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1. 发明申请

US20120274931A1 DEFECT DETECTION METHOD AND DEFECT DETECTION DEVICE AND DEFECT OBSERVATION DEVICE PROVIDED WITH SAME 有权
标题翻译：缺陷检测方法和缺陷检测装置和缺陷检测装置
公开(公告)号：US20120274931A1
公开(公告)日：2012-11-01
申请号：US13510300
申请日：2010-11-12
申请人： Yuko Otani , Takehiro Tachizaki , Masahiro Watanabe , Shunichi Matsumoto
发明人： Yuko Otani , Takehiro Tachizaki , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G01N21/88
CPC分类号： G01N21/8806 , G01N21/21 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/8848 , G01N2201/06113 , G01N2201/063
摘要： The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of a smaller scale. The electron microscope (5), which observes defects detected by an optical appearance-inspecting device or by an optical defect-inspecting device, has a configuration wherein an optimal microscope (14) that re-detects defects is incorporated, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope (14). The electron microscope (5), which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration wherein an optimal microscope (14) that re-detects defects is incorporated, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope (14).
摘要翻译：所公开的使用电子显微镜等精细观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的装置可以将观察到的缺陷可靠地插入电子显微镜领域或喜欢，可以是一个规模较小的设备。观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜（5）具有结合有重新检测缺陷的最佳显微镜（14），以及空间滤波器当使用该光学显微镜（14）进行暗视场观察时，在瞳平面处插入分布偏振元件。观察由光学外观检查装置或光学缺陷检查装置检测到的缺陷的电子显微镜（5）具有结合重新检测缺陷的最佳显微镜（14），并且插入分配滤波器在使用该光学显微镜（14）进行暗视场观察时在瞳孔平面上。

2. 发明授权

US08953156B2 Defect detection method and defect detection device and defect observation device provided with same 有权
公开(公告)号：US08953156B2
公开(公告)日：2015-02-10
申请号：US13510300
申请日：2010-11-12
申请人： Yuko Otani , Takehiro Tachizaki , Masahiro Watanabe , Shunichi Matsumoto
发明人： Yuko Otani , Takehiro Tachizaki , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G01N21/00 , G01N21/95 , G01N21/21 , G01N21/956 , G01N21/88
CPC分类号： G01N21/8806 , G01N21/21 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/8848 , G01N2201/06113 , G01N2201/063
摘要： The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of a smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or by an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration wherein an optical microscope that re-detects defects is incorporated, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

3. 发明授权

US07092348B2 Optical recording apparatus capable of changing the length of synchronization portions 有权
标题翻译：能够改变同步部分的长度的光学记录装置
公开(公告)号：US07092348B2
公开(公告)日：2006-08-15
申请号：US11176339
申请日：2005-07-08
申请人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
发明人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G11B7/24 , G11B5/09
CPC分类号： G11B20/1217 , G11B7/0045 , G11B7/00454 , G11B7/006 , G11B7/00718 , G11B7/00745 , G11B7/013 , G11B20/10009 , G11B20/12 , G11B2020/10898 , G11B2020/1285 , G11B2020/1287 , G11B2020/1288 , G11B2220/216 , G11B2220/2537
摘要： A method for recording information on a rewritable recording medium includes recording synchronizing signal information in a synchronizing signal portion on the medium, recording data information in a data portion of the medium after the synchronizing signal portion by forming marks in the data portion, and substantially randomly inverting the marks and spaces between the marks each time the information is recorded. The marks for particular areas of the medium are different in a physical property from other areas of the medium and data information is recorded in association with both ends of each of the marks. Upon rewriting of at least the recorded synchronizing signal information, a length of the synchronizing signal portion changes and a start position of the synchronizing signal portion changes, and wherein a change of the synchronizing signal information start position is smaller than a change of the length of the synchronizing signal portion.
摘要翻译：一种用于在可重写记录介质上记录信息的方法包括：将同步信号信息记录在介质上的同步信号部分中，通过在数据部分中形成标记，将数据信息记录在同步信号部分之后的介质的数据部分中，每次记录信息时，反转标记和标记之间的空格。介质的特定区域的标记在物理属性与介质的其他区域不同，并且与每个标记的两端相关联地记录数据信息。在重写至少记录的同步信号信息时，同步信号部分的长度改变，并且同步信号部分的开始位置改变，并且其中同步信号信息开始位置的改变小于同步信号部分。

4. 发明授权

US07084990B2 Method and its apparatus for measuring size and shape of fine patterns 有权
公开(公告)号：US07084990B2
公开(公告)日：2006-08-01
申请号：US10372270
申请日：2003-02-25
申请人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
发明人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G01B11/03
CPC分类号： G01B11/02 , G01B11/24
摘要： In size measurement of a semiconductor device, profiles of a pattern formed in a resist process are determined through an exposure/development simulation in respect of individual different combinations of exposure values and focus values to form a profile matrix and scattered light intensity distributions corresponding to the individual profiles are determined through calculation to form a scattered light library, thereby forming a profile library consisting of the profile matrix and scattered light library. A scattered light intensity distribution of an actually measured pattern is compared with the scattered light intensity distributions of the scattered light library and a profile of profile matrix corresponding to a scattered light intensity distribution of scattered light library having the highest coincidence is determined as a three-dimensional shape of the actually measured pattern.

5. 发明申请

US20050243684A1 Information recording method and apparatus 有权
标题翻译：信息记录方法和装置
公开(公告)号：US20050243684A1
公开(公告)日：2005-11-03
申请号：US11176339
申请日：2005-07-08
申请人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
发明人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G11B7/00 , G11B7/0045 , G11B7/006 , G11B7/007 , G11B7/013 , G11B20/10 , G11B20/12
CPC分类号： G11B20/1217 , G11B7/0045 , G11B7/00454 , G11B7/006 , G11B7/00718 , G11B7/00745 , G11B7/013 , G11B20/10009 , G11B20/12 , G11B2020/10898 , G11B2020/1285 , G11B2020/1287 , G11B2020/1288 , G11B2220/216 , G11B2220/2537
摘要： A method for recording information on a rewritable recording medium includes recording synchronizing signal information in a synchronizing signal portion on the medium, recording data information in a data portion of the medium after the synchronizing signal portion by forming marks in the data portion, and substantially randomly inverting the marks and spaces between the marks each time the information is recorded. The marks for particular areas of the medium are different in a physical property from other areas of the medium and data information is recorded in association with both ends of each of the marks. Upon rewriting of at least the recorded synchronizing signal information, a length of the synchronizing signal portion changes and a start position of the synchronizing signal portion changes, and wherein a change of the synchronizing signal information start position is smaller than a change of the length of the synchronizing signal portion.
摘要翻译：一种用于在可重写记录介质上记录信息的方法包括：将同步信号信息记录在介质上的同步信号部分中，通过在数据部分中形成标记，将数据信息记录在同步信号部分之后的介质的数据部分中，每次记录信息时，反转标记和标记之间的空格。介质的特定区域的标记在物理属性与介质的其他区域不同，并且与每个标记的两端相关联地记录数据信息。在重写至少记录的同步信号信息时，同步信号部分的长度改变，并且同步信号部分的开始位置改变，并且其中同步信号信息开始位置的改变小于同步信号部分。

6. 发明授权

US07075884B2 Optical recording apparatus capable of changing the length of synchronization portions 失效
标题翻译：能够改变同步部分的长度的光学记录装置
公开(公告)号：US07075884B2
公开(公告)日：2006-07-11
申请号：US11176320
申请日：2005-07-08
申请人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
发明人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G11B7/24
CPC分类号： G11B20/1217 , G11B7/0045 , G11B7/00454 , G11B7/006 , G11B7/00718 , G11B7/00745 , G11B7/013 , G11B20/10009 , G11B20/12 , G11B2020/10898 , G11B2020/1285 , G11B2020/1287 , G11B2020/1288 , G11B2220/216 , G11B2220/2537
摘要： A method for recording information on a rewritable recording medium includes recording first synchronizing signal information in a first synchronizing signal portion on the rewritable recording medium, recording second synchronizing signal information in a second synchronizing signal portion following the first synchronizing signal portion on the rewritable recording medium, recording data information in a data portion of the rewritable recording medium after the second synchronizing signal portion by forming marks in the data portion. The data information corresponds to both ends of each the marks. The marks and spaces between the marks are substantially randomly inverted each time the information is recorded and a length of the first synchronizing signal portion changes and a start position of the first synchronizing signal portion changes. A change of the start position of the first synchronizing signal portion is smaller than a change of the length of the first synchronizing signal portion.
摘要翻译：一种用于在可重写记录介质上记录信息的方法包括在可重写记录介质上的第一同步信号部分中记录第一同步信号信息，在可重写记录介质上的第一同步信号部分之后的第二同步信号部分中记录第二同步信号信息通过在数据部分中形成标记，将数据信息记录在第二同步信号部分之后的可重写记录介质的数据部分中。数据信息对应于每个标记的两端。每当信息被记录并且第一同步信号部分的长度改变并且第一同步信号部分的开始位置改变时，标记之间的标记和间隔基本上随机反转。第一同步信号部分的开始位置的改变小于第一同步信号部分的长度的变化。

7. 发明申请

US20050243683A1 Information recording method and apparatus 失效
标题翻译：信息记录方法和装置
公开(公告)号：US20050243683A1
公开(公告)日：2005-11-03
申请号：US11176320
申请日：2005-07-08
申请人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
发明人： Hideaki Sasazawa , Tohishiko Nakata , Masahiro Watanabe , Shunichi Matsumoto
IPC分类号： G11B7/00 , G11B7/0045 , G11B7/006 , G11B7/007 , G11B7/013 , G11B20/10 , G11B20/12
CPC分类号： G11B20/1217 , G11B7/0045 , G11B7/00454 , G11B7/006 , G11B7/00718 , G11B7/00745 , G11B7/013 , G11B20/10009 , G11B20/12 , G11B2020/10898 , G11B2020/1285 , G11B2020/1287 , G11B2020/1288 , G11B2220/216 , G11B2220/2537
摘要： A method for recording information on a rewritable recording medium includes recording first synchronizing signal information in a first synchronizing signal portion on the rewritable recording medium, recording second synchronizing signal information in a second synchronizing signal portion following the first synchronizing signal portion on the rewritable recording medium, recording data information in a data portion of the rewritable recording medium after the second synchronizing signal portion by forming marks in the data portion. The data information corresponds to both ends of each the marks. The marks and spaces between the marks are substantially randomly inverted each time the information is recorded and a length of the first synchronizing signal portion changes and a start position of the first synchronizing signal portion changes. A change of the start position of the first synchronizing signal portion is smaller than a change of the length of the first synchronizing signal portion.
摘要翻译：一种用于在可重写记录介质上记录信息的方法包括在可重写记录介质上的第一同步信号部分中记录第一同步信号信息，在可重写记录介质上的第一同步信号部分之后的第二同步信号部分中记录第二同步信号信息通过在数据部分中形成标记，将数据信息记录在第二同步信号部分之后的可重写记录介质的数据部分中。数据信息对应于每个标记的两端。每当信息被记录并且第一同步信号部分的长度改变并且第一同步信号部分的开始位置改变时，标记之间的标记和间隔基本上随机反转。第一同步信号部分的开始位置的改变小于第一同步信号部分的长度的变化。

8. 发明授权

US06909930B2 Method and system for monitoring a semiconductor device manufacturing process 有权
标题翻译：用于监测半导体器件制造工艺的方法和系统
公开(公告)号：US06909930B2
公开(公告)日：2005-06-21
申请号：US10124412
申请日：2002-04-18
申请人： Chie Shishido , Yuji Takagi , Masahiro Watanabe , Yasuhiro Yoshitake , Shunichi Matsumoto , Takashi Iizumi , Osamu Komuro , Maki Tanaka , Hidetoshi Morokuma
发明人： Chie Shishido , Yuji Takagi , Masahiro Watanabe , Yasuhiro Yoshitake , Shunichi Matsumoto , Takashi Iizumi , Osamu Komuro , Maki Tanaka , Hidetoshi Morokuma
IPC分类号： H01L21/00 , G06F19/00
CPC分类号： H01L21/67276
摘要： To realize a method for detecting variations in conditions (drift of the exposure and drift of the focus) in exposure equipment at a product wafer level in lithography process, the process is specified in such a way that calculation results of feature quantities such as electron beam images, line profiles, dimensions, etc. under various sets of the exposure and the focus are stored as a library, and an electron beam image of the product wafer is compared with these pieces of data in the library so that detection of drifts of the exposure and the focus a check of the results on the screen can easily be performed.
摘要翻译：为了实现用于在光刻工艺中在产品晶片级的曝光设备中检测条件变化（曝光漂移和焦点偏移）的方法，以这样的方式指定特征量的计算结果，例如电子束将各种曝光和焦点下的图像，线轮廓，尺寸等存储为库，并将产品晶片的电子束图像与库中的这些数据进行比较，以便检测到曝光和重点检查屏幕上的结果可以很容易地执行。

9. 发明授权

US08970836B2 Defect inspecting apparatus and defect inspecting method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US08970836B2
公开(公告)日：2015-03-03
申请号：US14235916
申请日：2012-05-14
申请人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
发明人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
IPC分类号： G01N21/00 , G01N21/95 , G01N21/956 , G01N21/21 , G01N21/88 , G01B11/06
CPC分类号： G01N21/95 , G01B11/0641 , G01N21/211 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/9513 , G02F1/1303 , G02F1/136259
摘要： An invention being applied is a defect detecting apparatus that has: an illuminating optical system with a laser light source for irradiating a sample on whose surface a pattern is formed with light; a detecting optical system with a sensor for detecting light generated from the sample illuminated by the illuminating optical system; and a signal processing unit that extracts a defect from an image based on the light detected by the detecting optical system, in which an amplification rate of the sensor is dynamically changed during a time when the light is detected by the detecting optical system.
摘要翻译：一种应用的发明是一种缺陷检测装置，其具有：具有激光光源的照明光学系统，用于对其表面形成有图案的样品进行照射; 检测光学系统，其具有用于检测由照明光学系统照射的样本产生的光的传感器; 以及信号处理单元，其基于由检测光学系统检测到的光的时间期间传感器的放大率动态地改变的检测光学系统检测到的光，从图像中提取缺陷。

10. 发明申请

US20140268122A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20140268122A1
公开(公告)日：2014-09-18
申请号：US14232929
申请日：2012-06-28
申请人： Shunichi Matsumoto , Atsushi Taniguchi , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
发明人： Shunichi Matsumoto , Atsushi Taniguchi , Toshifumi Honda , Yukihiro Shibata , Yuta Urano
IPC分类号： G01N21/95
CPC分类号： G01N21/9501 , G01N21/956 , G01N2201/126 , G01N2201/127 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A defect inspection method and device for irradiating a linear region on a surface-patterned sample mounted on a planarly movable table, with illumination light from an inclined direction relative to a direction of a line normal to the sample, next detecting in each of a plurality of directions an image of the light scattered from the sample irradiated with the illumination light, then processing signals obtained by the detection of the images of the scattered light, and thereby detecting a defect present on the sample; wherein the step of detecting the scattered light image in the plural directions is performed through elliptical lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light, the elliptical lenses being formed of circular lenses having left and right portions thereof cut.
摘要翻译：一种用于照射安装在平面可移动台上的表面图案样品上的线性区域的缺陷检查方法和装置，其具有相对于垂直于样品的线的方向的倾斜方向的照明光，接下来在多个指示从照射光照射的样品散射的光的图像，然后处理通过检测散射光的图像而获得的信号，从而检测样品上存在的缺陷; 其特征在于，所述检测多个方向的散射光图像的步骤是通过椭圆形透镜进行的，所述椭圆透镜在光学轴的仰角彼此不同的垂直于与所述表的表面法线形成的平面的一个平面内在其上安装样品和用照射光照射的线性区域的纵向方向，椭圆形透镜由其左侧和右侧部分切割的圆形透镜形成。

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