会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • THIN FILM CAPACITOR AND METHOD FOR FABRICATING THE SAME
    • 薄膜电容器及其制造方法
    • US20050040516A1
    • 2005-02-24
    • US10331140
    • 2002-12-27
    • Yukio SakashitaKyung-Ku Choi
    • Yukio SakashitaKyung-Ku Choi
    • H01G4/10H01G4/12H01G4/228H01G4/32H01G4/33H01L21/02H01L27/01H01L29/76
    • H01G4/33H01G4/10H01G4/228H01L27/016H01L28/57H01L28/65
    • A thin film capacitor according to the present invention includes a first electrode structural body, a second electrode structural body and a dielectric thin film provided between the first electrode structural body and the second electrode structural body and containing a bismuth layer structured compound. The surface of the first electrode structural body in contact with the dielectric thin film is oriented in the [001] direction. As a result, the orientation of the bismuth layer structured compound contained in the dielectric thin film in the [001] direction, namely, the c axis direction thereof, can be improved. Therefore, when a voltage is applied between the first electrode structural body and the second electrode structural body, since the direction of the electric field substantially coincides with the c axis of bismuth layer structured compound, the bismuth layer structured compound can be prevented from exhibiting the ferroelectric property and made to sufficiently exhibit the paraelectric property. Further, since a bismuth oxide layer (Bi2O2)2+ functions as an insulating layer, the insulation property of the dielectric thin film can be improved, whereby the dielectric thin film can be made much thinner. Since it is therefore possible to simultaneously make a thin film capacitor small and the capacitance thereof great, the thin film capacitor can be preferably used as a decoupling capacitor, in particular, a decoupling capacitor for an LSI having a high operating frequency.
    • 根据本发明的薄膜电容器包括第一电极结构体,第二电极结构体和设置在第一电极结构体和第二电极结构体之间并且含有铋层结构化合物的电介质薄膜。 与电介质薄膜接触的第一电极结构体的表面在[001]方向上取向。 结果,可以提高包含在电介质薄膜中的[001]方向即其c轴方向的铋层结构化合物的取向。 因此,当在第一电极结构体和第二电极结构体之间施加电压时,由于电场方向基本上与铋层结构化合物的c轴重合,所以可以防止铋层结构化合物表现出 铁电性能充分显现出顺电特性。 此外,由于氧化铋层(Bi 2 O 2)2+作为绝缘层发挥功能,所以能够提高电介质薄膜的绝缘性,能够使电介质薄膜变薄。 因此,由于可以同时使薄膜电容器小而且容量大,因此薄膜电容器可以优选用作去耦电容器,特别是用于具有高工作频率的LSI的去耦电容器。
    • 2. 发明授权
    • Thin film capacitor and method for fabricating the same
    • 薄膜电容器及其制造方法
    • US06876536B2
    • 2005-04-05
    • US10331140
    • 2002-12-27
    • Yukio SakashitaKyung-Ku Choi
    • Yukio SakashitaKyung-Ku Choi
    • H01G4/10H01G4/12H01G4/228H01G4/32H01G4/33H01L21/02H01L27/01H01L29/76
    • H01G4/33H01G4/10H01G4/228H01L27/016H01L28/57H01L28/65
    • A thin film capacitor including a first electrode structural body, a second electrode structural body and a dielectric thin film provided between the first and second electrode structural bodies and containing a bismuth layer structured compound. The surface of the first electrode structural body in contact with the dielectric thin film is oriented in the [001] direction. As a result, the dielectric thin film is naturally oriented so that its c axis is substantially perpendicular to the electrode structural bodies. When a voltage is applied between the first and second electrode structural bodies, since the direction of the electric field substantially coincides with the c axis of the bismuth layer structured compound, the bismuth layer structured compound can be prevented from exhibiting the ferroelectric property and made to sufficiently exhibit the paraelectric property. Further, a bismuth oxide layer (Bi2O2)2+ functions as an insulating layer, thereby improves the insulation property of the dielectric thin film while makes the thin film much thinner.
    • 一种薄膜电容器,包括第一电极结构体,第二电极结构体和设置在第一和第二电极结构体之间并且包含铋层结构化合物的电介质薄膜。 与电介质薄膜接触的第一电极结构体的表面在[001]方向上取向。 结果,电介质薄膜被天然地取向为使其c轴基本垂直于电极结构体。 当在第一和第二电极结构体之间施加电压时,由于电场方向基本上与铋层结构化合物的c轴重合,所以可以防止铋层结构化合物表现出铁电性质, 充分展现了顺电特性。 此外,氧化铋层(Bi 2 O 2)2+充当绝缘层,从而提高电介质薄膜的绝缘性,同时使薄膜更薄。