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1. 发明专利

JP2006276026A Scanning system for inspecting surface abnormalities 有权
标题翻译：扫描系统检测表面异常
公开(公告)号：JP2006276026A
公开(公告)日：2006-10-12
申请号：JP2006129606
申请日：2006-05-08
申请人： Kla-Tencor Technologies Corp , ケーエルエー−テンカーテクノロジィースコーポレイション
发明人： NIKOONAHAD MEHRDAD , STOKOWSKI STANLEY E
IPC分类号： G01B11/30 , G01N21/956 , G01B11/02 , G01N21/88 , G01N21/94 , G01N21/95 , G01R31/28 , G01R31/308 , G06T1/00 , G06T7/00 , H01L21/027 , H01L21/66
CPC分类号： G01N21/95623 , G01N21/94 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/8825 , G01R31/2831 , G01R31/308 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide a system and a method for detecting abnormalities on the surface of semiconductor wafers. SOLUTION: In this method, a light beam focused on the system which achieves surface inspection with the highest sensitivity and highest throughput is oriented to the surface under test at total reflection angle. Such a relative movement is brought about that the beam substantially covers all the surfaces between the beam and the surfaces to collect any light scattered on the passage for abnormality inspection. The scanning passage comprises multiple arrays of straight scanning channel segments. The focused light beam illuminates the surface area with width of 5-15 microns range, so this system can inspect 40 or more wafers of 150 mm diameter (6-inch wafer) per hour, 20 or more wafers of 200 mm diameter (8-inch wafer) per hour, and 10 or more wafers of 300 mm diameter (12-inch wafer) per hour. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于检测半导体晶片表面的异常的系统和方法。
解决方案：在该方法中，以完全反射角度将以聚焦在系统上的以最高灵敏度和最高产量实现表面检测的光束定向到待测表面。这样的相对运动是使光束基本上覆盖光束与表面之间的所有表面，以收集在通道上散射的任何光以进行异常检查。扫描通道包括多个直扫描通道段的阵列。聚焦光束照射宽度为5-15微米范围的表面区域，因此该系统可以检查每小时150毫米直径（6英寸晶圆）的40个或更多个晶片，20个或更多个直径为200毫米的晶圆（8- 英寸晶圆）和每小时300mm直径（12英寸晶片）的10个或更多个晶片。版权所有（C）2007，JPO＆INPIT

2. 发明专利

JP2006220667A Surface inspection system 有权
标题翻译：表面检查系统
公开(公告)号：JP2006220667A
公开(公告)日：2006-08-24
申请号：JP2006129701
申请日：2006-05-08
申请人： Kla-Tencor Technologies Corp , ケーエルエー−テンカーテクノロジィースコーポレイション
发明人： JORDAN III JOHN R , NIKOONAHAD MEHRDAD , WELLS KEITH B
IPC分类号： G01B11/30 , G01N21/956 , G01B11/02 , G01N21/88 , G01N21/94 , G01N21/95 , G01R31/28 , G01R31/308 , G06T1/00 , G06T7/00 , H01L21/66
CPC分类号： G01N21/95623 , G01N21/94 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/8825 , G01R31/2831 , G01R31/308 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： PROBLEM TO BE SOLVED: To provide a method and a system for detecting an abnormality on the surface of a semiconductor wafer. SOLUTION: This surface inspection system has a high processing capacity and high detection sensitivity. Acquired data are processed in real time at a rate below 50 MHz, to thereby reduce cost for data processing. An abnormality is detected and verified by comparing adjacent repeated patterns, and the surface height is monitored, and mechanically corrected in order to reduce a positioning error with a close repeated pattern. A local threshold using close information is used for detection and verification of existence of the abnormality. A sampled point distribution function wherein illumination and a collection system are combined together is utilized for detection and verification of the abnormality. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于检测半导体晶片的表面上的异常的方法和系统。
解决方案：该表面检测系统具有高处理能力和高检测灵敏度。获取的数据以低于50MHz的速率实时处理，从而降低数据处理的成本。通过比较相邻的重复图案来检测和验证异常，并且监测表面高度，并机械地校正以便以紧密重复的图案减少定位误差。使用密切信息的局部阈值用于检测和验证异常的存在。将照明和收集系统组合在一起的采样点分布函数用于异常的检测和验证。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2006164969A Apparatus and method for irradiating tilted particle beam 审中-公开
标题翻译：用于辐射倾斜粒子束的装置和方法
公开(公告)号：JP2006164969A
公开(公告)日：2006-06-22
申请号：JP2005335448
申请日：2005-11-21
申请人： Kla-Tencor Technologies Corp , ケイエルエイ−テンコーテクノロジーズ,コーポレイション
发明人： MANKOS MARIAN , GRELLA LUCA , ADLER DAVID L
IPC分类号： H01J37/29 , H01L21/66
CPC分类号： H01J37/1478 , H01J37/29 , H01J2237/2538
摘要： PROBLEM TO BE SOLVED: To improve a low-energy electron microscope (LEEM) system having a tilting ability.
SOLUTION: The apparatus is to inspect a substrate by using charged particles. The apparatus (100) includes an irradiation subsystem (102), an objective lens subsystem (104), a projection subsystem (106) and a beam separator (108) to interconnect the above subsystems. The irradiation subsystem advantageously includes a tilt deflector (130) structured to be tilted so as to be capable of controlling incident beams. Tilt of the incident beams by the tilt deflector is enlarged before the incident beams hit a substrate (112). With this technology, a big tilt of beams can be achieved in the substrate without aberration of a lens generated by introducing the tilt in the objective lens and without any troublesome problems caused by the use of a stage capable of changing inclination.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：改进具有倾斜能力的低能量电子显微镜（LEEM）系统。
解决方案：该设备是通过使用带电粒子检查基板。装置（100）包括照射子系统（102），物镜子系统（104），投影子系统（106）和用于互连上述子系统的分束器（108）。照射子系统有利地包括倾斜偏转器（130），其被构造成倾斜以便能够控制入射光束。倾斜偏转器的入射光束的倾斜在入射光束撞击基板（112）之前被放大。利用该技术，可以在基板中实现大的倾斜的光束，而不会由于通过在物镜中引入倾斜而产生的透镜的像差，并且不会由于使用能够改变倾斜度的台架而引起任何麻烦的问题。版权所有（C）2006，JPO＆NCIPI

4. 发明专利

JP2005043371A Method and apparatus for determining surface layer thickness using continuous multi-wavelength surface scanning 有权
标题翻译：使用连续多波长表面扫描法确定表面层厚度的方法和装置
公开(公告)号：JP2005043371A
公开(公告)日：2005-02-17
申请号：JP2004215668
申请日：2004-07-23
申请人： Kla-Tencor Technologies Corp , ケーエルエー−テンカーテクノロジィースコーポレイション
发明人： SHORTT DAVID W
IPC分类号： G01B11/06 , G01B11/30 , G01N21/956 , H01L21/66
CPC分类号： G01B11/0633
摘要： PROBLEM TO BE SOLVED: To provide an inspection tool including illumination elements for directing light beams at different wavelengths, or at different angles of incidence, or combination thereof. SOLUTION: A beam creates reflected light and scattered light optical signals. Scanning elements and optical detector elements are provided. The optical detector elements receive reflected light signals and scattered light signals. A circuit for receiving the reflected light signals and the scattered light signals is used, the value of thickness for a partially transmissive layer formed on a workpiece is determined, and the effect of the thickness of the partially transmissive layer is corrected, so that signals identify and characterize the defects of the workpiece. Further, the present invention also includes descriptions of methods for achieving such inspections. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种包括用于引导不同波长或不同入射角的光束或其组合的照明元件的检查工具。解决方案：光束产生反射光和散射光的光信号。提供扫描元件和光学检测器元件。光检测器元件接收反射光信号和散射光信号。使用用于接收反射光信号和散射光信号的电路，确定在工件上形成的部分透射层的厚度值，并且校正部分透射层的厚度的影响，使得信号识别并表征工件的缺陷。此外，本发明还包括用于实现这种检查的方法的描述。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2004264287A Method and apparatus for identifying defect in substrate surface using dithering for reconstructing image of insufficient sampling 有权
公开(公告)号：JP2004264287A
公开(公告)日：2004-09-24
申请号：JP2003383273
申请日：2003-11-13
申请人： Kla-Tencor Technologies Corp , ケーエルエー−テンカーテクノロジィースコーポレイション
发明人： CAVAN DANIEL L
IPC分类号： G01N21/956 , G01N21/88 , G06K9/00 , G06T1/00 , G06T5/50 , H01L21/66
CPC分类号： G06T3/4069 , G06T2207/30148
摘要： PROBLEM TO BE SOLVED: To provide a surface inspection apparatus for creating the reconstructed images of a target, having increased pixel density. SOLUTION: The surface inspection apparatus includes an optical system, having a plurality of time delay integration (TDI) sensors. The plurality of TDI sensors are configured to generate a plurality of images in the target so that groups of images are mutually offset by subpixel distances. In scanning elements, the target is scanned by the TDI sensor, and a series of continuous image groups in the target are generated. An image processing circuit processes a plurality of continuous image groups together and is used to create the reconstructed images of the target having increased pixel density. An embodiment includes a method for generating images reconstructed from a plurality of TDI image groups, obtained from at least two offset TDI sensors. COPYRIGHT: (C)2004,JPO&NCIPI

6. 发明专利

JP2004132956A Method for measuring undercut by using scanning electron microscope 有权
公开(公告)号：JP2004132956A
公开(公告)日：2004-04-30
申请号：JP2003270078
申请日：2003-07-01
申请人： Kla-Tencor Technologies Corp , ケイエルエイ−テンコーテクノロジーズ,コーポレイション
发明人： LORUSSO GIAN FRANCESCO , GRELLA LUCA
IPC分类号： G01B15/00 , G01N23/225 , G01Q30/02 , G01Q30/04 , G01Q30/20 , H01J37/28 , H01L21/66
CPC分类号： G01N23/2251 , H01J37/28 , H01J2237/2611 , H01J2237/2815
摘要： PROBLEM TO BE SOLVED: To prevent resolution degradation of a scanning electron microscope. SOLUTION: A method for measuring an undercut includes a step for radiating a primary electron beam to a structure at a certain incident angle, a step for changing the incident angle of the primary electron beam in a set of angles, a step for measuring intensity of electrons scattered from the structure at each incident angle in a set of angles and a step for finding discontinuity of the intensity as a function of the incident angle. COPYRIGHT: (C)2004,JPO

7. 发明专利

JP2006317446A Interference spectroscopy measurement in disturbance environment 审中-公开
标题翻译：干扰环境中的干涉光谱测量
公开(公告)号：JP2006317446A
公开(公告)日：2006-11-24
申请号：JP2006130454
申请日：2006-05-09
申请人： Kla Tencor Technologies Corp , ケーエルエー・テンコール・テクノロジーズ・コーポレーション
发明人： SAPPEY ROMAIN
IPC分类号： G01B11/14
CPC分类号： G01B9/02052 , G11B5/6052
摘要： PROBLEM TO BE SOLVED: To warrant that a recording head floats at a proper height by controlling a slider manufacturing process, by enabling accurate measurement between the head and a rotating disc.
SOLUTION: An interference spectroscopy measuring method in a disturbance state environment is described. The disturbance state environment 106 includes one or more fluctuations such as pressure fluctuation and/or heat fluctuation. For example, the disturbance state environment is generated by the rotating disc in an optical floating level testing device. A certain method includes detecting difference between the optical path of a first beam 108 and the optical path of a second beam 110. One or more beams of the first beam and the second beam are stored in a shroud 114 near the disturbance state environment. In this method, further, a window 116 can be connected with the shroud near the disturbance state environment. For example, bad influences of the disturbance state environment are reduced.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：通过控制滑块制造过程，通过使头部和旋转盘之间的精确测量，保证记录头浮动在适当的高度。解决方案：描述了干扰状态环境中的干涉光谱测量方法。干扰状态环境106包括一个或多个波动，例如压力波动和/或热波动。例如，通过光学浮动电平测试装置中的旋转盘产生干扰状态环境。一种方法包括检测第一光束108的光路和第二光束110的光路之间的差异。第一光束和第二光束的一个或多个光束被存储在干扰状态环境附近的护罩114中。此外，在该方法中，窗口116可以与干扰状态环境附近的护罩连接。例如，扰动状态环境的不良影响降低。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2004235149A Method and device for reducing effect of edge of substrate in electron lens 有权
公开(公告)号：JP2004235149A
公开(公告)日：2004-08-19
申请号：JP2004015147
申请日：2004-01-23
申请人： Kla-Tencor Technologies Corp , ケイエルエイ−テンコーテクノロジーズ,コーポレイション
发明人： MANKOS MARIAN , ADLER DAVID L
IPC分类号： H01L21/66 , G01N23/203 , G01Q30/02 , G01Q30/20 , G21K7/00 , H01J37/20 , H01J37/244 , H01J37/28
CPC分类号： H01J37/20 , H01J2237/153 , Y10T428/12528
摘要： PROBLEM TO BE SOLVED: To reduce an effect of an edge of a wafer during testing in a system to test a semiconductor wafer or the like by means of an electron beam. SOLUTION: One indicated embodiment is related to a method to test a substrate (106). The method includes the insertion of the substrate (106) into a retaining place (306) of a substrate holder (302), the transportation of the substrate holder (302) under the electron beam, and the application of a voltage to a conductive element (304) of the substrate holder (302). The effect of the edge to the substrate is reduced by the voltage applied to the conductive element (304). Another indicated embodiment is related to a device to retain the substrate (106) to reduce the effect of the edge of the substrate (106). That device includes the retaining place (306) into which the substrate (106) is inserted and the conductive element (304). The conductive element (304) is positioned in a gap (404) between the edge of the retaining place and the edge of the substrate. COPYRIGHT: (C)2004,JPO&NCIPI

9. 发明专利

JP2007279040A Method and system mounted on computer for determining configuration in light-scattering inspection system 有权
标题翻译：计算机上安装的方法和系统，用于确定光散射检测系统中的配置
公开(公告)号：JP2007279040A
公开(公告)日：2007-10-25
申请号：JP2007097606
申请日：2007-04-03
申请人： Kla-Tencor Technologies Corp , ケイエルエイ−テンコー・テクノロジーズ・コーポレーション
发明人： BELYAEV ALEXANDER , KAVALDJIEV DANIEL , MURALI AMITH , PETRENKO ALEKSEY , KIRK MIKE D , SHORTT DAVID , HAAS BRIAN L , HALLER KURT L
IPC分类号： G01N21/956 , H01L21/66
CPC分类号： G01N21/9501
摘要： PROBLEM TO BE SOLVED: To provide a system for determining the configuration of a light-scattering inspection system without measuring a wafer by the inspection system. SOLUTION: A method and a system mounted on a computer are composed for determining the configuration of the light-scattering inspection system. The method mounted on one computer includes the determination of the three-dimensional map of a signal-to-noise ratio value to a test piece and data to be acquired for the potential defect of the test piece by the light-scattering inspection system over the entire scattering hemisphere of the inspection system. The method includes the determination of one or more parts in the scattering hemisphere, where the signal-to-noise ratio value is higher than that of other parts of the scattering hemisphere, based on the three-dimensional map. The method includes the determination of the configuration of the detection subsystem of the inspection system, based on one or more parts in the scattering hemisphere. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于确定光散射检查系统的配置而不通过检查系统测量晶片的系统。解决方案：安装在计算机上的方法和系统被组成用于确定光散射检查系统的配置。安装在一台计算机上的方法包括确定测试件的信噪比值的三维映射图以及通过光散射检测系统对测试片的潜在缺陷获得的数据整个散射半球的检查系统。该方法包括基于三维图确定散射半球中的一个或多个部分，其中信噪比值高于散射半球的其它部分。该方法包括基于散射半球中的一个或多个部分确定检查系统的检测子系统的配置。版权所有（C）2008，JPO＆INPIT

10. 发明专利

JP2007273933A Method and device for detecting and removing local shunt defects in photovoltaic field 有权
标题翻译：用于检测和去除光伏领域的局部分支缺陷的方法和装置
公开(公告)号：JP2007273933A
公开(公告)日：2007-10-18
申请号：JP2006173544
申请日：2006-06-23
申请人： Kla-Tencor Technologies Corp , ケイエルエイ−テンコー・テクノロジーズ・コーポレーション
发明人： ZAPALAC GEORGE H JR
IPC分类号： H01L31/04
CPC分类号： H01L31/208 , Y02E10/541 , Y02E10/543 , Y02P70/521
摘要： PROBLEM TO BE SOLVED: To reduce abnormality that becomes a cause of deteriorating the efficiency of a thin-film photocell. SOLUTION: The photocurrent that is generated by focusing a beam 12 onto a cell 10 is measured by an ammeter 20. By adjusting the voltage at both ends of load resistance 21, the cell 10 is allowed to have a fixed voltage regardless of the photocurrent flowing to the load 21. When the beam 12 is away from the local shunt defect 14, the resistance between the beam 12 and the local shunt defect 14 due to a transparent conductive oxide 22 is increased. Thus, the photocurrent 18 that is necessary for saturating the local shunt defect 14 decreases, and the photocurrent 18 increases. Thereby, the location of the local shunt defect 14 is specified, so it is electrically removed by laser ablation. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了减少成为使薄膜光电池的效率变差的原因的异常。解决方案：通过电流计20测量通过将光束12聚焦到电池10上而产生的光电流。通过调整负载电阻21两端的电压，使电池10具有固定电压，而不管流过负载21的光电流。当光束12离开局部分流缺陷14时，由透明导电氧化物22引起的光束12与局部分流缺陷14之间的电阻增加。因此，使局部分流缺陷14饱和所需的光电流18降低，光电流18增加。因此，指定了局部分流缺陷14的位置，因此通过激光烧蚀电除去。版权所有（C）2008，JPO＆INPIT

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