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91. 发明公开

EP3069576A1 GERÄT ZUR BEHANDLUNG EINER FLÄCHE MIT EINEM PLASMA 有权
标题翻译： GERÄTZUR BEHANDLUNG EINERFLÄCHEMIT EINEM PLASMA
公开(公告)号：EP3069576A1
公开(公告)日：2016-09-21
申请号：EP14809279.4
申请日：2014-11-07
申请人： Cinogy GmbH
发明人： WANDKE, Dirk , TRUTWIG, Leonhard , HAHNL, Mirko , STORCK, Karl-Otto
IPC分类号： H05H1/24
CPC分类号： H05H1/2406 , A61L2/14 , H05H2001/2412 , H05H2245/1225 , H05H2277/10
摘要： A device for treating a surface with a dielectric barrier plasma, wherein the surface functions as a return electrode, having a housing (1), in which a high-voltage feed line, an electrode (8) which is connected to the high-voltage feed line, and a dielectric (9), which screens the electrode (8) with respect to the surface, are located, permits the plasma treatment of highly curved surfaces and of relatively large surface areas by virtue of the fact that the electrode (8) has the shape of a circle which is mounted in the housing (1) so as to be rotatable at least to a limited degree, and projects with a spherical section from an end-side opening (5) in the housing (1), and in that the electrode (8) is coated with the dielectric (9) in such a way that its spherical section projecting out of the housing (1) is covered by the dielectric (9) in every possible rotational position.
摘要翻译：一种用介质阻挡等离子体处理表面的装置，其中该表面用作返回电极，具有壳体（1），其中高压馈电线，连接到高电压的电极（8）馈电线和相对于表面对电极（8）进行屏蔽的电介质（9），通过电极（8）的等离子体处理可以高度弯曲的表面和相对较大的表面积）具有安装在壳体（1）中以至少可以有限度地旋转的圆形，并且从壳体（1）中的端侧开口（5）突出有球形部分，并且电极（8）以这样的方式涂覆有电介质（9），使得其在壳体（1）中突出的球形部分在每个可能的旋转位置被电介质（9）覆盖。

92. 发明公开

EP3050865A1 PROCESS FOR THE REDUCTION OF CARBON DIOXIDE TO METHANE BY DBD PLASMA-ACTIVATED CATALYST 有权转让
标题翻译：一种用于减少二氧化碳，甲烷介质阻挡放电等离子体活化的催化剂
公开(公告)号：EP3050865A1
公开(公告)日：2016-08-03
申请号：EP15202925.2
申请日：2015-12-29
申请人： Fundacio Institut Recerca en Energia de Catalunya , Université Pierre et Marie Curie , Instituto Superior Tecnico-Universidade de Lisboa , Universitat de Barcelona
发明人： ANDREU ARBELLA, Teresa , MORANTE LLEONART, Juan Ramón , AMOUROUX, Jacques , CAVADIAS, Simeon , NIZIO, Magdalena , OGNIER, Stéphanie , FARIA DE BARROS HENRIQUES, Carlos Manuel , MADEIRA LOPES, José Manuel Felix , BISCAYA SEMEDO PEREIRA DA GRAÇA, Inês Sofia , GOMES RIBEIRO, Maria Filipa , BACARIZA REY, María del Carmen
IPC分类号： C07C1/12 , C07C9/04 , B01J23/83 , B01J37/34
CPC分类号： C07C1/12 , B01J23/83 , B01J29/061 , B01J35/1061 , B01J37/349 , C07C2521/06 , C07C2523/10 , C07C2523/83 , C07C2529/072 , C10L3/08 , H05H1/2406 , H05H2001/2412 , H05H2001/245 , H05H2245/121 , C07C9/04
摘要： The present invention relates to a process for performing the following reaction with a catalyst:

CO 2 + 4 H 2 -> CH 4 + 2 H 2 O

characterized in that:
- said catalyst is based on the combination of ceria and nickel; and
- said catalyst is activated by a DBD (dielectric barrier discharge) plasma.
摘要翻译：本发明涉及一种方法，用于执行与催化剂以下反应：€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒCO 2 + 4 H 2 - > CH 4个+ 2 H 2ö特点DASS - 所述催化剂是基于氧化铈和镍的组合; 和 - 所述催化剂是由一个DBD（介质阻挡放电）等离子体激活。

93. 发明公开

EP2929932A1 POWDER PLASMA TREATMENT APPARATUS 有权转让
标题翻译：粉末等离子体处理装置
公开(公告)号：EP2929932A1
公开(公告)日：2015-10-14
申请号：EP13862200.6
申请日：2013-12-06
申请人： Korea Basic Science Institute
发明人： SEOK, Dong Chan , JUNG, Yong Ho , JEONG, Hyun Young
IPC分类号： B01J19/08 , B01J2/00 , H05H1/42
CPC分类号： H01J37/32532 , B01J19/088 , B01J2219/083 , B01J2219/0879 , H01J37/32009 , H01J37/32348 , H01J37/32568 , H05H1/2406 , H05H2001/2412 , H05H2001/2431
摘要： A powder plasma processing apparatus is disclosed. The powder plasma processing apparatus is a powder plasma processing apparatus of a cylindrical surface discharge plasma module, and the apparatus includes a plate-like electrode layer serving as an external surface of the cylindrical surface discharge plasma module, an insulating layer disposed on an internal surface of the plate-like electrode layer, and a plasma generating electrode disposed on the insulating layer, wherein the cylindrical surface discharge plasma module rotates, an alternating voltage is applied to the plasma generating electrode and the plate-like electrode layer to generate plasma around the plasma generating electrode, and a powder for plasma processing is processed by the plasma within the cylindrical surface discharge plasma module.
摘要翻译：公开了一种粉末等离子体处理设备。粉末等离子体处理装置是圆筒形表面放电等离子体模块的粉末等离子体处理装置，并且该装置包括用作圆柱形表面放电等离子体模块的外表面的板状电极层，设置在内表面上的绝缘层以及设置在所述绝缘层上的等离子体产生电极，其中所述圆柱形表面放电等离子体模块旋转，交流电压施加到所述等离子体产生电极和所述板状电极层，以在所述等离子体产生电极和所述板状电极层周围产生等离子体等离子体产生电极和用于等离子体处理的粉末由圆柱面放电等离子体模块内的等离子体处理。

94. 发明授权

EP2743090B1 Printing apparatus, treatment object modifying apparatus, printing system, and printed material manufacturing method 有权
标题翻译：打印设备中，处理对象修改装置，印刷系统和制造工艺印刷品
公开(公告)号：EP2743090B1
公开(公告)日：2015-09-16
申请号：EP13196819.0
申请日：2013-12-12
申请人： Ricoh Company, Ltd.
发明人： HIROSE, Yohji , YOSHIDA, Masakazu , OSANAI, Toshitaka
IPC分类号： B41M5/00 , B41J11/00
CPC分类号： B41J11/0015 , B41M5/0011 , B41M5/0041 , B41M5/0047 , B41M5/0064 , H05H1/2406 , H05H2001/2412 , H05H2001/2431

95. 发明公开

EP2873531A1 Treatment-object modifying device, printing apparatus, printing system, and method of manufacturing print 有权
标题翻译：治疗对象修改装置，打印装置，打印系统和方法，用于产生压力
公开(公告)号：EP2873531A1
公开(公告)日：2015-05-20
申请号：EP14192955.4
申请日：2014-11-13
申请人： Ricoh Company, Ltd.
发明人： Saitoh, Haruki
IPC分类号： B41J11/00 , H05H1/24
CPC分类号： B41J11/0015 , H05H2001/2412 , H05H2001/2431
摘要： A treatment-object modifying device (10,100) lowers a pH value of a surface of a treatment object by using dielectric-barrier discharge. The treatment-object modifying device includes discharge electrodes (11, 110, 111 to 115) disposed over a conveying route of the treatment object (20); and a counter electrode (14,141) disposed to face the discharge electrodes across the conveying route so as to correspond to the respective discharge electrodes. Each discharge electrode has a columnar shape or a cylindrical shape. Curved surfaces of the discharge electrodes faces the counter electrode. Curved surfaces of the discharge electrodes face one another. A distance between the adjacent discharge electrodes is equal to or less than 2 millimeters.
摘要翻译： A处理对象修改设备（10,100）降低通过使用电介质阻挡层放电的处理对象物的表面的pH值。治疗对象修改设备包括设置在被处理物（20）的输送路径的放电电极（11，110，111〜115）; 和反电极（14.141）设置成面对整个输送路径在放电电极以便对应于respectivement放电电极。每个放电电极具有圆柱状或圆筒状。放电电极的弯曲表面面对反电极。放电电极的弯曲表面彼此相向。相邻的放电电极之间的距离是等于或小于2毫米。

96. 发明公开

EP2755454A4 PLASMA GENERATION DEVICE, CVD DEVICE AND PLASMA TREATMENT PARTICLE GENERATION DIVICE 有权转让
标题翻译：等离子体产生装置，CVD装置及颗粒生产设备的等离子处理
公开(公告)号：EP2755454A4
公开(公告)日：2015-04-15
申请号：EP12829850
申请日：2012-04-23
申请人： TOSHIBA MITSUBISHI ELEC INC
发明人： TABATA YOICHIRO , WATANABE KENSUKE
IPC分类号： H05H1/24 , C23C16/452 , C23C16/505 , H01J37/32 , H01L21/31
CPC分类号： H01J37/32449 , C23C16/452 , C23C16/45557 , C23C16/45565 , C23C16/503 , H01J37/32348 , H05H1/2406 , H05H2001/2412
摘要： The present invention provides a plasma generation apparatus that, even when a source gas is supplied into a housing where an electrode cell is arranged, does not cause a problem of corrosion of a power feed part and an electrode surface arranged in the housing and a problem of deposition of a metal in a place within the housing other than a discharge part of the electrode cell. A plasma generation apparatus (100) according to the present invention includes an electrode cell and a housing (16) that encloses the electrode cell. The electrode cell includes a first electrode (3), a second electrode (1) facing the first electrode (3) with interposition of a discharge space (6) therebetween, and dielectrics (2a, 2b) arranged on main surfaces of the electrodes (1, 3). The plasma generation apparatus (100) further includes a pipe passage (75) configured to directly supply a source gas from the outside of the housing (16) to the discharge space (6) without being connected to a space within the housing (16) where the electrode cell is not arranged.

97. 发明公开

EP2854268A1 Cold plasma treatment devices and associated methods 有权
标题翻译： Kaltplasmabehandlungsvorrichtung undzugehörigeVerfahren
公开(公告)号：EP2854268A1
公开(公告)日：2015-04-01
申请号：EP14195019.6
申请日：2012-09-14
申请人： Cold Plasma Medical Technologies, Inc.
发明人： Watson, Gregory A. , Hummel, Robert M. , Jacofsky, Marc C. , Jacofsky, David J.
IPC分类号： H02M1/00
CPC分类号： H05H1/46 , A61L2/00 , A61L2/0011 , A61L2/0094 , A61L2/14 , A61L2202/11 , A61M15/02 , A61M16/06 , A61M16/12 , A61M2202/0208 , A61M2202/025 , A61N1/40 , A61N1/44 , H01J37/321 , H01J37/32348 , H01J37/3244 , H01J37/3266 , H05H1/2406 , H05H2001/2412 , H05H2001/466 , H05H2001/4682 , H05H2240/20 , H05H2245/1225 , H05H2277/10
摘要： A cold plasma high voltage power supply, comprising a capacitor charging power supply having one or more command inputs and an output; a capacitor bank having one or more capacitors, the capacitor bank being coupled to the output of the capacitor charging power supply; a controllable switch having an input port, and output port and a control port, the controllable switch coupled to the capacitor bank; a double tuned RF transformer having an input and an output, the input coupled to the output port of the controllable switch, and the double tuned RF transformer configured to resonate at a first frequency and at a second frequency; and a controller configured to provide commands to the one or more command inputs of the capacitor charging power supply, and to provide a trigger pulse to the control port of the controllable switch.
摘要翻译：一种冷等离子体高压电源，包括具有一个或多个命令输入和输出的电容器充电电源; 具有一个或多个电容器的电容器组，所述电容器组耦合到所述电容器充电电源的输出端; 可控开关，其具有输入端口，输出端口和控制端口，该可控开关耦合到电容器组; 具有输入和输出的双重调谐RF变压器，所述输入耦合到所述可控开关的输出端口，并且所述双重调谐RF变压器被配置为以第一频率和第二频率谐振; 以及控制器，被配置为向电容器充电电源的一个或多个命令输入提供命令，并且向可控开关的控制端口提供触发脉冲。

98. 发明公开

EP2756739A4 COLD PLASMA STERILIZATION DEVICES AND ASSOCIATED METHODS 有权
标题翻译：低温等离子体灭菌设备中，因此相关的方法
公开(公告)号：EP2756739A4
公开(公告)日：2015-03-25
申请号：EP12832065
申请日：2012-09-14
申请人： COLD PLASMA MEDICAL TECHNOLOGIES INC
发明人： WATSON GREGORY A , JACOFSKY MARC C , JACOFSKY DAVID J
IPC分类号： H05H1/46 , A61L2/00
CPC分类号： H05H1/46 , A61L2/00 , A61L2/0011 , A61L2/0094 , A61L2/14 , A61L2202/11 , A61M15/02 , A61M16/06 , A61M16/12 , A61M2202/0208 , A61M2202/025 , A61N1/40 , A61N1/44 , H01J37/321 , H01J37/32348 , H01J37/3244 , H01J37/3266 , H05H1/2406 , H05H2001/2412 , H05H2001/466 , H05H2001/4682 , H05H2240/20 , H05H2245/1225 , H05H2277/10
摘要： A cold plasma high voltage power supply, comprising a capacitor charging power supply having one or more command inputs and an output; a capacitor bank having one or more capacitors, the capacitor bank being coupled to the output of the capacitor charging power supply; a controllable switch having an input port, and output port and a control port, the controllable switch coupled to the capacitor bank; a double tuned RF transformer having an input and an output, the input coupled to the output port of the controllable switch, and the double tuned RF transformer configured to resonate at a first frequency and at a second frequency; and a controller configured to provide commands to the one or more command inputs of the capacitor charging power supply, and to provide a trigger pulse to the control port of the controllable switch.

99. 发明公开

EP2756517A4 COLD PLASMA TREATMENT DEVICES AND ASSOCIATED METHODS 有权
标题翻译：冷等离子体处理装置及相关方法
公开(公告)号：EP2756517A4
公开(公告)日：2015-03-11
申请号：EP12832526
申请日：2012-09-14
申请人： COLD PLASMA MEDICAL TECHNOLOGIES INC
发明人： WATSON GREGORY A , HUMMEL ROBERT M , JACOFSKY MARC C , JACOFSKY DAVID J
IPC分类号： H05H1/46 , A61M35/00 , A61N1/00
CPC分类号： H05H1/46 , A61L2/00 , A61L2/0011 , A61L2/0094 , A61L2/14 , A61L2202/11 , A61M15/02 , A61M16/06 , A61M16/12 , A61M2202/0208 , A61M2202/025 , A61N1/40 , A61N1/44 , H01J37/321 , H01J37/32348 , H01J37/3244 , H01J37/3266 , H05H1/2406 , H05H2001/2412 , H05H2001/466 , H05H2001/4682 , H05H2240/20 , H05H2245/1225 , H05H2277/10
摘要： A cold plasma high voltage power supply, comprising a capacitor charging power supply having one or more command inputs and an output; a capacitor bank having one or more capacitors, the capacitor bank being coupled to the output of the capacitor charging power supply; a controllable switch having an input port, and output port and a control port, the controllable switch coupled to the capacitor bank; a double tuned RF transformer having an input and an output, the input coupled to the output port of the controllable switch, and the double tuned RF transformer configured to resonate at a first frequency and at a second frequency; and a controller configured to provide commands to the one or more command inputs of the capacitor charging power supply, and to provide a trigger pulse to the control port of the controllable switch.

100. 发明公开

EP2758979A4 HARMONIC COLD PLASMA DEVICES AND ASSOCIATED METHODS 有权
标题翻译： HARMONISCHE KALTPLASMAVORRICHTUNGEN UND VERFAHRENDAFÜR
公开(公告)号：EP2758979A4
公开(公告)日：2015-02-11
申请号：EP12838901
申请日：2012-09-14
申请人： COLD PLASMA MEDICAL TECHNOLOGIES INC
发明人： WATSON GREGORY A , HUMMEL ROBERT M , JACOFSKY MARC C , JACOFSKY DAVID J
IPC分类号： H05H1/46
CPC分类号： H05H1/46 , A61L2/00 , A61L2/0011 , A61L2/0094 , A61L2/14 , A61L2202/11 , A61M15/02 , A61M16/06 , A61M16/12 , A61M2202/0208 , A61M2202/025 , A61N1/40 , A61N1/44 , H01J37/321 , H01J37/32348 , H01J37/3244 , H01J37/3266 , H05H1/2406 , H05H2001/2412 , H05H2001/466 , H05H2001/4682 , H05H2240/20 , H05H2245/1225 , H05H2277/10
摘要： A cold plasma high voltage power supply, comprising a capacitor charging power supply having one or more command inputs and an output; a capacitor bank having one or more capacitors, the capacitor bank being coupled to the output of the capacitor charging power supply; a controllable switch having an input port, and output port and a control port, the controllable switch coupled to the capacitor bank; a double tuned RF transformer having an input and an output, the input coupled to the output port of the controllable switch, and the double tuned RF transformer configured to resonate at a first frequency and at a second frequency; and a controller configured to provide commands to the one or more command inputs of the capacitor charging power supply, and to provide a trigger pulse to the control port of the controllable switch.
摘要翻译：一种冷等离子体高压电源，包括具有一个或多个命令输入和输出的电容器充电电源; 具有一个或多个电容器的电容器组，所述电容器组耦合到所述电容器充电电源的输出端; 可控开关，其具有输入端口，输出端口和控制端口，该可控开关耦合到电容器组; 具有输入和输出的双重调谐RF变压器，所述输入耦合到所述可控开关的输出端口，并且所述双重调谐RF变压器被配置为以第一频率和第二频率谐振; 以及控制器，被配置为向电容器充电电源的一个或多个命令输入提供命令，并且向可控开关的控制端口提供触发脉冲。

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