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1. 发明申请

US20040168929A1 Electrodes for electrolytic capacitors and method for producing them 失效
标题翻译：电解电容器用电极及其制造方法
公开(公告)号：US20040168929A1
公开(公告)日：2004-09-02
申请号：US10730537
申请日：2003-12-05
发明人： Dina Katsir , Uri Zarnitsky
IPC分类号： C25D011/04
CPC分类号： H01G9/045 , H01G9/0032 , H01G9/042
摘要： In an anodized electrode which comprises a substrate, a vacuum deposited porous coating thereon comprising at least one substance selected from valve metals, valve metal oxides and mixtures thereof, and at least one ectrolytically produced anodized layer selected from valve metal oxides and mixtures thereof, the effective surface area is increased prior to deposition of the at least one anodized layer, e.g. by oxidizing the surface of the porous layer and removing thus formed oxide, and/or by roughening the surface of substrate mechanically, chemically and/or electrochemically, prior to vapor deposition.
摘要翻译：在包括基底的阳极氧化电极中，其上包含至少一种选自阀金属，阀金属氧化物及其混合物的物质的真空沉积的多孔涂层以及选自阀金属氧化物及其混合物的至少一个电解产生的阳极氧化层，在沉积至少一个阳极氧化层之前有效的表面积增加，例如通过氧化多孔层的表面并除去由此形成的氧化物，和/或通过在气相沉积之前机械，化学和/或电化学粗化基材的表面。

2. 发明申请

US20030075452A1 Process of surface treating aluminum articles 失效
标题翻译：表面处理铝制品的工艺
公开(公告)号：US20030075452A1
公开(公告)日：2003-04-24
申请号：US10036830
申请日：2001-12-29
发明人： Che-Yuan Hsu , Fu-Keng Yang , Wen-Shan Chien
IPC分类号： C25D011/04 , C25D005/48 , C25D011/18
CPC分类号： C25D11/18
摘要： A process of surface treating an aluminum or aluminum alloy article includes the steps of: (1) forming an oxide layer on the aluminum or aluminum alloy article by anodizing; (2) sealing the oxide layer of the article; and (3) forming a protective film on the sealed oxide layer of the article. The process may further comprise a step of coloring the oxide layer of the aluminum or aluminum alloy article between said steps (1) and (2). The aluminum or aluminum alloy article is corrosion-resistant and resistant to damage by contact, by virtue of the protective film formed on the sealed oxide layer in said step (3). In addition, the protective film can also give the aluminum or aluminum alloy article a long-lasting attractive appearance by preventing a colored sealed oxide layer of the aluminum or aluminum alloy article from fading.
摘要翻译：铝或铝合金制品的表面处理方法包括以下步骤：（1）通过阳极氧化在铝或铝合金制品上形成氧化物层; （2）密封制品的氧化层; 和（3）在物品的密封氧化物层上形成保护膜。该方法还可以包括在所述步骤（1）和（2）之间着色铝或铝合金制品的氧化物层的步骤。铝或铝合金制品由于在所述步骤（3）中在密封的氧化物层上形成的保护膜，因而具有耐腐蚀性和耐接触损伤。此外，保护膜还可以通过防止铝或铝合金制品的着色的密封氧化物层褪色而使铝或铝合金制品具有持久的吸引人的外观。

3. 发明申请

US20040182715A1 Process and apparatus for air bubble removal during electrochemical processing 审中-公开
标题翻译：电化学处理过程中气泡去除的工艺和设备
公开(公告)号：US20040182715A1
公开(公告)日：2004-09-23
申请号：US10692953
申请日：2003-10-24
发明人： Jeffrey Bogart , Hung-Ming Wang , Serkan Erdemli , Serdar Aksu , Erol C. Basol , Manuel R. Cornejo , Bulent M. Basol
IPC分类号： C25D005/08 , B23H005/00 , B23H003/00 , C25D011/04
CPC分类号： C25F7/00 , B23H5/08 , C25D5/003 , C25D5/08 , C25D7/123 , C25D17/001 , C25D21/04 , C25D21/10 , C25F3/00
摘要： A method for removing gas bubbles from a surface of a wafer is provided. Removal process is performed as the wafer surface is placed into a process solution for an electrochemical process. As the wafer surface is placed into the solution and moved towards a pressure barrier placed into the solution, a process solution flow between the wafer surface and the pressure barrier is induced to remove gas bubbles from the wafer surface. The pressure barrier includes openings which allow process solution to flow through the pressure barrier
摘要翻译：提供了从晶片表面去除气泡的方法。当将晶片表面放置在用于电化学过程的处理溶液中时，执行去除过程。当晶片表面被放置在溶液中并朝向放置在溶液中的压力屏障移动时，引起晶片表面和压力屏障之间的工艺溶液流从晶片表面去除气泡。压力屏障包括允许工艺溶液流过压力屏障的开口

4. 发明申请

US20030089616A1 Method for surface treatment of metal base 有权
标题翻译：金属基体表面处理方法
公开(公告)号：US20030089616A1
公开(公告)日：2003-05-15
申请号：US10118137
申请日：2002-04-05
发明人： Che-Yuan Hsu
IPC分类号： C25D005/00 , C25D011/02 , C25D011/04
CPC分类号： C25D11/12
摘要： A method for surface treatment of a metal base includes the steps of: (a) anodizing the base to obtain a first layer of oxidation film on a surface of the base; (b) removing or covering a first area of the oxidation film; and (c) anodizing the base to obtain a second layer of oxidation film. A second area of the oxidation film is thus formed on the base which is different from the first area of the oxidation film. The second area is either higher or lower than the first area, therefore an anaglyphic decorative effect is obtained on the surface of the base.
摘要翻译：一种用于表面处理金属基底的方法包括以下步骤：（a）阳极氧化基底以在基底的表面上获得第一层氧化膜; （b）去除或覆盖氧化膜的第一区域; 和（c）阳极氧化基底以获得第二层氧化膜。因此，在与氧化膜的第一区域不同的基底上形成氧化膜的第二区域。第二区域高于或低于第一区域，因此在基底的表面上获得了一种不均匀的装饰效果。

5. 发明申请

US20030075453A1 Light metal anodization 审中-公开
标题翻译：轻金属阳极氧化
公开(公告)号：US20030075453A1
公开(公告)日：2003-04-24
申请号：US10033554
申请日：2001-10-19
发明人： Shawn E. Dolan
IPC分类号： C25D005/18 , C25D011/00 , C25D009/00 , C25D011/04
CPC分类号： C25D11/06 , C25D11/30
摘要： Using pulsed current and relatively low average voltages, articles containing light metals such as magnesium may be rapidly anodized to form protective surface coatings. The anodizing solutions employed may contain phosphate, pennanganate, silicate, zirconate, vanadate, titanate and/or complex fluoride, optionally with other components present.
摘要翻译：使用脉冲电流和相对较低的平均电压，可以快速阳极氧化含有轻金属如镁的物品以形成保护性表面涂层。所使用的阳极氧化溶液可以含有磷酸盐，倍氮酸盐，硅酸盐，锆酸盐，钒酸盐，钛酸盐和/或络合氟化物，任选地存在其它组分。

6. 发明申请

US20020056648A1 Process for producing aluminum support for planographic printing plate, aluminum support for planographic printing plate, and planographic printing master plate 有权
标题翻译：用于平版印刷版的铝支架的制造方法，平版印刷版的铝支架和平版印刷主板
公开(公告)号：US20020056648A1
公开(公告)日：2002-05-16
申请号：US09951406
申请日：2001-09-14
申请人： FUJI PHOTO FILM CO., LTD.
发明人： Hirokazu Sawada , Akio Uesugi , Atsuo Nishino , Yoshitaka Masuda
IPC分类号： C25D005/34 , C25D011/18 , C25D005/44 , C25D011/16 , C25D011/04
CPC分类号： C22C21/00 , B41N3/034
摘要： A process for producing an aluminum support for a planographic printing plate, the process comprising the steps of: (a) preparing an aluminum plate; (b) disposing said aluminum plate in an aqueous acidic solution; and (c) electrochemically surface-roughening said aluminum plate using an alternating current, wherein a ratio QC/QA of a cathode-time quantity of electricity of said aluminum plate QC to an anode-time quantity of electricity of said aluminum plate QA is from 0.95 to 2.5. An aluminum support for a planographic printing plate formed by the process. A planographic printing master plate comprising at least a positive-type or negative-type light-sensitive layer on the aluminum support.
摘要翻译：一种用于制备平版印刷版的铝支架的方法，所述方法包括以下步骤：（a）制备铝板; （b）将所述铝板置于酸性水溶液中; 和（c）使用交流电对所述铝板进行电化学表面粗糙化，其中所述铝板QC的阴极时间电量与所述铝板QA的阳极时间电量的比值QC / QA来自 0.95〜2.5。用于通过该方法形成的平版印刷版的铝支架。平版印刷母板，其在铝支架上至少包括正型或负型光敏层。

7. 发明申请

US20040211674A1 Gas distribution plate with anodized aluminum coating 失效
标题翻译：带阳极氧化铝涂层的气体分布板
公开(公告)号：US20040211674A1
公开(公告)日：2004-10-28
申请号：US10424447
申请日：2003-04-28
申请人： Taiwan Semiconductor Manufacturing Co., Ltd.
发明人： Huan-Liang Tzeng , Jung-Hsiang Chang , Ping-Jen Cheng
IPC分类号： B32B015/04 , C25D011/04
CPC分类号： C25D11/04 , Y10S428/935 , Y10T428/12361 , Y10T428/263
摘要： A new and improved, anodized aluminum gas distribution plate for process chambers, particularly an etch chamber. The gas distribution plate includes an aluminum body having multiple gas low openings extending therethrough and an alumina anodized coating or layer on the plate. The gas distribution plate is charcterized by enhanced longevity and durability and resists particle-forming deterioration and damage throughout prolonged use.
摘要翻译：一种新的改进的阳极氧化铝气体分配板，用于处理室，特别是蚀刻室。气体分配板包括铝体，其具有延伸穿过其中的多个气体低开口和在该板上的氧化铝阳极氧化涂层或层。气体分布板通过增强寿命和耐用性而得以表征，并且可以在长时间使用时防止颗粒形成劣化和损坏。

8. 发明申请

US20040173469A1 Plasma processing apparatus and method for manufacturing electrostatic chuck 审中-公开
标题翻译：等离子体处理装置及其制造方法
公开(公告)号：US20040173469A1
公开(公告)日：2004-09-09
申请号：US10377825
申请日：2003-03-04
发明人： Ryujiro Udo , Masatsugu Arai , Masanori Kadotani
IPC分类号： C25D011/04
CPC分类号： H01L21/67069 , C25D11/005 , C25D11/026 , C25D11/04 , H01J37/32082 , H01L21/6831 , H01L21/6833
摘要： An electrostatic chuck comprising an insulating base 6, a plurality of conductive aluminum thin films 4a, 4b deposited on the surface of the base, and alumite films 2a, 2b formed by anodizing the surfaces of the conductive thin films 4a, 4b, wherein the conductive thin films 4a, 4b are each provided with a DC voltage of a different polarity so that a surface chucking a wafer 7 is electrostatically bipolar.
摘要翻译：一种静电卡盘，包括绝缘基底6，沉积在基底表面上的多个导电铝薄膜4a，4b和通过阳极氧化导电薄膜4a，4b的表面而形成的耐酸铝膜2a，2b，其中导电薄膜4a，4b分别具有不同极性的直流电压，使得夹持晶片7的表面是静电双极的。

9. 发明申请

US20040004003A1 Methods for treating the surfaces of aluminium alloys by means of formulations containing alkane sulfonic acid 审中-公开
标题翻译：通过含有烷烃磺酸的配方处理铝合金表面的方法
公开(公告)号：US20040004003A1
公开(公告)日：2004-01-08
申请号：US10332586
申请日：2003-01-10
发明人： Werner Hesse
IPC分类号： C25D011/04 , C25D011/18
CPC分类号： C25D11/10 , C25D11/22
摘要： Aluminum or aluminum alloys are surface-treated by anodic oxidation (anodization) in an electrolyte containing from 3 to 30% by weight of an alkanesulfonic acid. Workpieces based on aluminum or aluminum alloys and produced by this process can be used in building and construction, in automobile or aircraft construction and in the packaging industry. An electrolyte composition containing from 3 to 30% by weight of an alkanesulfonic acid can be used in the anodic oxidation of aluminum or aluminum alloys (anodization) to increase the rate of anodic oxidation and to reduce the energy consumption.
摘要翻译：铝或铝合金通过阳极氧化（阳极氧化）在含有3至30重量％链烷磺酸的电解质中进行表面处理。基于铝或铝合金制造的工件可以用于建筑和建筑，汽车或飞机建筑以及包装行业。含有3〜30重量％链烷磺酸的电解质组合物可用于铝或铝合金的阳极氧化（阳极氧化），以提高阳极氧化速率并降低能量消耗。

10. 发明申请

US20030224188A1 CLEAN ALUMINUM ALLOY FOR SEMICONDUCTOR PROCESSING EQUIPMENT 有权
标题翻译：用于半导体加工设备的清洁铝合金
公开(公告)号：US20030224188A1
公开(公告)日：2003-12-04
申请号：US10352631
申请日：2003-01-27
发明人： Shun Wu , Clifford C. Stow , Hong Wang , Yixing Lin , Brian West
IPC分类号： B32B015/04 , C25D011/04
CPC分类号： H01J37/32467 , C23C16/4401 , C25D11/04 , H01J37/32477 , H01J37/32559 , Y10T428/1259 , Y10T428/12611 , Y10T428/249961 , Y10T428/249987 , Y10T428/25 , Y10T428/256 , Y10T428/258 , Y10T428/26 , Y10T428/263
摘要： We have discovered that the formation of particulate inclusions at the surface and the interior of an aluminum alloy article interferes with the performance of the article when a surface of the article is protected by an anodized coating. We have also discovered that the formation of such particulate inclusions can be controlled to a large extent by controlling the concentration of particular impurities present in the alloy used to fabricate the aluminum alloy article.
摘要翻译：我们已经发现，当铝合金制品的表面和内部形成颗粒状夹杂物时，通过阳极氧化涂层保护制品的表面时会干扰制品的性能。我们还发现，通过控制用于制造铝合金制品的合金中存在的特定杂质的浓度，可以在很大程度上控制这种颗粒夹杂物的形成。

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