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1. 发明申请

WO2011119952A2 INTEGRATED SYSTEM FOR VAPOR GENERATION AND THIN FILM DEPOSITION 审中-公开
标题翻译：用于蒸汽发生和薄膜沉积的集成系统
公开(公告)号：WO2011119952A2
公开(公告)日：2011-09-29
申请号：PCT/US2011/029987
申请日：2011-03-25
申请人： MSP CORPORATION , LIU, Benjamin, Y.H. , MA, Yamin , DINH, Thuc
发明人： LIU, Benjamin, Y.H. , MA, Yamin , DINH, Thuc
IPC分类号： H01L21/205
CPC分类号： F01K17/04 , Y10T137/0318 , Y10T137/0379 , Y10T137/7761 , Y10T137/8593
摘要： An apparatus and method for generating vapor from a liquid precursor for a thin film deposition on a substrate includes an inlet 130 section in fluid communication with a downstream vaporization chamber 120 section. The inlet 130 section comprises a gas inlet for receiving gas from a gas source 180 through a gas flow sensor 202 and a gas flow control valve 230 and a liquid inlet 150 for receiving liquid from a liquid source 220 through a liquid flow sensor 210 and a liquid flow control valve 230. An electronic controller 600 controls the gas and liquid flow control valves 230 thereby controlling the rates of gas and liquid flow into the inlet 130 section to generate vapor in the downstream vaporization chamber 120 section for thin film deposition on the substrate.
摘要翻译：用于从液体前体产生蒸气的设备和方法用于薄膜沉积在基底上，包括与下游蒸发室120部分流体连通的入口130部分。入口130部分包括气体入口，用于通过气体流量传感器202和气体流量控制阀230从气体源180接收气体，以及用于通过液体流量传感器210从液体源220接收液体的液体入口150和液体流量控制阀230.电子控制器600控制气体和液体流量控制阀230，从而控制进入入口130部分的气体和液体流量的速率，以在下游蒸发室120部分中产生蒸汽，用于在基板上进行薄膜沉积。

2. 发明申请

WO2003091708A3 COMPACT, HIGH-EFFICIENCY CONDENSATION NUCLEUS COUNTER 审中-公开
公开(公告)号：WO2003091708A3
公开(公告)日：2003-11-06
申请号：PCT/US2003/009820
申请日：2003-04-02
申请人： MSP CORPORATION
发明人： LIU, Benjamin, Y., H.
IPC分类号： G01N15/06
摘要： A condensation nucleus counter (20, 90) has a series of flow passageways forming a flow path, including a first passageway (24, 30, 42, 54, 56, 106, 110, 118, 122) for carrying the gas stream having the particles to be detected which is heated, so that the gas stream is heated prior to entering a saturator (30, 110). The saturator (30, 110) is positioned as part of the flow path (24, 30, 42, 54, 56, 106, 110, 118) for the gas stream and is made of a porous material having a portion immersed in a liquid working fluid (36). The porous material is selected so that capillary action will move the liquid working fluid (36, 114) along the length of the saturator (30, 110). Vapor from the working liquid will be transferred to the gas stream as it moves through the saturator (30). The gas stream then passes to a condenser or cooler (54, 122) that reduces the temperature of the gas stream and causes the working fluid vapor to condense on the particles in the gas stream to form droplets. A particle detector (58, 132), such as a light scattering particle detector (58, 132), then receives the gas stream and detects the droplets that have been formed.

3. 发明申请

WO2002063277A3 METHOD AND APPARATUS FOR AUTOMATED OPERATION OF IMPACTORS 审中-公开
公开(公告)号：WO2002063277A3
公开(公告)日：2002-08-15
申请号：PCT/US2002/003893
申请日：2002-02-07
申请人： MSP CORPORATION
发明人： ROBERTS, Daryl, L. , MARPLE, Virgil, A. , MILLER, Nicholas, C.
IPC分类号： G01N1/40
摘要： A method for automating the process of impaction of particles, recovering samples from a plurality of impaction cups (32A-32H), and washing the cups (32A-32H) for a new cycle. The process includes steps of agitating the solvent used for dissolving samples, removing samples and transferring the samples to vials used in an analyzing instrument.

4. 发明申请

WO2011047219A3 METHOD AND APPARATUS FOR COUNTING PARTICLES IN A GAS 审中-公开
公开(公告)号：WO2011047219A3
公开(公告)日：2011-04-21
申请号：PCT/US2010/052773
申请日：2010-10-15
申请人： MSP CORPORATION , LIU, Benjamin, Y.H. , DICK, William, D. , COLLINS, Aaron, M. , ROMAY, Francisco, J.
发明人： LIU, Benjamin, Y.H. , DICK, William, D. , COLLINS, Aaron, M. , ROMAY, Francisco, J.
IPC分类号： G01N15/14 , G01N21/47 , G01N15/10
摘要： The present disclosure describes a method and apparatus (90) for detecting particles in a gas by saturating the gas with vapor and causing the gas to flow through a chamber (410) with walls (440) that are at a temperature different than the temperature of the entering gas creating a gas turbulence within the chamber resulting in the gas becoming super- saturated with vapor and causing said super- saturated vapor to condense on said particles and form droplets, which are then detected and counted by an optical light-scattering detector (600).

5. 发明申请

WO2007062242A2 HIGH STABILITY AND HIGH CAPACITY PRECURSOR VAPOR GENERATION FOR THIN FILM DEPOSITION 审中-公开
标题翻译：用于薄膜沉积的高稳定性和高容量前躯体蒸发
公开(公告)号：WO2007062242A2
公开(公告)日：2007-05-31
申请号：PCT/US2006/045512
申请日：2006-11-28
申请人： MSP CORPORATION , LIU, Benjamin, Y.H.
发明人： LIU, Benjamin, Y.H.
IPC分类号： B01D47/00 , F22B23/00 , C23C16/00
CPC分类号： C23C16/4482 , C23C16/4481
摘要： An apparatus for vaporizing a liquid for subsequent thin film deposition on a substrate. The apparatus comprises a housing with an inlet and an outlet and a liquid reservoir. A mechanism controls the liquid level in the reservoir to a substantially constant level. A gas flow passageway extends along side a porous metal wall with interstitial spaces for containing liquid from the reservoir and with a package for a carrier gas to flow along side the porous metal wall, forming a gas/vapor mixture suitable for thin film deposition.
摘要翻译：用于蒸发液体用于随后在基底上沉积薄膜的装置。该设备包括具有入口和出口以及液体储存器的壳体。一个机构将储存器中的液位控制在基本恒定的水平。气体流动通道沿多孔金属壁的侧面延伸，具有用于容纳来自容器的液体的间隙空间和用于载体气体沿着多孔金属壁的侧面流动的包装，从而形成适于薄膜沉积的气体/蒸气混合物。 / p>

6. 发明申请

WO2019083987A1 APPARATUS AND METHOD FOR VAPOR GENERATION AND FILM DEPOSITION 审中-公开
公开(公告)号：WO2019083987A1
公开(公告)日：2019-05-02
申请号：PCT/US2018/057083
申请日：2018-10-23
申请人： MSP CORPORATION
发明人： DINH, Thuc, M. , MA, Yamin , LIU, Benjamin, Y.H.
IPC分类号： B01D1/06 , B01D1/26
CPC分类号： B01D1/0017 , B01D1/06 , B01D1/14 , B01D1/16 , B01D1/26
摘要： An apparatus and method for generating a vapor with a compact vaporizer design and exposing the gas and liquid mixture for vaporization to a reduced maximum temperature. A gas and liquid droplet flow through a metal housing (110) configured to heat the gas and liquid droplet mixture flow for vaporization includes directing the gas and liquid droplet mixture through an inlet (120) of the metal housing and flowing the gas through a tortious flow path defined by a plurality of tubular flow passageways (180) arranged around a central axis for vaporization. The flow path is directed through a heat exchanger (410) including one more changes in direction of flow path before flowing into the further tortious flow path described above. Residual liquid droplets may be further vaporized by flowing through a second metal housing configured to heat the gas and liquid droplet mixture for vaporization and having a similar construction to the first metal housing and providing a second tortious flow path.

7. 发明申请

WO2006044725A2 METHOD AND APPARATUS FOR GENERATING CHARGED PARTICLES 审中-公开
标题翻译：用于产生带电粒子的方法和设备
公开(公告)号：WO2006044725A2
公开(公告)日：2006-04-27
申请号：PCT/US2005/037132
申请日：2005-10-18
申请人： MSP CORPORATION , DICK, William , LIU, Benjamin, Y.H.
发明人： DICK, William , LIU, Benjamin, Y.H.
CPC分类号： H01L21/67028 , B05D1/06
摘要： A method for establishing a calibrating standard for wafer inspection includes depositing solid ionized particles of a known size range with an aerosol onto a wafer. The method also includes depositing particles onto a wafer in a deposition chamber by using an aerosol stream and the solid particles suspended in a gas; ionizing the aerosol stream with a negative or positive charge polarity or both by passing the aerosol stream through a non-radioactive ionizer 40 to produce charged particles and supplying such aerosol stream to the deposition chamber. An apparatus 110 for producing charged particles includes an atomizer 10 and a non-radioactive ionizer 40 in fluid communication with each other. The apparatus 110 may also include an electrospray droplet generator for producing an aerosol with dry-solid particles and an ionizer that ionizes the molecules of the gas. The apparatus may also include a generator for generating an aerosol with particles suspended in the gas with a non-radioactive ionizer 40 that ionizes the gas in the aerosol causing the aerosol particles to be charged. The apparatus 110 may further include an electrostatic classifier for classifying the charged particles to a selected size range.
摘要翻译：用于建立用于晶片检查的校准标准的方法包括将具有气溶胶的已知尺寸范围的固体电离粒子沉积到晶片上。该方法还包括通过使用气溶胶流和悬浮在气体中的固体颗粒将颗粒沉积到沉积室中的晶片上; 通过使气溶胶流通过非放射性离子发生器40以产生带电粒子并将这种气溶胶流供应到沉积室来使负极或正极电荷极性的气溶胶流离子化或二者。用于产生带电粒子的装置110包括彼此流体连通的雾化器10和非放射性离子发生器40。装置110还可以包括用于产生具有干固体颗粒的气溶胶和电离气体分子的离子发生器的电喷雾液滴发生器。该装置还可以包括发生器，该发生器用非放射性离子发生器40产生具有悬浮在气体中的颗粒的气溶胶，该非放射性离子发生器40使气溶胶中的气体离子化，使气溶胶颗粒带电。装置110还可以包括静电分类器，用于将带电粒子分类至选定的尺寸范围。

8. 发明申请

WO2005068682A2 HIGH-PERFORMANCE VAPORIZER FOR LIQUID-PRECURSOR AND MULTI-LIQUID-PRECURSOR VAPORIZATION IN SEMICONDUCTOR THIN FILM DEPOSITION 审中-公开
标题翻译：用于液体前驱物的高性能蒸发器和半导体薄膜沉积中的多液体前驱体蒸发
公开(公告)号：WO2005068682A2
公开(公告)日：2005-07-28
申请号：PCT/US2004/041944
申请日：2004-12-15
申请人： MSP CORPORATION , LIU, Benjamin, Y., H. , MA, Yamin
发明人： LIU, Benjamin, Y., H. , MA, Yamin
IPC分类号： C23C16/448
CPC分类号： C23C16/4486 , B01B1/005
摘要： A vaporization system (50, 92, 92a, 92b, 180) for thin film formation and for introducing vapors into a deposition chamber (26, 84, 130) for depositing films onto a semi-conductor surface has a vaporization chamber (52, 116, 192) that is selectively provided with at least two different, that is selectively provided with at least two different, separate, precursor liquids (54A, 54B, 54C, 110A, 110B, 186) carried in a gas stream that may be a single carrier gas, or a selected one of a plurality of carrier gases from gas sources (12, 62A, 62B, 62C, 98A, 98B, 184). When the liquids being introduced are likely to be subject to thermal decomposition from contact with high temperature surfaces, an atomizer (94, 142A, 142B, 154A, 154B, 182) is used at the inlet of the vaporization chamber (52, 116, 192) to provide an aerosol to the vaporization chamber (52, 116, 192) from one or more individual carrier gases from gas sources 12, 62A, 62B, 62C, 98A, 98B for simultaneous or sequential introduction into the vaporization chamber (52, 116, 192). The vaporization chamber (52, 116, 192) may be designed to insure complete vaporization by incorporating a recirculating gas flow through heated passageways (198, 124, 202, 212) before the vaporized gas/vapor mixture exits the vaporization chamber (52, 116, 192).
摘要翻译：用于薄膜形成和用于将蒸气引入用于将膜沉积到半导体表面上的沉积室（26,84,130）中的蒸发系统（50,92,92a，92b，180）具有蒸发室（52,116 ，192），其被选择性地设置有至少两个不同的，其被选择性地设置有携带在气流中的至少两种不同的分离的前体液体（54A，54B，54C，110A，110B，186）载气或来自气体源（12,62A，62B，62C，98A，98B，184）的多种载气中的选定的一种。当引入的液体可能经受与高温表面接触的热分解时，在蒸发室（52,116,192）的入口处使用雾化器（94,142A，142B，154A，154B，182））以从气源12,62A，62B，62C，98A，98B的一种或多种单独的载气提供气雾剂以同时或顺序地引入蒸发室（52,116），192）。蒸发室（52,116,192）可以被设计成通过在汽化的气体/蒸气混合物离开蒸发室（52,116）之前并入循环气流通过加热通道（198,124,202,212）来确保完全蒸发，192）。

9. 发明申请

WO2005015171A3 CASCADE IMPACTOR WITH INDIVIDUALLY DRIVEN IMPACTOR PLATES 审中-公开
公开(公告)号：WO2005015171A3
公开(公告)日：2005-02-17
申请号：PCT/US2004/025461
申请日：2004-08-06
申请人： MSP CORPORATION
发明人： MARPLE, Virgil, A. , LUI, Benjamin, Y.H.
IPC分类号： G01N15/02
摘要： A cascade impactor (10) has a series of vertically stacked impactor housing sections (12,14,16). Each of the impactor housing sections (12,14,16) has an upper portion that supports a motor (50) for driving an impactor plate (58) that is positioned below a nozzle plate (38B,40B,42B) through which flow passes. Each housing section (12,14,16) also has an outlet passageway (30) leading to a lower impactor chamber (24) for the next in a series of impactor chambers (24), except the last outlet passageway opens through a filter (68) to exhaust. The impactor chambers (24) are defined by a skirt (22) that seals on the neck (18) of the next downstream housing section (12, 14, 16) The impactor plates (58) are each driven by a separate motor (50), and held onto a hub (52) on the motor output shaft with a magnetic coupling (54,56) so the impactor plates (58) can be removed when the housing sections (12,14,16) are separated.

10. 发明申请

WO2002061172A1 SCANNING DEPOSITION HEAD FOR DEPOSITING PARTICLES ON A WAFER 审中-公开
标题翻译：扫描沉积头用于在水平面上沉积颗粒
公开(公告)号：WO2002061172A1
公开(公告)日：2002-08-08
申请号：PCT/US2002/001462
申请日：2002-01-18
申请人： MSP CORPORATION
发明人： SUN, James, J. , LIU, Benjamin, Y., H.
IPC分类号： C23C20/00
CPC分类号： H01L21/6715 , C23C18/00 , C30B7/00
摘要： A deposition chamber (18) is formed in a housing (10) that has a substrate carrier (12) on the interior. The substrate carrier (12) is rotatable about a central axis (20), and a particle deposition head (24) is mounted in the chamber (18) on a support (40) that can be moved linearly along lines that are substantially radial to the central axis (20) of the substrate carrier (12). The deposition head (24) thus can be moved to different radial positions of a substrate (26) carried on the substrate carrier (12) as the carrier (12) rotates during deposition from the head (24) to provide for a wide variety of deposition patterns on the substrate. The deposition head (24) has a pair of aerosol discharge openings (28, 30), one being the end of a substantially tubular central passageway (28) and the other being the end of an annular passageway (30) that surrounds the central tubular passageway (28).
摘要翻译：沉积室（18）形成在壳体（10）中，在壳体（10）内部具有衬底载体（12）。衬底载体（12）可围绕中心轴线（20）旋转，并且颗粒沉积头（24）安装在腔室（18）中的支撑件（40）上，支撑件（40）可以沿着基本上径向到衬底载体（12）的中心轴线（20）。因此，当沉积头（24）从头部（24）沉积时，沉积头（24）可以移动到承载在基底载体（12）上的基底（26）的不同的径向位置，以便提供各种各样的衬底上的沉积图案。沉积头（24）具有一对气溶胶排放口（28,30），一对是大致管状的中央通道（28）的端部，另一个是环形通道（30）的端部，环形通道通道（28）。

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