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    • 1. 发明授权
    • Manufacture of solid state imager having plurality of photosensors per each pixel
    • 每个像素具有多个光电传感器的固态成像器的制造
    • US06929972B2
    • 2005-08-16
    • US10858281
    • 2004-06-02
    • Yutaka TakeuchiKatsuhiro Shibata
    • Yutaka TakeuchiKatsuhiro Shibata
    • H01L27/148H01L31/10H04N5/335H04N5/369H04N5/372H01L21/00
    • H01L27/14812
    • A second conductivity type well is formed in a first conductivity type semiconductor substrate. Vertical CCD channels of the first conductivity type are formed in the second conductivity type well. Vertical transfer electrodes are formed above the vertical CCD channels to form vertical CCDs along with the vertical CCD channels. A first impurity diffusion layer is formed in the well by implanting first conductivity type impurities along a first direction crossing the normal direction of the semiconductor substrate. A second impurity diffusion layer is formed in the well by implanting first conductivity type impurities along a second direction crossing the normal direction of the semiconductor substrate. A third impurity diffusion layer of the second conductivity type is formed between the first and second impurity diffusion layer. A fourth impurity diffusion layer of the second conductivity type is formed in the well above the first to third impurity diffusion layers.
    • 在第一导电型半导体衬底中形成第二导电类型阱。 在第二导电类型井中形成第一导电类型的垂直CCD通道。 在垂直CCD通道上形成垂直传输电极,以形成垂直的CCD通道。 通过沿着与半导体衬底的法线方向交叉的第一方向注入第一导电型杂质,在阱中形成第一杂质扩散层。 通过沿着与半导体衬底的法线方向交叉的第二方向注入第一导电型杂质,在阱中形成第二杂质扩散层。 在第一和第二杂质扩散层之间形成第二导电类型的第三杂质扩散层。 在第一至第三杂质扩散层上方的阱中形成第二导电类型的第四杂质扩散层。
    • 5. 发明授权
    • Solid-state image pick-up device
    • 固态摄像装置
    • US06787824B2
    • 2004-09-07
    • US10464730
    • 2003-06-19
    • Yutaka TakeuchiKatsuhiro Shibata
    • Yutaka TakeuchiKatsuhiro Shibata
    • H01L2980
    • H01L27/14806H01L27/14627H01L31/02327
    • In a solid-state image pick-up device 10 in which a microlens layer 16 is provided on a surface of a semiconductor substrate 11 having photoelectric converting units 12H and 12L for storing an electric charge corresponding to an amount of incident light arranged vertically and horizontally, a microlens 16H to be provided on the microlens layer 16 is disposed on only the photoelectric converting unit 12H to be used as a pixel having a high sensitivity and the microlens layer 16 in a position facing the photoelectric converting unit 12L to be used as a residual pixel having a low sensitivity has a planar structure 16L or a perforated structure 16L.
    • 在固体摄像装置10中,在具有光电转换单元12H和12L的半导体衬底11的表面上设置有微透镜层16,用于存储对应于垂直和水平布置的入射光量的电荷 在微透镜层16上设置的微透镜16H仅设置在光电转换单元12H上,用作具有高灵敏度的像素,微透镜层16位于与光电转换单元12L相对的位置,用作为 具有低灵敏度的残余像素具有平面结构16L或多孔结构16L。
    • 9. 发明授权
    • Monolith supporting structure for use in catalytic converter
    • 用于催化转化器的单片支撑结构
    • US06685888B1
    • 2004-02-03
    • US09527466
    • 2000-03-17
    • Katsuhiro ShibataKen OouchiHidetoshi ItouKimiyoshi Nishizawa
    • Katsuhiro ShibataKen OouchiHidetoshi ItouKimiyoshi Nishizawa
    • B01D5334
    • F01N3/2853F01N3/2867
    • For resiliently and safely supporting a monolith in a housing, a supporting structure is proposed. An annular seat structure is defined in the housing. An annular resilient washer is made of wire mesh and is put on the annular seat structure for supporting thereon a circular peripheral edge of the monolith. A biasing structure biases the monolith toward the annular resilient washer to compress the washer. The washer has a generally rectangular cross section and has a chamfered surface around a circular outer surface thereof. The chamfered surface is positioned radially outside the circular peripheral edge of the monolith. With this, even when compressed by the monolith, the washer is prevented from producing a biasing force for pulling the circular peripheral edge of the monolith radially outward, and thus, damage of the edge is suppressed.
    • 为了弹性地和安全地将整体支撑在壳体中,提出了一种支撑结构。 在壳体中限定了环形座椅结构。 环形弹性垫圈由金属丝网制成,并放置在环形座椅结构上,用于在其上支撑整料的圆形周边边缘。 偏压结构将整料朝向环形弹性垫圈偏压以压紧垫圈。 垫圈具有大致矩形的横截面并且在其圆形外表面周围具有倒角表面。 倒角表面位于整料的圆形周边的径向外侧。 由此,即使在被整体压缩的情况下,也能够防止垫圈产生用于将整体的圆形周缘径向向外拉的偏压力,因此能够抑制边缘的损伤。