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21. 发明公开

EP1090329A4 ALIGNMENT SIMULATION 审中-公开
标题翻译： AUSRICHTUNGSSIMULATION
公开(公告)号：EP1090329A4
公开(公告)日：2002-09-25
申请号：EP99920243
申请日：1999-04-29
申请人： NIPPON KOGAKU KK
发明人： COON PAUL DEREK , CHAU HENRY KWOK PANG , AIYER ARUN ANANTH
IPC分类号： G03F9/00 , G03B27/42 , G03B27/58
CPC分类号： G03F9/7092 , G03F9/7076
摘要： An alignment simulation method simulates the signal waveform for an alignment mark using various alignment methods as well as the signal strength for an alignment mark, which is useful in optimizing the thickness of one or more layers as well as the geometry of the mark. The simulation of signal strength is also useful in optimizing the thickness of a layer for artifact wafers. The alignment simulation method includes accurately modeling the alignment mark, including one or more layers of various thicknesses and materials. The accurate modeling of the alignment mark includes such things as smoothing regions of the alignment mark and generating lateral shifts of the layers. The model of the alignment mark is a series of small pixels, each including the thickness of the layers and the layers indices of refraction. Using scalar diffraction, a complex reflectivity is generated for each pixel and a fast fourier transform is performed on the series of pixels. The results of the fast fourier transform are used to simulate the diffraction intensities for the alignment mark alignment systems, such as LIA or LSA as well as the signal waveforms. The LSA signal waveform, however, requires additional modeling of the alignment mark. An FIA image is generated by removing appropriate orders from the fast fourier transform result and performing an inverse fast fourier transform and repeating the process at different light wavelengths and illumination angles. The signal strength is the maximum value of the image minus the minimum.
摘要翻译：对准模拟方法使用各种对准方法模拟对准标记的信号波形以及对准标记的信号强度，其可用于优化一个或多个层的厚度以及标记的几何形状。信号强度的模拟也可用于优化人造晶片层的厚度。对准模拟方法包括对准标记的精确建模，包括一层或多层各种厚度和材料。对准标记的精确建模包括诸如对准标记的平滑区域和产生层的横向偏移的事情。对准标记的模型是一系列小像素，每个小像素包括层的厚度和层的折射率。使用标量衍射，为每个像素生成复杂的反射率，并对像素系列执行快速傅立叶变换。快速傅里叶变换的结果用于模拟对准标记对准系统的衍射强度，例如LIA或LSA以及信号波形。然而，LSA信号波形需要对准标记的附加建模。通过从快速傅里叶变换结果中去除适当的顺序并执行反向快速傅立叶变换并在不同的光波长和照射角度重复该过程，从而生成FIA图像。信号强度是图像的最大值减去最小值。

22. 发明公开

EP1180251A1 WAFER ALIGNMENT 审中-公开
标题翻译： WAFERAUSRICHTUNG
公开(公告)号：EP1180251A1
公开(公告)日：2002-02-20
申请号：EP01918374.8
申请日：2001-03-05
申请人： Koninklijke Philips Electronics N.V.
发明人： HUBBARD, Bryan , LEROUX, Pierre
IPC分类号： G03F9/00
CPC分类号： G03F9/7092 , G03F9/7076
摘要： A method for determining the centroid of a wafer target. In one embodiment, the method comprises a series of steps in a stepper, starting with the step of receiving a wafer, having a target set formed therein. Next, a signal is passed over the target set and over a material separating target shapes in the target set. Then a return signal is reflected, and received, from the surface of the target shapes and the material separating them. A location of at least one maxima point of the return signal is identified. Finally, a centroid is determined as the median of the locations of at least one maxima point.

23. 发明公开

EP1061417A2 Method and apparatus for overlay measurement 审中-公开
标题翻译： Verfahren und Vorrichtung zurÜberdeckungsmessung
公开(公告)号：EP1061417A2
公开(公告)日：2000-12-20
申请号：EP00112776.0
申请日：2000-06-16
申请人： Infineon Technologies AG
发明人： Gould, Chris , Muller, Paul K. , Prakash, Jai V.C. , Van den Berg, Robert
IPC分类号： G03F7/20
CPC分类号： G03F9/7092 , G03F7/70633
摘要： A process for measuring the alignment of different layers on a semiconductor wafer (33) includes forming repetitive alignment marks (14, 24) having substantially the same period on the different layers on the wafer (33). The images of the overlay alignment marks (14, 24) are converted from space domain to frequency domain through Fourier transformations. The alignment measurements are performed by calculating the phase difference between the images corresponding to the repetitive patterns (14, 24) on different layers.
摘要翻译：用于测量半导体晶片（33）上的不同层的对准的方法包括在晶片（33）上的不同层上形成具有基本上相同周期的重复对准标记（14,24）。覆盖对齐标记（14,24）的图像通过傅立叶变换从空间域转换到频域。通过计算对应于不同层上的重复图案（14,24）的图像之间的相位差来执行对准测量。

24. 发明公开

EP4379466A1 ALIGNMENT METHOD AND ASSOCIATED ALIGNMENT AND LITHOGRAPHIC APPARATUSES 审中-公开
公开(公告)号：EP4379466A1
公开(公告)日：2024-06-05
申请号：EP22210353.3
申请日：2022-11-29
申请人： ASML Netherlands B.V.
发明人： HULSEBOS, Edo, Maria , BIJNEN, Franciscus, Godefridus, Casper , DAI, Jin
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F9/708 , G03F9/7076 , G03F9/7088 , G03F7/70683 , G03F9/7092
摘要： Disclosed is a method of correcting position measurement data for an effect of a scan offset, the method comprising: obtaining position measurement data relating to an obliquely scanned measurement along an oblique scan direction over one or more alignment marks, each said one or more alignment marks comprising one or more first direction sub-marks for measurement in a first direction and one or more second direction sub-marks for measurement in a second direction different from said first direction; determining a signal amplitude imbalance metric from said position measurement data, the signal amplitude imbalance metric comprising a ratio of a signal amplitude metric in the first direction to a signal amplitude metric in the second direction; and correcting said position measurement data using said signal amplitude imbalance metric.

25. 发明授权

EP1796136B1 ALIGNMENT INFORMATION DISPLAY METHOD, PROGRAM THEREOF, ALIGNMENT METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, DISPLAY SYSTEM, DISPLAY DEVICE, PROGRAM, AND MEASUREMENT/INSPECTION DEVICE 有权转让
标题翻译：登记信息显示方法，及其程序，校直法，曝光方法元法，显示系统，显示设备，程序和测量/检测设备
公开(公告)号：EP1796136B1
公开(公告)日：2015-09-30
申请号：EP05772567.3
申请日：2005-08-19
申请人： Nikon Corporation
发明人： Okita, Shinichi
IPC分类号： H01L21/027 , G03F9/00 , H01L21/00 , G05B15/00 , G05B19/418 , G06Q50/00 , B23Q41/08
CPC分类号： H01L21/682 , G03F7/70633 , G03F9/7003 , G03F9/7046 , G03F9/7092 , Y02P90/86
摘要： [PROBLEM] To provide an information display method enabling efficient analysis and evaluation of alignment results and thereby facilitating the setting of effective alignment conditions or parameters. [MEANS FOR SOLUTION] The alignment information display method of the present invention receives as input the data of the results of processing relating to alignment measurement, receives as input information relating to the parameters of the alignment measurement, finds the information for display from the data of the results of processing based on the input parameters, and displays the found desired information for display by a display mode by which the effects on the alignment measurement become clear. Therefore, in setting the desired conditions, it is possible to easily confirm the results of analysis by the set conditions, that is, the effects of the set conditions. Therefore, a user can easily detect the optimum alignment conditions and parameters.

26. 发明授权

EP1285223B1 DATA AGE ADJUSTMENTS 有权
标题翻译：适应数据的AGE
公开(公告)号：EP1285223B1
公开(公告)日：2009-04-08
申请号：EP01935631.0
申请日：2001-05-16
申请人： ZYGO CORPORATION
发明人： DEMAREST, Frank, C.
IPC分类号： G01B9/02 , G01J9/02 , G03F9/00
CPC分类号： G01B9/02062 , G01B9/02003 , G01B9/02083 , G01B2290/70 , G01J3/45 , G03F7/70775 , G03F9/7049 , G03F9/7092
摘要： A method for compensating data age in measurement signals from an interferometer includes measuring a value of the measurement signal and adjusting the measured value based on the measurement signal with a data age adjustment value to correct for data age.

27. 发明公开

EP1843210A3 Method of aligning and exposing a substrate 审中-公开
标题翻译：对准和曝光的基板的方法
公开(公告)号：EP1843210A3
公开(公告)日：2007-11-28
申请号：EP07251283.3
申请日：2007-03-26
申请人： ASML Netherlands BV
发明人： Werkman, Roy , Mos, Everhardus Cornelis
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F7/70633 , G03F9/7092
摘要： Correcting for misalignment of a substrate before it is exposed is performed using offset corrections and process corrections that are calculated based on alignment offset measurements of alignment marks and overlay measurements of overlay targets on substrates in previous batches.

28. 发明公开

EP1150249A4 MARK DETECTING METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, MARK DETECTOR, EXPOSURE APPARATUS, AND DEVICE 审中-公开
标题翻译：用于确定品牌，曝光方法，用于生产部件，标检测器，曝光装置及零件
公开(公告)号：EP1150249A4
公开(公告)日：2007-10-31
申请号：EP99931487
申请日：1999-07-22
申请人： NIPPON KOGAKU KK
发明人： NAKAJIMA SHIN-ICHI
IPC分类号： G03F9/00 , G06T7/00 , G01B11/00 , H01L21/027
CPC分类号： G03F9/7092 , G03F9/70 , G03F9/7088
摘要： The object of the present invention is to provide a mark detection method, an exposure method, a device manufacturing method, a mark detection apparatus, an exposure apparatus, and a device manufactured by the use of the exposure apparatus, which are capable of reducing a position measurement error in a short time even in the case where a sampling interval must be set to about 0.2 times or more of a lower limit of a minimum periodic component. In the present invention, a mark formed on an object is irradiated with a detection beam, an image of the mark is picked up through an image-forming system, the image of the mark formed on an image pickup device is converted into an electrical image signal, a signal related to the image signal is output at predetermined sampling intervals, and a signal related to the image signal is interpolated in a cycle equal to or less than the predetermined sampling interval.

29. 发明公开

EP1843210A2 Method of aligning and exposing a substrate 审中-公开
标题翻译：对准和暴露基板的方法
公开(公告)号：EP1843210A2
公开(公告)日：2007-10-10
申请号：EP07251283.3
申请日：2007-03-26
申请人： ASML Netherlands BV
发明人： Werkman, Roy , Mos, Everhardus Cornelis
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F7/70633 , G03F9/7092
摘要： Correcting for misalignment of a substrate before it is exposed is performed using offset corrections and process corrections that are calculated based on alignment offset measurements of alignment marks and overlay measurements of overlay targets on substrates in previous batches.
摘要翻译：在衬底未曝光之前，使用偏移校正和工艺校正来校正衬底的未对准，所述偏移校正和工艺校正基于对准标记的对准偏移测量和先前批次中衬底上的重叠目标的重叠测量来计算。

30. 发明公开

EP1184896A1 PATTERN MATCHING METHOD AND DEVICE, POSITION DETERMINING METHOD AND DEVICE, POSITION ALIGNING METHOD AND DEVICE, EXPOSING METHOD AND DEVICE, AND DEVICE AND ITS PRODUCTION METHOD 审中-公开
标题翻译：模型比较的方法和装置，位置检测方法和装置，调整位置的方法和设备和装置及其制造
公开(公告)号：EP1184896A1
公开(公告)日：2002-03-06
申请号：EP00900417.7
申请日：2000-01-18
申请人： Nikon Corporation
发明人： YOSHIDA, Kouji, Nikon Corporation
IPC分类号： H01L21/027
CPC分类号： H01L23/544 , G03F7/70491 , G03F9/7092 , G06K9/00536 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
摘要： A template generator (32) generates a waveform template including an expected value of a signal value at each value of a parameter and a probability template including a piece of occurrence probability information of the expected value at each value of the parameter, based on a plurality of measured signal waveforms, and a matching judgment unit (33) performs template matching between a newly measured signal waveform and the waveform template by using pieces of occurrence probability information of the expected values as pieces of weight information at respective values of the parameter, the pieces of occurrence probability information composing the probability template. Additionally, the template generator (32) updates the waveform template and probability template taking into account the newly measured signal waveform so as to prepare next pattern matching. In this way, the template matching on the signal waveform that varies according to the change of the parameter's value is performed with improved accuracy of matching.
摘要翻译：模板生成器（32）基因率基于多个波形模板包含上在一个参数和一个概率模板包含在该参数的每个值的一块的预期值的发生概率信息的每个值的信号值的预期值，测量的信号的波形，和一个匹配判断单元（33）执行一个新测定的信号波形，并通过使用的预期值的发生概率信息作为参数的respectivement值的权重信息的波形模板之间的模板匹配，则的发生概率信息构成的概率模板件。此外，模板生成器（32）更新波形模板和模板的概率考虑到新测量的信号波形，以制备下一个模式匹配。通过这种方式，在信号波形模板匹配确实不定雅鼎的参数值的变化，进行与之搭配的改进的精度。

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