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    • 1. 发明授权
    • Radiation absorbing polymer and synthesis thereof
    • 辐射吸收聚合物及其合成
    • US06184305B2
    • 2001-02-06
    • US09079565
    • 1998-05-15
    • Wen-Bing KanAkihiko TokidaKayo AramakiHatsuyuki TanakaKen Kimura
    • Wen-Bing KanAkihiko TokidaKayo AramakiHatsuyuki TanakaKen Kimura
    • C08F2008
    • C08F8/34C08F8/30C09D5/32G03F7/091
    • A radiation absorbing polymer is characterized by having a main chain copolymer containing recurring units of dicarboxylic acid or carboxylic anhydride group with an organic chromophore bonded to the carboxyl group through methylene or alkylene linkage group, where the organic chromophore is bonded to the carboxyl group by esterification reaction. Residual carboxyl groups of the radiation absorbing polymer can optionally be amidized and/or imidized with an aromatic compounds having a reactive amino group. When the photoresist is applied on the antireflective coating and is exposed by radiation such as deep ultraviolet radiation, a resist pattern with high resolving power is formed, which is not affected by standing wave upon manufacturing integrated circuit elements.
    • 辐射吸收聚合物的特征在于具有含有二羧酸或羧酸酐基团的重复单元的主链共聚物和通过亚甲基或亚烷基连接基与羧基键合的有机发色团,其中有机发色团通过酯化键合到羧基上 反应。 辐射吸收聚合物的残余羧基可以任选地被具有反应性氨基的芳族化合物酰胺化和/或酰亚胺化。 当光致抗蚀剂被施加在抗反射涂层上并且通过诸如深紫外线辐射的辐射曝光时,形成具有高分辨能力的抗蚀剂图案,其在制造集成电路元件时不受驻波的影响。