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1. 发明授权

US08791019B2 Metal polishing slurry and method of polishing a film to be polished 有权
标题翻译：金属抛光浆料及抛光方法
公开(公告)号：US08791019B2
公开(公告)日：2014-07-29
申请号：US12159419
申请日：2006-12-27
申请人： Yutaka Nomura , Hiroshi Nakagawa , Sou Anzai , Ayako Tobita , Takafumi Sakurada , Katsumi Mabuchi
发明人： Yutaka Nomura , Hiroshi Nakagawa , Sou Anzai , Ayako Tobita , Takafumi Sakurada , Katsumi Mabuchi
IPC分类号： H01L21/306 , C11D11/00 , H01L21/321 , C09G1/02
CPC分类号： C11D11/0047 , C09G1/02 , C09K3/1463 , H01L21/3212
摘要： The present invention provides a metal polishing liquid capable of CMP at a high Cu polishing rate and solving the problems: (a) generation of scratches attributable to solid particles, (b) generation of deteriorations in flatness such as dishing and erosion, (c) complexity in a washing process for removing abrasive particles remaining on the surface of a substrate after polishing, and (d) higher costs attributable to the cost of a solid abrasive itself and to waste liquid treatment, as well as a method of polishing a film to be polished by using the same. Disclosed are a metal polishing liquid which comprises a metal oxidizer, a metal oxide solubilizer, a metal anticorrosive, and a water-soluble polymer having an anionic functional group with a weight-average molecular weight of 8,000 or more and has pH 1 or more to 3 or less, and a method of polishing a film to be polished, which comprises supplying the above metal polishing liquid onto a polishing cloth of a polishing platen and simultaneously relatively moving the polishing platen and a substrate having a metallic film to be polished while the substrate is pressed against the polishing cloth.
摘要翻译：本发明提供一种能够以高Cu抛光速率进行CMP处理的金属抛光液，并且解决了以下问题：（a）产生由固体颗粒引起的划痕，（b）产生诸如凹陷和腐蚀的平坦度的劣化，（c）用于去除抛光后残留在基材表面上的磨料颗粒的洗涤过程中的复杂性，以及（d）由于固体磨料本身的成本和废液处理造成的更高成本，以及抛光膜的方法通过使用它来抛光。公开了一种金属抛光液，其包含金属氧化剂，金属氧化物增溶剂，金属防腐蚀剂和具有重均分子量为8000以上的阴离子官能团的水溶性聚合物，其pH为1以上至 3以下，以及抛光被研磨膜的方法，该方法包括将上述金属抛光液供给到研磨台板的研磨布上，同时相对移动研磨台板和具有待研磨金属膜的基板，同时基板被压在抛光布上。

2. 发明申请

US20100178765A1 Metal Polishing Slurry and Method of Polishing a Film to be Polished 有权
标题翻译：金属抛光浆料和抛光薄膜抛光方法
公开(公告)号：US20100178765A1
公开(公告)日：2010-07-15
申请号：US12159419
申请日：2006-12-27
申请人： Yutaka Nomura , Hiroshi Nakagawa , Sou Anzai , Ayako Tobita , Takafumi Sakurada , Katsumi Mabuchi
发明人： Yutaka Nomura , Hiroshi Nakagawa , Sou Anzai , Ayako Tobita , Takafumi Sakurada , Katsumi Mabuchi
IPC分类号： H01L21/304 , H01L21/306 , C09K13/00 , C09K13/06
CPC分类号： C11D11/0047 , C09G1/02 , C09K3/1463 , H01L21/3212
摘要： The present invention provides a metal polishing liquid capable of CMP at a high Cu polishing rate and solving the problems: (a) generation of scratches attributable to solid particles, (b) generation of deteriorations in flatness such as dishing and erosion, (c) complexity in a washing process for removing abrasive particles remaining on the surface of a substrate after polishing, and (d) higher costs attributable to the cost of a solid abrasive itself and to waste liquid treatment, as well as a method of polishing a film to be polished by using the same. Disclosed are a metal polishing liquid which comprises a metal oxidizer, a metal oxide solubilizer, a metal anticorrosive, and a water-soluble polymer having an anionic functional group with a weight-average molecular weight of 8,000 or more and has pH 1 or more to 3 or less, and a method of polishing a film to be polished, which comprises supplying the above metal polishing liquid onto a polishing cloth of a polishing platen and simultaneously relatively moving the polishing platen and a substrate having a metallic film to be polished while the substrate is pressed against the polishing cloth.
摘要翻译：本发明提供一种能够以高Cu抛光速率进行CMP处理的金属抛光液，并且解决了以下问题：（a）产生由固体颗粒引起的划痕，（b）产生诸如凹陷和腐蚀的平坦度的劣化，（c）用于去除抛光后残留在基材表面上的磨料颗粒的洗涤过程中的复杂性，以及（d）由于固体磨料本身的成本和废液处理造成的更高成本，以及抛光膜的方法通过使用它来抛光。公开了一种金属抛光液，其包含金属氧化剂，金属氧化物增溶剂，金属防腐蚀剂和具有重均分子量为8000以上的阴离子官能团的水溶性聚合物，其pH为1以上至 3以下，以及抛光被研磨膜的方法，该方法包括将上述金属抛光液供给到研磨台板的研磨布上，同时相对移动研磨台板和具有待研磨金属膜的基板，同时基板被压在抛光布上。

3. 发明申请

US20070147551A1 Abrasive-free polishing slurry and CMP process 审中-公开
标题翻译：无磨料抛光浆和CMP工艺
公开(公告)号：US20070147551A1
公开(公告)日：2007-06-28
申请号：US11643691
申请日：2006-12-22
申请人： Katsumi Mabuchi , Haruo Akahoshi , Masanobu Habiro , Takafumi Sakurada , Yutaka Nomura
发明人： Katsumi Mabuchi , Haruo Akahoshi , Masanobu Habiro , Takafumi Sakurada , Yutaka Nomura
IPC分类号： H03D1/00
CPC分类号： C09G1/04
摘要： A CMP slurry is mixed with an oxidant in polishing and contains a copper rust inhibitor, a water-soluble polymer, a pH controller capable of forming a complex with copper, and water, and is substantially free from abrasive. The CMP slurry effectively reduces dishing in chemical polishing of copper and forms reliable wiring. Preferably, the contents of the rust inhibitor, the water-soluble polymer, and the oxidant are 0.1 to 5 wt %, 0.05 to 5 wt %, and 0.01 to 5M relative to 1 liter of the CMP slurry, respectively, and the amount of the pH controller is a necessary amount for adjusting pH of the CMP slurry to 1.5 to 2.5.
摘要翻译：将CMP浆料与抛光中的氧化剂混合，并含有铜锈病抑制剂，水溶性聚合物，能够与铜形成络合物的pH控制剂和水，并且基本上不含研磨剂。 CMP浆料有效减少了铜化学抛光中的凹陷，形成了可靠的布线。防锈剂，水溶性聚合物和氧化剂的含量优选分别相对于1升CMP浆料为0.1〜5重量％，0.05〜5重量％，0.01〜5微米， pH控制器是将CMP浆料的pH调节至1.5至2.5的必需量。

4. 发明申请

US20100306886A1 Probe Microscope 审中-公开
标题翻译：探头显微镜
公开(公告)号：US20100306886A1
公开(公告)日：2010-12-02
申请号：US12789796
申请日：2010-05-28
申请人： Motoko HARADA , Kyoko Honbo , Katsumi Mabuchi
发明人： Motoko HARADA , Kyoko Honbo , Katsumi Mabuchi
IPC分类号： G01Q30/00
CPC分类号： G01Q60/44 , G01Q60/02
摘要： An object of the present invention is to provide a probe microscope that permits qualitative and quantitative evaluation on ions existing near the surface of a sample and permits to detect further simply and easily such as impurities, flaws and corrosion origins existing on the sample in high sensitivity. A probe microscope according to the present invention is provided with a test cell that holds a sample and permits to receive liquid, a probe, a counter electrode, a reference electrode, a drive mechanism that causes the probe to follow the surface of the sample as well as to scan the same, a potential control portion that controls a potential between the probe and the reference electrode and a current measuring portion that measures a current flowing between the probe and the counter electrode, and is characterized in that the material of the probe is constituted by a conductive body containing any of gold or gold alloy, carbon or carbon compound, boron, zinc, lead, tin and mercury.
摘要翻译：本发明的目的是提供一种探针显微镜，其允许对存在于样品表面附近的离子进行定性和定量评估，并且允许以高灵敏度进一步简单且容易地检测样品中存在的杂质，缺陷和腐蚀起源。。根据本发明的探针显微镜设置有容纳样品并允许接收液体，探针，对电极，参比电极，使探针跟随样品表面的驱动机构的测试电池，以及扫描相同的电位控制部分，其控制探针和参考电极之间的电势;以及电流测量部分，其测量在探针和对电极之间流动的电流，其特征在于探针的材料由含有金或金合金，碳或碳化合物，硼，锌，铅，锡和汞的导电体构成。

5. 发明授权

US6096137A Pickling plant and method of controlling the same 失效
标题翻译：酸洗厂及其控制方法
公开(公告)号：US6096137A
公开(公告)日：2000-08-01
申请号：US33243
申请日：1998-03-03
申请人： Katsumi Mabuchi , Tomoko Kikuchi , Yasunobu Kani , Tsuneo Nakamura , Shinichi Yokosuka
发明人： Katsumi Mabuchi , Tomoko Kikuchi , Yasunobu Kani , Tsuneo Nakamura , Shinichi Yokosuka
IPC分类号： C23G1/02 , C23G3/02 , B08B1/02 , B08B3/08 , C23G1/08
CPC分类号： C23G3/02 , C23G1/02
摘要： A pickling plant for a steel strip and a method for controlling the pickling plant, including monitoring at least one quantity of state represented by thickness, width and quantity of scale of the steel strip, and at least one quantity of state of operation of a plant represented by concentration, quantity and temperature of acid supplied into a pickling tank of the pickling plant, line speed of the steel strip, and temperature of the steel strip immediately before entering the pickling tank calculating on the basis of values of said quantity of state and quantity of state of operation, at least one of concentration distribution of acid, concentration distribution of iron and descaling rate at optional plural positions, and on the basis of the calculating the optimum quantity of state for operation of the plant is determined.
摘要翻译：用于钢带的酸洗设备和控制酸洗设备的方法，包括监测由钢带的厚度，宽度和数量表示的至少一种状态，以及至少一个工厂的运行状态以酸洗设备的酸洗槽供给的酸的浓度，数量和温度，钢带的线速度，以及刚刚进入酸洗槽之前的钢带的温度根据所述状态数量和确定操作状态的数量，确定酸的浓度分布，铁的浓度分布和任选的多个位置的除垢率中的至少一种，以及计算植物的最佳操作状态量的基础。

6. 发明授权

US08367573B2 Glass composition and its applications 有权
标题翻译：玻璃组成及其应用
公开(公告)号：US08367573B2
公开(公告)日：2013-02-05
申请号：US12366829
申请日：2009-02-06
申请人： Takashi Naito , Shinichi Tachizono , Kei Yoshimura , Hiroki Yamamoto , Hiroshi Yoshida , Shinji Yamada , Katsumi Mabuchi
发明人： Takashi Naito , Shinichi Tachizono , Kei Yoshimura , Hiroki Yamamoto , Hiroshi Yoshida , Shinji Yamada , Katsumi Mabuchi
IPC分类号： C03C3/21 , C03C8/00 , C03C8/14 , C03C8/08
CPC分类号： H01J9/261 , C03C3/062 , C03C3/21 , C03C8/24 , H01J17/183 , H01L31/022425 , Y02E10/50
摘要： A glass composition substantially free from lead and bismuth and containing vanadium oxide and phosphor oxide as main ingredients, wherein the sintered glass of the glass composition exhibits 109 Ωcm or more at 25° C.
摘要翻译：基本上不含铅和铋并含有氧化钒和磷氧化物作为主要成分的玻璃组合物，其中玻璃组合物的烧结玻璃在25℃下显示出109＆OHgr·cm或更高。

7. 发明申请

US20080105651A1 Polishing Slurry for Cmp 审中-公开
标题翻译：抛光浆料为Cmp
公开(公告)号：US20080105651A1
公开(公告)日：2008-05-08
申请号：US11572321
申请日：2005-08-09
申请人： Katsumi Mabuchi , Haruo Akahoshi , Yasuo Kamigata , Masanobu Habiro , Hiroshi Ono
发明人： Katsumi Mabuchi , Haruo Akahoshi , Yasuo Kamigata , Masanobu Habiro , Hiroshi Ono
IPC分类号： C09K13/00 , C03C15/00
CPC分类号： H01L21/3212 , C09G1/02
摘要： A polishing liquid for CMP has a composition loaded with, for example, an inorganic salt, a protective film forming agent and a surfactant capable of imparting a dissolution accelerating activity to enlarge a difference between polishing speed under non-load and polishing speed under load. By virtue of this polishing liquid for CMP, there can be simultaneously accomplished a speed increase for increasing CMP productivity, and wiring planarization for miniaturization and multilayer formation of wiring.
摘要翻译：用于CMP的抛光液具有负载有例如无机盐，保护膜形成剂和能够赋予溶解促进活性的表面活性剂的组合物，以增加负载下的抛光速度和负载下的抛光速度之间的差异。由于该CMP用抛光液，可以同时实现提高CMP生产率的速度增加，以及用于小型化和布线的多层形成的布线平面化。

8. 发明申请

US20070153419A1 Perpendicular magnetic record medium and magnetic storage system 审中-公开
标题翻译：垂直磁记录介质和磁存储系统
公开(公告)号：US20070153419A1
公开(公告)日：2007-07-05
申请号：US11645252
申请日：2006-12-21
申请人： Reiko Arai , Katsumi Mabuchi , Mitsuhiro Shoda , Hiroyuki Matsumoto , Hiroyuki Nakagawa
发明人： Reiko Arai , Katsumi Mabuchi , Mitsuhiro Shoda , Hiroyuki Matsumoto , Hiroyuki Nakagawa
IPC分类号： G11B5/74 , G11B5/02
CPC分类号： G11B5/4555 , G11B5/7379
摘要： Embodiments in accordance with the invention realize a perpendicular magnetic record medium with a high media S/N and excellent corrosion resistance. In a perpendicular magnetic record medium in accordance with an embodiment of the present invention prepared by forming an adhesion layer, an underlayer, a seed layer, an intermediate layer, and a recording layer sequentially on a substrate, the seed layer is specified to have a laminated structure consisting of a first seed layer and a second seed layer. The first seed layer consists of an amorphous alloy containing Cr and the second seed layer consists of an amorphous alloy predominantly composed of Ni with an fcc structure.
摘要翻译：根据本发明的实施例实现了具有高介质S / N和优异耐腐蚀性的垂直磁记录介质。在根据本发明的实施例的垂直磁记录介质中，通过在基板上依次形成粘合层，底层，种子层，中间层和记录层而制备，种子层被规定为具有层叠结构由第一种子层和第二种子层构成。第一晶种层由含有Cr的非晶合金构成，第二晶种层由主要由具有fcc结构的Ni构成的非晶合金构成。

9. 发明申请

US20070059584A1 Electrode for use in electrochemical device, solid electrolyte/electrode assembly, and production method thereof 失效
标题翻译：用于电化学装置的电极，固体电解质/电极组件及其制造方法
公开(公告)号：US20070059584A1
公开(公告)日：2007-03-15
申请号：US11518204
申请日：2006-09-11
申请人： Hiroshi Nakano , Hiroshi Yoshida , Masatoshi Sugimasa , Katsumi Mabuchi , Haruo Akahoshi
发明人： Hiroshi Nakano , Hiroshi Yoshida , Masatoshi Sugimasa , Katsumi Mabuchi , Haruo Akahoshi
IPC分类号： H01M4/02 , H01M4/86 , C25B11/02
CPC分类号： C25D1/00 , C25D1/006 , C25D9/04 , C25D11/02 , C25D11/045 , G01N27/4045 , H01M4/0404 , H01M4/134 , H01M4/32 , H01M4/38 , H01M4/387 , H01M4/8807 , H01M4/8817 , H01M4/8853 , H01M4/92 , H01M10/0525 , Y02E60/122
摘要： In an electrode in electrochemical device, particularly an anode lithium ion secondary battery, a cathode for use in alkali storage battery, an electrode for use in fuel cell, or a capacitor electrode, a metal structure has nano size micro-pillars is constructed with an electrode active material being formed on the surface of the metal structure. The metal structure having nano size micro-pillars can be formed, for example, by forming a metal layer as an electrode material by plating to the surface of a substrate having pores and then removing the substrate by dissolution, the metal filled in the pores of the substrate to form a group of micro-pillars. And the active material can be formed by depositing metal by plating. Since the active material is in direct contact with the conductive skeleton, the conducting agent for connecting the active materials to each other may not be added at all.
摘要翻译：在电化学装置中的电极中，特别是阳极锂离子二次电池，碱性蓄电池用阴极，燃料电池用电极或电容电极中，金属结构具有纳米尺寸的微柱，电极活性材料形成在金属结构的表面上。具有纳米尺寸微柱的金属结构可以通过例如通过将具有孔的基板的表面电镀形成作为电极材料的金属层，然后通过溶解除去基板而形成，底物形成一组微柱。并且活性物质可以通过电镀沉积金属而形成。由于活性物质与导电骨架直接接触，所以可能根本不添加用于将活性物质彼此连接的导电剂。

10. 发明授权

US5472579A Hot-rolled steel strip manufacturing and descaling method and apparatus 失效
标题翻译：热轧钢带制造及除垢方法及装置
公开(公告)号：US5472579A
公开(公告)日：1995-12-05
申请号：US289267
申请日：1994-08-11
申请人： Katsumi Mabuchi , Masahiro Itoh , Eizi Kashimura , Tsuneo Nakamura
发明人： Katsumi Mabuchi , Masahiro Itoh , Eizi Kashimura , Tsuneo Nakamura
IPC分类号： B21B1/26 , B21B1/28 , B21B1/46 , B21B27/00 , B21B45/06 , C25F1/06 , C25F7/00
CPC分类号： B21B45/06 , C25F1/06 , B21B1/26 , B21B1/28 , B21B1/46 , B21B27/00
摘要： This invention provides a method and an apparatus for removing scales from hot-rolled steel strips to produce steel strips with excellent surface conditions. In a pickling facility to pickle the hot-rolled steel strip, the pickling method of this invention passes an electric current through the continuously fed, hot-rolled steel strip in one or more of a plurality of pickling tanks. A means to supply an electric current is also provided.
摘要翻译：本发明提供一种用于从热轧钢带去除氧化皮的方法和装置，以产生具有优异表面条件的钢带。在酸洗设备中，酸洗该热轧钢带，本发明的酸洗方法使电流通过连续供给的多个酸洗槽中的一个或多个的热轧钢带。还提供了提供电流的装置。

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