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    • 1. 发明授权
    • Linear temperature sensor
    • 线性温度传感器
    • US06345238B1
    • 2002-02-05
    • US09364464
    • 1999-07-30
    • Shaun Goodwin
    • Shaun Goodwin
    • G01K120
    • G01K7/10
    • A linear temperature sensor that incorporates passive bipolar semiconductor devices and is capable of high accuracy over a very wide temperature range. The passive bipolar semiconductor device splits a voltage drop between the bipolar semiconductor and a resistor, such that the voltage drop varies approximately linearly in negative dependence on temperature. Optionally the linearity may be improved by providing sufficient current to produce a self-heating effect which compensates for non-linear deviations in performance at low temperatures.
    • 线性温度传感器,采用无源双极型半导体器件,能够在非常宽的温度范围内实现高精度。 无源双极半导体器件分离双极半导体和电阻器之间的电压降,使得电压降与温度呈负相关的近似线性变化。 可选地,可以通过提供足够的电流来产生补偿低温下性能的非线性偏差的自发热效应来改善线性度。
    • 2. 发明授权
    • Method and apparatus for reducing deposition variation by modeling post-clean chamber performance
    • 通过建模后清洁室性能来减少沉积变化的方法和装置
    • US06512991B1
    • 2003-01-28
    • US09614312
    • 2000-07-12
    • Bradley M. DavisAllen L. EvansCraig W. Christian
    • Bradley M. DavisAllen L. EvansCraig W. Christian
    • G01K120
    • G01K7/42
    • A method for reducing deposition thickness variation in a processing tool comprises storing a post-clean performance model of the processing tool; receiving at least one of a showerhead age and a tool idle time associated with the processing tool as an input parameter; determining temperature control parameters based on the input parameter and the post-clean performance model; and modifying an operating recipe of the processing tool based on the temperature control parameters. A processing system includes a processing tool and an automatic process controller. The processing tool is adapted to process wafers in accordance with an operating recipe. The automatic process controller is adapted to store a post-clean performance model of the processing tool, receive at least one of a showerhead age and a tool idle time associated with the processing tool as an input parameter, determine temperature control parameters based on the input parameter and the post-clean performance model, and modify the operating recipe of the processing tool based on the temperature control parameters.
    • 一种用于减少处理工具中的沉积厚度变化的方法包括:存储处理工具的后清洁性能模型; 接收与处理工具相关联的喷头年龄和工具空闲时间中的至少一个作为输入参数; 根据输入参数和清洁后性能模型确定温度控制参数; 以及基于所述温度控制参数来修改所述处理工具的操作配方。 处理系统包括处理工具和自动过程控制器。 处理工具适于根据操作配方处理晶片。 自动过程控制器适于存储处理工具的后清洁性能模型,接收与处理工具相关联的喷头年龄和工具空闲时间中的至少一个作为输入参数,基于输入来确定温度控制参数 参数和清洁后性能模型,并根据温度控制参数修改加工工具的操作配方。
    • 4. 发明授权
    • Heat flux differential scanning calorimeter sensor
    • 热通量差示扫描量热仪传感器
    • US06431747B1
    • 2002-08-13
    • US09643870
    • 2000-08-23
    • Robert L. Danley
    • Robert L. Danley
    • G01K120
    • G01K17/00G01K17/04G01N25/4833G01N25/4866
    • A sensor for a heat flux differential scanning calorimeter in which one absolute temperature measurement and two differential temperature measurements are used. The sensor is calibrated and used based on a four-term model heat flow equation. The calibration is carried out in two experiments which are used to calculate the sensor thermal resistance for the sample and reference positions, respectively, and the sensor heat capacity for the sample and reference positions, respectively. Differential scanning calorimeters using this sensor exhibit improved resolution, improved baseline performance and improved dynamic response.
    • 用于热通量差示扫描量热计的传感器,其中使用一个绝对温度测量和两个差分温度测量。 传感器基于四项模型热流方程校准和使用。 在两个实验中进行校准,分别用于计算样品和参考位置的传感器热阻,以及样品和参考位置的传感器热容。 使用该传感器的差示扫描量热仪表现出改进的分辨率,改进的基线性能和改善的动态响应。