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21. 发明公开

EP2232195A2 ANALYZING SURFACE STRUCTURE USING SCANNING INTERFEROMETRY 有权
标题翻译：表面结构的分析，使用RASTERINTERFEROMETRIE
公开(公告)号：EP2232195A2
公开(公告)日：2010-09-29
申请号：EP08862014.1
申请日：2008-12-11
申请人： Zygo Corporation
发明人： DE GROOT, Peter , COLONNA DE LEGA, Xavier
IPC分类号： G01B11/00 , G01B9/02 , G06F7/00 , G01B11/06 , G01B11/03 , G01B11/24
CPC分类号： G01B9/02084 , G01B9/02057 , G01B9/02088 , G01B9/0209 , G01B11/06 , G01B11/0675 , G01B11/2441 , G01N21/45 , G01N21/8422 , G01N21/9501 , G01N21/95607
摘要： A method includes comparing a scanning interferometry signal obtained for a location of a test object to each of multiple model signals corresponding to different model parameters for modeling the test object, wherein for each model signal the comparing comprises calculating a correlation function between the scanning interferometry signal and the model signal to identify a surface-height offset between the scanning interferometry signal and the model signal and, based on the identified surface-height offset, calculating a height-offset compensated merit value indicative of a similarity between the scanning interferometry signal and the model signal for a common surface height. The method further includes, based on the respective merit values for the different model signals, determining a test object parameter at the location of the test object.

22. 发明公开

EP2097713A4 APPARATUS AND METHOD FOR MEASURING CHARACTERISTICS OF SURFACE FEATURES 审中-公开
标题翻译：装置和方法测量表面性质
公开(公告)号：EP2097713A4
公开(公告)日：2010-09-15
申请号：EP07871735
申请日：2007-12-21
申请人： ZYGO CORP
发明人： DE LEGA XAVIER COLONNA , DE GROOT PETER
IPC分类号： G01B11/00 , G01B11/06 , G01B11/24
CPC分类号： G01B9/02043 , G01B9/02057 , G01B9/02072 , G01B9/02084 , G01B9/02088 , G01B9/0209 , G01B2290/70 , G01N21/8422 , G01N21/9501 , G01N2021/9513

23. 发明公开

EP3163251A1 METHOD AND SYSTEM FOR REGIONAL PHASE UNWRAPPING WITH PATTERN-ASSISTED CORRECTION 有权
标题翻译： VERFAHREN UND系统ZUR REGIONALEN PHASENABWICKLUNG MITSTRUKTURUNTERSTÜTZTERKORREKTUR
公开(公告)号：EP3163251A1
公开(公告)日：2017-05-03
申请号：EP16191014
申请日：2016-09-28
申请人： KLA-TENCOR CORP
发明人： LIU HELEN , ZHAO XUAN , LI XIAOWEI
IPC分类号： G01B11/24 , G01B9/02
CPC分类号： G01B9/02083 , G01B9/02078 , G01B9/02088 , G01B11/0608 , G01B11/2441 , G01B2210/56
摘要： A wafer metrology system includes an interferometer sub-system and a controller. The interferometer sub-system is configured to generate an interferogram with an intensity map that corresponds to a modulated representation of a wafer surface. Further, the interferometer sub-system includes a detector configured to capture the interferogram. The controller includes one or more processors configured to generate a wrapped phase map of the interferogram, define patterns associated with features on the wafer, and correct phase discontinuities by applying a phase unwrapping procedure to the wrapped phase map to generate an unwrapped phase map and correcting phase discontinuities in the unwrapped phase map based on the patterns, or by combining phase unwrapping and correction in a unified step. Further, the patterns comprise two or more structures such that a portion of the unwrapped phase map associated with structures of the same type is continuous across borders separating structures of the same type.
摘要翻译：晶片测量系统包括干涉仪子系统和控制器。干涉仪子系统被配置为生成具有对应于晶片表面的调制表示的强度图的干涉图。此外，干涉仪子系统包括配置成捕获干涉图的检测器。该控制器包括一个或多个处理器，该一个或多个处理器被配置为产生干涉图的卷绕相位图，定义与晶片上的特征相关联的图案，并且通过将相位展开程序应用于卷绕相位图来校正相位不连续性以生成展开相位图并校正基于图案的展开相位图中的相位不连续性，或者通过在统一的步骤中组合相位展开和校正。此外，图案包括两个或更多个结构，使得与相同类型的结构相关联的一部分展开的相位图跨过分隔相同类型的结构的边界是连续的。

24. 发明授权

EP2677271B1 Broadband interferometer for determining a property of a thin film 有权
标题翻译：用于确定薄膜特性的宽带干涉仪
公开(公告)号：EP2677271B1
公开(公告)日：2017-04-26
申请号：EP13167065.5
申请日：2013-05-08
申请人： Mitutoyo Corporation
发明人： Haitjema, Han , Quaedackers, Johannes Anna
IPC分类号： G01B9/02 , G01B11/06 , G01N21/47
CPC分类号： G01B9/02088 , G01B9/02087 , G01B9/0209 , G01B11/0675 , G01N21/45 , G01N2021/4126

25. 发明公开

EP2914925A1 METHOD AND APPARATUS FOR PROCESSING THE SIGNAL IN SPECTRAL DOMAIN INTERFEROMETRY AND METHOD AND APPARATUS FOR SPECTRAL DOMAIN OPTICAL COHERENCE TOMOGRAPHY 有权
标题翻译：方法和设备在SPEKTRALBEREICHSINTERFEROMETRIE信号处理的方法和装置光学SPEKTRALBEREICHSKOHÄRENZTOMOGRAFIE
公开(公告)号：EP2914925A1
公开(公告)日：2015-09-09
申请号：EP13801687.8
申请日：2013-11-01
申请人： University of Kent
发明人： PODOLEANU, Adrian , BRADU, Adrian
IPC分类号： G01B9/02
CPC分类号： G01B9/02044 , G01B9/02004 , G01B9/02064 , G01B9/02088 , G01B9/02091 , G01B2290/60
摘要： Real-time depth measurements in sensing in spectral domain interferometry and for en-face and cross section image production in optical coherence tomography can operate without any need to linearize the data to maximize the output signal and achieve the theoretical depth resolution. Novel interferometry is disclosed, where parameters of a master interferometer dictate the results in a slave interferometer. The master interferometer can be the same measuring interferometer used in two stages. The master interferometer parameters are at least optical path difference (OPD) or the speed of variation of the OPD in the master interferometer. Coherence gated data are produced from selected axial positions which can be from positive or negative optical path differences, in parallel, enabling generation of en-face (C-scan) OCT images simultaneously from several depths, free from mirror terms, and production of A-scans and B-scan OCT images using plural reflectivity values measured in parallel from different depths within A-scans.

26. 发明公开

EP2733478A4 PROGRAM TO CORRECT DATA MEASURED BY PS-OCT AND PS-OCT SYSTEM THAT COMES WITH THE PROGRAM 审中-公开
标题翻译：计划用于校正通过PS-OCT测量数据和PS-OCT系统与程序
公开(公告)号：EP2733478A4
公开(公告)日：2014-12-31
申请号：EP12812095
申请日：2012-04-25
申请人： UNIV TSUKUBA
发明人： YASUNO YOSHIAKI , DUAN LIAN , ITO MASAHIDE
IPC分类号： G01N21/17 , G01B9/02
CPC分类号： G06F7/483 , A61B3/102 , A61B5/0066 , A61B5/7203 , G01B9/02011 , G01B9/02027 , G01B9/02044 , G01B9/0207 , G01B9/02088 , G01B9/02091 , G01B2290/45 , G01B2290/70 , G01N21/274 , G01N21/4795

27. 发明公开

EP2733478A1 PROGRAM TO CORRECT DATA MEASURED BY PS-OCT AND PS-OCT SYSTEM THAT COMES WITH THE PROGRAM 审中-公开
标题翻译：通过PS-OCT和PS-OCT系统测量数据的程序
公开(公告)号：EP2733478A1
公开(公告)日：2014-05-21
申请号：EP12812095.3
申请日：2012-04-25
申请人： University of Tsukuba
发明人： YASUNO Yoshiaki , DUAN Lian , ITO Masahide
IPC分类号： G01N21/17
CPC分类号： G06F7/483 , A61B3/102 , A61B5/0066 , A61B5/7203 , G01B9/02011 , G01B9/02027 , G01B9/02044 , G01B9/0207 , G01B9/02088 , G01B9/02091 , G01B2290/45 , G01B2290/70 , G01N21/274 , G01N21/4795
摘要： Data measured by PS-OCT is corrected in a non-linear manner to enhance the quantitative analysis capability of PS-OCT and permit accurate quantitative diagnosis, including diagnosis of disease stage of lesions, as a useful means for computer diagnosis. Even when retardation per PS-OCT contains error and becomes noise and its distribution is not normal or symmetrical around the true value, measured data is converted using a distribution conversion function obtained by analyzing the characteristics of noise via Monte Carlo simulation to remove the systematic error and estimate the true value otherwise buried in noise and thereby correct the PS-OCT 1 image more clearly.
摘要翻译：通过PS-OCT测量的数据以非线性方式进行校正以增强PS-OCT的定量分析能力，并且允许包括诊断病变疾病阶段在内的准确定量诊断，作为计算机诊断的有用手段。即使每个PS-OCT的延迟包含误差并且变为噪声并且其分布在真值周围不是正态或对称的，使用通过分析噪声特性获得的分布转换函数来转换测量数据，通过蒙特卡罗模拟来消除系统误差并估计否则掩埋在噪声中的真实值，从而更清楚地校正PS-OCT 1图像。

28. 发明公开

EP1883781A4 ANALYZING LOW-COHERENCE INTERFEROMETRY SIGNALS FOR THIN FILM STRUCTURES 有权
标题翻译：方法和系统分析信息的INTERFEROMETRIESIGNALEN低稠度ON薄膜结构HIN
公开(公告)号：EP1883781A4
公开(公告)日：2014-01-01
申请号：EP06760145
申请日：2006-05-18
申请人： ZYGO CORP
发明人： DE GROOT PETER
IPC分类号： G01B9/02
CPC分类号： G01B11/2441 , G01B9/02084 , G01B9/02087 , G01B9/02088 , G01B9/0209 , G01N21/8422
摘要： Methods and systems are disclosed for analyzing a scanning interferometry signal. Steps include: providing a scanning interferometry signal produced by a scanning interferometer for a first location of a test object (e.g., a sample having a thin film); providing a model function of the scanning interferometry signal produced by the scanning interferometer, wherein the model function is parameterized by one or more parameter values; fitting the model function to the scanning interferometry signal for each of a series of shifts in scan position between the model function and the scanning interferometry signal by varying the parameter values; and determining information about the test object (e.g., a surface height or height profile, and/or a thickness or thickness profile for a thin film in the test object) at the first location based on the fitting.

29. 发明公开

EP2645053A1 Measuring apparatus, measuring method, and method of manufacturing an optical component 审中-公开
标题翻译：测定装置，测定方法及其制造方法的光学部件
公开(公告)号：EP2645053A1
公开(公告)日：2013-10-02
申请号：EP13159880.7
申请日：2013-03-19
申请人： Canon Kabushiki Kaisha
发明人： Iijima, Hitoshi , Maeda, Atsushi
IPC分类号： G01B9/02 , G01M11/00 , G01B11/24 , G01J9/00
CPC分类号： G01B11/2441 , G01B9/02027 , G01B9/02039 , G01B9/02088 , G01B9/0209 , G01B2290/70 , G01J2009/002 , G01J2009/0203 , G01M11/025 , G01M11/0271 , Y10T29/49826
摘要： To eliminate influence of undesirable light component from an object when measuring optical characteristics such as shape and wavefront aberration of the object, light from light source (101) is separated by polarization beam splitter (103) into measuring light (L1) that irradiates and travels via the object (108) and is condensed on image plane (P) through microlenses (114a) of microlens array (114), and reference light (L2) that does not irradiate the object and is guided to the image plane by reference light optical system (109). A computer (113) acquires picked-up images sequentially from CCD image sensor (116) arranged on the image plane while changing optical path length of the reference light by movable stage (117), extracts interference light spots generated through interference between signal light component and the reference light from the picked-up images, calculates positions of the interference light spots, and calculates deviation amounts of positions from predetermined reference positions.
摘要翻译：为了从在对象消除有害光分量的影响在测量光学特性：如所述对象的形状和波前像差，从光源（101）的光被偏振分束器（103）分离成测量光（L1）没有照射和行进通过对象（108）和平面会聚在图像（P）通过微透镜阵列（114）和参考光（L2）的微透镜（114a）的根本不照射该对象，并通过参考光引导至图像平面系统（109）。一种计算机（113）获取从布置在图像平面上，同时由可移动台（117）改变参考光的光路长度的CCD图像传感器（116）拍摄图像顺序地，萃取物通过信号光成分之间的干涉产生的干涉光点并从拍摄图像的参照光，计算所述干扰光点的位置，并且计算从预定基准位置的位置的偏离量。

30. 发明公开

EP2409650A4 OPTICAL THREE-DIMENSIONAL STRUCTURE MEASURING DEVICE AND STRUCTURE INFORMATION PROCESSING METHOD THEREFOR 有权转让
标题翻译：光学三维结构表和结构信息处理，以便
公开(公告)号：EP2409650A4
公开(公告)日：2012-09-05
申请号：EP10753408
申请日：2010-03-03
申请人： FUJIFILM CORP
发明人： TERAMURA YUICHI
IPC分类号： A61B10/00 , A61B1/00 , A61B1/04 , A61B5/00 , G01B9/02 , G01B11/24 , G01N21/17 , G01N21/47
CPC分类号： G01B9/02069 , A61B3/00 , A61B3/1005 , A61B3/102 , A61B5/0059 , A61B5/0066 , A61B5/0084 , A61B5/7203 , A61B5/7264 , G01B9/02004 , G01B9/02085 , G01B9/02088 , G01B9/02091 , G01B2290/65 , G01N21/4795

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