专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2006175416A Wetting device 审中-公开
标题翻译：润湿装置
公开(公告)号：JP2006175416A
公开(公告)日：2006-07-06
申请号：JP2004374349
申请日：2004-12-24
申请人： Yuzo Mori , Sharp Corp , シャープ株式会社 , 森勇蔵
发明人： MAKIOKA HIROSHIGE , ARIKAWA KAZUHIKO , MORITA KENICHI , ISHIDA JUNICHI , KANDA HIROFUMI , YOSHII MOTOYASU , YAMAMOTO YUICHI , MORI YUZO
IPC分类号： B08B3/02 , B08B3/08 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a wetting device having a high capacity of peeling and removing a removal object matter deposited on a cleaning object regardless of the electrical characteristics of the cleaning object, i.e., a high cleaning power and a high cleaning speed, which device requires reduced equipment cost and has a low environmental load. SOLUTION: The wetting device 1 includes a nozzle 2 comprising a nozzle main body 4 having a slit-shaped opening part 17 and a radical generating means 5, a substrate transfer means 3, a first pure water supply means 7, and a second pure water supply means 8. The radical generating means 5 is installed at the outside of the nozzle main body 4, a cleaning liquid 10 is prepared by mixing the water flow of pure water discharged from the slit-shaped opening part 17 with the pure water containing active species such as radicals generated in the radical generating means 5, and the cleaning liquid 10 is supplied onto a surface 9a to to be cleaned of the substrate 9. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种润湿装置，其具有高的剥离能力和除去清洁物体上沉积的清除物体，而与清洁对象的电气特性无关，即高清洁力和高清洁度速度，哪个装置需要降低设备成本并且具有低的环境负荷。润湿装置1包括喷嘴2，喷嘴2包括具有狭缝状开口部17和自由基发生装置5的喷嘴主体4，基板输送装置3，第一纯水供给装置7和第二纯水供给装置8.自由基产生装置5安装在喷嘴主体4的外侧，通过将从狭缝状开口部17排出的纯水的水流与纯水含有活性物质的水，例如在自由基产生装置5中产生的自由基，以及清洗液10被供给到要被清洁的基材9的表面9a上。（C）2006，JPO＆NCIPI

2. 发明专利

JP2006122784A Substrate washing method and substrate washing apparatus 审中-公开
标题翻译：基板清洗方法和基板清洗装置
公开(公告)号：JP2006122784A
公开(公告)日：2006-05-18
申请号：JP2004312740
申请日：2004-10-27
申请人： Yuzo Mori , Sharp Corp , シャープ株式会社 , 森勇蔵
发明人： MORITA KENICHI , MORI YUZO
IPC分类号： B08B3/02
摘要： PROBLEM TO BE SOLVED: To provide a substrate washing method capable of continuously performing the peeling and removal of the pollutant on a substrate from the surface of the substrate and the extrusion of the pollutant to the outside of the substrate using only pure water but not using a chemical liquid of a high concentration without using a plurality of chemical liquid tanks, pin water discharge devices and the like, and a substrate washing apparatus.
SOLUTION: The substrate 1 is held to an inclined posture so as to form angle θ1 of inclination with respect to a horizontal surface 2 and pure water in a pressurized state is ejected to the surface 1a to be washed of the substrate 1 from a pure water jet means 3 so as to leave an interval d1 from the surface 1a to be washed to form a liquid film 7 flowing on the surface 1a to be washed in one direction from the upper part to the lower part of the substrate 1 to remove the pollutant on the surface 1a to be washed of the substrate 1.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够从衬底的表面连续地进行基板上的污染物的剥离和去除以及仅使用纯水将污染物向衬底外部挤出的衬底洗涤方法但不使用高浓度的化学液体，而不使用多个化学液体容器，针式排水装置等，以及基板清洗装置。解决方案：将基板1保持为倾斜姿势，以形成相对于水平表面2倾斜的角度θ1，将加压状态的纯水从基板1的表面1a喷射到基板1的清洗表面纯水喷射装置3，以便从表面1a留下间隔d1以进行洗涤，以形成液体膜7，该液膜7在表面1a上流动，从基板1的上部到下部的一个方向被洗涤到一个方向，去除要洗涤的基材1的表面1a上的污染物。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2008083418A Protection sheet peeling device and method 审中-公开
标题翻译：保护片剥离装置及方法
公开(公告)号：JP2008083418A
公开(公告)日：2008-04-10
申请号：JP2006263588
申请日：2006-09-27
申请人： Sharp Corp , シャープ株式会社
发明人： TADERA TAKAMITSU , MORITA KENICHI
IPC分类号： G02F1/13 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide a protection sheet peeling device capable of maintaining stable surface potential without performing treatment on the surface of a polarizing plate and without being affected by peeling conditions of peeling environments such as temperature and humidity, peeling speed and the like when a protection sheet is peeled from a liquid crystal panel, and to provide a protection sheet peeling method. SOLUTION: In the protection sheet peeling method, a peeling part 4 peels the protection sheet 8 from the liquid crystal panel 2 while being moved, mist is formed, the mist is blown out toward the surface of the liquid crystal panel 2 to which the protection sheet 8 is stuck and the mist present on the periphery of the surface of the liquid crystal panel 2 to which the protection sheet 8 is stuck is sucked. Humidity on the periphery of the surface of the liquid crystal panel 2 to which the protection sheet 8 is stuck is detected and a mist blowing amount, a mist sucking amount and the moving speed of the peeling part 4 are controlled on the basis of the detected humidity. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在不对偏光板的表面进行处理的情况下保持稳定的表面电位并且不受诸如温度和湿度，剥离速度等剥离环境的剥离条件的影响的保护片剥离装置当保护片从液晶面板剥离时，提供保护片剥离方法。解决方案：在保护片剥离方法中，剥离部分4在移动时将保护片8从液晶面板2剥离，形成雾，将雾从液晶面板2的表面吹出，吸附保护片8并且存在于保护片8所粘附的液晶面板2的表面的周围的雾。检测保护片8被粘附在其上的液晶面板2的表面周边的湿度，并且根据所检测出的雾化量，吸雾量和剥离部分4的移动速度进行控制湿度。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2010036467A Module assembling device and its method 审中-公开
标题翻译：模块装配装置及其方法
公开(公告)号：JP2010036467A
公开(公告)日：2010-02-18
申请号：JP2008202453
申请日：2008-08-05
申请人： Sharp Corp , シャープ株式会社
发明人： MORITA KENICHI , ISHIDA JUNICHI , YAMANO ATSUO , KUGA TORU , YAMATAKA HIRONORI
IPC分类号： B32B43/00 , G02F1/13 , G02F1/1335 , G09F9/00
CPC分类号： B32B38/10 , B32B37/0046 , B32B2038/1891 , B32B2457/20 , G02F1/1303
摘要： PROBLEM TO BE SOLVED: To provide a module assembling device and its method for reducing moving amount of a substrate as much as possible, possibility of adhesion of dust, and a working space when peeling a protective film off from a substrate and assembling the substrate after the protective film being peeled off to a workpiece. SOLUTION: A liquid crystal panel 2 having the protective films 27a, 27b attached to both surfaces in the thickness direction is held by holding hands H21, H22, and the protective film 27b is peeled by a peeling hand H3 and a peeling robot R3. A back light 3 is held by a back light transfer conveyor 5 so that the surface of the liquid crystal panel 2 having the protective film 27b peeled off and the fitting portion are opposed to each other and parallel to the liquid crystal panel 2. An assembling hand H1 and an assembling robot R1 assemble the liquid crystal panel 2 to the back light 3 by moving the liquid crystal panel 2 having the protective film 27b peeled off to the direction close to the back light 3. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种模块组装装置及其方法，用于尽可能减少基板的移动量，灰尘附着的可能性，以及从基板剥离保护膜时的工作空间和组装保护膜被剥离到工件后的基板。解决方案：通过握持手H21，H22来保持具有附着在厚度方向的两个表面上的保护膜27a，27b的液晶面板2，并且保护膜27b被剥皮手H3和剥离机器人 R3。背光3由背光传输输送机5保持，使得具有保护膜27b的液晶面板2的表面被剥离，并且嵌合部分彼此相对并平行于液晶面板2.组装手部H1和组装机器人R1通过将具有剥离的保护膜27b的液晶面板2移动到靠近背光3的方向，将液晶面板2组装到背光3上。（C） 2010年，JPO＆INPIT

5. 发明专利

JP2007201186A Substrate cleaning device and substrate cleaning method 审中-公开
标题翻译：基板清洁装置和基板清洁方法
公开(公告)号：JP2007201186A
公开(公告)日：2007-08-09
申请号：JP2006018117
申请日：2006-01-26
申请人： Sharp Corp , シャープ株式会社
发明人： MORITA KENICHI
IPC分类号： H01L21/304 , B08B3/04 , G02F1/13 , G02F1/1333
摘要： PROBLEM TO BE SOLVED: To provide a substrate cleaning device which is capable of sufficiently removing foreign objects attached to the surface of a substrate with a small consumption of cleaning liquid.
SOLUTION: The substrate cleaning device 1 is equipped with a cleaning liquid supply unit 4 provided facing the cleaned surface 2a that is one of the main surfaces possessed by a substrate 2, and a cleaning roller 5 which is provided facing the cleaned surface 2a and located nearly in parallel with the cleaning liquid supply unit 4. The cleaning liquid supply unit 4 supplies cleaning liquid 3 onto the cleaned surface 2a, the roller 5 is rotated in the direction of an arrow 17 so as to send the supplied cleaning liquid 3 into a gap 6 formed between the cleaned surface 2a and the cleaning roller 5, and to form a shearing flow of the cleaning liquid 3 in the gap 6 to clean up the cleaned surface 2a.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决的问题：提供一种能够以少量的清洗液充分除去附着在基板表面的异物的基板清洗装置。解决方案：基板清洁装置1配备有清洁液供给单元4，该清洁液供给单元4设置为与基板2所具有的主表面之一的清洁表面2a相对，以及清洁辊5，其设置成面向清洁表面清洁液供给单元4将清洁液3供给到清洁表面2a上，辊5沿箭头17的方向旋转，从而将供给的清洗液 3形成在清洁表面2a和清洁辊5之间形成的间隙6中，并且在间隙6中形成清洁液体3的剪切流，以清洁清洁表面2a。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2010286880A System and method for estimating failure factor 审中-公开
标题翻译：用于估计故障因子的系统和方法
公开(公告)号：JP2010286880A
公开(公告)日：2010-12-24
申请号：JP2009138149
申请日：2009-06-09
申请人： Sharp Corp , シャープ株式会社
发明人： NAKABAYASHI KEIYA , MORITA KENICHI , SUMIKAWA MASAHITO
IPC分类号： G05B19/418 , G06Q50/00 , G06Q50/04
CPC分类号： Y02P90/14 , Y02P90/22 , Y02P90/30
摘要： PROBLEM TO BE SOLVED: To minimize facility investment and to shorten a start period in constructing a new factory. SOLUTION: Manufacturing devices 37 to 39 of a new factory 22 in start are set to be almost the same as manufacturing devices 23 to 25 of an existing factory 21 in a stable operation state. Also, an inspection device 40 of the new factory 22 is set to be almost the same as an inspection device 26 of the existing factory 21. Also, a second factor analyzing part 42 of the new factory 22 is connected through a communication line 49 to a correlation database 28 of the existing factory 21. The correlation database 28 stores many quality information, process information and restoring operation information related with each other. Consequently, in the optimizing the manufacturing device of the new factory 22, when a failure factor is estimated by the second factor analyzing part 42, the correlation database 28 can be used. It is therefore not necessary to perform mass production trial for accumulating many information by providing a correction database in the new factory 22, and it is possible to suppress the facility investment to the minimum, and to shorten a start period. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：尽量减少设施投资，缩短新工厂的开工时间。解决方案：起动中的新工厂22的制造装置37至39被设置为与处于稳定运行状态的现有工厂21的制造装置23至25几乎相同。此外，新工厂22的检查装置40被设置为与现有工厂21的检查装置26几乎相同。另外，新工厂22的第二因素分析部42通过通信线路49连接到现有工厂21的相关数据库28.相关数据库28存储彼此相关的许多质量信息，处理信息和恢复操作信息。因此，在优化新工厂22的制造装置时，当通过第二因素分析部42估计故障因子时，可以使用相关数据库28。因此，在新工厂22中提供校正数据库不需要进行大量生产试验以积累许多信息，并且可以将设备投资抑制在最小限度以及缩短开始周期。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2010283012A Production line control system and production line control method 审中-公开
标题翻译：生产线控制系统和生产线控制方法
公开(公告)号：JP2010283012A
公开(公告)日：2010-12-16
申请号：JP2009133052
申请日：2009-06-02
申请人： Sharp Corp , シャープ株式会社
发明人： MORITA KENICHI , NAKABAYASHI KEIYA , SUMIKAWA MASAHITO
IPC分类号： H01L21/02
摘要： PROBLEM TO BE SOLVED: To minimize the number of inspection devices in a new production line which models on an existing basic production line.
SOLUTION: When a production line controller S controls the existing basic production line A, a data group creation unit 5 stores the first process recipe 1, the process data 2 and the inspection data 3 for the basic production line A in a database 8 while matching each other. When the new production line B installed anew is controlled, a second process recipe extraction unit 7 extracts the optimal one of the first process recipes 1 thus stored, and outputs the optimal first process recipe 1 as a second process recipe 9 for the new production line B. Since the first process recipe 1 of the basic production line A which is producing stably serves as the second process recipe 9 for the new production line B, production of the new production line B is stabilized and the quality of product fulfills a reference level. As a result, no inspection device is required in the new production line B and the production cost can be lowered.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：最大限度地减少在现有基本生产线上建模的新生产线中的检测设备数量。
解决方案：当生产线控制器S控制现有基本生产线A时，数据组创建单元5将基本生产线A的第一处理配方1，处理数据2和检查数据3存储在数据库中 8相互匹配。当重新安装新的生产线B被控制时，第二处理配方提取单元7提取这样存储的第一处理配方1中的最佳的一个，并输出最佳的第一处理配方1作为新的生产线的第二处理配方9 B.由于生产稳定的基础生产线A的第一工艺配方1作为新生产线B的第二工艺配方9，新生产线B的生产稳定，产品质量达到参考水平。因此，在新的生产线B中不需要检查装置，并且可以降低生产成本。版权所有（C）2011，JPO＆INPIT

8. 发明专利

JP2010037076A Film separation device 审中-公开
标题翻译：电影分离装置
公开(公告)号：JP2010037076A
公开(公告)日：2010-02-18
申请号：JP2008203627
申请日：2008-08-06
申请人： Sharp Corp , シャープ株式会社
发明人： YAMANO ATSUO , ISHIDA JUNICHI , MORITA KENICHI , KUGA TORU , YAMATAKA HIRONORI , FURUKAWA MASANOBU , YOSHIDA MITSUNOBU
IPC分类号： B65H41/00 , B65H29/54
摘要： PROBLEM TO BE SOLVED: To provide a film separation device improving use efficiency of a collection vessel for putting a separated protective film therein by facilitating the handling of the separated protective film by reducing the exposed area of a pressure sensitive adhesive surface having stickiness in the protective film separated from a substrate. SOLUTION: This film separation device has a substrate holding means, first and second separation means, a substrate transfer means, and a control means for holding one substrate of sticking the protective film to a reverse side surface by the substrate holding means, transferring the other substrate to a predetermined position by the substrate transfer means so that the protective film sticking to an obverse side surface of the other substrate and the protective film sticking to the reverse side surface of the one substrate are opposed and controlling so as to simultaneously separate a reverse side protective film of the one substrate and an obverse side protective film of the other substrate by the first and second separation means. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种膜分离装置，通过减少具有粘性的压敏粘合剂表面的暴露面积，便于处理分离的保护膜，从而提高用于将分离的保护膜放入其中的收集容器的使用效率在与基材分离的保护膜中。解决方案：该膜分离装置具有基板保持装置，第一和第二分离装置，基板转印装置和用于通过基板保持装置将一个将保护膜粘贴到反面的基板的控制装置，通过基板转印装置将另一个基板转移到预定位置，使得粘附到另一基板的正面的保护膜和粘附到一个基板的反面的保护膜相对并控制以同时通过第一和第二分离装置分离一个基板的背面保护膜和另一个基板的正面保护膜。版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2008162783A Sucking/holding device and sucking/holding method 审中-公开
标题翻译：获取/保存设备和获取/保存方法
公开(公告)号：JP2008162783A
公开(公告)日：2008-07-17
申请号：JP2006356274
申请日：2006-12-28
申请人： Sharp Corp , シャープ株式会社
发明人： YAMANO ATSUO , ISHIDA JUNICHI , MORITA KENICHI
IPC分类号： B65G49/06 , B23P19/04 , B23P21/00 , G02F1/13
摘要： PROBLEM TO BE SOLVED: To provide a sucking/holding device sucking and holding a plate-like body by a sucking means, and arranging the plate-like body to a destination while preventing the misalignment of the plate-like body, and a sucking/holding method. SOLUTION: The sucking/holding device comprises: a first sucking means 10 preventing displacement of the plate-like body in an extending direction along a surface of the plate-like body; and a second sucking means 20 sucking and holding the plate-like body to be capable of being displaced in the extending direction along the surface of the plate-like body. The sucking/holding method includes a sucking step using the first sucking means 10 and the second sucking means 20. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过抽吸装置吸住和保持板状体的吸持/保持装置，并且将板状体排列到目的地，同时防止板状体的未对准，以及吸吮法。吸入保持装置包括：第一吸引装置10，其防止板状体沿着板状体的表面沿延伸方向位移; 以及第二吸引装置20，其吸取并保持板状体，以能够沿着板状体的表面在延伸方向上移位。吸入/保持方法包括使用第一吸入装置10和第二吸入装置20的吸取步骤。版权所有（C）2008，JPO＆INPIT

10. 发明专利

JP2006255532A Substrate washing nozzle, and method and apparatus for washing substrate 审中-公开
标题翻译：衬底洗涤喷嘴，以及洗涤衬底的方法和装置
公开(公告)号：JP2006255532A
公开(公告)日：2006-09-28
申请号：JP2005073736
申请日：2005-03-15
申请人： Sharp Corp , シャープ株式会社
发明人： MORITA KENICHI
IPC分类号： B08B3/02 , B05B1/04 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a substrate washing nozzle capable of preventing the curtain-like liquid film, which is ejected from a nozzle opening, from expanding into a tapered form and capable of allowing the ejection point of a nozzle to approach the surface of a substrate to eject it to the surface of the substrate at a low angle.
SOLUTION: The substrate washing nozzle 1 for ejecting a washing liquid toward the fed substrate to wash the surface of the substrate has a first nozzle opening 2 and a second nozzle opening 3 both of which extend in the direction crossing the feed direction of the substrate at a right angle to be formed into a slit-like shape so as to become almost parallel to each other. Liquid film flows 7a and 7b, which are formed by respectively ejecting the washing liquid from the first and second nozzle openings 2 and 3, are attracted to each other to form a single curtain-like liquid film flow 7c.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够防止从喷嘴开口喷射的帘状液膜膨胀成锥形并能够使喷嘴的喷射点接近的基板清洗喷嘴衬底的表面以低角度将其喷射到衬底的表面。解决方案：用于将洗涤液朝向供给基板喷射以洗涤基板的表面的基板清洗喷嘴1具有第一喷嘴开口2和第二喷嘴开口3，第一喷嘴开口2和第二喷嘴开口3在与进给基板的进给方向交叉的方向上延伸所述基板成直角，形成为狭缝状，以使其几乎平行。通过分别从第一和第二喷嘴开口2和3喷射清洗液而形成的液膜流7a和7b被彼此吸引以形成单个的帘式液膜流7c。版权所有（C）2006，JPO＆NCIPI

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式