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1. 发明申请

US20110304856A1 LIGHTWAVE INTERFERENCE MEASUREMENT APPARATUS 审中-公开
标题翻译： LIGHTWAVE干扰测量装置
公开(公告)号：US20110304856A1
公开(公告)日：2011-12-15
申请号：US13149198
申请日：2011-05-31
申请人： Zongtao GE , Masaaki TOMIMIZU , Hideo KANDA , Hiroyuki IWAZAKI , Noboru KOIZUMI , Takayuki SAITO , Seiji MOCHITATE , Takeshi OGASAWARA , Takashi NAKAJIMA
发明人： Zongtao GE , Masaaki TOMIMIZU , Hideo KANDA , Hiroyuki IWAZAKI , Noboru KOIZUMI , Takayuki SAITO , Seiji MOCHITATE , Takeshi OGASAWARA , Takashi NAKAJIMA
IPC分类号： G01B11/02
CPC分类号： G01B11/2441 , G01M11/0207 , G01M11/025 , G01M11/0271
摘要： A microinterferometer applies low coherent measurement light, which travels along an optical axis in a converging manner, to a front surface of a flange. A part of the measurement light is reflected inside an interferometric optical system, and becomes reference light. Apart of the measurement light passed through the interferometric optical system is reflected from the front surface of the flange, and is incident again upon the interferometric optical system. By combining the reflected light with the reference light, interference light is obtained. While a sample rotating stage rotates a sample lens through 360 degrees, a first imaging camera having one-dimensional image sensor captures 3600 images of the interference light, i.e., the image of the interference light is captured every time the sample lens is rotated by 0.1 degrees. Based on the images of interference fringes, the shape of the front surface of the flange is analyzed.
摘要翻译：微型干涉仪将以相聚的方式沿光轴行进的低相干测量光应用于凸缘的前表面。测量光的一部分在干涉光学系统内反射，成为参考光。除了通过干涉光学系统的测量光之外，还从法兰的前表面反射，并再次入射到干涉光学系统上。通过将反射光与参考光组合，获得干涉光。当样品旋转台将样品透镜旋转360度时，具有一维图像传感器的第一成像相机捕获干涉光的3600张图像，即每次将样品透镜旋转0.1次时捕获干涉光的图像度。基于干涉条纹的图像，分析法兰前表面的形状。

2. 发明申请

US20100231923A1 THREE-DIMENSIONAL SHAPE MEASURING METHOD AND DEVICE 审中-公开
标题翻译：三维形状测量方法和装置
公开(公告)号：US20100231923A1
公开(公告)日：2010-09-16
申请号：US12721084
申请日：2010-03-10
申请人： Zongtao GE , Masaaki Tomimizu , Hideo Kanda , Takayuki Saito , Noboru Koizumi , Seiji Mochitate , Shigeyuki Takano , Hiroyuki Iwazaki
发明人： Zongtao GE , Masaaki Tomimizu , Hideo Kanda , Takayuki Saito , Noboru Koizumi , Seiji Mochitate , Shigeyuki Takano , Hiroyuki Iwazaki
IPC分类号： G01B11/25
CPC分类号： G01B11/2441 , G01M11/0221 , G01M11/025 , G01M11/0271
摘要： A process of measuring a shape while changing the relative posture of an microscopic interferometer to a sample lens which is rotated about a rotation axis is divided into a process of measuring a top surface in a state where the sample lens is supported from a back surface and a process of measuring a back surface in a state where the sample lens is supported from the top surface. By combining first shape information of a flange side surface acquired by the process of measuring the top surface and second shape information of the flange side surface acquired by the process of measuring the back surface, the relative positional relation between the sample top surface and the sample back surface is calculated.
摘要翻译：在将微型干涉仪相对于相对于旋转轴线旋转的样本透镜的相对姿势变化的同时测量形状的处理被划分为从背面支撑样本透镜的状态下测量顶面的处理，在从上表面支撑样本透镜的状态下测量背面的处理。通过组合通过测量上表面获得的凸缘侧表面的第一形状信息和通过测量背面的处理获得的凸缘侧表面的第二形状信息，样本顶表面和样本之间的相对位置关系计算背面。

3. 发明申请

US20100097619A1 OPTICAL WAVE INTERFERENCE MEASURING APPARATUS 有权
标题翻译：光波干扰测量装置
公开(公告)号：US20100097619A1
公开(公告)日：2010-04-22
申请号：US12571993
申请日：2009-10-01
申请人： Zongtao GE , Hideo KANDA , Takayuki SAITO , Noboru KOIZUMI
发明人： Zongtao GE , Hideo KANDA , Takayuki SAITO , Noboru KOIZUMI
IPC分类号： G01B11/02
CPC分类号： G01B11/2441 , G01M11/025 , G01M11/0271
摘要： The relative position of a test surface is sequentially changed from a reference position where a surface central axis is aligned with a measurement optical axis such that the measurement optical axis is sequentially moved to a plurality of annular regions obtained by dividing the test surface in a diametric direction. The test surface is rotated on a rotation axis whenever the relative position is changed. Measurement light that travels while being converged by a Mirau objective interference optical system is radiated to the rotating test surface, and a one-dimensional image sensor captures interference fringes at each of a plurality of rotational positions. The shape information of each annular region is calculated on the basis of the captured interference fringes at each rotational position, and the shape information is connected to calculate the shape information of the entire measurement region.
摘要翻译：测试表面的相对位置从表面中心轴与测量光轴对准的参考位置顺序地改变，使得测量光轴顺序地移动到通过将测试表面分成直径而获得的多个环形区域方向。每当相对位置改变时，测试表面都会在旋转轴上旋转。在由Mirau物镜干涉光学系统会聚的同时行进的测量光被照射到旋转测试表面，并且一维图像传感器在多个旋转位置的每一个处捕获干涉条纹。基于每个旋转位置处的捕获的干涉条纹来计算每个环形区域的形状信息，并且形状信息被连接以计算整个测量区域的形状信息。

4. 发明申请

US20100091299A1 OPTICAL WAVE INTERFERENCE MEASURING APPARATUS 失效
标题翻译：光波干扰测量装置
公开(公告)号：US20100091299A1
公开(公告)日：2010-04-15
申请号：US12578997
申请日：2009-10-14
申请人： Zongtao GE , Hideo Kanda , Takayuki Saito , Noboru Koizumi
发明人： Zongtao GE , Hideo Kanda , Takayuki Saito , Noboru Koizumi
IPC分类号： G01B11/24
CPC分类号： G01M11/0271 , G01M11/025
摘要： The relative position of a test surface is sequentially changed from a reference position where a surface central axis is aligned with a measurement optical axis such that the measurement optical axis is sequentially moved to a plurality of annular regions obtained by dividing the test surface in a diametric direction. The test surface is rotated on a rotation axis whenever the relative position is changed. Measurement light composed of a plane wave is radiated to the rotating test surface, and a one-dimensional image sensor captures interference fringes at each of a plurality of rotational positions. The shape information of each annular region is calculated on the basis of the captured interference fringes at each rotational position, and the shape information is connected to calculate the shape information of the entire measurement region.
摘要翻译：测试表面的相对位置从表面中心轴与测量光轴对准的参考位置顺序地改变，使得测量光轴顺序地移动到通过将测试表面分成直径而获得的多个环形区域方向。每当相对位置改变时，测试表面都会在旋转轴上旋转。由平面波构成的测量光被照射到旋转测试表面，并且一维图像传感器在多个旋转位置中的每一个处捕获干涉条纹。基于每个旋转位置处的捕获的干涉条纹来计算每个环形区域的形状信息，并且形状信息被连接以计算整个测量区域的形状信息。

5. 发明申请

US20090309957A1 OMNIDIRECTIONAL IMAGING APPARATUS 审中-公开
标题翻译： OMNIDIRECTIONAL成像装置
公开(公告)号：US20090309957A1
公开(公告)日：2009-12-17
申请号：US12484926
申请日：2009-06-15
申请人： Zongtao GE , Seiji MOCHITATE
发明人： Zongtao GE , Seiji MOCHITATE
IPC分类号： H04N7/00
CPC分类号： H04N5/232 , G02B6/3604 , H04N5/23238
摘要： Disclosed is an omnidirectional imaging apparatus capable of obtaining substantially the same amount of image data per unit azimuth angle in subject information within the same azimuth angle range, in the entire image region of an omnidirectional image, and forming a high-quality panoramic image over the entire image region.A line sensor of an imaging unit is rotated on an imaging surface to perform scanning, thereby sequentially acquiring image data of an omnidirectional image in all directions that is formed by an imaging optical system. A panoramic image forming unit forms a panoramic image on the basis of the image data of the omnidirectional image sequentially acquired in all directions.
摘要翻译：公开了一种全向成像装置，其能够在全向图像的整个图像区域中在相同的方位角范围内的对象信息中获得与每单位方位角大致相同量的图像数据，并且在全方位图像的整个图像区域上形成高质量的全景图像整个图像区域。成像单元的线传感器在成像表面上旋转以执行扫描，从而顺序地获取由成像光学系统形成的所有方向上的全向图像的图像数据。全景图像形成单元基于在所有方向上顺序获取的全向图像的图像数据形成全景图像。

6. 发明申请

US20100246900A1 METHOD AND APPARATUS OF MEASURING POSITIONAL VARIATION OF ROTATION CENTER LINE 审中-公开
标题翻译：测量旋转中心线位置变化的方法和装置
公开(公告)号：US20100246900A1
公开(公告)日：2010-09-30
申请号：US12730696
申请日：2010-03-24
申请人： Zongtao GE , Kenichi Takahashi
发明人： Zongtao GE , Kenichi Takahashi
IPC分类号： G06K9/62
CPC分类号： G01B11/272 , B23Q17/24
摘要： A measurement jig having a position indicator is set so as to rotate integrally with a sample, and a magnified image of the position indicator formed by a microscope is picked up by an imaging camera at plural time points during the rotation of the sample. A movement locus of the magnified images picked up is founded, and position variation amount of a rotation center line of the sample is calculated on the basis of the found movement locus.
摘要翻译：将具有位置指示器的测量夹具设置成与样品一体旋转，并且在样品旋转期间，通过成像摄像机在多个时间点拾取由显微镜形成的位置指示器的放大图像。建立拾取的放大图像的运动轨迹，并且基于找到的移动轨迹计算样本的旋转中心线的位置变化量。

7. 发明申请

US20100201992A1 LIGHTWAVE INTERFERENCE MEASUREMENT DEVICE 审中-公开
标题翻译： LIGHTWAVE干扰测量设备
公开(公告)号：US20100201992A1
公开(公告)日：2010-08-12
申请号：US12647091
申请日：2009-12-24
申请人： Zongtao GE
发明人： Zongtao GE
IPC分类号： G01B11/02
CPC分类号： G01B11/2441 , G01B11/06 , G01B11/306
摘要： A test surface is rotatable around a rotation axis and an interferometer main unit is movable with respect to a test surface so that an observation area is moved on the test surface which is rotating. While the observation area is moved within the test surface, an interfering light beam is successively captured by a one-dimensional image sensor, straight belt form observation-position-specific interference fringes formed by the interfering light beam are successively imaged, and the shape information of the test surface is obtained based on the imaged observation-position-specific interference fringes.
摘要翻译：测试面可以围绕旋转轴线旋转，并且干涉仪主单元可相对于测试表面移动，使得观察区域在正在旋转的测试表面上移动。当观察区域在测试表面内移动时，干涉光束被一维图像传感器连续地捕获，直线形式由干涉光束形成的观察位置特定的干涉条纹被连续地成像，并且形状信息基于成像的观察位置特定干涉条纹获得测试表面。

8. 发明申请

US20090073459A1 WAVEFRONT MEASURING APPARATUS FOR OPTICAL PICKUP 失效
标题翻译：用于光学拾取的WAVEFRONT测量装置
公开(公告)号：US20090073459A1
公开(公告)日：2009-03-19
申请号：US12193975
申请日：2008-08-19
申请人： Zongtao GE
发明人： Zongtao GE
IPC分类号： G01B9/02
CPC分类号： G01J9/02 , G01B9/02083 , G01B9/02084 , G11B7/22
摘要： A wavefront measuring apparatus for optical pickup includes: a beam splitting section; a wavefront shaping section; a beam combining section that generate interference light; an interference fringe image-acquiring section that acquires an interference fringe image including wavefront information of the light beam; and an analyzing section that analyzes a wavefront of the light beam on the basis of the interference fringe image. The analyzing section includes: an image processing section that performs a filtering process on the interference fringe image to eliminate a frequency component corresponding to the sub beam, so as to acquire the filtering-processed interference fringe image, and a wavefront analyzing section that analyzes a wavefront of the main beam on the basis of the filtering-processed interference fringe image.
摘要翻译：一种用于光学拾取器的波前测量装置，包括：分束部分; 波前成形部分; 产生干涉光的光束组合部分; 干涉条纹图像获取部，其获取包括所述光束的波前信息的干涉条纹图像; 以及分析部，其基于干涉条纹图像分析光束的波前。分析部分包括：图像处理部分，对干涉条纹图像执行滤波处理以消除与子光束相对应的频率分量，以获取滤波处理的干涉条纹图像;以及波前分析部分，其分析基于滤波处理干涉条纹图像的主波束的波前。

9. 发明申请

US20100309458A1 ASPHERE MEASUREMENT METHOD AND APPARATUS 审中-公开
标题翻译： ASPHERE测量方法和设备
公开(公告)号：US20100309458A1
公开(公告)日：2010-12-09
申请号：US12785639
申请日：2010-05-24
申请人： Zongtao GE , Ping Sun
发明人： Zongtao GE , Ping Sun
IPC分类号： G01B9/00
CPC分类号： G01M11/0242
摘要： Disclosed is an asphere measurement method capable of measuring the surface deviations and the surface tilts with high accuracy even when an asphere to be measured does not have the wedge-shaped flat portion.Provided is an asphere measurement method of measuring surface deviations and surface tilts of an asphere having a first detection target surface and a second detection target surface formed as aspheric surfaces which are rotationally symmetric. The method includes, in order of measurement: a first interference fringe acquisition step; a second interference fringe acquisition step; a first shape data acquisition step; a second shape data acquisition step; a first axis data acquisition step; a second axis data acquisition step; and a surface deviation/tilt analysis step.
摘要翻译：公开了一种非球面测量方法，即使被测量的非球面不具有楔形平坦部分，也能够以高精度测量表面偏离和表面倾斜。提供了一种测量具有第一检测目标表面的非球面的表面偏差和表面倾斜的非球面测量方法，以及形成为旋转对称的非球面的第二检测目标表面。该方法按照测量顺序包括：第一干涉条纹获取步骤; 第二干涉条纹获取步骤; 第一形状数据获取步骤; 第二形状数据获取步骤; 第一轴数据采集步骤; 第二轴数据采集步骤; 和表面偏离/倾斜分析步骤。

10. 发明申请

US20100245804A1 METHOD OF MEASURING AMOUNT OF ECCENTRICITY 有权
标题翻译：测量偏差的方法
公开(公告)号：US20100245804A1
公开(公告)日：2010-09-30
申请号：US12732836
申请日：2010-03-26
申请人： Zongtao GE , Kenichi TAKAHASHI
发明人： Zongtao GE , Kenichi TAKAHASHI
IPC分类号： G01B9/00
CPC分类号： G01B11/272 , G01M11/0221 , G06T7/001 , G06T2207/30108
摘要： An optical element to be measured is irradiated with the light which has passed through an indicator, thereby to form an indicator image on an image pick-up surface. Maximum peak coordinates are specified and stored as a position of the indicator image relating to the first surface. Whether the second largest peak may be specified or not is determined. In case that this result is NO, the maximum peak indicator image is deleted, and maximum peak coordinates are specified again and stored as a position of the indicator image relating to the second surface.
摘要翻译：用已经通过指示器的光照射要测量的光学元件，从而在图像拾取表面上形成指示图像。指定最大峰值坐标并将其存储为与第一表面有关的指示器图像的位置。确定是否可以指定第二大峰值。在该结果为“否”的情况下，最大峰值指示图像被删除，并且再次指定最大峰值坐标并存储为与第二表面相关的指示器图像的位置。

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