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31. 发明授权

EP0795952B1 Method of and apparatus for stopping a motor having magnetic bearings 失效
标题翻译：用于停止与磁性轴承的电机的方法和设备
公开(公告)号：EP0795952B1
公开(公告)日：2002-08-14
申请号：EP97104282.5
申请日：1997-03-13
申请人： EBARA CORPORATION
发明人： Shinozaki, Hiroyuki , Yamasaki, Hironobu , Nasa, Kazunari
IPC分类号： H02P3/24 , H02J9/06
CPC分类号： H02J9/062 , F16C32/0442 , F16C32/0457 , F16C2360/45 , F16C2380/26

32. 发明公开

EP1137126A1 ELECTRIC DISCHARGE EXCITATION EXCIMER LASER 有权
标题翻译： DURCH ELEKTRISCHE ENTLADUNG ANGEREGTER EXCIMERLASER
公开(公告)号：EP1137126A1
公开(公告)日：2001-09-26
申请号：EP99973186.2
申请日：1999-11-26
申请人： EBARA CORPORATION , KOMATSU LTD.
发明人： Shinozaki, Hiroyuki , Sekiguchi, Shinichi , Barada, Toshimitsu , Nakazawa, Toshiharu
IPC分类号： H01S3/036 , F16C32/04
CPC分类号： F16C32/047 , H01S3/036 , H01S3/225
摘要： A long-life electric discharge excitation excimer laser improved in that the laser gas in the laser enclosure hardly degrades, no dust enters the inside of the magnetic bearing and the inside of the motor, and damage to the portions in contact with the laser gas is little. The electric discharge excitation excimer laser is characterized by comprising a housing connected to both ends of a laser enclosure where the laser gas is sealed and a pair of main discharge electrodes are housed, a cross flow fan rotatably supported at both ends by a magnetic bearing housed in the housing and adapted to produce a laser gas flow, a motor housed in the housing and adapted to rotate the cross flow fan, a laser gas passage extending through the gap between the rotor side and the-stator side of the magnetic bearing and the gap between the rotor side and the stator side of the motor along the full length of the housing and communicating with the laser enclosure, a laser gas introduction passage extending from the inside of the laser enclosure and communicating with the laser gas passage at one end of the housing, and a filter disposed in the laser gas introduction passage.
摘要翻译：长寿命放电励磁准分子激光器的改进在于激光外壳中的激光气体几乎不降解，不会有灰尘进入到磁轴承和电机内部，并且与激光气体接触的部分损坏是小。放电激发准分子激光器的特征在于，包括连接到激光器外壳的两端的壳体，其中激光气体被密封并且容纳一对主放电电极，横流风扇由两个端部旋转地支撑，在壳体中并且适于产生激光气流，马达容纳在壳体中并且适于旋转横流风扇，激光气体通道延伸穿过磁轴承的转子侧和定子侧之间的间隙和沿着壳体的整个长度的电机的转子侧和定子侧之间的间隙，与激光外壳连通，激光气体引入通道从激光外壳的内部延伸并与激光气体通道的一端连通壳体和布置在激光气体导入通道中的过滤器。

33. 发明公开

EP1079122A1 Magnetic bearing device 有权
标题翻译：磁轴承装置
公开(公告)号：EP1079122A1
公开(公告)日：2001-02-28
申请号：EP00117398.8
申请日：2000-08-24
申请人： EBARA CORPORATION
发明人： Nakazawa, Toshiharu , Barada, Toshimitsu , Ooyama, Atsushi , Inoue, Masafumi , Sekiguchi, Shinichi , Shinozaki, Hiroyuki
IPC分类号： F16C32/04
CPC分类号： F16C32/0451 , F16C32/047 , F16C2300/42 , F16C2360/45
摘要： A magnetic bearing device has an electromagnet for levitating an object under electromagnetic forces, a displacement sensor for detecting the displacement of the levitated object, a controller for supplying a signal to the displacement sensor through a cable and a current to the electromagnet through a cable, and a protective plate of nonmagnetic metal material disposed between the displacement sensor and the levitated object. The controller includes a levitation control system having a noise removing filter for preventing an abnormal signal caused by the protective plate from being applied to the displacement sensor.
摘要翻译：一种磁性轴承装置具有用于在电磁力下悬浮物体的电磁体，用于检测悬浮物体的位移的位移传感器，用于通过电缆向位移传感器提供信号并通过电缆向电磁体提供电流的控制器，以及设置在位移传感器与悬浮物体之间的非磁性金属材料的保护板。控制器包括具有噪声消除滤波器的悬浮控制系统，用于防止由保护板引起的异常信号被施加到位移传感器。

34. 发明公开

EP1056171A2 Discharge-pumped excimer laser device 有权
标题翻译： Entladungsgepumpter准分子激光
公开(公告)号：EP1056171A2
公开(公告)日：2000-11-29
申请号：EP00111269.7
申请日：2000-05-25
申请人： EBARA CORPORATION
发明人： Sekiguchi, Shinichi , Shinozaki, Hiroyuki , Barada, Toshimitsu , Nakazawa, Toshiharu
IPC分类号： H01S3/225 , H01S3/03
CPC分类号： F16C32/047 , H01S3/03 , H01S3/036 , H01S3/225
摘要： A discharge-pumped excimer laser device has a casing (1), a pair main discharge electrodes (2), a cross-flow fan (3) for producing a high-speed laser gas flow between the main discharge electrodes (2), the cross-flow fan (3) having a rotatable shaft (4) projecting from opposite ends thereof, magnetic bearings (8,9,10,11), the rotatable shaft (4) being rotatably supported by the bearings, protective bearings (13,14,15) for supporting the rotatable shaft (4) when the magnetic bearings are not in operation, and a motor (12) for actuating the cross-flow fan (3). The magnetic bearings include radial magnetic bearings (8,9,10) disposed on the opposite ends of the rotatable shaft (4). One of the radial magnetic bearings which is disposed closely to the motor (12) has a bearing rigidity greater than the bearing rigidity of the magnetic bearing that is disposed remotely from the motor.
摘要翻译：排出泵浦准分子激光装置具有壳体（1），一对主放电电极（2），用于在主放电电极（2）之间产生高速激光气流的横流风扇（3），横流风扇（3）具有从其两端突出的可旋转轴（4），所述旋转轴（4）由所述轴承可旋转地支撑，所述旋转轴（4,9） 14,15），用于当所述磁轴承不工作时支撑所述可旋转轴（4），以及用于致动所述横流风扇（3）的马达（12）。磁性轴承包括设置在可旋转轴（4）的相对端上的径向磁轴承（8,9,10）。靠近电动机（12）设置的径向磁轴承之一具有大于远离电动机的磁性轴承的轴承刚性的轴承刚性。

35. 发明公开

EP0852970A3 Vapor feed supply system 失效
标题翻译：系统的蒸汽供应
公开(公告)号：EP0852970A3
公开(公告)日：2000-11-02
申请号：EP98100218.1
申请日：1998-01-08
申请人： EBARA CORPORATION
发明人： Horie, Kuniaki , Suzuki, Hidenao , Nakada, Tsutomu , Murakami, Takeshi , Fukunaga, Yukio , Abe, Masahito , Shinozaki, Hiroyuki , Tsukamoto, Kiwamu , Shibasaki, Mitsunao , Araki, Yuji , Ueyama, Hiroyuki
IPC分类号： B08B9/00 , C23C16/44 , B01D8/00 , F16K51/00
CPC分类号： C23C16/448 , B08B9/00 , C23C16/4407 , Y10S134/902
摘要： A vapor feed supply system including a vaporizer device (10) and a method of cleaning a vapor flow region including such a vaporizer device (10), to enable thorough cleaning of the system, without having to degrade the overall system vacuum in the process of cleaning the vaporizer device (10) is presented. The method comprises: defining a cleaning fluid passage (22) having a predetermined withstand pressure by isolating a cleaning region of the vapor flow region; and flowing a cleaning fluid (26) into the cleaning fluid passage (22) under a pressure so as to enable the cleaning fluid (26) to remain in a liquid state at a cleaning temperature of the cleaning region.

36. 发明公开

EP0909836A2 Thin-film deposition apparatus 失效
标题翻译： Vorrichtung zum Herstellen vondünnenSchichten
公开(公告)号：EP0909836A2
公开(公告)日：1999-04-21
申请号：EP98113599.9
申请日：1998-07-21
申请人： EBARA CORPORATION
发明人： Fukunaga, Yukio , Shinozaki, Hiroyuki , Tsukamoto, Kiwamu , Shibasaki, Mitsunao , Horie, Kuniaki , Ueyama, Hiroyuki , Murakami, Takeshi
IPC分类号： C23C16/44 , C23C16/54 , C23C16/40
CPC分类号： C23C16/45565 , C23C16/4412 , C23C16/4557 , C23C16/45591 , C23C16/46
摘要： A compact thin-film deposition apparatus can promote a stable growth of a high quality thin-film product of uniform quality. It comprises a vacuum-tight deposition chamber (10) enclosing a substrate holding device (12) for holding a substrate (W). An elevator device (14) for moving the substrate holding device and a gas showering head (16) for flowing a film forming gas towards the substrate are provided. A transport opening (20) and an exhaust opening (22) are provided on a wall section (18) of the deposition chamber at a height to correspond to the transport position and the deposition position respectively. The deposition chamber is provided with a flow guiding member (44), and the flow guiding member comprises a cylindrical member (48) to surround an elevating path of the substrate holding device and a first ring member (50) to vertically divide a chamber space at a height between the exhaust opening and the transport opening.
摘要翻译：紧凑的薄膜沉积装置可以促进质量均匀的高质量薄膜产品的稳定生长。它包括一个真空密封的沉积室（10），其包围用于保持基底（W）的基片保持装置（12）。提供了用于移动基板保持装置的电梯装置（14）和用于使成膜气体朝向基板流动的气体淋浴头（16）。输送开口（20）和排气口（22）分别设置在沉积室的壁部分（18）上，以分别对应于输送位置和沉积位置。沉积室设置有导流构件（44），并且流动引导构件包括围绕基板保持装置的升降路径的圆柱形构件（48）和第一环构件（50），以垂直分隔腔室空间在排气口和输送口之间的高度处。

37. 发明公开

EP2131387A3 Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method 审中-公开
标题翻译：基板处理装置，基板处理方法，基板保持机构和所述基板保持方法
公开(公告)号：EP2131387A3
公开(公告)日：2015-01-21
申请号：EP09007434.5
申请日：2009-06-04
申请人： EBARA CORPORATION
发明人： Miyazaki, Mitusru , Katsuoka, Seiji , Matsuda, Naoki , Kunisawa, Junji , Kobayashi, Kenichi , Sotozaki, Hiroshi , Shinozaki, Hiroyuki , Nabeya, Osamu , Morisawa, Shinya , Ogawa, Takahiro , Makino, Natsuki
IPC分类号： H01L21/00
CPC分类号： B24B37/345 , H01L21/30625 , H01L21/67219 , H01L21/67739 , H01L21/67742 , H01L21/67754 , Y10T137/0318 , Y10T137/8593
摘要： An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.

38. 发明公开

EP2131387A2 Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method 审中-公开
标题翻译：亚斯特拉斯堡大学
公开(公告)号：EP2131387A2
公开(公告)日：2009-12-09
申请号：EP09007434.5
申请日：2009-06-04
申请人： EBARA CORPORATION
发明人： Miyazaki, Mitusru , Katsuoka, Seiji , Matsuda, Naoki , Kunisawa, Junji , Kobayashi, Kenichi , Sotozaki, Hiroshi , Shinozaki, Hiroyuki , Nabeya, Osamu , Morisawa, Shinya , Ogawa, Takahiro , Makino, Natsuki
IPC分类号： H01L21/00
CPC分类号： B24B37/345 , H01L21/30625 , H01L21/67219 , H01L21/67739 , H01L21/67742 , H01L21/67754 , Y10T137/0318 , Y10T137/8593
摘要： An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.
摘要翻译：公开了一种用于处理衬底的设备。该装置包括：抛光部，被配置为对基板进行抛光;传送机构，其构造成传送基板;以及清洁部，其构造成清洁和干燥被抛光的基板。清洗部具有多个用于清洗多个基板的清洗线。多个清洁线具有多个清洁模块和用于传送基板的多个传送机器人。

39. 发明授权

EP1071118B1 Substrate rotating apparatus 有权
标题翻译：基板旋转装置
公开(公告)号：EP1071118B1
公开(公告)日：2008-09-24
申请号：EP00115587.8
申请日：2000-07-19
申请人： EBARA CORPORATION
发明人： Shinozaki, Hiroyuki
IPC分类号： H01L21/00 , H01L21/68 , C23C16/458
CPC分类号： H01L21/68792 , F16C32/047 , F16C2300/42 , F16C2300/62

40. 发明授权

EP1164667B1 Electric discharge gas laser 有权
标题翻译： Gasentladungslaser
公开(公告)号：EP1164667B1
公开(公告)日：2008-09-17
申请号：EP01113983.9
申请日：2001-06-08
申请人： EBARA CORPORATION
发明人： Ooyama, Atushi , Sekiguchi, Shinichi , Shinozaki, Hiroyuki , Barada, Toshimitsu , Nakazawa, Toshiharu
IPC分类号： H01S3/036
CPC分类号： F16C32/0444 , F16C32/0489 , H01S3/036 , H01S3/225

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