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31. 发明授权

EP0295093B1 Liquid machine dishwashing composition 失效
标题翻译：液体清洗组合物
公开(公告)号：EP0295093B1
公开(公告)日：1991-06-05
申请号：EP88305256.5
申请日：1988-06-09
申请人： UNILEVER PLC , UNILEVER N.V.
发明人： Elliott, David Leroy , Christiano, Steven Patrick , Lang, David John , Sisco, Rosemary Margaret
IPC分类号： C11D3/395 , C11D3/12 , C11D7/10 , C11D7/60
CPC分类号： C11D3/3765 , C11D3/1266 , C11D3/3956 , C11D17/003

32. 发明授权

EP0103466B1 Oven cleaner 失效
标题翻译：烤箱清洁剂
公开(公告)号：EP0103466B1
公开(公告)日：1987-06-10
申请号：EP83305244.2
申请日：1983-09-08
申请人： R & C PRODUCTS PTY. LIMITED
发明人： Silvester, Raymond Neville
IPC分类号： C23G1/14 , C23G1/18 , C23G5/02 , C11D7/12 , C11D7/26 , C11D7/60 , B08B3/08
CPC分类号： C11D7/5022 , C11D3/0057 , C11D7/12 , C11D7/261

33. 发明公开

EP0103466A1 Oven cleaner 失效
标题翻译： Ofenreinigungsmittel。
公开(公告)号：EP0103466A1
公开(公告)日：1984-03-21
申请号：EP83305244.2
申请日：1983-09-08
申请人： R & C PRODUCTS PTY. LIMITED
发明人： Silvester, Raymond Neville
IPC分类号： C23G1/14 , C23G1/18 , C23G5/02 , C11D7/12 , C11D7/26 , C11D7/60 , B08B3/08
CPC分类号： C11D7/5022 , C11D3/0057 , C11D7/12 , C11D7/261
摘要： An oven cleaner containing as the active ingredients a non-caustic alkali metal carbonate, sesquicarbonate or bicarbonate and a polyhydric alcohol, preferably glycerol, which is liquid and substantially non-volatile at the desired cleaning temperature and in which the alkali metal salt is soluble at that temperature.
A method for cleaning ovens and cookware comprises applying the oven cleaner according to the invention to the surface to be cleaned and heating the surface to a temperature of at least 125°C for a period of at least five minutes and wiping and/or washing the saponified oils and fats from the surfaces.
Effective oven cleaning compositions having a-pH of 9 or below may be produced using the present invention.
摘要翻译：一种烘箱清洁剂，其含有非腐蚀性碱金属碳酸盐，倍半碳酸盐或碳酸氢盐和多元醇，优选甘油，其在所需的清洁温度下为液体并基本上不挥发，并且其中碱金属盐可溶于那个温度。一种用于清洁烤箱和炊具的方法包括将根据本发明的烤箱清洁器应用于要清洁的表面，并将表面加热到至少125℃的温度至少5分钟的时间，并擦拭和/或洗涤来自表面的皂化油和脂肪。使用本发明可以生产pH为9或更低的有效的烘箱清洁组合物。

34. 发明公开

EP3425035A1 FAST DRYING AND FAST DRAINING RINSE AID 有权
公开(公告)号：EP3425035A1
公开(公告)日：2019-01-09
申请号：EP18189655.6
申请日：2010-05-12
申请人： Ecolab USA Inc.
发明人： Kieffer, Janel M. , Man, Victor F. , Lentsch, Steven E.
IPC分类号： C11D7/60 , C11D7/26 , C11D17/08 , C11D1/00 , C11D1/72 , C11D1/825 , C11D3/00 , C11D3/20 , C11D3/48 , C11D3/37 , C11D3/32 , C11D11/00 , C11D1/722
摘要： The present invention is directed to rinse aid compositions and methods for making and using the rinse aid compositions. The compositions of the invention include a sheeting agent, a defoaming agent, and an association disruption agent. The rinse aid compositions of the present invention result in a faster draining/drying time on most substrates compared to conventional rinse aids. The rinse aid compositions of the present invention are especially suitable for use on plastic substrates.

35. 发明公开

EP3077129A1 CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES 有权
标题翻译：清洁剂清除表面残留物
公开(公告)号：EP3077129A1
公开(公告)日：2016-10-12
申请号：EP14867771.9
申请日：2014-12-03
申请人： FujiFilm Electronic Materials USA, Inc.
发明人： TAKAHASHI, Tomonori , DU, Bing , WOJTCZAK, William A. , DORY, Thomas , KNEER, Emil A.
IPC分类号： B08B3/04 , C11D7/60
摘要： This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one first chelating agent, the first chelating agent being a polyaminopolycarboxylic acid; 3) at least one second chelating agent different from the first chelating agent, the second chelating agent containing at least two nitrogen-containing groups; 4) at least one metal corrosion inhibitor, the metal corrosion inhibitor being a substituted or unsubstituted benzotriazole; 5) at least one organic solvent selected from the group consisting of water soluble alcohols, water soluble ketones, water soluble esters, and water soluble ethers; 6) water; and 7) optionally, at least one pH adjusting agent, the pH adjusting agent being a base free of a metal ion. This disclosure also relates to a method of using the above composition for cleaning a semiconductor substrate.
摘要翻译：本公开涉及一种清洁组合物，其包含1）至少一种氧化还原剂; 2）至少一种第一螯合剂，第一螯合剂是聚氨基多羧酸; 3）至少一种不同于第一螯合剂的第二螯合剂，第二螯合剂含有至少两个含氮基团; 4）至少一种金属腐蚀抑制剂，所述金属腐蚀抑制剂为取代或未取代的苯并三唑; 5）至少一种选自水溶性醇，水溶性酮，水溶性酯和水溶性醚的有机溶剂; 6）水; 和7）任选地，至少一种pH调节剂，该pH调节剂是不含金属离子的碱。本公开还涉及使用上述组合物来清洁半导体衬底的方法。

36. 发明公开

EP2430141A4 FAST DRYING AND FAST DRAINING RINSE AID 有权转让
标题翻译：干燥速度快FAST FLOW END洗涤剂
公开(公告)号：EP2430141A4
公开(公告)日：2013-06-12
申请号：EP10774627
申请日：2010-05-12
申请人： ECOLAB USA INC
发明人： KIEFFER JANEL M , MAN VICTOR F , LENTSCH STEVEN E
IPC分类号： C11D7/60 , C11D1/00 , C11D1/72 , C11D1/825 , C11D7/26 , C11D17/08
CPC分类号： C11D1/722 , C11D1/008 , C11D1/72 , C11D1/825 , C11D3/0026 , C11D3/0036 , C11D3/2068 , C11D3/323 , C11D3/3707 , C11D3/48 , C11D11/0035

37. 发明授权

EP1999214B1 LIQUID POLISHING COMPOSITION AND KIT 有权
标题翻译：液体抛光组合物和试剂盒
公开(公告)号：EP1999214B1
公开(公告)日：2012-02-29
申请号：EP07754073.0
申请日：2007-03-27
申请人： Turtle Wax, Inc.
发明人： SCHULTZ, Michael, A. , JOSEPH, II, Frederic, W. , DEDDO, Michael A.
IPC分类号： C09D4/00 , C08L93/00 , C09G1/10 , C08L91/06 , C11D7/60
CPC分类号： C08L83/04 , C08G77/045 , C08G77/20 , C08G77/26 , C08G77/42 , C08G77/46 , C08G77/50 , C08G77/70 , C09G1/12
摘要： A liquid polishing composition of the invention suitable for polishing an automobile and the like comprises about 0.01 to about 3 percent by weight of at least one silicone-based wax, about 0.20 to about 10 percent by weight of poly(alpha olefin) compounds including about 0.1 to about 5 percent by weight of at least one hyperbranched poly(alpha olefin), about 6 to about 60 percent by weight of at least one polydimethylsiloxane silicone fluid, about 1 to about 20 percent by weight of at least one volatile cyclic silicone, about 0.25 to about 3 percent by weight of at least one amino-functional silicone, about 0.01 to about 5 percent by weight of at least one UV absorber, and a petroleum-based carrier therefor. The liquid polishing composition can be packaged together with a microfiber polishing cloth in the form of a polishing kit. The liquid polishing composition provides a long lasting showroom finish and can be used directly on rubber, vinyl, and plastic components without leaving a white residue, commonly associated with conventional polishing compositions.

38. 发明公开

EP1999214A4 LIQUID POLISHING COMPOSITION AND KIT 有权
标题翻译：液体抛光组合物和试剂盒
公开(公告)号：EP1999214A4
公开(公告)日：2010-07-28
申请号：EP07754073
申请日：2007-03-27
申请人： TURTLE WAX INC
发明人： SCHULTZ MICHAEL A , JOSEPH II FREDERIC W , DEDDO MICHAEL A
IPC分类号： C09D4/00 , C08L91/06 , C08L93/00 , C09G1/10 , C11D7/60
CPC分类号： C08L83/04 , C08G77/045 , C08G77/20 , C08G77/26 , C08G77/42 , C08G77/46 , C08G77/50 , C08G77/70 , C09G1/12

39. 发明公开

EP1381656A4 AQUEOUS CLEANING COMPOSITION CONTAINING COPPER-SPECIFIC CORROSION INHIBITOR FOR CLEANING INORGANIC RESIDUES ON SEMICONDUCTOR SUBSTRATE 有权
标题翻译：与铜的具体防腐蚀水基清洗剂用于清洁无机残余物半导体衬底
公开(公告)号：EP1381656A4
公开(公告)日：2007-06-13
申请号：EP02717727
申请日：2002-03-27
申请人： ADVANCED TECH MATERIALS
发明人： WOJTCZAK WILLIAM A , SEIJO FATIMA MA , BERNHARD DAVID , NGUYEN LONG
IPC分类号： C09K13/00 , C11D7/10 , C09K13/06 , C09K13/08 , C11D7/26 , C11D7/32 , C11D7/60 , G03F7/42 , H01L21/02 , H01L21/027 , H01L21/304 , H01L21/306 , H01L21/3065 , H01L21/311 , H01L21/321 , H01L21/3213
CPC分类号： H01L21/02071 , C09K13/08 , C11D7/265 , C11D7/266 , C11D7/3209 , C11D7/3218 , C11D7/3245 , C11D7/3263 , G03F7/425 , G03F7/426 , H01L21/02074 , H01L21/31138
摘要： A semiconductor wafer cleaning formulation, including 1-21% wt. fluoride source, 20-55% wt. organic amine(s), 0.5-40% wt. nitrogenous component, e.g., a nitrogen-containing carboxylic acid or an imine, 23-50% wt. water, and 0-21% wt. metal chelating agent(s). The formulations are useful to remove residue from wafers following a resist plasma ashing step, such as inorganic residue from semiconductor wafers containing delicate copper interconnecting structures.

40. 发明授权

EP1249353B1 Reinigungs- und Poliermittel für metallische Oberflächen 有权
标题翻译：清洗和抛光剂为金属表面
公开(公告)号：EP1249353B1
公开(公告)日：2004-07-14
申请号：EP02090137.7
申请日：2002-04-09
申请人： Läufer-Werk Aktiengesellschaft
发明人： Geltenpoth, Peter
IPC分类号： B43L19/00 , C11D7/60 , C11D7/20 , C11D17/00
CPC分类号： C23G5/00 , B24D15/04 , C08K3/34 , C11D7/02 , C11D7/20 , C11D17/00 , C08L21/00

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