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1. 发明申请

US20110023757A1 METHOD AND SYSTEM FOR LOCALLY CONTROLLING SUPPORT OF A FLAT OBJECT 有权
标题翻译：用于局部控制平面对象支持的方法和系统
公开(公告)号：US20110023757A1
公开(公告)日：2011-02-03
申请号：US12921336
申请日：2009-03-11
申请人： Hilel Richman , Oded Yehoshua Licht , Oded Hamburger , Yuval Yassour , Boaz Nishri , Arie Harnik , Alla Soudakovitch , Shay Levavy
发明人： Hilel Richman , Oded Yehoshua Licht , Oded Hamburger , Yuval Yassour , Boaz Nishri , Arie Harnik , Alla Soudakovitch , Shay Levavy
IPC分类号： A47B13/08
CPC分类号： B65G51/03 , B65H5/22 , B65H2406/112 , B65H2406/1132 , B65H2406/364
摘要： A non-contact support platform system is provided for supporting a substantially flat object. The system includes a platform with a first plurality of pressure ports and a first plurality of vacuum ports for inducing a fluid cushion to support the object at a distance from the platform. The system further includes a second plurality of pressure ports located at a predetermined zone of the platform for increasing the distance of the object from the platform at the predetermined zone.
摘要翻译：提供了用于支撑基本平坦的物体的非接触支撑平台系统。该系统包括具有第一多个压力端口的平台和用于引导流体垫以在离平台一定距离处支撑物体的第一多个真空端口。该系统还包括位于平台的预定区域处的第二多个压力端口，用于在预定区域增加物体与平台的距离。

2. 发明申请

US20070195653A1 Non-contact support platforms for distance adjustment 有权
标题翻译：用于距离调整的非接触式支撑平台
公开(公告)号：US20070195653A1
公开(公告)日：2007-08-23
申请号：US11578162
申请日：2005-04-13
申请人： Yuval Yassour , Arie Harnik , Hilel Richman
发明人： Yuval Yassour , Arie Harnik , Hilel Richman
IPC分类号： G11B11/00
CPC分类号： B65G49/065 , B24B37/30 , B65G2249/02 , B65G2249/04 , B65G2249/045 , F16C29/025 , H01L21/67784 , H01L21/6838 , H01L21/68714
摘要： An apparatus for supporting a stationary or moving substantially flat object without physical contact on an fluid-cushion. The object floats on a fluid cushion gap, the apparatus aimed for globally or locally adjusting the gap. The apparatus comprising: a first platform for supporting the object without contact, the platform having a substantially flat active surface comprised of one or more sectors, each sector comprising at least one of a plurality of basic cells, each basic cell having at least one of a plurality of pressure outlets fluidically connected through a pressure flow restrictors to a higher-pressure manifold associated with the sector in which the basic cell lies, the higher-pressure manifold is fluidically connected through main supply pipeline to pressurized fluid supply and at least one of a plurality of fluid-evacuation channels fluidically connected to a lower-pressure manifold associated with the sector in which the basic cell lies having main evacuation pipeline; wherein the flow restrictor characteristically exhibiting fluidic return spring behavior; and wherein at least one pressure control valve is interposed with at least one of the two main pipelines of at least one sector for controlling pressure levels of at least one of the two manifolds of that sector.
摘要翻译：一种用于支撑静止或移动的基本平坦的物体而不在液垫上物理接触的装置。物体漂浮在液体缓冲间隙上，该装置旨在全局或局部调整间隙。该装置包括：用于在不接触的情况下支撑物体的第一平台，所述平台具有由一个或多个扇区组成的基本上平坦的有源表面，每个扇区包括多个基本单元中的至少一个，每个基本单元具有至少一个多个压力出口，其通过压力限流器流体连接到与基本单元所在的扇区相关联的高压歧管，高压歧管通过主供应管线流体连接到加压流体供应器，并且至少一个流体连接到与基本单元所在的具有主排空管线的扇区相关联的低压歧管的多个流体排出通道; 其中所述限流器特征性地表现出流体回流弹簧的性能; 并且其中至少一个压力控制阀插入有至少一个扇区的两个主管线中的至少一个，用于控制该扇区的两个歧管中的至少一个歧管的压力水平。

3. 发明授权

US08690489B2 Method and system for locally controlling support of a flat object 有权
标题翻译：用于本地控制平面物体支撑的方法和系统
公开(公告)号：US08690489B2
公开(公告)日：2014-04-08
申请号：US12921336
申请日：2009-03-11
申请人： Hilel Richman , Oded Yehoshua Licht , Oded Hamburger , Yuval Yassour , Boaz Nishri , Arie Harnik , Alla Soudakovitch , Shay Levavy
发明人： Hilel Richman , Oded Yehoshua Licht , Oded Hamburger , Yuval Yassour , Boaz Nishri , Arie Harnik , Alla Soudakovitch , Shay Levavy
IPC分类号： B65G53/00
CPC分类号： B65G51/03 , B65H5/22 , B65H2406/112 , B65H2406/1132 , B65H2406/364
摘要： A non-contact support platform system is provided for supporting a substantially flat object. The system includes a platform with a first plurality of pressure ports and a first plurality of vacuum ports for inducing a fluid cushion to support the object at a distance from the platform. The system further includes a second plurality of pressure ports located at a predetermined zone of the platform for increasing the distance of the object from the platform at the predetermined zone.
摘要翻译：提供了用于支撑基本平坦的物体的非接触支撑平台系统。该系统包括具有第一多个压力端口的平台和用于引导流体垫以在离平台一定距离处支撑物体的第一多个真空端口。该系统还包括位于平台的预定区域处的第二多个压力端口，用于在预定区域增加物体与平台的距离。

4. 发明申请

US20080145190A1 Non-Contact Thermal Platforms 有权
标题翻译：非接触式热平台
公开(公告)号：US20080145190A1
公开(公告)日：2008-06-19
申请号：US10592763
申请日：2005-03-16
申请人： Yuval Yassour , Arie Harnik , Hilel Richman
发明人： Yuval Yassour , Arie Harnik , Hilel Richman
IPC分类号： B65G49/00 , B65G51/00
CPC分类号： H01L21/6838 , H01L21/00 , H01L21/67098 , H01L21/68714
摘要： A thermal treatment system comprising at least one apparatus for thermally treating an object, the apparatus comprising: one platform or two substantially opposite platforms, where at least one of the platforms has at least one thermal means for heating or cooling of the object; and at least one of the platforms has fluid-mechanical means for supporting the object without contact. The platform has an active surface comprising at least one of a plurality of basic cells, each basic cell having at least one of a plurality of pressure outlets and at least one of a plurality of fluid-evacuation channels. At least one of the pressure outlets of each basic cell is fluidically connected through a flow restrictor to a high-pressure fluid supply, the pressure outlets providing pressurized fluid for maintaining a fluid-cushion between the object and the active-surface of the platform. The f low restrictor characteristically exhibits fluidic return spring behavior. Each of the evacuation channels has an inlet and outlet, for locally balancing mass flow for the basic cells.
摘要翻译：一种热处理系统，包括至少一个用于热处理物体的装置，所述装置包括：一个平台或两个基本上相对的平台，其中至少一个平台具有用于加热或冷却物体的至少一个热装置; 并且所述平台中的至少一个具有用于不接触地支撑所述物体的流体 - 机械装置。该平台具有包括多个碱性细胞中的至少一个的活性表面，每个碱性细胞具有多个压力出口和多个排液通道中的至少一个。每个基本单元的压力出口中的至少一个通过限流器流体连接到高压流体供应源，压力出口提供加压流体，用于在物体和平台的活动表面之间维持流体缓冲。低限制器具有流体回弹性能。每个排气通道都有一个入口和出口，用于局部平衡基本电池的质量流量。

5. 发明授权

US07604439B2 Non-contact support platforms for distance adjustment 有权
标题翻译：用于距离调整的非接触式支撑平台
公开(公告)号：US07604439B2
公开(公告)日：2009-10-20
申请号：US11578162
申请日：2005-04-13
申请人： Yuval Yassour , Arie Harnik , Hilel Richman
发明人： Yuval Yassour , Arie Harnik , Hilel Richman
IPC分类号： B65G53/00
CPC分类号： B65G49/065 , B24B37/30 , B65G2249/02 , B65G2249/04 , B65G2249/045 , F16C29/025 , H01L21/67784 , H01L21/6838 , H01L21/68714
摘要： An apparatus for supporting a stationary or moving substantially flat object without physical contact on an fluid-cushion. The object floats on a fluid cushion gap, the apparatus aimed for globally or locally adjusting the gap. The apparatus comprising: a first platform for supporting the object without contact, the platform having a substantially flat active surface comprised of one or more sectors, each sector comprising at least one of a plurality of basic cells, each basic cell having at least one of a plurality of pressure outlets fluidically connected through a pressure flow restrictors to a higher-pressure manifold associated with the sector in which the basic cell lies, the higher-pressure manifold is fluidically connected through main supply pipeline to pressurized fluid supply and at least one of a plurality of fluid-evacuation channels fluidically connected to a lower-pressure manifold associated with the sector in which the basic cell lies having main evacuation pipeline; wherein the flow restrictor characteristically exhibiting fluidic return spring behavior; and wherein at least one pressure control valve is interposed with at least one of the two main pipelines of at least one sector for controlling pressure levels of at least one of the two manifolds of that sector.
摘要翻译：一种用于支撑静止或移动的基本平坦的物体而不在液垫上物理接触的装置。物体漂浮在液体缓冲间隙上，该装置旨在全局或局部调整间隙。该装置包括：用于在不接触的情况下支撑物体的第一平台，所述平台具有由一个或多个扇区组成的基本上平坦的有源表面，每个扇区包括多个基本单元中的至少一个，每个基本单元具有至少一个多个压力出口，其通过压力限流器流体连接到与基本单元所在的扇区相关联的高压歧管，高压歧管通过主供应管线流体连接到加压流体供应器，并且至少一个流体连接到与基本单元所在的具有主排空管线的扇区相关联的低压歧管的多个流体排出通道; 其中所述限流器特征性地表现出流体回流弹簧的性能; 并且其中至少一个压力控制阀插入有至少一个扇区的两个主管线中的至少一个，用于控制该扇区的两个歧管中的至少一个歧管的压力水平。

6. 发明授权

US07603028B2 Non-contact thermal platforms 有权
标题翻译：非接触热平台
公开(公告)号：US07603028B2
公开(公告)日：2009-10-13
申请号：US10592763
申请日：2006-09-14
申请人： Yuval Yassour , Arie Harnik , Hilel Richman
发明人： Yuval Yassour , Arie Harnik , Hilel Richman
IPC分类号： B05B1/24 , C23C16/00 , A47J45/00 , B65G25/00
CPC分类号： H01L21/6838 , H01L21/00 , H01L21/67098 , H01L21/68714
摘要： A thermal treatment system comprising at least one apparatus for thermally treating an object, the apparatus comprising: one platform or two substantially opposite platforms, where at least one of the platforms has at least one thermal means for heating or cooling of the object; and at least one of the platforms has fluid-mechanical means for supporting the object without contact. The platform has an active surface comprising at least one of a plurality of basic cells, each basic cell having at least one of a plurality of pressure outlets and at least one of a plurality of fluid-evacuation channels. At least one of the pressure outlets of each basic cell is fluidically connected through a flow restrictor to a high-pressure fluid supply, the pressure outlets providing pressurized fluid for maintaining a fluid-cushion between the object and the active-surface of the platform. The flow restrictor characteristically exhibits fluidic return spring behavior. Each of the evacuation channels has an inlet and outlet, for locally balancing mass flow for the basic cells.
摘要翻译：一种热处理系统，包括至少一个用于热处理物体的装置，所述装置包括：一个平台或两个基本上相对的平台，其中至少一个平台具有用于加热或冷却物体的至少一个热装置; 并且所述平台中的至少一个具有用于不接触地支撑所述物体的流体 - 机械装置。该平台具有包括多个碱性细胞中的至少一个的活性表面，每个碱性细胞具有多个压力出口和多个排液通道中的至少一个。每个基本单元的压力出口中的至少一个通过限流器流体连接到高压流体供应源，压力出口提供加压流体，用于在物体和平台的活动表面之间维持流体缓冲。流量限制器具有流体回流弹簧特性。每个排气通道都有一个入口和出口，用于局部平衡基本电池的质量流量。

7. 发明授权

US06084213A Method and apparatus for increasing temperature uniformity of heated wafers 失效
标题翻译：用于提高加热晶片温度均匀性的方法和装置
公开(公告)号：US06084213A
公开(公告)日：2000-07-04
申请号：US80402
申请日：1998-05-18
申请人： Gil Kohav , Igor Fidelman , Arie Harnik
发明人： Gil Kohav , Igor Fidelman , Arie Harnik
IPC分类号： H01L21/00 , H01L21/20
CPC分类号： H01L21/67115
摘要： A method and apparatus are described for increasing the temperature uniformity of a wafer heated in a rapid thermal process (RTP) while the wafer is supported by a high emissivity structure in spaced relation above the head during the heating of the wafer; characterized in that a high-reflectivity ring, highly reflective to the radiation of the wafer, is provided on the head underlying the high emissivity ring.
摘要翻译：描述了一种用于提高在快速热处理（RTP）中加热的晶片的温度均匀性的方法和装置，同时晶片在晶片的加热期间以高于头部的间隔关系支撑着高发射率结构; 其特征在于，在高发射率环上的头部上提供对晶片辐射高度反射的高反射率环。

8. 发明授权

US06313443B1 Apparatus for processing material at controlled temperatures 失效
标题翻译：用于在受控温度下处理材料的装置
公开(公告)号：US06313443B1
公开(公告)日：2001-11-06
申请号：US09294149
申请日：1999-04-20
申请人： Arie Harnik , Elie Schwarzfuchs , Eliezer Iskevitch
发明人： Arie Harnik , Elie Schwarzfuchs , Eliezer Iskevitch
IPC分类号： A21B100
CPC分类号： H01L21/67248 , H01L21/67098
摘要： Semiconductor processing apparatus, including a chamber, into which a semiconductor wafer is introduced for processing thereof and a heater, which heats the wafer in the chamber. A radiation guide collects thermal radiation from a selected region of the wafer. A wafer support assembly supports the wafer and shields the radiation guide from radiation other than radiation from the region. A pyrometer, coupled to receive the radiation from the guide, analyzes the radiation to determine a temperature of the region, for use in controlling the processing.
摘要翻译：半导体处理装置，包括其中引入半导体晶片以用于其处理的腔室和加热器，其加热腔室中的晶片。辐射导向器从晶片的选定区域收集热辐射。晶片支撑组件支撑晶片并且遮蔽辐射引导件不受来自该区域的辐射的辐射。耦合以接收来自引导件的辐射的高温计分析辐射以确定区域的温度，以用于控制处理。

9. 发明授权

US06362096B1 Wafer processing with water vapor pumping 失效
标题翻译：晶圆加工采用水蒸气抽吸
公开(公告)号：US06362096B1
公开(公告)日：2002-03-26
申请号：US09610778
申请日：2000-07-06
申请人： Arie Harnik , Michael Sandler , Itai Bransky
发明人： Arie Harnik , Michael Sandler , Itai Bransky
IPC分类号： C23C1624
CPC分类号： C23C16/4412 , C23C16/24
摘要： A method and apparatus for selectively depositing hemispherical grained silicon on the surface of a wafer in a process chamber. The chamber is evacuated so that a partial pressure of water vapor in the chamber is less than 10−7 torr, preferably using a turbomolecular pump and a water vapor pump in cooperation. A process gas mixture including silicon is introduced into the chamber. The surface of the wafer is seeded with silicon nuclei, and the wafer is annealed to convert the silicon to HSG.
摘要翻译：一种用于在处理室中的晶片表面上选择性地沉积半球形晶粒硅的方法和装置。腔室被排空，使得腔室中的水蒸气分压小于10 -7乇，最好是配合使用涡轮分子泵和水蒸汽泵。将包括硅的工艺气体混合物引入室中。将晶片的表面接种硅晶核，将晶片退火以将硅转化为HSG。

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