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1. 发明授权

US08598587B2 Optical sensor 有权
标题翻译：光学传感器
公开(公告)号：US08598587B2
公开(公告)日：2013-12-03
申请号：US13209188
申请日：2011-08-12
申请人： Yun Jong Yeo , Hong-Kee Chin , Byeong Hoon Cho , Ki-Hun Jeong , Jung Suk Bang , Woong Kwon Kim , Sung Ryul Kim , Dae Cheol Kim , Kun-Wook Han
发明人： Yun Jong Yeo , Hong-Kee Chin , Byeong Hoon Cho , Ki-Hun Jeong , Jung Suk Bang , Woong Kwon Kim , Sung Ryul Kim , Dae Cheol Kim , Kun-Wook Han
IPC分类号： H01L31/0376
CPC分类号： G06F3/0412 , G06F3/0421 , G06F2203/04103
摘要： An optical sensor preventing damage to a semiconductor layer, and preventing a disconnection and a short circuit of a source electrode and a drain electrode, and a manufacturing method of the optical sensor is provided. The optical sensor includes: a substrate; an infrared ray sensing thin film transistor including a first semiconductor layer disposed on the substrate; a visible ray sensing thin film transistor including a second semiconductor layer disposed on the substrate; a switching thin film transistor including a third semiconductor layer disposed on the substrate; and a semiconductor passivation layer enclosing an upper surface and a side surface of an end portion of at least one of the first semiconductor layer, the second semiconductor layer, and the third semiconductor layer.
摘要翻译：提供了防止半导体层损坏并防止源电极和漏极的断开和短路的光学传感器以及光学传感器的制造方法。光学传感器包括：基板; 包括设置在所述基板上的第一半导体层的红外线感测薄膜晶体管; 包括设置在所述基板上的第二半导体层的可见光线感测薄膜晶体管; 开关薄膜晶体管，其包括设置在所述基板上的第三半导体层; 以及半导体钝化层，其包围第一半导体层，第二半导体层和第三半导体层中的至少一个的端部的上表面和侧面。

2. 发明申请

US20120182277A1 DISPLAY PANEL HAVING EMBEDDED LIGHT SENSORS 有权
标题翻译：具有嵌入式光传感器的显示面板
公开(公告)号：US20120182277A1
公开(公告)日：2012-07-19
申请号：US13300358
申请日：2011-11-18
申请人： Ki-Hun JEONG , Woongkwon Kim , Yunjong Yeo , Sungryul Kim , Byeonghoon Cho , Heejoon Kim , Daecheol Kim , Hong-Kee Chin , Jung Suk Bang , Kun-Wook Han
发明人： Ki-Hun JEONG , Woongkwon Kim , Yunjong Yeo , Sungryul Kim , Byeonghoon Cho , Heejoon Kim , Daecheol Kim , Hong-Kee Chin , Jung Suk Bang , Kun-Wook Han
IPC分类号： G09G5/00
CPC分类号： G06F3/0412
摘要： A display panel includes a plurality of pixels disposed on a first panel substrate of first and second panel substrates that face each other and cooperate to display an image. The second panel substrate includes a base substrate, a read-out line, a first insulating layer, a scan line, a switching device, and a light sensor. The read-out line is disposed on the base substrate and extended in a direction. The first insulating layer is disposed on the read-out line. The scan line is extended to cross the read-out line and disposed on the first insulating layer. The switching device includes a first electrode connected to the scan line, a second electrode connected to a read-out line, and a third electrode spaced apart from the second electrode. The light sensor is structured to selectively detect lights of predetermined wavelengths and connected to the third electrode of the switching device.
摘要翻译：显示面板包括多个像素，其设置在第一和第二面板基板的彼此面对并配合以显示图像的第一面板基板上。第二面板基板包括基底基板，读出线，第一绝缘层，扫描线，开关器件和光传感器。读出线设置在基底基板上并沿一个方向延伸。第一绝缘层设置在读出线上。扫描线被延伸以跨过读出线并且设置在第一绝缘层上。开关装置包括连接到扫描线的第一电极，连接到读出线的第二电极和与第二电极间隔开的第三电极。光传感器被构造成选择性地检测预定波长的光并连接到开关装置的第三电极。

3. 发明授权

US06746826B1 Method for an improved developing process in wafer photolithography 有权
标题翻译：晶圆光刻技术改进显影工艺的方法
公开(公告)号：US06746826B1
公开(公告)日：2004-06-08
申请号：US09624712
申请日：2000-07-25
申请人： Jae Heon Park , Jung Suk Bang
发明人： Jae Heon Park , Jung Suk Bang
IPC分类号： G03C500
CPC分类号： G03F7/3021
摘要： Methods and apparatus are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. A method for achieving a more uniform, quasi-equilibrium succession of states from the introduction of developer chemical to the wafer surface to its removal is also described. The method reduces process-induced defects and improves critical dimension (CD) control.
摘要翻译：描述了用于改善液体聚合物和其它材料的产量和线宽性能的方法和装置。通过降低pH的突然变化来最小化显影反应物的沉淀的方法包括：用显影剂流体的初始电荷在基底上显影至少一部分聚合物层; 然后用额外的显影剂流体冲洗聚合物，以便可控地最小化随后的pH的突然变化; 然后用另一种流体的电荷冲洗聚合物。还描述了从引入显影剂化学品到晶片表面到其去除的实现更均匀的准平衡连续状态的方法。该方法减少了工艺引起的缺陷并改善了临界尺寸（CD）控制。

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