS FOR FORMING A SILICON OXIDE LAYER OVER A SUBSTRATE 审中-公开
标题翻译：法在基板上形成氧化硅层的
公开(公告)号：EP2208222A1
公开(公告)日：2010-07-21
申请号：EP08841549.2
申请日：2008-10-20
申请人： Applied Materials, Inc.
发明人： NEMANI, Srinivas, D , MALLICK, Abhijit, Basu , YIEH, Ellie, Y
IPC分类号： H01L21/31 , C09D183/14 , C09D183/05
CPC分类号： H01L21/31612 , C23C16/045 , C23C16/401 , C23C16/452 , C23C16/56 , H01L21/02126 , H01L21/02164 , H01L21/02216 , H01L21/02222 , H01L21/02274 , H01L21/02337 , H01L21/3122 , H01L21/31633
摘要： A method of depositing a silicon oxide layer over a substrate includes providing a substrate to a deposition chamber. A first silicon-containing precursor, a second silicon-containing precursor and a NH3 plasma are reacted to form a silicon oxide layer. The first silicon-containing precursor includes at least one of Si-H bond and Si-Si bond. The second silicon-containing precursor includes at least one Si-N bond. The deposited silicon oxide layer is annealed.

50. 发明公开

EP2204399A2 Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same 有权
标题翻译：树脂底涂剂组合物和制造半导体集成电路装置，使得的方法
公开(公告)号：EP2204399A2
公开(公告)日：2010-07-07
申请号：EP09180744.6
申请日：2009-12-24
申请人： Cheil Industries Inc.
发明人： Cho, Hyeon-Mo , Kim, Sang-Kyun , Woo, Chang-Soo , Kim, Mi-Young , Koh, Sang-Ran , Yun, Hiu-Chan , Lee, Woo-Jin , Kim, Jong-Seob
IPC分类号： C08G77/50 , C08G77/52 , C08L83/04 , C08L83/14 , C09D183/04 , C09D183/14 , C08K5/09 , C08K5/19 , C08K5/42 , G03F7/11 , H01L21/027 , H01L21/312
CPC分类号： G03F7/0752 , C08G77/12 , C08G77/14 , C08G77/16 , C08G77/18 , C08G77/20 , C08G77/24 , C08G77/26 , C08G77/50 , C08G77/52 , C08G77/70 , C08K5/0008 , C08L83/04 , C08L83/14 , C09D183/04 , C09D183/14 , G03F7/0757 , G03F7/09 , G03F7/091 , G03F7/094 , G03F7/11 , G03F7/30 , G03F7/36
摘要： Disclosed is a resist underlayer composition that includes
(i) an organosilane condensation polymerization product obtained from at least one of the compounds of the Chemical Formula 1 and 2, and at least one of the compounds of the Chemical Formula 3 to 5; or
(ii) an organosilane condensation polymerization product including a repeating unit represented by the Chemical Formula 6; and
a solvent:

[Chemical Formula 1] [R 1 ] 3 Si-[Ph 1 ] l -Si[R 2 ] 3

[Chemical Formula 2] [R 1 ] 3 Si-[Ph 1 ] m -Ph 2

[Chemical Formula 3] [R 1 ] 3 Si- CH 2n -R 3

[Chemical Formula 4] [R 1 ] 3 Si-R 4

[Chemical Formula 5] [R 1 ] 3 Si-X-Si[R 2 ] 3

[Chemical Formula 6] (SiO 1.5 -[Ph 1 ] l -SiO 1.5 ) a (Ph 2 -[Ph 1 ] m -SiO 1.5 ) b (R 3 - CH 2n -SiO 1.5 ) c (R 4 -SiO 1.5 ) d SiO 1.5 -X-SiO 1.5 ) e ,

wherein 0≤a≤0.99, 0≤b≤0.99, 0.01≤a+b≤0.99, and 0≤c≤0.99, 0≤d≤0.99, 0≤e≤0.99, 0.01≤c+d+e≤0.99, a+b+c+d+e=1.
In the above Chemical Formula 1 to 6, Ph 1 , Ph 2 , R 1 to R 4 , X, I, m, and n are the same as in the specification.
摘要翻译：公开了一种抗蚀剂下层组合物确实包括从所述化学式1和2的化合物中的至少一个，并且所述化学式3〜5的化合物中的至少一种（i）得到的有机硅烷缩聚产物; 或（ii）有机硅烷缩聚产物包含由化学式6表示的重复单元; 和溶剂：€€ƒƒƒ€€€ƒƒƒ€€€ƒƒ[化学式1]ƒ€€€ƒƒƒ€€ƒ[R 1] 3 SI-[PH 1]升-Si [ R 2] 3€€ƒƒƒ€€€ƒƒƒ€€€ƒƒ[化学式2]ƒ€€€ƒƒƒ€€ƒ[R 1] 3 SI-[PH 1]米-Ph 2 €€ƒƒƒ€€€ƒƒƒ€€€ƒƒ[化学式3]ƒ€€€ƒƒƒ€€ƒ[R 1] 3 SI-CH 2n个-R 3€€ƒƒƒ€€ ƒ€ƒ€ƒ€ƒ€ƒ[化学式4]€ƒ€ƒ€ƒ€ƒ€ƒ[R 1] 3的Si-R 4€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ[ 化学式5]€ƒ€ƒ€ƒ€ƒ€ƒ[R 1] 3的Si-X-的Si [R 2] 3€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ[化学式6] €€ƒƒƒ€€€ƒƒ（SIO 1.5 - [PH 1]升-SiO 1.5）A（PH 2 - [PH 1]中号-SiO 1.5）b（，R 3 - CH 2N -SiO 1.5）C（，R 4 -SiO 1.5）δ的SiO 1.5 -X-的SiO 1.5）E，worin 0‰‰¤0.99¤A，0‰‰¤B¤0.99，00:01‰‰¤0.99¤A+ b和0‰‰¤c ¤0.99，0‰‰¤d¤0.99，0‰‰¤e¤0.99，12点01‰¤c+ D + E‰¤0.99，A + b + C + D + E = 1。在上面的化学式1〜6中，Ph 1中，Ph 2，R 1至R 4，X，I，m和n是相同的如本说明书中。

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