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    • 6. 发明授权
    • Composition and process for controlled radical polymerization using multifunctional initiator/regulator compounds
    • 使用多功能引发剂/调节剂化合物控制自由基聚合的组成和方法
    • US06710146B2
    • 2004-03-23
    • US10406374
    • 2003-04-03
    • Wiebke WunderlichRudolf PfaendnerRaymond SeltzerJames Peter Galbo
    • Wiebke WunderlichRudolf PfaendnerRaymond SeltzerJames Peter Galbo
    • C08F404
    • C08F2/38C08F4/00C08K5/34926
    • The present invention relates to a polymerizable composition comprising a) at least one ethylenically unsaturated monomer and b1) at least one multifunctional triazinyl based 2,2,6,6 tetramethylpiperidine-1-oxyl and a free radical initiator or b2) at least one multifunctional triazinyl based 2,2,6,6 tetramethylpiperidine-1-oxyl-ether. Further aspects of the present invention are a process for polymerizing ethylenically unsaturated monomers, the (co)polymers obtainable by this process and the use of multifunctional triazinyl based 2,2,6,6 tetramethylpiperidine-1-oxyls in combination with a free radical initiator, or a multi-functional triazinyl based 2,2,6,6 tetramethylpiperidine-1-oxyl-ethers for controlled polymerization. In a particularly preferred embodiment at least one additional heating step at a temperature from 140 to 280° C. is applied after polymerization is completed.
    • 本发明涉及一种可聚合组合物,其包含a)至少一种烯属不饱和单体和b1)至少一种多官能三嗪基2,2,6,6四甲基哌啶-1-氧基和自由基引发剂或b2)至少一种多官能 三嗪基2,2,6,6四甲基哌啶-1-氧基醚。 本发明的其它方面是聚合烯键式不饱和单体的方法,可通过该方法获得的(共)聚合物和使用多官能三嗪基基2,2,6,6四甲基哌啶-1-氧基与自由基引发剂 ,或用于受控聚合的多官能三嗪基2,2,6,6四甲基哌啶-1-氧基醚。 在特别优选的实施方案中,在聚合完成后,施加140-180℃温度下的至少一个另外的加热步骤。
    • 10. 发明授权
    • Process for preparing polymer compound for resist
    • 制备抗蚀剂聚合物化合物的方法
    • US06653418B1
    • 2003-11-25
    • US10219262
    • 2002-08-16
    • Katsuhiro MaruyamaSatoru YoshidaSatoru KitanoHitoshi Mashio
    • Katsuhiro MaruyamaSatoru YoshidaSatoru KitanoHitoshi Mashio
    • C08F404
    • C08F12/22
    • There is provided a process for preparing a polymer compound for a resist, which can improve the performance, such as the heat resistance, sensitivity and resolution of the resist, without causing film loss of the resist, line width reduction of the resist or deterioration of the dry etching resistance of the polymer. This process comprises dissolving a styrene-based monomer containing at least a 4-acetoxystyrene monomer, and a dimethyl-2,2′-azobiscarboxylate ester in a solvent, thereby to polymerize the styrene-based monomer; adding an alkali catalyst to the resulting polymer solution, thereby to hydrolyze the polymer solution; and washing the resulting polymer compound with water.
    • 提供了制备抗蚀剂用高分子化合物的方法,其可以提高抗蚀剂的耐热性,灵敏度和分辨率等性能,而不会导致抗蚀剂的膜损失,抗蚀剂的线宽减小或抗蚀剂的劣化 聚合物的耐干蚀刻性。 该方法包括将至少含有4-乙酰氧基苯乙烯单体的苯乙烯基单体和二甲基-2,2'-偶氮二羧酸酯溶解在溶剂中,从而聚合苯乙烯类单体; 向所得聚合物溶液中加入碱催化剂,从而水解聚合物溶液; 并用水洗涤所得高分子化合物。