专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

21. 发明授权

EP1576072B1 AQUEOUS PHOSPHORIC ACID COMPOSITIONS FOR CLEANING SEMICONDUCTOR DEVICES 有权
标题翻译：酸的水溶液组成用于清洗半导体器件
公开(公告)号：EP1576072B1
公开(公告)日：2008-08-20
申请号：EP03777786.9
申请日：2003-10-21
申请人： EKC TECHNOLOGY, INC.
发明人： DAVIOT, Jerome , REID, Christopher , HOLMES, Douglas
IPC分类号： C09K13/00 , C11D7/08 , C11D7/32 , C11D11/00 , C11D7/06
CPC分类号： H01L21/02071 , C11D7/06 , C11D7/08 , C11D7/3218 , C11D7/3227 , C11D7/3281 , C11D11/0047
摘要： The present invention relates to dilute aqueous solutions containing phosphoric acid and methods for cleaning plasma etch residue from semiconductor substrates including such dilute aqueous solutions. The solution according to the invention may advantageous contain an alkaline compound, one or more other acid compounds, and/or a fluoride-containing compound and may optionally contain additional components such as organic solvents, chelating agents, amines, and/or surfactants.

22. 发明授权

EP1378492B1 REMOVER FOR SCALE DEPOSITED ON TITANIUM MATERIAL 有权
标题翻译：手段沉积物在钛材料去除
公开(公告)号：EP1378492B1
公开(公告)日：2008-04-02
申请号：EP01906187.8
申请日：2001-02-21
申请人： Seiwa Pro Co., Ltd.
发明人： SUGIMOTO, Takeshi
IPC分类号： C02F5/12 , C23G1/10 , C11D7/08 , C11D7/10 , C11D7/26 , C11D11/00
CPC分类号： C11D7/08 , C02F5/125 , C02F2103/005 , C11D7/10 , C11D7/265 , C11D11/0029 , C23G1/106
摘要： A scale remover for use in removing a scale deposited on members made of titanium or a titanium alloy, which comprises a hydroxycarboxylic acid, sulfamic acid, and ammonium sulfate as active ingredients and is highly inhibited from causing dissolution of titanium ions.

23. 发明公开

EP1693437A4 CIP CLEANING AGENT COMPOSITION AND METHOD OF CLEANING THEREWITH 审中-公开
标题翻译： CIP清洗组合物和方法所以清洗
公开(公告)号：EP1693437A4
公开(公告)日：2007-12-05
申请号：EP04799852
申请日：2004-11-19
申请人： JOHNSON DIVERSEY INC
发明人： ISHIHARA SATORU , CHIBA TSUNENORI , NISHIZAWA MASAHIRO
IPC分类号： C11D1/04 , C11D1/06 , C11D1/74 , C11D3/00 , C11D3/02 , C11D3/20 , C11D3/34 , C11D7/08 , C11D7/26 , C11D11/00
CPC分类号： C11D7/265 , C11D1/04 , C11D1/06 , C11D1/74 , C11D3/0026 , C11D3/042 , C11D3/2079 , C11D3/2082 , C11D3/2086 , C11D3/2089 , C11D3/2093 , C11D7/08 , C11D7/266 , C11D11/0041
摘要： [PROBLEMS] To provide a CIP cleaning agent composition that not only is capable of efficient removal of flavor adhering to production equipment for food, beverage, etc., especially flavor adhering to packings and the like but also having low bubbling property, is capable of carrying out in one step both steps of acid cleaning and deodorization; and provide a method of cleaning with the CIP cleaning agent composition. [MEANS FOR SOLVING PROBLEMS] There is provided a composition comprising 0.005 to 30.0 wt.% of at least one member selected from the group consisting of, represented by respective given general formulae, fatty acids, ether carboxylic acids, diglycerides or triglycerides and fatty acid esters, or comprising the same plus 0.01 wt.% or more of inorganic acid and/or organic acid, to which according to necessity 0.005 to 30 wt.% of solubilizing agent is added. (Herein, the wt.% is in terms of pure contents without exception.)

24. 发明公开

EP1776446A1 METHOD OF REMOVING LAUNDRY ASH 审中-公开
标题翻译：去除洗衣粉的方法
公开(公告)号：EP1776446A1
公开(公告)日：2007-04-25
申请号：EP05767553.0
申请日：2005-07-08
申请人： Reckitt Benckiser N.V.
发明人： CORRADINI, Fabio, Reckitt Benckiser Italia S.p.A.
IPC分类号： C11D7/26 , C11D7/08 , C11D3/20 , C11D3/02
CPC分类号： C11D3/042 , C11D3/0036 , C11D3/2075 , C11D3/2086 , C11D7/08 , C11D7/265 , C11D11/0023
摘要： This invention relates to a method of removing and preventing the deposition of hard water scale in a clothes washing machine. In particular the method relates to the removal of and prevention of scale build up after the main wash of a clothes washing machine. The invention involves the addition of a buffered composition of pH 1-6 into the rinse cycle of the clothes washing machine. The invention also relates to water-softening compositions for such methods.
摘要翻译：本发明涉及一种去除和防止洗衣机中硬水垢沉积的方法。具体地说，该方法涉及在洗衣机的主洗涤之后去除和防止结垢。本发明涉及在洗衣机的漂洗循环中加入pH1-6的缓冲组合物。本发明还涉及用于这种方法的水软化组合物。

25. 发明公开

EP1776445A1 METHOD OF REMOVING LAUNDRY ASH 审中-公开
标题翻译：程序对取出衣物ASH
公开(公告)号：EP1776445A1
公开(公告)日：2007-04-25
申请号：EP05761692.2
申请日：2005-07-08
申请人： Reckitt Benckiser N.V.
发明人： CORRADINI, Fabio, Reckitt Benckiser Italia S.p.A.
IPC分类号： C11D7/26 , C11D7/08 , C11D3/20 , C11D3/02
CPC分类号： C11D3/042 , C11D3/0036 , C11D3/2075 , C11D3/2086 , C11D7/08 , C11D7/265 , C11D11/0023
摘要： This invention relates to a method of removing and preventing the deposition of hard water scale in a clothes washing machine. In particular the method relates to the removal of and prevention of scale build up after the main wash of a clothes washing machine, by use of an acidic composition. The invention also relates to water-softening compositions for such methods.

26. 发明公开

EP1472017A4 METHOD FOR CLEANING AN ARTICLE 审中-公开
标题翻译：清理方法的一篇文章
公开(公告)号：EP1472017A4
公开(公告)日：2007-03-21
申请号：EP03729378
申请日：2003-01-07
申请人： PRAXAIR TECHNOLOGY INC
发明人： BILLINGHAM JOHN FREDRIC
IPC分类号： B08B7/00 , C11D7/04 , C11D7/06 , C11D7/08 , C11D7/30 , C11D7/50 , C11D11/00 , H01L21/027 , H01L21/304 , B08B3/00 , G03F7/42 , H01L21/00
CPC分类号： C11D7/06 , B08B7/00 , B08B7/0021 , C11D7/04 , C11D7/08 , C11D7/30 , C11D7/50 , C11D11/0047
摘要： A method for cleaning an article includes the steps of contacting the article with a solvent fluid that includes carbon dioxide, whereby contaminants on the article dissolve in the solvent fluid and displacing the solvent fluid with a displacing fluid, that is other than carbon dioxide. In one aspect, the displacing fluid is at a temperature and pressure sufficient to prevent forming a second phase in the solvent fluid being displaced and at least a portion of the carbon dioxide is recycled to the article. In another aspect, the pressure of the solvent fluid is reduced prior to its displacement with the displacing gas.

27. 发明授权

EP1167501B1 Process of treating a fabric by generating heat 有权
标题翻译：一种通过热产生治疗组织的方法
公开(公告)号：EP1167501B1
公开(公告)日：2006-05-24
申请号：EP00870134.4
申请日：2000-06-19
申请人： THE PROCTER & GAMBLE COMPANY
发明人： Pace, Luigi (NMN) , Fauré-Tromeur, Melanie
IPC分类号： C11D3/00 , C11D3/39 , C11D3/395 , C11D7/02 , C11D7/06 , C11D7/08 , C11D7/10 , C11D7/26 , C11D7/32 , C11D7/36 , C11D7/50
CPC分类号： C11D3/0052 , C11D3/0031 , C11D3/0042 , C11D3/042 , C11D3/044 , C11D3/128 , C11D3/2075 , C11D3/43 , C11D7/06 , C11D7/10 , C11D7/261 , C11D7/262 , C11D7/263 , C11D7/264 , C11D7/3209 , C11D7/3227 , C11D7/3245 , C11D7/3263 , C11D7/3281 , C11D7/36 , C11D7/50 , C11D11/0017 , C11D11/007

28. 发明授权

EP1205537B1 Builder-Zusammensetzung 有权
标题翻译：助洗剂组合物
公开(公告)号：EP1205537B1
公开(公告)日：2006-03-08
申请号：EP01126163.3
申请日：2001-11-03
申请人： Clariant GmbH
发明人： Bauer, Harald, Dr. , Holz, Josef, DI. , Schimmel, Günther, Dr.
IPC分类号： C11D3/12 , C11D3/02 , C11D7/08 , C11D3/20 , C11D3/37 , C11D3/36 , C11D17/00
CPC分类号： C11D17/0073 , C11D3/042 , C11D3/1273 , C11D3/2075 , C11D3/361 , C11D3/364 , C11D3/3761 , C11D3/378

29. 发明公开

EP1519234A3 Stripping and cleaning compositions for microelectronics 有权
标题翻译：回收和清洁组合物用于微电子
公开(公告)号：EP1519234A3
公开(公告)日：2005-11-30
申请号：EP03257383.4
申请日：2003-11-24
申请人： MALLINCKRODT BAKER, Inc.
发明人： Kane, Sean Michael , Kim, Sang In, Tae-Young APT.
IPC分类号： G03F7/42 , C11D7/08 , C11D7/26 , C11D7/32 , C11D7/34 , C11D11/00
CPC分类号： C11D7/5013 , C11D7/08 , C11D7/261 , C11D7/263 , C11D7/265 , C11D7/3218 , C11D7/3263 , C11D7/3281 , C11D7/34 , C11D11/0047 , G03F7/425 , G03F7/426
摘要： Alkaline-containing cleaning compositions and method of using the cleaning compositions for cleaning microelectronic substrates, particularly FPD microelectronic substrates, which compositions are able to essentially completely clean such substrates and produce essentially no metal corrosion of the metal elements of such substrates. The alkaline-containing cleaning compositions of this invention have (a) a nucleophilic amine, (b) a moderate to weak acid having a strength expressed as a "pKa" for the dissociation constant in aqueous solution of from about 1.2 to about 8, (c) a compound selected from an aliphatic alcohol, diol, polyol or aliphatic glycol ether, and (d) an organic co-solvent preferably having a solubility parameter of from about 8 to about 15. The cleaning compositions of this invention will have an amount of weak acid such that the equivalent mole ratio of acid groups to amine groups is greater than .75 and may range up to and beyond a ratio of 1, such as for example a ratio of 1.02 or more. The pH of the alkaline-containing cleaning compositions of this invention will be from about pH 4.5 to 9.5.

30. 发明公开

EP1452582A4 DETERGENT FOR METALLIC PRODUCT 有权
标题翻译： DETERGENSFÜRMETALLISCHES PRODUKT
公开(公告)号：EP1452582A4
公开(公告)日：2005-07-27
申请号：EP01981049
申请日：2001-11-09
申请人： SAKURAI JIRO
发明人： SAKURAI JIRO , SUGIMOTO TAKESHI
IPC分类号： C11D3/02 , C11D7/08 , C11D7/26 , C11D7/34 , C11D11/00
CPC分类号： C11D3/042 , C11D7/08 , C11D7/265 , C11D7/34 , C11D11/0029
摘要： A cleaning agent of sulfamic acid-hydroxycarboxylic acid system is provided, which has the capability of preventing metal elution from metal products to be cleaned and hydrogen embrittlement of the metal products. This cleaning agent comprises sulfamic acid and at least one of hydroxycarboxylic acids, and a compounding ratio (weight ratio) of sulfamic acid : at least one of hydroxycarboxylic acids is (60 SIMILAR 95) : (40 SIMILAR 5), and preferably (80 SIMILAR 95) : (20 SIMILAR 5). In particular, when citric acid and malic acid are used as the hydroxycarboxylic acids, and a compounding ratio (weight ratio) of sulfamic acid : citric acid : malic acid is (80 SIMILAR 95) : (10 SIMILAR 2.5) : (10 SIMILAR 2.5), it is possible to provide excellent performance in preventing metal elution and hydrogen embrittlement as well as high detergency.
摘要翻译：提供氨基磺酸 - 羟基羧酸系统的清洗剂，其具有防止金属洗涤金属洗涤和金属产品氢脆性的能力。该清洗剂包含氨基磺酸和至少一种羟基羧酸，以及氨基磺酸的配合比例（重量比）：至少一种羟基羧酸为（60〜95）：（40〜5），优选为（80〜 95）:( 20类5）。特别是当使用柠檬酸和苹果酸作为羟基羧酸时，氨基磺酸：柠檬酸：苹果酸的配合比（重量比）为（80〜95）：（10〜2.5）:( 10〜2.5）），可以提供优异的防止金属洗脱和氢脆性能以及高洗涤性能。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式