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1. 发明授权

US09255793B2 Defect inspection method and device thereof 有权
标题翻译：缺陷检查方法及其装置
公开(公告)号：US09255793B2
公开(公告)日：2016-02-09
申请号：US13521086
申请日：2011-02-09
申请人： Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
发明人： Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
IPC分类号： G01N21/55 , G06F19/00 , G01B11/30 , G01N21/956 , H01L21/67
CPC分类号： G01B11/303 , G01N21/956 , H01L21/67288
摘要： A defect inspection device includes an irradiation unit for simultaneously irradiating different regions on a sample with illumination light under different optical conditions, the sample being predesigned to include patterns repeatedly formed thereupon, wherein the patterns are to be formed in the same shape; a detection unit for detecting, for each of the different regions, a beam of light reflected from each region irradiated with the illumination light; a defect candidate extraction unit for extracting defect candidates under the different optical conditions for each of the different regions, by processing detection signals corresponding to the reflected light which is detected; a defect extraction unit for extracting defects by integrating the defect candidates extracted under the different optical conditions; and a defect classifying unit for calculating feature quantities of the extracted defects and classifies the defects according to the calculated feature quantities.
摘要翻译：缺陷检查装置包括：照射单元，用于在不同光学条件下用照明光同时照射样品上的不同区域，所述样品被预先设计为包括在其上重复形成的图案，其中所述图案将被形成为相同的形状; 检测单元，用于针对每个所述不同区域检测从照射光照射的每个区域反射的光束; 缺陷候选提取单元，用于通过处理与检测到的反射光相对应的检测信号来提取在不同区域的不同光学条件下的缺陷候选; 缺陷提取单元，用于通过对在不同光学条件下提取的缺陷候选进行积分来提取缺陷; 以及缺陷分类单元，用于计算提取的缺陷的特征量，并根据所计算的特征量对缺陷进行分类。

2. 发明申请

US20120092657A1 METHOD OF DEFECT INSPECTION AND DEVICE OF DEFECT INSPECTION 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US20120092657A1
公开(公告)日：2012-04-19
申请号：US13265935
申请日：2010-04-22
申请人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
发明人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
IPC分类号： G01N21/88
CPC分类号： G01N21/95623 , G01N21/95607 , G01N2021/8822 , G01N2201/062 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of inspecting defects and a device inspecting defects of detecting defects at high sensitivity and high capture efficiency even on various patterns existing on a wafer. In the device of inspecting defects, an illumination optical system is formed of two systems of a coherent illumination of a laser 5 and an incoherent illumination of LEDs 6a, 6b, 6c and 6d, and light paths are divided in a detecting system corresponding to respective illumination light, spatial modulation elements 55a and 55b are arranged to detecting light paths, respectively, scattered light inhibiting sensitivity is shielded by the spatial modulating elements 55a and 55b, scattered light transmitted through the spatial modulation elements 55a and 55b is detected by image sensors 90a and 90b arranged to respective light paths, and images detected by these two image sensors 90a and 90b are subjected to a comparison processing, thereby determining a defect candidate.
摘要翻译：一种检测缺陷的方法，以及即使在晶片上存在的各种图案，也可以检测高灵敏度和高捕获效率的缺陷检测缺陷。在检查缺陷的装置中，照明光学系统由激光器5的相干照明和LED 6a，6b，6c和6d的非相干照明的两个系统形成，并且光路被分成对应于相应的照明光，空间调制元件55a和55b分别被布置成检测光路，散射光抑制灵敏度被空间调制元件55a和55b屏蔽，传播通过空间调制元件55a和55b的散射光被图像传感器90a检测和90b，并且由这两个图像传感器90a和90b检测到的图像进行比较处理，从而确定缺陷候选。

3. 发明授权

US08804112B2 Method of defect inspection and device of defect inspection 有权
标题翻译：缺陷检查方法和缺陷检查装置
公开(公告)号：US08804112B2
公开(公告)日：2014-08-12
申请号：US13265935
申请日：2010-04-22
申请人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
发明人： Yukihiro Shibata , Toshihiko Nakata , Taketo Ueno , Atsushi Taniguchi , Toshifumi Honda
IPC分类号： G01N21/00
CPC分类号： G01N21/95623 , G01N21/95607 , G01N2021/8822 , G01N2201/062 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A method of inspecting defects and a device inspecting defects of detecting defects at high sensitivity and high capture efficiency even on various patterns existing on a wafer. In the device of inspecting defects, an illumination optical system is formed of two systems of a coherent illumination of a laser 5 and an incoherent illumination of LEDs 6a, 6b, 6c and 6d, and light paths are divided in a detecting system corresponding to respective illumination light, spatial modulation elements 55a and 55b are arranged to detecting light paths, respectively, scattered light inhibiting sensitivity is shielded by the spatial modulating elements 55a and 55b, scattered light transmitted through the spatial modulation elements 55a and 55b is detected by image sensors 90a and 90b arranged to respective light paths, and images detected by these two image sensors 90a and 90b are subjected to a comparison processing, thereby determining a defect candidate.
摘要翻译：一种检测缺陷的方法，以及即使在晶片上存在的各种图案，也可以检测高灵敏度和高捕获效率的缺陷检测缺陷。在检查缺陷的装置中，照明光学系统由激光器5的相干照明和LED 6a，6b，6c和6d的非相干照明的两个系统形成，并且光路被分成对应于相应的照明光，空间调制元件55a和55b分别被布置成检测光路，散射光抑制灵敏度被空间调制元件55a和55b屏蔽，传播通过空间调制元件55a和55b的散射光被图像传感器90a检测和90b，并且由这两个图像传感器90a和90b检测到的图像进行比较处理，从而确定缺陷候选。

4. 发明授权

US08970836B2 Defect inspecting apparatus and defect inspecting method 有权
标题翻译：缺陷检查装置和缺陷检查方法
公开(公告)号：US08970836B2
公开(公告)日：2015-03-03
申请号：US14235916
申请日：2012-05-14
申请人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
发明人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
IPC分类号： G01N21/00 , G01N21/95 , G01N21/956 , G01N21/21 , G01N21/88 , G01B11/06
CPC分类号： G01N21/95 , G01B11/0641 , G01N21/211 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/9513 , G02F1/1303 , G02F1/136259
摘要： An invention being applied is a defect detecting apparatus that has: an illuminating optical system with a laser light source for irradiating a sample on whose surface a pattern is formed with light; a detecting optical system with a sensor for detecting light generated from the sample illuminated by the illuminating optical system; and a signal processing unit that extracts a defect from an image based on the light detected by the detecting optical system, in which an amplification rate of the sensor is dynamically changed during a time when the light is detected by the detecting optical system.
摘要翻译：一种应用的发明是一种缺陷检测装置，其具有：具有激光光源的照明光学系统，用于对其表面形成有图案的样品进行照射; 检测光学系统，其具有用于检测由照明光学系统照射的样本产生的光的传感器; 以及信号处理单元，其基于由检测光学系统检测到的光的时间期间传感器的放大率动态地改变的检测光学系统检测到的光，从图像中提取缺陷。

5. 发明申请

US20140233024A1 Defect Inspecting Apparatus and Defect Inspecting Method 有权
标题翻译：缺陷检查仪器和缺陷检查方法
公开(公告)号：US20140233024A1
公开(公告)日：2014-08-21
申请号：US14235916
申请日：2012-05-14
申请人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
发明人： Atsushi Taniguchi , Taketo Ueno , Shunichi Matsumoto , Yukihiro Shibata , Toshifumi Honda
IPC分类号： G01N21/95
CPC分类号： G01N21/95 , G01B11/0641 , G01N21/211 , G01N21/9501 , G01N21/95607 , G01N21/95623 , G01N2021/8822 , G01N2021/9513 , G02F1/1303 , G02F1/136259
摘要： An invention being applied is a defect detecting apparatus that has: an illuminating optical system with a laser light source for irradiating a sample on whose surface a pattern is formed with light; a detecting optical system with a sensor for detecting light generated from the sample illuminated by the illuminating optical system; and a signal processing unit that extracts a defect from an image based on the light detected by the detecting optical system, in which an amplification rate of the sensor is dynamically changed during a time when the light is detected by the detecting optical system.
摘要翻译：一种应用的发明是一种缺陷检测装置，其具有：具有激光光源的照明光学系统，用于对其表面形成有图案的样品进行照射; 检测光学系统，其具有用于检测由照明光学系统照射的样本产生的光的传感器; 以及信号处理单元，其基于由检测光学系统检测到的光的时间期间传感器的放大率动态地改变的检测光学系统检测到的光，从图像中提取缺陷。

6. 发明申请

US20120296576A1 DEFECT INSPECTION METHOD AND DEVICE THEREOF 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US20120296576A1
公开(公告)日：2012-11-22
申请号：US13521086
申请日：2011-02-09
申请人： Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
发明人： Yukihiro Shibata , Toshifumi Honda , Taketo Ueno , Atsushi Taniguchi
IPC分类号： G01N21/55 , G06F19/00
CPC分类号： G01B11/303 , G01N21/956 , H01L21/67288
摘要： The present invention relates to a defect inspection device which includes: irradiating means for simultaneously irradiating different regions on a sample with illumination light under different optical conditions, the sample being predesigned to include patterns repeatedly formed thereupon, wherein the patterns are to be formed in the same shape; detection means for detecting, for each of the different regions, a beam of light reflected from each region irradiated with the illumination light; defect candidate extraction means for extracting defect candidates under the different optical conditions for each of the different regions, by processing detection signals corresponding to the reflected light which is detected; defect extraction means for extracting defects by integrating the defect candidates extracted under the different optical conditions; and defect classifying means for calculating feature quantities of the extracted defects and classifies the defects according to the calculated feature quantities.
摘要翻译：缺陷检查装置技术领域本发明涉及一种缺陷检查装置，包括：照射装置，用于在不同光学条件下用照明光同时照射样品上的不同区域，所述样品被预先设计为包括在其上重复形成的图案，其中，图案将形成在相同的形状; 检测装置，用于针对每个不同区域检测从照射光照射的每个区域反射的光束; 缺陷候选提取装置，用于通过处理与所检测的反射光相对应的检测信号，提取在不同区域的不同光学条件下的缺陷候选; 缺陷提取装置，用于通过对在不同光学条件下提取的缺陷候选进行积分来提取缺陷; 以及用于计算提取的缺陷的特征量并根据计算的特征量对缺陷进行分类的缺陷分类装置。

7. 发明授权

US09182592B2 Optical filtering device, defect inspection method and apparatus therefor 有权
标题翻译：光学滤波装置，缺陷检查方法及其装置
公开(公告)号：US09182592B2
公开(公告)日：2015-11-10
申请号：US13983310
申请日：2012-02-03
申请人： Taketo Ueno , Toshihiko Nakata , Yukihiro Shibata , Shun'ichi Matsumoto , Atsushi Taniguchi , Hiroshi Toshiyoshi , Takuya Takahashi , Kentaro Motohara
发明人： Taketo Ueno , Toshihiko Nakata , Yukihiro Shibata , Shun'ichi Matsumoto , Atsushi Taniguchi , Hiroshi Toshiyoshi , Takuya Takahashi , Kentaro Motohara
IPC分类号： G01N21/00 , G02B26/02 , G01N21/956 , G01N21/95
CPC分类号： G02B26/02 , G01N21/9501 , G01N21/956
摘要： An optical filtering device and an optical inspection apparatus for detecting a defect in a high sensitivity using an optical filtering device which includes a shutter array formed in a two-dimensionally on an optically opaque thin film produced on a SOI wafer and the SOI wafer is removed at portions thereof on the lower side of the shutter patterns to form perforation portions while working electrodes are formed at the remaining portion of the SOI wafer, a glass substrate having electrode patterns formed on the surface thereof and having the shutter array mounted thereon, and a power supply section for supplying electric power to the electrode patterns formed on the glass substrate and the working electrodes of the SOI wafer. And the working electrodes is controlled to cause the shutter patterns to carry out opening and closing movements with respect to the perforation portions to carry out optical filtering.
摘要翻译：使用光学滤波装置来检测高灵敏度的缺陷的光学滤波装置和光学检查装置，该光学滤波装置包括在SOI晶片和SOI晶片上制造的光学不透明薄膜上二维地形成的快门阵列在闸板图案的下侧的部分处形成穿孔部分，同时在SOI晶片的剩余部分处形成工作电极，在其表面上形成有安装有快门阵列的电极图案的玻璃基板，以及电源部分，用于向形成在玻璃基板上的电极图案和SOI晶片的工作电极提供电力。并且控制工作电极以使快门图案相对于穿孔部分进行打开和关闭运动以进行光学过滤。

8. 发明授权

US08885037B2 Defect inspection method and apparatus therefor 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US08885037B2
公开(公告)日：2014-11-11
申请号：US13375239
申请日：2010-07-01
申请人： Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Toshihiko Nakata
发明人： Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Toshihiko Nakata
IPC分类号： H04N9/47 , G01J4/00 , G01N21/00 , G06K9/00 , G01N37/00 , G01N21/95 , G01N21/956
CPC分类号： G01N21/956 , G01N21/9501
摘要： To effectively utilize the polarization property of an inspection subject for obtaining higher inspection sensitivity, for the polarization of lighting, it is necessary to observe differences in the reflection, diffraction, and scattered light from the inspection subject because of polarization by applying light having the same elevation angle and wavelength in the same direction but different polarization. According to conventional techniques, a plurality of measurements by changing polarizations is required to cause a prolonged inspection time period that is an important specification of inspection apparatuses. In this invention, a plurality of polarization states are modulated in micro areas in the lighting beam cross section, images under a plurality of polarized lighting conditions are collectively acquired by separately and simultaneously forming the scattered light from the individual micro areas in the individual pixels of a sensor, whereby inspection sensitivity and sorting and sizing accuracy are improved without reducing throughput.
摘要翻译：为了有效地利用检查对象的偏振特性以获得更高的检测灵敏度，对于照明的偏振，需要观察来自检查对象的反射，衍射和散射光的差异，因为通过施加具有相同的光的偏振仰角和波长相同但偏振不同。根据常规技术，需要通过改变极化的多个测量来引起作为检查设备的重要规格的延长的检查时间段。在本发明中，在照明光束横截面的微小区域中调制多个偏振状态，通过分别并且同时形成来自各个像素中的各个微区域的散射光，共同地获得多个偏振光照条件下的图像传感器，从而在不降低生产能力的情况下提高检测灵敏度和分选和尺寸精度。

9. 发明授权

US08681328B2 Dark-field defect inspecting method, dark-field defect inspecting apparatus, aberration analyzing method, and aberration analyzing apparatus 有权
标题翻译：暗场缺陷检查方法，暗场缺陷检查装置，像差分析方法和像差分析装置
公开(公告)号：US08681328B2
公开(公告)日：2014-03-25
申请号：US13142328
申请日：2010-01-20
申请人： Atsushi Taniguchi , Taketo Ueno , Yukihiro Shibata , Shunji Maeda , Tetsuya Matsui
发明人： Atsushi Taniguchi , Taketo Ueno , Yukihiro Shibata , Shunji Maeda , Tetsuya Matsui
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/4788 , G01N21/93 , G01N21/94 , G01N21/956 , G01N2021/8822
摘要： By including an illumination system and a detection system, an information collecting function of monitoring an environment, such as temperature and atmospheric pressure, and an apparatus state managing function having a feedback function of comparing the monitoring result and a design value, a theoretical calculation value or an ideal value derived from simulation results and calibrating an apparatus so that the monitoring result is brought close to the ideal value, a unit for keeping the apparatus state and apparatus sensitivity constant is provided. A control unit 800 is configured to include a recording unit 801, a comparing unit 802, a sensitivity predicting unit 803, and a feedback control unit 804. In the comparing unit 802, the monitoring result transmitted from the recording unit 801 and an ideal value stored in a database 805 are compared with each other. When a difference between the ideal value and the monitoring result exceeds a predetermined threshold, the feedback control unit 804 corrects the illumination system and the detection system.
摘要翻译：通过包括照明系统和检测系统，监视诸如温度和大气压力之类的环境的信息收集功能，以及具有比较监视结果和设计值的反馈功能的设备状态管理功能，理论计算值或者从模拟结果导出的理想值，并且对设备进行校准，使得监视结果接近理想值，提供用于保持设备状态和设备灵敏度恒定的单元。控制单元800被配置为包括记录单元801，比较单元802，灵敏度预测单元803和反馈控制单元804.在比较单元802中，从记录单元801发送的监视结果和理想值存储在数据库805中进行比较。当理想值与监视结果之间的差异超过预定阈值时，反馈控制单元804校正照明系统和检测系统。

10. 发明申请

US20120092484A1 DEFECT INSPECTION METHOD AND APPARATUS THEREFOR 有权
标题翻译：缺陷检查方法及其设备
公开(公告)号：US20120092484A1
公开(公告)日：2012-04-19
申请号：US13375239
申请日：2010-07-01
申请人： Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Toshihiko Nakata
发明人： Atsushi Taniguchi , Yukihiro Shibata , Taketo Ueno , Toshihiko Nakata
IPC分类号： H04N7/18
CPC分类号： G01N21/956 , G01N21/9501
摘要： To effectively utilize the polarization property of an inspection subject for obtaining higher inspection sensitivity, for the polarization of lighting, it is necessary to observe differences in the reflection, diffraction, and scattered light from the inspection subject because of polarization by applying light having the same elevation angle and wavelength in the same direction but different polarization. According to conventional techniques, a plurality of measurements by changing polarizations is required to cause a prolonged inspection time period that is an important specification of inspection apparatuses. In this invention, a plurality of polarization states are modulated in micro areas in the lighting beam cross section, images under a plurality of polarized lighting conditions are collectively acquired by separately and simultaneously forming the scattered light from the individual micro areas in the individual pixels of a sensor, whereby inspection sensitivity and sorting and sizing accuracy are improved without reducing throughput.
摘要翻译：为了有效地利用检查对象的偏振特性以获得更高的检测灵敏度，对于照明的偏振，需要观察来自检查对象的反射，衍射和散射光的差异，因为通过施加具有相同的光的偏振仰角和波长相同但偏振不同。根据常规技术，需要通过改变极化的多个测量来引起作为检查设备的重要规格的延长的检查时间段。在本发明中，在照明光束横截面的微小区域中调制多个偏振状态，通过分别并且同时形成来自各个像素中的各个微区域的散射光，共同地获得多个偏振光照条件下的图像传感器，从而在不降低生产能力的情况下提高检测灵敏度和分选和尺寸精度。

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