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    • 6. 发明申请
    • METHOD OF FABRICATING MICROSCALE OPTICAL STRUCTURES
    • 微波光学结构的制作方法
    • US20110062111A1
    • 2011-03-17
    • US12991043
    • 2008-05-06
    • Jong-Souk YeoCharlotte R. Lanig
    • Jong-Souk YeoCharlotte R. Lanig
    • C03C15/02B24B13/00B24B7/24B05D5/06
    • G02B6/13G02B5/04
    • A method for manufacturing a microscale optical structure from a wafer, including: preparing the wafer with coatings of desired optical properties by depositing the coatings on an optically finished surface of the wafer; mounting the wafer on a supporting base having a releasable medium, with the optically finished surface adjacent the supporting base to protect the optically finished surface; forming additional surfaces of the optical structure at a desired angle and depth using a grinding blade having a cutting face at the angle, the grinding blade being configured to rotate about an axis; and polishing the additional surfaces of the optical structure by introducing a polishing material onto the wafer and using a polishing means to smooth the additional surfaces.
    • 一种用于从晶片制造微型光学结构的方法,包括:通过将所述涂层沉积在所述晶片的光学加工表面上来制备具有所需光学性质的涂层的晶片; 将晶片安装在具有可释放介质的支撑基座上,光学加工表面邻近支撑基座以保护光学加工表面; 使用具有切割面的研磨刀片以一定角度将所述光学结构的附加表面以期望的角度和深度形成,所​​述研磨刀片构造成围绕轴线旋转; 以及通过将抛光材料引入晶片上并使用抛光装置来平滑附加表面来研磨光学结构的附加表面。
    • 9. 发明申请
    • DISPLAY
    • 显示
    • US20120162745A1
    • 2012-06-28
    • US13264931
    • 2009-04-30
    • Pavel KornilovichJeffrey Todd MabeckJong-Souk Yeo
    • Pavel KornilovichJeffrey Todd MabeckJong-Souk Yeo
    • G02F1/167H01L21/336
    • G02F1/167G02F1/1676
    • The display element(s) (14, 14A, 14B, 14C, 14D, 14E, 14F, 14′, 14″, 14′″, 14″″) have i) a substrate (12, 13), ii) an electrode (24, 24′) adjacent to, and disposed on at least a portion of the substrate (12, 13), iii) another electrode (26) distal to the substrate and opposed to the electrode (24, 24′), iv) a dielectric layer (16) established on the substrate (12, 13) and/or the electrode (24, 24′) or distal electrode (26), v) an electrically activatable medium including colorant particles (22) disposed between the electrode (24, 24′) and the distal electrode (26), vi) at least one reservoir (18) having an area that is less than an area of the display element(s) (14, 14A, 14B, 14C, 14D, 14E, 14F, 14′, 14″, 14′″, 14″″), and vii) a gate electrode (28, 28′) having at least a portion thereof disposed between the electrode (24, 24′) and the distal electrode (26). The display element(s) (14, 14A, 14E, 14C, 14D, 14E, 14F, 14′, 14″, 14′″, 14″″) form a visible image by in-plane motion of the colorant particle(s) (22) when electric potential is applied to the electrode (24, 24′), the distal electrode (26), and/or the gate electrode (28, 28′).
    • 显示元件(14,14A,14B,14C,14D,14E,14F,14“,14”,14“,14”,14“,14”,14“,14”)具有i)基板(12,13),ii) (24,24'),并且布置在所述基板(12,13)的至少一部分上,iii)远离所述基板并与所述电极(24,24')相对的另一个电极(26),iv) 建立在所述基板(12,13)和/或所述电极(24,24')或远端电极(26)上的电介质层(16),v)包括着色剂颗粒(22)的可电激活介质,所述着色剂颗粒设置在所述电极 24,24')和远端电极(26),vi)至少一个具有小于显示元件(14,14A,14B,14C,14D,14E的面积)的区域的储存器(18) ,14“,14”,14“”)和vii)栅电极(28,28'),其至少一部分设置在电极(24,24')和远端电极 (26)。 显影元件(14,14A,14E,14C,14D,14E,14F,14“,14”,14“,14”,14“,14”,14“,14”“)通过着色剂颗粒 )(22)和/或所述栅电极(28,28')施加电位时(22)。