专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06255405B1 Light-absorbing polymers and application thereof to anti-reflection film 有权
标题翻译：吸光聚合物及其应用于抗反射膜
公开(公告)号：US06255405B1
公开(公告)日：2001-07-03
申请号：US09424128
申请日：2000-03-23
申请人： Wen-Bing Kang , Yoshinori Nishiwaki , Ken Kimura , Syoko Matsuo , Hatsuyuki Tanaka
发明人： Wen-Bing Kang , Yoshinori Nishiwaki , Ken Kimura , Syoko Matsuo , Hatsuyuki Tanaka
IPC分类号： C08F12008
CPC分类号： G03F7/091 , C08F8/14 , C08F8/30 , C09D5/32 , C08F220/00
摘要： A high-performance anti-reflective coating which highly absorbs a given light, e.g., deep ultraviolet rays, tenaciously adheres to substrates upon coating formation, is satisfactory in covering, and eliminates the influence of standing waves in the production of integrated circuits; novel light-absorbing polymers for forming the anti-reflective coating; and a process for producing the polymers. One of the polymers is produced by esterifying a copolymer comprising carboxylic anhydride groups and/or dicarboxylic acid groups such as maleic acid as basic recurring units with a hydroxylated aromatic chromophore. The unreacted carboxylic acid groups or acid anhydride groups remaining in the esterified light-absorbing polymer may be amidated and/or imidized with an aminated aromatic compound. Each of these polymers is dissolved in an organic solvent comprising an alcohol, aromatic hydrocarbon, ketone, ester, or combination of these, and the solution is applied to a substrate and then baked to form an anti-reflective coating.
摘要翻译：在涂层形成时，高度吸收给定光（例如深紫外线）强力粘附于基材的高性能抗反射涂层在覆盖时是令人满意的，并且消除驻波在集成电路生产中的影响; 用于形成抗反射涂层的新型光吸收聚合物; 和聚合物的制造方法。其中一种聚合物是通过将包含羧酸酐基团和/或二羧酸基团如马来酸的共聚物作为碱性重复单元与羟基化芳族发色团酯化而制备的。残留在酯化光吸收聚合物中的未反应的羧酸基团或酸酐基团可以用胺化芳族化合物酰胺化和/或酰亚胺化。将这些聚合物中的每一种溶解在包含醇，芳族烃，酮，酯或它们的组合的有机溶剂中，并将溶液施加到基材上，然后烘焙以形成抗反射涂层。

2. 发明授权

US06800696B2 Method for producing copolymer of alkylvinyl ether and maleic anhydride, and copolymer of alkylvinyl ether and maleic anhydride 失效
标题翻译：制备烷基乙烯基醚和马来酸酐的共聚物的方法，以及烷基乙烯基醚和马来酸酐的共聚物
公开(公告)号：US06800696B2
公开(公告)日：2004-10-05
申请号：US10754979
申请日：2004-01-09
申请人： Morihito Saito
发明人： Morihito Saito
IPC分类号： C08F12008
CPC分类号： C08F222/06 , C08F6/12 , C08F216/16
摘要： In the first aspect of the present invention, there is disclosed a method for producing a copolymer of an alkyl vinyl ether and maleic anhydride which comprises removing an organic solvent used in a reaction under a temperature so that a slurry state can be maintained. According to the first aspect, such a copolymer of the alkyl vinyl ether and maleic anhydride which contains a little amount of the solvent remaining therein as disclosed in the second aspect of the present invention, can be obtained. Further, it can be avoided that a specific viscosity of the copolymer of the alkyl vinyl ether and maleic anhydride is lowered, by means of a method for producing a copolymer of alkyl vinyl ether and maleic anhydride which comprises shielding oxygen in a polymerization, as disclosed in the third aspect of the present invention.
摘要翻译：在本发明的第一方面，公开了一种烷基乙烯基醚和马来酸酐的共聚物的制造方法，其包括在温度下除去反应中使用的有机溶剂，从而可以保持浆料状态。根据第一方面，可以获得如本发明第二方面所述的含有少量残留的溶剂的烷基乙烯基醚和马来酸酐的共聚物。此外，可以避免的是，烷基乙烯基醚和马来酸酐的共聚物的比粘度通过烷基乙烯基醚和马来酸酐的共聚物的制备方法降低，其包括在聚合中屏蔽氧，如本发明第三方面所公开的。

3. 发明授权

US06291594B1 Textile sizes containing anhydride based graft copolymers 失效
标题翻译：含有酸酐基接枝共聚物的纺织品尺寸
公开(公告)号：US06291594B1
公开(公告)日：2001-09-18
申请号：US09047051
申请日：1998-03-24
申请人： Klein A. Rodrigues
发明人： Klein A. Rodrigues
IPC分类号： C08F12008
CPC分类号： D06M15/53 , D06M15/233 , D06M15/263 , D06M15/27 , D06M15/285 , D06M2200/40
摘要： Compositions useful for textile sizes which contain anhydride based graft copolymers. The anhydride based graft copolymers are the reaction product of an ethylenically unsaturated monomer, an anhydride monomer selected from maleic anhydride and itaconic anhydride, either a monofunctional polyglycol having a hydroxyl or amine terminal group or a polyfunctional polyglycol having a weight average molecular weight of greater than 5,000 and at least one terminal hydroxyl group, and a free radical initiator. The anhydride based graft copolymers provide lubrication during sizing and a thorough removal of waxes and oils during desizing and scouring.
摘要翻译：可用于含有酸酐基接枝共聚物的纺织品尺寸的组合物。基于酸酐的接枝共聚物是烯键式不饱和单体，选自马来酸酐和衣康酸酐的酸酐单体，具有羟基或胺末端基团的单官能聚二醇或重均分子量大于的多官能聚乙二醇的反应产物 5,000和至少一个末端羟基，以及自由基引发剂。基于酸酐的接枝共聚物在上浆过程中提供润滑，并在脱浆和精练期间彻底除去蜡和油。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式