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31. 发明公开

EP1085003A1 HIGH-PURITY 1,3-PROPANEDIOL DERIVATIVE SOLVENT, PROCESS FOR PRODUCING THE SAME, AND USE THEREOF 审中-公开
标题翻译： 1,3-丙二醇高纯溶剂衍生，方法及其生产和需求
公开(公告)号：EP1085003A1
公开(公告)日：2001-03-21
申请号：EP00912993.3
申请日：2000-03-30
申请人： DAICEL CHEMICAL INDUSTRIES, Ltd.
发明人： TANIGAWA, Hiroto , MIYAKE, Hiroto , KOYAMA, Hiroshi , FUJITA, Akihiko , MARUO, Katsuya
IPC分类号： C07C43/13 , C07C41/26 , C07C41/42 , G03F7/004 , G03F7/32 , G03F7/027 , H05K3/00 , C08L101/00
CPC分类号： G03F7/422 , C07C43/13 , C07C45/71 , G03F7/0048 , G03F7/322 , G03F7/325 , C07C47/19
摘要： The present invention No. I is to obtain a high purity 3-alkoxy-1-propanol having the content of alcoholic impurities of not more than 0.3% by weight by allowing to react acrolein with a linear or branched alcohol having a carbon number of 1-4 using acrolein having the content of propionaldehyde of not more than 1% by weight as a raw material, a 3-alkoxy-1-propanol is produced by a hydrogenation reaction using hydrogen of a reaction mass under the presence of a catalyst, followed by recovering through a distillation of the 3-alkoxy-1-propanol having the content of alcoholic impurities of not more than 0.3% by weight from a crude solution in the hydrogenation reaction.
The present invention No. II is a cleaning agent for a lithography which is a solvent (a) alone which includes a 1,3-propanediol alkylether, a 1,3-propanediol alkylether acetate, or a mixture thereof and, further, in which there are employed together the alcohols (b) having a carbon number of 1-4 and propylene glycol methylether acetate.
The present invention No. III is a rinsing liquid for lithography which comprises a homogeneous solution containing the solvent (a) and water.
The present invention No. IV is to employ the solvent (a) as a solvent for a resist composition, and it is a resist composition composed of the solvent for a resist composition and a component for a resist.
The present invention No. V is composed of the solvent (a), and a modified copolymer in which an epoxy group-contained unsaturated compound having an aliphatic structure is added to carboxylic groups in a copolymer of a copolymerizable unsaturated carboxylic acid with an unsaturated compound other than the unsaturated carboxylic acid.
摘要翻译：本发明第 I是通过使反应丙烯醛与线性或使用具有丙烯醛具有1-4个碳数的支链醇具有不超过0.3％（重量）醇中的杂质的含量3-烷氧基-1-丙醇，以获得高纯度的的不超过1％的丙醛（重量）作为原料的内容，3-烷氧基-1-丙醇是由氢化反应使用反应物料的氢下，在催化剂的随后通过蒸馏回收存在下生产具有不大于0.3％的酒精中杂质的重量从在氢化反应中的粗溶液中的含量的3-烷氧基-1-丙醇。本发明第 II是一种清洗剂光刻所有这是一种溶剂（a）单独，其包括1.3丙二醇烷基醚，醋酸1,3-丙二醇醚，或它们的混合物，并且进一步地，其中有一起使用的醇（b）具有的1-4和丙二醇甲基醚乙酸酯的碳原子数。本发明第 III是用于平版印刷的冲洗液，其包含一种均匀的溶液含有溶剂（a）和水。本发明第 IV是使用溶剂（a）中，作为抗蚀剂组合物的溶剂，并且它是用于抗蚀剂组合物和组件，用于抗蚀剂的溶剂组成的抗蚀剂组合物。本发明第 V被由溶剂（a）的，和改性的共聚物，其中，以环氧树脂具有脂族结构中包含基团的不饱和化合物在低于不饱和羧酸等不饱和化合物添加到羧基的共聚性不饱和羧酸的共聚物与酸。

32. 发明公开

EP1002258A1 OFFSETDRUCKPLATTE MIT HOHER AUFLAGENSTABILITÄT 审中-公开
标题翻译：具有极高的稳定性版胶印版
公开(公告)号：EP1002258A1
公开(公告)日：2000-05-24
申请号：EP99938142.9
申请日：1999-06-07
申请人： Kodak Polychrome Graphics GmbH
发明人： HAUCK, Gerhard , JAREK, Mathias , KESSELMAN, Jerome, Philip , PAPPAS, Socrates, Peter
IPC分类号： G03F7/023 , G03F7/032 , G03F7/021 , G03F7/004
CPC分类号： G03F7/0048 , G03F7/0212 , G03F7/0233 , G03F7/033 , G03F7/16 , G03G5/0525
摘要： The invention relates to coating solutions, methods for producing a printing plate using these coating solutions, and printing plates produced in this manner. In particular, the invention relates to printing plates whose photosensitive layer contains homogeneously distributed polymer particles.

33. 发明公开

EP0986776A1 LIQUID PHOTOSENSITIVE COMPOSITION 失效
标题翻译：液体光敏组合物
公开(公告)号：EP0986776A1
公开(公告)日：2000-03-22
申请号：EP98932073.4
申请日：1998-05-22
申请人： Ciba Specialty Chemicals Holding Inc.
发明人： MUNK, Kurt
IPC分类号： G03F7/033 , G03F7/004 , G03F7/00
CPC分类号： G03F7/0048 , G03F7/033 , G06K19/02 , Y10S430/108 , Y10S430/111 , Y10S430/117 , Y10S430/121
摘要： A photosensitive composition which is liquid at room temperature and which comprises a) 18 to 22 % by weight of a binder polymer based on a styrene-maleic anhydride halfester copolymer, b) 10 to 15 % by weight of at least one photocurable acrylate compound, c)0.1 to 10 % by weight of a photoinitiator, and d) 45 to 70 % by weight of a propylene glycol halfester or propylene glycol halfether, the sum of the components a) to d) being 100 % by weight, is suitable for the production of photostructured objects, preferably for the production of telephone cards.

34. 发明公开

EP0907108A1 Radiation-sensitive resin composition 有权
标题翻译： Strahlungsempfindliche Harzzusammensetzung
公开(公告)号：EP0907108A1
公开(公告)日：1999-04-07
申请号：EP98118693.5
申请日：1998-10-02
申请人： JSR Corporation
发明人： Inoue, Masaaki , Inomata, Katsumi , Hara, Hiromichi , Yumoto, Yoshiji
IPC分类号： G03F7/004 , G03F7/022
CPC分类号： G03F7/0048 , G03F7/022
摘要： A radiation-sensitive resin composition including (1) an alkali-soluble resin, (2) a quinonediazide compound and (3) a mixed solvent including a monoketone having 7 to 14 carbon atoms and an alkoxypropionic acid alkyl ester is provided. The composition can be coated in a uniform thickness in a small coating weight. The composition has a high sensitivity and a high resolution, and also enables formation of resist patterns having a superior pattern shape with less pattern defects. Thus, it is suitable as a positive resist.
摘要翻译：提供了包含（1）碱溶性树脂，（2）醌二叠氮化合物和（3）含有7-14个碳原子的单酮和烷氧基丙酸烷基酯的混合溶剂的辐射敏感性树脂组合物。组合物可以以小的涂层重量以均匀的厚度涂覆。该组合物具有高灵敏度和高分辨率，并且还能够形成具有较少图案缺陷的优异图案形状的抗蚀剂图案。因此，它适合作为正性抗蚀剂。

35. 发明公开

EP0875022A1 COMPOSITION FOR THE MANUFACTURE OF FLEXOGRAPHIC PRINTING PLATES 失效
标题翻译：组成柔性版制版
公开(公告)号：EP0875022A1
公开(公告)日：1998-11-04
申请号：EP97902014.0
申请日：1997-01-10
申请人： M.A. Hanna Company
发明人： MCAFEE, Carl, D. , LOV, Piseth , HUGHES, David, T. , CHASE, Michael, W. , GRIMM, Donald, C.
IPC分类号： G03F7
CPC分类号： G03F7/038 , G03F7/0048 , G03F7/033 , Y10S430/111
摘要： A water processable photopolymeric composition for use in the manufacture of flexographic photopolymer printing plates is disclosed. Preferably, the flexomer blend includes a flexomer having an affinity for water combined with a hydrophilic cross-linking agent, a nonhydrophilic cross-linking agent, a swell enhancing filler, a hydrophilic plasticizer, a compatibilizer and a surfactant. The compatibilizer aids the blending of the hydrophilic components with the flexomer blend.

36. 发明公开

EP0868684A2 A MIXED SOLVENT SYSTEM FOR POSITIVE PHOTORESISTS 失效
标题翻译：溶剂体系对于正性光刻胶工作
公开(公告)号：EP0868684A2
公开(公告)日：1998-10-07
申请号：EP96945607.0
申请日：1996-12-17
申请人： Clariant International Ltd.
发明人： WANAT, Stanley, F. , RAHMAN, M., Dalil , KHANNA, Dinesh, N. , AUBIN, Daniel, P. , DIXIT, Sunit, S.
IPC分类号： G03F7 , H01L21
CPC分类号： G03F7/0048 , G03F7/022 , G03F7/0236
摘要： A positive working photosensitive composition suitable for use as a photoresist, which comprises an admixture of at least one water insoluble, aqueous alkali soluble, film forming novolak resin; at least one o-diazonaphthoquinone photosensitizer; and a photoresist solvent mixture comprising a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy butanol and process for producing such a composition.

37. 发明授权

EP0506593B1 Uniformly coated photoresist compositions 失效
标题翻译：均匀涂覆的光致抗蚀剂组合物
公开(公告)号：EP0506593B1
公开(公告)日：1998-10-07
申请号：EP92480023.8
申请日：1992-02-11
申请人： International Business Machines Corporation
发明人： Cornett, Kathleen Marie , Hefferon, George Joseph , Montgomery, Melvin Warren , Moreau, Wayne Martin
IPC分类号： G03F7/004 , G03F7/022
CPC分类号： G03F7/0048

38. 发明公开

EP0851297A1 Radiation-sensitive composition adapted for roller coating 失效
标题翻译： Strahlungsempfindlic Zusammensetzung zur Walzenbeschichtung
公开(公告)号：EP0851297A1
公开(公告)日：1998-07-01
申请号：EP97122388.8
申请日：1997-12-18
申请人： CLARIANT INTERNATIONAL LTD.
发明人： Susukida, Kenji
IPC分类号： G03F7/004
CPC分类号： G03F7/0048
摘要： A radiation-sensitive composition adapted for roller coating is disclosed, which contains, as a solvent for the composition, a mixed solvent of at least one member selected from the group consisting of propylene glycol alkyl ethers and propylene glycol diacetate having a boiling point of 170 to 250 °C, kinematic viscosity of 2 cSt or more at 25 °C and a relative evaporation rate of 10 or less taking the evaporation rate of n-butyl acetate as 100, and other solvent or solvents. This composition forms less uneven coating upon being coated on a substrate by roller coating. The propylene glycol alkyl ethers are exemplified by propylene glycol phenyl ether, tripropylene glycol methyl ether, dipropylene glycol n-butyl ether, dipropylene glycol methyl ether, propylene glycol n-butyl ether, etc. and other solvents are exemplified by propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether, ethyl lactate, n-butyl acetate, etc.
摘要翻译：公开了一种适用于辊涂的辐射敏感组合物，其包含作为组合物的溶剂的选自丙二醇烷基醚和沸点为170的丙二醇二乙酸酯中的至少一种的混合溶剂在250℃下，运动粘度在25℃下为2cSt或更高，相对蒸发速率为10或更低，取乙酸正丁酯的蒸发速率为100，以及其它溶剂或溶剂。当通过辊涂在基材上涂布时，该组合物形成较少的不均匀涂层。丙二醇烷基醚的例子有丙二醇苯基醚，三丙二醇甲基醚，二丙二醇正丁基醚，二丙二醇甲基醚，丙二醇正丁基醚等，其它溶剂的例子有丙二醇单甲醚乙酸酯，丙二醇单甲醚，乙二醇单乙醚乙酸酯，乙二醇单丁醚，乳酸乙酯，乙酸正丁酯等

39. 发明公开

EP0843218A1 Photosensitive composition 失效
标题翻译：照片Zusammensetzung
公开(公告)号：EP0843218A1
公开(公告)日：1998-05-20
申请号：EP97119923.7
申请日：1997-11-13
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Kawamura, Koichi , Watanabe, Noriaki
IPC分类号： G03F7/023 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0048 , G03F7/0233 , Y10S430/107 , Y10S430/111
摘要： Disclosed is a positive working photosensitive composition comprising a specific fluorine-containing copolymer. The positive working photosensitive composition has not only an ability to form a highly contrasty image but also an ability to inhibit the halation, a satisfactory safe light tolerance and a wide development latitude, without lowering the sensitivity.
摘要翻译：公开了包含特定的含氟共聚物的正性感光性组合物。正性工作感光性组合物不仅具有形成高度对比度的图像的能力，而且还具有抑制晕影的能力，令人满意的安全光线耐受性和广泛的开发宽容度，而不降低灵敏度。

40. 发明授权

EP0634696B1 Chemically amplified resist composition 失效
标题翻译：化学放大抗蚀
公开(公告)号：EP0634696B1
公开(公告)日：1998-01-14
申请号：EP94305148.2
申请日：1994-07-14
申请人： JAPAN SYNTHETIC RUBBER CO., LTD.
发明人： Kobayashi, Eiichi , Murata, Makoto , Ota, Toshiyuki , Tsuji, Akira
IPC分类号： G03F7/004
CPC分类号： G03F7/039 , G03F7/0045 , G03F7/0048 , Y10S430/106 , Y10S430/111

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