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1. 发明授权

US07955545B2 Nano-imprinting process 有权
标题翻译：纳米压印过程
公开(公告)号：US07955545B2
公开(公告)日：2011-06-07
申请号：US11897859
申请日：2007-08-31
申请人： Yung-Chun Lee , Fei-Bin Hsiao , Cheng-Yu Chiu
发明人： Yung-Chun Lee , Fei-Bin Hsiao , Cheng-Yu Chiu
IPC分类号： B29C59/00
CPC分类号： B29C59/022 , B29C2059/023 , Y10S977/887
摘要： A nano-imprinting process is described, comprising: providing a substrate including an imprinting material layer covering a surface of the substrate; providing a mold including protruding features set on a surface of the mold covered with an anti-adhesion layer; forming a transferring material layer on a top surface of each protruding feature; embedding the transferring material layer into a first portion of the imprinting material layer; removing the mold and separating the mold and the transferring material layer simultaneously to transfer the transferring material layer into the first portion of the imprinting material layer and to expose a second portion of the imprinting material layer; using the transferring material layer as a mask to remove the second portion of the imprinting material layer and a portion of the substrate; and removing the first portion of the imprinting material layer and the transferring material layer.
摘要翻译：描述了纳米压印方法，其包括：提供包括覆盖所述基板的表面的压印材料层的基板; 提供包括设置在模具的表面上的突出特征的模具，其覆盖有防粘附层; 在每个突出特征的顶表面上形成转印材料层; 将转印材料层嵌入到压印材料层的第一部分中; 去除模具并同时分离模具和转移材料层，以将转印材料层转印到压印材料层的第一部分中并暴露压印材料层的第二部分; 使用转印材料层作为掩模以去除压印材料层的第二部分和基板的一部分; 并移除压印材料层和转印材料层的第一部分。

2. 发明申请

US20080296803A1 Nano-imprinting process 有权
标题翻译：纳米压印过程
公开(公告)号：US20080296803A1
公开(公告)日：2008-12-04
申请号：US11897859
申请日：2007-08-31
申请人： Yung-Chun Lee , Fei-Bin Hsiao , Cheng-Yu Chiu
发明人： Yung-Chun Lee , Fei-Bin Hsiao , Cheng-Yu Chiu
IPC分类号： B29C41/22
CPC分类号： B29C59/022 , B29C2059/023 , Y10S977/887
摘要： A nano-imprinting process is described, comprising: providing a substrate including an imprinting material layer covering a surface of the substrate; providing a mold including protruding features set on a surface of the mold covered with an anti-adhesion layer; forming a transferring material layer on a top surface of each protruding feature; embedding the transferring material layer into a first portion of the imprinting material layer; removing the mold and separating the mold and the transferring material layer simultaneously to transfer the transferring material layer into the first portion of the imprinting material layer and to expose a second portion of the imprinting material layer; using the transferring material layer as a mask to remove the second portion of the imprinting material layer and a portion of the substrate; and removing the first portion of the imprinting material layer and the transferring material layer.
摘要翻译：描述了纳米压印方法，包括：提供包括覆盖基材表面的压印材料层的基板; 提供包括设置在模具的表面上的突出特征的模具，其覆盖有防粘附层; 在每个突出特征的顶表面上形成转印材料层; 将转印材料层嵌入到压印材料层的第一部分中; 去除模具并同时分离模具和转移材料层，以将转印材料层转印到压印材料层的第一部分中并暴露压印材料层的第二部分; 使用转印材料层作为掩模以去除压印材料层的第二部分和基板的一部分; 并移除压印材料层和转印材料层的第一部分。

3. 发明申请

US20080217819A1 Micro/Nano-Pattern Film Contact Transfer Process 审中-公开
标题翻译：微/纳米图案膜接触传递过程
公开(公告)号：US20080217819A1
公开(公告)日：2008-09-11
申请号：US11779997
申请日：2007-07-19
申请人： Yung-Chun Lee , Chuan-Pu Liu , Fei-Bin Hsiao , Chun-Hung Chen , Cheng-Yu Chiu
发明人： Yung-Chun Lee , Chuan-Pu Liu , Fei-Bin Hsiao , Chun-Hung Chen , Cheng-Yu Chiu
IPC分类号： B29C59/16
CPC分类号： B29C37/0067 , B29C35/0888 , B29C59/022 , B29C59/16 , B29C2035/0822 , B29C2035/0838 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A micro/nano-pattern film contact transfer process is described, comprising: providing a mold, wherein an imprinting pattern is set in a first surface of the mold; forming a release layer on the first surface of the mold and a transfer material layer on the release layer; providing a substrate; placing the mold on a first surface of the substrate, wherein the first surface of the mold is opposite to the first surface of the substrate; applying a pre-pressed force on the substrate from a second surface opposite to the first surface of the substrate; providing a heating source to heat the transfer material layer to produce an adhesion effect between a portion of the transfer material layer contacting with the first surface of the substrate and the substrate; and removing the mold, wherein the contacting portion of the transfer material layer is transferred onto the first surface of the substrate.
摘要翻译：描述了微/纳米图案膜接触转移方法，包括：提供模具，其中将压印图案设置在模具的第一表面中; 在模具的第一表面上形成剥离层和在脱模层上形成转印材料层; 提供衬底; 将模具放置在基板的第一表面上，其中模具的第一表面与基板的第一表面相对; 从与所述基板的所述第一表面相对的第二表面施加预压力在所述基板上; 提供加热源以加热所述转移材料层以在所述转印材料层的与所述基板的所述第一表面接触的部分与所述基板之间产生粘附效应; 并且移除模具，其中转印材料层的接触部分被转印到基底的第一表面上。

4. 发明授权

US08617658B2 Method and apparatus for conducting film coating on surface of spinning circular workpiece under action of gas pressure, and nozzle utilized in the same 失效
标题翻译：在气压作用下在旋转圆形工件的表面上进行薄膜涂覆的方法和装置，以及在其中使用的喷嘴
公开(公告)号：US08617658B2
公开(公告)日：2013-12-31
申请号：US12732661
申请日：2010-03-26
申请人： Yung-Chun Lee , Chuan-Hsiang Lee , Shou-Chi Cho
发明人： Yung-Chun Lee , Chuan-Hsiang Lee , Shou-Chi Cho
IPC分类号： B05D3/04 , B05D3/12
CPC分类号： B05C9/12 , B05C5/0241 , B05C11/021 , B05C11/08 , B05D1/002 , B05D1/26 , B05D3/042
摘要： This invention relates to a method for conducting film coating on the surface of spinning circular workpiece under action of gas pressure, and nozzle utilized in the same. Circular workpiece to be coated is held on a rotating mechanism, and a feedstock loading machine having a nozzle, which is capable of guiding redundant feedstock and overflowing in a specific direction, is set to have a 100 μm gap with the circular workpiece. When the rotating mechanism is rotated, the polymer solution is precoated on the surface of the circular workpiece, and when gas valve is opened, the polymer solution is squeezed to a predetermined thickness by an annular high pressure gas-stream formed on the periphery of a cylinder, produced from the high pressure gas released.
摘要翻译：本发明涉及一种在气压作用下在旋转圆形工件的表面上进行膜涂覆的方法，以及在其中使用的喷嘴。要被涂覆的圆形工件被保持在旋转机构上，并且具有能够引导冗余原料并沿特定方向溢出的喷嘴的原料装载机被设定为与圆形工件具有100毫米间隙。当旋转机构旋转时，将聚合物溶液预涂在圆形工件的表面上，并且当打开气阀时，聚合物溶液通过形成在圆形工件的周边上的环形高压气流挤压到预定厚度气瓶，由高压气体释放出来。

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