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    • 5. 发明授权
    • Method of manufacturing planar optical waveguides
    • 制造平面光波导的方法
    • US5800860A
    • 1998-09-01
    • US496268
    • 1995-06-28
    • Arnd Hermann KilianHyung Jong LeeJohn Burnette MacChesney
    • Arnd Hermann KilianHyung Jong LeeJohn Burnette MacChesney
    • G02B6/13C03B8/04C03B19/14C03B20/00C03C17/02G02B6/12G02B6/132B05D5/06
    • G02B6/132C03B19/1453C03C17/02C03B2201/10G02B2006/12038G02B2006/12064G02B2006/12116
    • A novel planar waveguide structure has been constructed by sintering substantially pure SiO.sub.2 layers in a He.sub.2 /BCl.sub.3 atmosphere. This results in the generation of a liquid phase of substantially lower viscosity than that of the deposited silica by itself. Since viscous sintering is enhanced by the presence of this liquid, consolidation occurs at lower temperature, e.g. 1000.degree.-1100.degree. C., than those used in the prior art, e.g. 1350.degree.-1500.degree. C. Much of the B.sub.2 O.sub.3 remains unreacted with the silica particles it helps to sinter, acting like a flux to bring about consolidation. This remaining B.sub.2 O.sub.3 is removed at the conclusion of the consolidation procedure by steam treatment at temperatures of 900.degree.-1100.degree. C. Some boron is incorporated into the silica layer, changing its CTE without substantially increasing its index. Thus, this method improves both structure and processing of planar waveguides by reducing the processing temperature and producing a glass which does not bow the substrate and essentially eliminates birefringence resulting in polarization dependent losses. This greatly benefits sophisticated circuits such as those intended for wavelength diversion multiplexing and allows narrow and precisely positional pass bands.
    • 通过在He2 / BCl3气氛中烧结基本上纯的SiO 2层来构造新颖的平面波导结构。 这导致产生比沉积二氧化硅自身明显低的粘度的液相。 由于这种液体的存在增强了粘性烧结,因此在较低温度下发生固结,例如, 1000°-1100℃,比现有技术中使用的那些。 1350°-1500℃。大部分B2O3仍然与二氧化硅颗粒未反应,有助于烧结,起到助焊剂的作用,从而形成固结。 在900°-1100℃的温度下,通过蒸汽处理,在固结程序结束时,除去剩余的B2O3。一些硼被掺入到二氧化硅层中,改变其CTE而基本上不增加其指数。 因此,该方法通过降低加工温度并产生不会对基板弯曲的玻璃并且基本上消除导致偏振相关损耗的双折射,从而改善了平面波导的结构和处理。 这对于诸如那些用于波长分流复用的复杂电路非常有益,并允许窄且精确的位置通带。
    • 7. 发明公开
    • A method of sintering glass preforms for manufacturing planar optical waveguides
    • 玻璃预制件的烧结的用于生产光波导planären的方法
    • EP0751408A1
    • 1997-01-02
    • EP96304513.3
    • 1996-06-18
    • AT&T IPM Corp.
    • Kilian, Arnd HermannMacChesney, John BurnetteLee, Hyung Jong
    • G02B6/12C03B19/14C03C17/02
    • G02B6/132C03B19/1453C03B2201/10C03C17/02G02B2006/12038G02B2006/12064G02B2006/12116
    • A planar waveguide structure is produced by a process comprising sintering substantially pure SiO 2 layers in a He 2 /BCl 3 or He 2 /BF 3 atmosphere. This results in the generation of a liquid phase of substantially lower viscosity than that of the deposited silica by itself. Since viscous sintering is enhanced by the presence of this liquid, consolidation occurs at lower temperature, e.g. 1000-1100°C, than those used in the prior art, e.g. 1350-1500° C. Much of the B 2 O 3 remains unreacted with the silica particles it helps to sinter, acting like a flux to bring about consolidation. This remaining B 2 O 3 is removed at the conclusion of the consolidation procedure by steam treatment at temperatures of 900°C - 1100°C. Some boron is incorporated into the silica layer, changing its Coefficient of Thermal Expansion (CTE) without substantially increasing its index. Thus, this method improves both structure and processing of planar waveguides by reducing the processing temperature and producing a glass which does not bow the substrate and essentially eliminates birefringence resulting in polarization dependent losses. This greatly benefits sophisticated circuits such as those intended for wavelength diversion multiplexing and allows narrow and precisely positional pass bands.
    • 一种平面波导结构通过包括烧结在何/或的BCl 3何/ BF3气氛基本上纯的SiO 2层的过程中产生的。 这导致比由本身所沉积的二氧化硅的基本上较低粘度的液体相的生成。 由于粘性烧结由该液体的存在而增强,巩固发生在较低温度,例如 1000-1100℃,比现有技术中使用,例如 1350年至1500年℃下大部分的B 2 O 3的保持未反应与二氧化硅颗粒它有助于烧结,像个磁通带来合并。 该剩余B2O3在通过蒸汽处理结束时,合并过程被除去,在900℃的温度下 - 一些硼掺入到二氧化硅层1100℃,而基本不增加其指数改变其热膨胀系数(CTE)的系数。 因此,这种方法通过降低处理温度和制造玻璃这并不弓基板改善了结构和平面波导的加工和基本上消除双折射的偏振相关损耗所得到的。 这大大有利于复杂的电路:如那些用于波长复用和导流允许窄且精确位置匹配频带。
    • 8. 发明专利
    • 製造平面光學導波板之改良方法
    • 制造平面光学导波板之改良方法
    • TW369611B
    • 1999-09-11
    • TW085104688
    • 1996-04-19
    • AT﹠T IPM公司
    • 李亨鍾亞德.賀門.克萊約翰.伯奈特.麥克雪尼
    • G02BC03BC03C
    • G02B6/132C03B19/1453C03B2201/10C03C17/02G02B2006/12038G02B2006/12064G02B2006/12116
    • 一種新穎平面導波板結構係已經由於一種He2/BC13大氣中燒結實質上純SiO2層而構成。此致使比單獨沉積矽石者實質上較低黏度之一種液相之產生。由於黏性燒結係經由此種液體之存在而增進,因此固結係於比於先前技藝中使用之溫度(例如1350-1500℃)較低之溫度(例如1000-1100℃)發生。大部分之B2O3維持不與其協助燒結之矽石粒子反應,充當如一種助熔劑之作用以致使固結。此種留下之B2O3係於固結程序之結束經由於900℃-1100℃之溫度之蒸汽處理而移除。部分之硼係組合入矽石層中,改變其熱膨脹係數而實質上不增加其折射率。因此,此種方法經由降低處理溫度及製造不彎曲底材及實質地消除造成偏光作用相關損失之雙折射之一種玻璃而改良平面導波板之結構及處理。此鉅量地有益於精密之電路諸如計畫用於波長分散多工化及容許狹窄並且精確地定位之通帶。
    • 一种新颖平面导波板结构系已经由于一种He2/BC13大气中烧结实质上纯SiO2层而构成。此致使比单独沉积硅石者实质上较低黏度之一种液相之产生。由于黏性烧结系经由此种液体之存在而增进,因此固结系于比于先前技艺中使用之温度(例如1350-1500℃)较低之温度(例如1000-1100℃)发生。大部分之B2O3维持不与其协助烧结之硅石粒子反应,充当如一种助熔剂之作用以致使固结。此种留下之B2O3系于固结进程之结束经由于900℃-1100℃之温度之蒸汽处理而移除。部分之硼系组合入硅石层中,改变其热膨胀系数而实质上不增加其折射率。因此,此种方法经由降低处理温度及制造不弯曲底材及实质地消除造成偏光作用相关损失之双折射之一种玻璃而改良平面导波板之结构及处理。此巨量地有益于精密之电路诸如计划用于波长分散多任务化及容许狭窄并且精确地定位之通带。