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1. 发明申请

WO1991017561A1 APPARATUS FOR-PLASMA TREATMENT OF CONTINUOUS MATERIAL 审中-公开
标题翻译：装置用于等离子体处理连续材料
公开(公告)号：WO1991017561A1
公开(公告)日：1991-11-14
申请号：PCT/US1991003229
申请日：1991-05-09
申请人： KODAK (AUSTRALASIA) PTY. LTD. , EASTMAN KODAK COMPANY , BROWN, Robert, Winston , COOPES, Ian, Henry , FUSCA, Joseph , GIFKINS, Kenneth, John , IRVIN, John, Andrew
发明人： KODAK (AUSTRALASIA) PTY. LTD. , EASTMAN KODAK COMPANY
IPC分类号： H01J37/20
CPC分类号： H01J37/20 , B29C59/14 , F16J15/168 , G03C1/915
摘要： An apparatus (1) for continuous treatment of a material (M) of continuous length with a low temperature plasma of a plasma gas (G) under vacuum. The apparatus (1) includes a plasma treatment chamber (3) having a chamber wall (4) and, in the wall (4), an entrance zone (6) and an exit zone (7) for receiving and discharging the continuous material (M). Evacuating means (48) is operable to establish a vacuum in the chamber (3). Support means (9) advances the continuous material (M) along a path (8) through the chamber (3) and also maintains a vacuum seal at the entrance and exit zones (6, 7). The support means (9) includes a backing roller (10) mounted adjacent the entrance and exit zones (6, 7), an entrance sealing roller (11) positioned adjacent the entrance zone (6) and an exit sealing roller (13) positioned adjacent the exit zone (7). The backing roller (10) forms with each sealing roller (11, 13) a respective nip (12, 14) at the entrance and exit zones (6, 7) through which the continuous material (m) passes into and out of the treatment chamber (3). A plasma generating head (53) is posi tioned within the treatment chamber (3) adjacent the path (8) for generating a low temperature plasma which contacts the continuous material (M) while it is advanced through the treatment chamber (3).
摘要翻译：一种用于在真空下用等离子体气体（G）的低温等离子体连续处理连续长度的材料（M）的装置（1）。装置（1）包括具有室壁（4）和在壁（4）中的等离子体处理室（3），入口区（6）和出口区（7），用于接收和排出连续材料 M）。抽气装置（48）可操作以在室（3）中建立真空。支撑装置（9）使连续材料（M）沿着路径（8）前进通过腔室（3），并且还在入口和出口区域（6,7）处保持真空密封。支撑装置（9）包括邻近入口和出口区域（6,7）安装的背衬辊（10），邻近入口区域（6）定位的入口密封辊（11）和定位的出口密封辊（13）邻近出口区域（7）。背衬辊（10）在入口和出口区（6,7）处与每个密封辊（11,13）形成相应的辊隙（12,14），连续材料（m）通过该压区进入和离开处理室（3）。等离子体产生头（53）位于与路径（8）相邻的处理室（3）内，用于产生在连续材料（M）进入处理室（3）期间接触连续材料（M）的低温等离子体。

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