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171. 发明授权

EP1639393B1 KORREKTUREINRICHTUNG ZUR KOMPENSATION VON STÖRUNGEN DER POLARISATIONSVERTEILUNG SOWIE PROJEKTIONSOBJEKTIV FÜR DIE MIKROLITHOGRAPHIE 有权
标题翻译：校正装置用于问题某些微光刻偏振分布和投影镜片补偿
公开(公告)号：EP1639393B1
公开(公告)日：2010-08-18
申请号：EP04739966.2
申请日：2004-06-17
申请人： Carl Zeiss SMT AG
发明人： HEMBD, Christian
IPC分类号： G02B5/30 , G02B27/00 , G02B13/14
CPC分类号： G03F7/70966 , G02B1/08 , G02B5/3083 , G02B17/0892 , G02B27/286 , G03F7/70308 , G03F7/70566
摘要： Disclosed is a corrective device for compensating disturbances of polarization distribution across the cross-section of a light beam (10). Said corrective device comprises a corrective member (18; 118) encompassing two double-refractive corrective elements (20, 22; 120a, 120b, 122; 220; 222; 320, 322) with two substantially parallel surfaces (24, 26; 126, 127). The thickness (d) of the corrective element (22, 122, 222) is essentially constant between said surfaces (26; 126, 127). At least one of the surfaces (24, 26; 126, 127) of at least one of the corrective elements (20, 22; 120a, 120b, 122; 220; 222; 320, 322) is refinished in such a way that local irregularities in thickness Δd are created by means of which the disturbances of polarization distribution are at least nearly compensated. The arrangement, thickness (d), and double-refractory properties of the corrective elements (20, 22; 120a, 120b, 122; 220; 222; 320, 322) are selected such that the double-refractive effects thereof mutually cancel each other if the local irregularities in thickness Δd are not taken into consideration. The inventive corrective device influences polarization only at points where disturbances are to be compensated.

172. 发明公开

EP1651991A4 INSPECTION SYSTEM USING SMALL CATADIOPTRIC OBJECTIVE 审中-公开
标题翻译： WITH A小折反射镜片检验系统
公开(公告)号：EP1651991A4
公开(公告)日：2010-08-11
申请号：EP04809477
申请日：2004-07-06
申请人： KLA TENCOR TECH CORP
发明人： CHUANG YUNG-HO , ARMSTRONG JOSEPH J , SHAFER DAVID R
IPC分类号： G02B17/00 , G01N21/88 , G01N21/95 , G02B20060101 , G02B5/00 , G02B17/08 , G02B21/02 , G03F7/20
CPC分类号： G01N21/8806 , G01N21/9501 , G02B5/001 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/0892 , G02B21/02 , G03F7/70225 , G03F7/70341

173. 发明公开

EP1783525A4 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD 审中-公开
标题翻译：投影光学系统，曝光装置以及曝光方法
公开(公告)号：EP1783525A4
公开(公告)日：2009-09-23
申请号：EP05766167
申请日：2005-07-22
申请人： NIPPON KOGAKU KK
发明人： OMURA YASUHIRO , OWA SOICHI
IPC分类号： G02B13/24 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70958 , G02B17/0892 , G03F7/70225 , G03F7/70341
摘要： A projection optical system that has liquid interposed in an optical path to the image plane to achieve a large effective image-side numerical aperture larger than, for example, 1.4, while a relatively large effective imaging region can be achieved. The projection optical system that projects a reduced image of a first surface (R) onto a second surface (W). The optical path between the projection optical system and the second surface can be filled with liquid (Lm) having a refractive index larger than 1.5, where a refractive index of gas in an optical path within the projection optical system is 1. The projection optical system comprises a boundary lens (Lb) that can be contacted with the gas on the side of the first surface and contacted with the liquid on the side of the second surface, and the boundary lens has a positive refracting power and is made of an optical material having a refractive index larger than 1.8.

174. 发明公开

EP1481279A4 MULTI-DETECTOR MICROSCOPIC INSPECTION SYSTEM 失效
标题翻译：与多个探测器微观调查制度
公开(公告)号：EP1481279A4
公开(公告)日：2009-05-06
申请号：EP03715985
申请日：2003-02-05
申请人： KLA TENCOR TECH CORP
发明人： LANGE STEVEN R
IPC分类号： G02B21/06 , G02B27/12 , G01N21/956 , G01Q10/00 , G01Q30/20 , G02B5/08 , G02B15/14 , G02B17/08 , G02B21/00 , G02B21/02 , G02B21/04 , G02B21/18 , G02B21/36 , G21K7/00
CPC分类号： G02B17/086 , G02B17/0808 , G02B17/0856 , G02B17/0892 , G02B21/0016 , G02B21/025 , G02B21/04 , G02B21/18 , G02B21/367
摘要： Techniques for utilizing a microscope inspection system (100) capable of inspecting specimens (112) at high throughput rates are described. The inspection system achieves the higher throughput rates by utilizing more than one detector array (116) and a large field of view to scan the surface of the semiconductor wafers. The microscope inspection system also has high magnification capabilities, a high numerical aperture, and a large field of view. By using more than one detector array, more surface area of a wafer can be inspected during each scanning swath across the semiconductor wafers. The microscope inspection system is configured to have a larger field of view so that the multiple detector arrays can be properly utilized. Additionally, special arrangements of reflective and/or refractive surfaces are used in order to fit the detector arrays within the physical constraints of the inspection system.

175. 发明公开

EP2003506A2 REFLECTIVE, REFRACTIVE AND PROJECTING OPTICAL SYSTEM; REFLECTIVE, REFRACTIVE AND PROJECTING DEVICE; SCANNING EXPOSURE DEVICE; AND METHOD OF MANUFACTURING MICRO DEVICE 审中-公开
标题翻译：反射的，衍射以及一种用于制造微器件投影光学系统衍射映和装置投射，ABTASTBELICHTUNGSEINRICHTUNG AND METHOD
公开(公告)号：EP2003506A2
公开(公告)日：2008-12-17
申请号：EP07714853.4
申请日：2007-02-23
申请人： Nikon Corporation
发明人： KATO, Masaki
IPC分类号： G03F7/20 , G02B13/24 , G02B17/08 , H01L21/027
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70216 , G03F7/70275 , G03F7/70791
摘要： A scanning exposure apparatus of the present invention is one for transferring a pattern of a first object onto a second object while projecting an image of the first object placed on a first plane, onto the second object placed on a second plane and changing a positional relation between the image of the first object and the second object in a scanning direction. The scanning exposure apparatus has a first projection optical system having a first field of view on the first plane and adapted to project an enlargement image of a portion of the first object in a first projection region on the second plane, based on light from the first field of view, and a second projection optical system having a second field of view on the first plane and adapted to project an enlargement image of a portion of the first object in a second projection region on the second plane, based on light from the second field of view. The scanning exposure apparatus satisfies the relation of Dp = β × Dm, where Dm is a first interval being an interval along the scanning direction on the first plane between the first field of view and the second field of view, Dp is a second interval being an interval along the scanning direction on the second plane between the first projection region and the second projection region, and β is a magnification of the first and second projection optical systems.
摘要翻译：本发明的扫描曝光装置是一个用于传递环而投影计划放置在第二平面放置在第一的第一对象，走上secondObject的图像，并改变位置关系到第二对象的第一对象的图案所述第一对象的图像，并在扫描方向上的第二物体之间。的扫描曝光装置具有在所述第一平面和angepasst的第一视场的第一投影光学系统，以在所述第二平面上的第一投影区域中的所述第一对象的一部分的放大图像，基于光从所述第一对突出的视场，并具有在所述第一平面和angepasst的第二视场投影在所述第二平面上的第二投影区域中的所述第一对象的一部分的放大图像上，基于来自所述第二光的第二投影光学系统视野。的扫描曝光装置SATIS外资企业Dp的关系=²×DM，其中DM是第一间隔是沿着上的所述第一视场和所述第二视场之间的第一平面上的扫描方向上的间隔，Dp为第二间隔为在沿着所述第一突起区域和第二突起区域之间的第二平面上的扫描方向上的间隔，并且是²所述第一和第二投影光学系统的放大率。

176. 发明公开

EP1771753A4 CATADIOPTRIC IMAGING SYSTEM EXHIBITING ENHANCED DEEP ULTRAVIOLET SPECTRAL BANDWIDTH 审中-公开
标题翻译：具有增强光谱DEEP-UV带宽折反射式图象系统
公开(公告)号：EP1771753A4
公开(公告)日：2008-11-05
申请号：EP05778140
申请日：2005-07-28
申请人： KLA TENCOR TECH CORP
发明人： CHUANG YUNG-HO , ARMSTRONG JOSEPH J , SHAFER DAVID R
IPC分类号： G02B5/08 , G02B17/08 , G02B21/02 , G03F7/20
CPC分类号： G03F7/70225 , G02B17/0808 , G02B17/0812 , G02B17/0856 , G02B17/0892 , G02B21/02 , G03F7/70341
摘要： A relatively high spectral bandwidth objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective comprises a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. The objective may provide, in certain instances, a spectral bandwidth up to approximately 193 to 266 manometers and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may comprise more than one lens and may be formed of a material different from at least one other lens in the objective.

177. 发明公开

EP1417530A4 INTRINSIC BIREFRINGENCE COMPENSATION FOR BELOW 200 NANOMETER WAVELENGTH OPTICAL LITHOGRAPHY COMPONENTS WITH CUBIC CRYSTALLINE STRUCTURES 审中-公开
标题翻译：下的光学光刻波长范围INTRISISCHE双折射补偿200米，与晶体结构NANO CUBIC组件
公开(公告)号：EP1417530A4
公开(公告)日：2008-10-08
申请号：EP02750066
申请日：2002-07-16
申请人： CORNING INC
发明人： ALLAN DOUGLAS C , WEBB JAMES E , BRUNING JOHN H
IPC分类号： G01L1/24 , G02B1/02 , G02B5/30 , G02B17/08 , G02F1/01 , G03F7/20 , H01L21/027 , G02B27/14 , G01J4/00 , G01R33/02 , G02F1/07 , G02F1/1333 , H01J40/14
CPC分类号： G02B17/0892 , G01L1/241 , G02B1/02 , G02B5/3091 , G02B17/0808 , G02B17/086 , G02F1/0131 , G03F7/70225 , G03F7/70566 , G03F7/70958 , G03F7/70966
摘要： Stress-induced photoelastic birefringence compensates for intrinsic birefringence of cubic crystalline structures (12) in deep ultraviolet (less than 200 nm) microlithographic imaging systems (10). Both the photoelastic birefringence and the intrinsic birefringence are expressed in a tensor format simplified by the symmetries of cubic crystalline structures. The stress-induced photoelastic birefringence can be sized to individually compensate for intrinsic birefringence exhibited in the same optical elements or preferably to collectively compensate for the cumulative effects of intrinsic birefringence in other optical elements in the lithography system.

178. 发明授权

EP1709472B1 CATADIOPTRIC PROJECTION OBJECTIVE 有权
标题翻译：折反射式投影镜头
公开(公告)号：EP1709472B1
公开(公告)日：2008-08-06
申请号：EP05700877.3
申请日：2005-01-13
申请人： Carl Zeiss SMT AG
发明人： SHAFER, David , ULRICH, Wilhelm , DODOC, Aurelian , VON BÜNAU, Rudolf , MANN, Hans-Jürgen , EPPLE, Alexander
IPC分类号： G02B17/00 , G03F7/20
CPC分类号： G03F7/70958 , G02B13/22 , G02B17/0812 , G02B17/0892 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70966
摘要： A catadioptric projection objective (200) for imaging a pattern provided in an object plane (201) of the projection objective onto an image plane (202) of the projection objective comprises: a first objective part (210) for imaging the pattern provided in the object plane into a first intermediate image; a second objective part (220) for imaging the first intermediate imaging into a second intermediate image; a third objective part (230) for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror (221) having a first continuous mirror surface and at least one second concave mirror (222) having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

179. 发明授权

EP1261890B1 IMPROVED LENS FOR MICROSCOPIC INSPECTION 有权
标题翻译：改进了镜头进行显微研究
公开(公告)号：EP1261890B1
公开(公告)日：2008-07-16
申请号：EP01918472.0
申请日：2001-03-09
申请人： KLA-Tencor Corporation
发明人： LANGE, Steven, R. , SHAFER, David
IPC分类号： G02B15/14 , G02B17/00 , G02B21/02 , G02B25/00 , G02B17/08 , G01N21/956
CPC分类号： G02B21/04 , G02B17/0808 , G02B17/0856 , G02B17/0892 , G02B21/0016 , G02B21/025

180. 发明授权

EP1751601B1 CATADIOPTRIC PROJECTION OBJECTIVE WITH INTERMEDIATE IMAGES 失效
标题翻译：使用图像之间的反射折射投影物镜
公开(公告)号：EP1751601B1
公开(公告)日：2007-12-05
申请号：EP05738376.2
申请日：2005-05-13
申请人： Carl Zeiss SMT AG
发明人： DODOC, Aurelian , ULRICH, Wilhelm , EPPLE, Alexander
IPC分类号： G02B17/08 , G03F7/20
CPC分类号： G03F7/70058 , G02B17/06 , G02B17/08 , G02B17/0804 , G02B17/0892 , G03F7/7015 , G03F7/70225 , G03F7/70275
摘要： A catadioptric projection objective for imaging of a pattern, which is arranged on the object plane of the projection objective, on the image plane of the projection objective has a first objective part for imaging of an object field to form a first real intermediate image, a second objective part for production of a second real intermediate image using the radiation coming from the first objective part; and a third objective part for imaging of the second real intermediate image on the image plane. The second objective part is a catadioptric objective part with a concave mirror. A first folding mirror for deflection of the radiation coming from the object plane in the direction of the concave mirror and a second folding mirror for deflection of the radiation coming from the concave mirror in the direction of the image plane are provided. A field lens with a positive refractive power is arranged between the first intermediate image and/or the first folding mirror and the concave mirror, in an area close to the field of the first intermediate image.

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