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    • 1. 发明授权
    • Negatively chargeable electrophotographic photoreceptor
    • 可负电荷的电子照相感光体
    • US5556729A
    • 1996-09-17
    • US464466
    • 1995-06-05
    • Yuzuru FukudaTsuyoshi OhtaMasato OnoTaketoshi HigashiShigeru Yagi
    • Yuzuru FukudaTsuyoshi OhtaMasato OnoTaketoshi HigashiShigeru Yagi
    • G03G5/08G03G5/082G03G5/147
    • G03G5/08235G03G5/08278
    • An electrophotographic photoreceptor comprising: an electrically conductive substrate, a charge injection blocking layer formed on said electrically conductive substrate, a photoconductive layer comprising a single layer formed on said charge injection blocking layer, said photoconductive layer comprising amorphous silicon containing boron, a positive hole capturing layer formed on said photoconductive layer, said positive hole capturing layer being selected from the group comprising amorphous silicon containing less than 50 ppm boron and amorphous silicon being substantially composed of hydrogen and silicon atoms, and a surface layer formed on said positive hole capturing layer. The boron concentration contained in said photoconductive layer is 0.01-1000 ppm. The surface layer is formed by amorphous silicon nitride, amorphous silicon oxide, amorphous silicon carbide or amorphous carbon as a main body. The charge injection blocking layer has amorphous silicon as a main body and contains a group V element. The electrophotographic photoreceptor is excellent in the dark attenuation, the sensitivity and electrification capacity and does not cause image flow or image fogging on copied images obtained by using the photoreceptor.
    • 一种电子照相感光体,其特征在于,具有:导电性基板,形成在所述导电性基板上的电荷注入阻挡层,含有形成于所述电荷注入阻挡层上的单层的光电导层,所述光电导层含有含硼的非晶硅, 所述空穴捕获层选自含有小于50ppm硼的非晶硅和基本上由氢和硅原子组成的非晶硅,以及形成在所述正空穴捕获层上的表面层。 所述光电导层中含有的硼浓度为0.01〜1000ppm。 表面层由非晶氮化硅,非晶氧化硅,非晶碳化硅或无定形碳作为主体形成。 电荷注入阻挡层以非晶硅为主体,含有V族元素。 电子照相感光体在黑暗衰减,灵敏度和带电能力方面优异,并且不会对通过使用感光体获得的复印图像上的图像流动或图像起雾。
    • 6. 发明授权
    • Electrophotographic photoreceptor with amorphous Si-Ge layer
    • 具有非晶Si-Ge层的电子照相感光体
    • US5514507A
    • 1996-05-07
    • US249964
    • 1994-05-27
    • Shigeru YagiTsuyoshi Ohta
    • Shigeru YagiTsuyoshi Ohta
    • G03G5/08G03G5/082G03G5/14G03G5/147
    • G03G5/08264G03G5/08221G03G5/08235G03G5/0825
    • An electrophotographic photoreceptor for positive electrification comprising at least an electroconductive layer, a charge injection blocking layer, a photoconductive layer and a surface layer. The photoconductive layer comprises a layer having an amorphous silicon layer containing one or more of hydrogen, halogen and a Group III element for controlling electroconductivity and layer having an amorphous silicon germanium layer containing at least hydrogen, halogen and a Group III element. The charge injection blocking layer comprises an amorphous silicon layer containing hydrogen and a Group III element in an amount of equal or less than 1000 ppm. The electrophotographic photoreceptor has excellent electrification characteristics with dark and light sensitivities, stability against repetitive use and may be utilized as a photoreceptor for a semiconductor laser beam printer.
    • 一种用于正电荷的电子照相感光体,其至少包括导电层,电荷注入阻挡层,光电导层和表面层。 光电导层包括具有含有一个或多个氢,卤素和用于控制导电性的III族元素的非晶硅层的层,以及具有至少含有氢,卤素和III族元素的非晶硅锗层的层。 电荷注入阻挡层包含含有等于或小于1000ppm的氢和III族元素的非晶硅层。 电子照相感光体具有优异的起电特性,具有暗和光敏感性,耐重复使用的稳定性,可用作半导体激光束打印机的感光体。
    • 8. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20070145416A1
    • 2007-06-28
    • US11616603
    • 2006-12-27
    • Tsuyoshi OhtaBungo Tanaka
    • Tsuyoshi OhtaBungo Tanaka
    • H01L29/76
    • H01L29/7813H01L29/0649H01L29/0696H01L29/4236H01L29/42372H01L29/4925H01L29/4958H01L29/7397
    • A semiconductor device comprises on a surface of a first semiconductor layer of the first conduction type a second semiconductor layer of the first conduction type. A semiconductor base layer of the second conduction type is formed on the second semiconductor layer, and a semiconductor diffusion layer of the first conduction type is formed on a surface of the semiconductor base layer. A trench is formed from the surface of the semiconductor diffusion layer to a depth reaching the second semiconductor layer. A gate electrode is formed of a conductor film buried in the trench with a gate insulator interposed therebetween. The conductor film includes a first conductor film formed along the gate electrode to have a recess and a second conductor film formed to fill the recess.
    • 半导体器件包括在第一导电类型的第一半导体层的表面上的第一导电类型的第二半导体层。 第二导电类型的半导体基层形成在第二半导体层上,并且在半导体基底层的表面上形成第一导电类型的半导体扩散层。 从半导体扩散层的表面到到达第二半导体层的深度形成沟槽。 栅电极由埋在沟槽中的导体膜形成,栅极绝缘体插入其间。 导体膜包括沿着栅电极形成以具有凹部的第一导体膜和形成为填充凹部的第二导体膜。