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1. 发明专利

JP2006164969A Apparatus and method for irradiating tilted particle beam 审中-公开
标题翻译：用于辐射倾斜粒子束的装置和方法
公开(公告)号：JP2006164969A
公开(公告)日：2006-06-22
申请号：JP2005335448
申请日：2005-11-21
申请人： Kla-Tencor Technologies Corp , ケイエルエイ−テンコーテクノロジーズ,コーポレイション
发明人： MANKOS MARIAN , GRELLA LUCA , ADLER DAVID L
IPC分类号： H01J37/29 , H01L21/66
CPC分类号： H01J37/1478 , H01J37/29 , H01J2237/2538
摘要： PROBLEM TO BE SOLVED: To improve a low-energy electron microscope (LEEM) system having a tilting ability.
SOLUTION: The apparatus is to inspect a substrate by using charged particles. The apparatus (100) includes an irradiation subsystem (102), an objective lens subsystem (104), a projection subsystem (106) and a beam separator (108) to interconnect the above subsystems. The irradiation subsystem advantageously includes a tilt deflector (130) structured to be tilted so as to be capable of controlling incident beams. Tilt of the incident beams by the tilt deflector is enlarged before the incident beams hit a substrate (112). With this technology, a big tilt of beams can be achieved in the substrate without aberration of a lens generated by introducing the tilt in the objective lens and without any troublesome problems caused by the use of a stage capable of changing inclination.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：改进具有倾斜能力的低能量电子显微镜（LEEM）系统。
解决方案：该设备是通过使用带电粒子检查基板。装置（100）包括照射子系统（102），物镜子系统（104），投影子系统（106）和用于互连上述子系统的分束器（108）。照射子系统有利地包括倾斜偏转器（130），其被构造成倾斜以便能够控制入射光束。倾斜偏转器的入射光束的倾斜在入射光束撞击基板（112）之前被放大。利用该技术，可以在基板中实现大的倾斜的光束，而不会由于通过在物镜中引入倾斜而产生的透镜的像差，并且不会由于使用能够改变倾斜度的台架而引起任何麻烦的问题。版权所有（C）2006，JPO＆NCIPI

2. 发明专利

JP2004235149A Method and device for reducing effect of edge of substrate in electron lens 有权
公开(公告)号：JP2004235149A
公开(公告)日：2004-08-19
申请号：JP2004015147
申请日：2004-01-23
申请人： Kla-Tencor Technologies Corp , ケイエルエイ−テンコーテクノロジーズ,コーポレイション
发明人： MANKOS MARIAN , ADLER DAVID L
IPC分类号： H01L21/66 , G01N23/203 , G01Q30/02 , G01Q30/20 , G21K7/00 , H01J37/20 , H01J37/244 , H01J37/28
CPC分类号： H01J37/20 , H01J2237/153 , Y10T428/12528
摘要： PROBLEM TO BE SOLVED: To reduce an effect of an edge of a wafer during testing in a system to test a semiconductor wafer or the like by means of an electron beam. SOLUTION: One indicated embodiment is related to a method to test a substrate (106). The method includes the insertion of the substrate (106) into a retaining place (306) of a substrate holder (302), the transportation of the substrate holder (302) under the electron beam, and the application of a voltage to a conductive element (304) of the substrate holder (302). The effect of the edge to the substrate is reduced by the voltage applied to the conductive element (304). Another indicated embodiment is related to a device to retain the substrate (106) to reduce the effect of the edge of the substrate (106). That device includes the retaining place (306) into which the substrate (106) is inserted and the conductive element (304). The conductive element (304) is positioned in a gap (404) between the edge of the retaining place and the edge of the substrate. COPYRIGHT: (C)2004,JPO&NCIPI

3. 发明专利

JP2005228743A Prism array improved for electron beam inspection and scrutiny of defect 有权
标题翻译：改进了电子束检查和缺陷的清晰度的PRISM阵列
公开(公告)号：JP2005228743A
公开(公告)日：2005-08-25
申请号：JP2005031276
申请日：2005-02-08
申请人： Kla-Tencor Technologies Corp , ケイエルエイ−テンコーテクノロジーズ,コーポレイション
发明人： MANKOS MARIAN
IPC分类号： H01L21/66 , G01N23/203 , G01Q30/02 , H01J37/147 , H01J37/29
CPC分类号： G01N23/203 , H01J2237/1523
摘要： PROBLEM TO BE SOLVED: To provide a magnetic prism array improved for use for an electron beam inspection device or the like. SOLUTION: A device (100) for inspecting a substrate with the use of charged particles includes irradiation optics, objective optics (104), a projection optics (106), and a beam separator (108). The beam separator (108) is so structured to receive incident beams from the irradiation optical system and bend the incident beams toward the objective optical system, as well as to receive scattered beams from the objective optical system and bend the scattered beams toward the projection optical system. The beam separator (108) consists of a magnetic prism array (202) including a central magnetic sector (204), inside magnetic sectors (206) located outside the center magnetic sector (204), and outside magnetic sectors (208) located outside the inside magnetic sector. Each of the inside and outside sectors can be structured to have field strength independently adjustable for alignment and focusing purposes. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供改进用于电子束检查装置等的磁性棱镜阵列。解决方案：用于使用带电粒子检查衬底的器件（100）包括照射光学器件，物镜（104），投影光学器件（106）和光束分离器（108）。光束分离器（108）被构造成接收来自照射光学系统的入射光束并将入射光束弯曲朝向物镜光学系统，并且接收来自物镜光学系统的散射光束，并将散射光束朝向投影光学系统。光束分离器（108）由包括中心磁性扇区（204）的磁性棱镜阵列（202）组成，位于中心磁性扇区（204）外侧的磁性扇区（206）内部，以及外部磁性扇区（208）内磁区。内部和外部扇区中的每一个可以被构造成具有独立可调整的场强度用于对准和聚焦目的。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2004264290A High-contrast inspection and close inspection of magnetic medium and of head 有权
公开(公告)号：JP2004264290A
公开(公告)日：2004-09-24
申请号：JP2004001754
申请日：2004-01-07
申请人： Kla-Tencor Technologies Corp , ケイエルエイ−テンコーテクノロジーズ,コーポレイション
发明人： MANKOS MARIAN , SOLTZ DAVID A , HESS HARALD F
IPC分类号： G01N23/225 , G01Q30/02 , G01Q30/04 , G01R33/028 , G11B5/012 , G11B5/09 , G11B5/127 , G11B5/31 , G11B5/455 , G11B5/84 , G11B27/36 , H01J37/29
CPC分类号： G11B5/455 , G01N23/2251 , G11B5/012 , G11B5/09 , G11B5/1272 , G11B5/3166 , G11B5/3193 , G11B27/36 , G11B2220/20
摘要： PROBLEM TO BE SOLVED: To provide a method for inspecting and closely inspecting a sample magnetized, using an automatic inspecting apparatus. SOLUTION: In the method, an electron source is used for generating incident electron beams; the sample is biased to the electron source so that incident electrons are decelerated, as they approach the surface of the sample; and one portion of the sample is irradiated with inclined incident electron beams. The sample moves below the incident electron beams by using the movable stage of the inspecting apparatus. Scattered electrons are detected to form the image data of the sample for showing separate contrast between regions with different magnetizations. The movement of the sample below the incident electron beams is continuous, and the data of a plurality of image pixels are acquired in parallel by using a time delay integrating detector. COPYRIGHT: (C)2004,JPO&NCIPI

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