会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • SEMICONDUCTOR DEVICE
    • 半导体器件
    • US20120012861A1
    • 2012-01-19
    • US13258452
    • 2010-03-23
    • Yuki NakanoShuhei MitaniMineo Miura
    • Yuki NakanoShuhei MitaniMineo Miura
    • H01L29/24
    • H01L29/7816H01L29/045H01L29/1045H01L29/1095H01L29/1608H01L29/4236H01L29/42376H01L29/4238H01L29/45H01L29/66068H01L29/7811H01L29/7813
    • A semiconductor device including a semiconductor layer of a first conductivity type; a plurality of body regions of a second conductivity type, each formed in a region extending from the surface of the semiconductor layer to a halfway portion of the same in the thickness direction, and each spaced apart from each other in a direction perpendicular to the thickness direction; source regions of the first conductivity type, each formed on the surface layer part of each body region and spaced away from the edges of each body region; a gate insulating film formed on the semiconductor layer; and gate electrodes formed on the gate insulating film. In the semiconductor layer, trenches extending between two neighboring source regions are formed by digging from the source of the semiconductor layer, the inside surface of the trenches are covered by the gate insulating film, and the gate electrodes comprise surface-facing parts, which face the surface of the semiconductor layer, and buried parts, which are buried in the trenches.
    • 一种半导体器件,包括第一导电类型的半导体层; 多个第二导电类型的主体区域,各自形成在从半导体层的表面延伸到其厚度方向的中间部分的区域中,并且在垂直于厚度的方向上彼此间隔开 方向; 源区域,每个源区域形成在每个体区域的表面层部分上并与每个身体区域的边缘隔开; 形成在所述半导体层上的栅极绝缘膜; 以及形成在栅极绝缘膜上的栅电极。 在半导体层中,通过从半导体层的源进行挖掘来形成在两个相邻的源极区之间延伸的沟槽,沟槽的内表面被栅极绝缘膜覆盖,并且栅电极包括面向表面的部分 半导体层的表面和埋在沟槽中的埋藏部分。
    • 2. 发明授权
    • Semiconductor device
    • 半导体器件
    • US08546814B2
    • 2013-10-01
    • US13258452
    • 2010-03-23
    • Yuki NakanoShuhei MitaniMineo Miura
    • Yuki NakanoShuhei MitaniMineo Miura
    • H01L31/0312
    • H01L29/7816H01L29/045H01L29/1045H01L29/1095H01L29/1608H01L29/4236H01L29/42376H01L29/4238H01L29/45H01L29/66068H01L29/7811H01L29/7813
    • A semiconductor device including a semiconductor layer of a first conductivity type; a plurality of body regions of a second conductivity type, each formed in a region extending from the surface of the semiconductor layer to a halfway portion of the same in the thickness direction, and each spaced apart from each other in a direction perpendicular to the thickness direction; source regions of the first conductivity type, each formed on the surface layer part of each body region and spaced away from the edges of each body region; a gate insulating film formed on the semiconductor layer; and gate electrodes formed on the gate insulating film. In the semiconductor layer, trenches extending between two neighboring source regions are formed by digging from the source of the semiconductor layer, the inside surface of the trenches are covered by the gate insulating film, and the gate electrodes comprise surface-facing parts, which face the surface of the semiconductor layer, and buried parts, which are buried in the trenches.
    • 一种半导体器件,包括第一导电类型的半导体层; 多个第二导电类型的主体区域,各自形成在从半导体层的表面延伸到其厚度方向的中间部分的区域中,并且在垂直于厚度的方向上彼此间隔开 方向; 源区域,每个源区域形成在每个体区域的表面层部分上并与每个身体区域的边缘隔开; 形成在所述半导体层上的栅极绝缘膜; 以及形成在栅极绝缘膜上的栅电极。 在半导体层中,通过从半导体层的源进行挖掘来形成在两个相邻的源极区之间延伸的沟槽,沟槽的内表面被栅极绝缘膜覆盖,并且栅电极包括面向表面的部分 半导体层的表面和埋在沟槽中的埋藏部分。
    • 9. 发明授权
    • SiC field effect transistor
    • SiC场效应晶体管
    • US09219127B2
    • 2015-12-22
    • US13518650
    • 2010-12-24
    • Yuki Nakano
    • Yuki Nakano
    • H01L29/78H01L29/66H01L29/165H01L29/417H01L29/16H01L29/43H01L29/47H01L29/861H01L29/872
    • H01L29/7813H01L29/1608H01L29/165H01L29/41741H01L29/41766H01L29/43H01L29/47H01L29/66068H01L29/7803H01L29/7806H01L29/8618H01L29/872
    • A SiC field effect transistor includes: a SiC semiconductor layer; and a MIS transistor structure including a first conductivity type source region in the semiconductor layer, a second conductivity type body region in the semiconductor layer in contact with the source region, a first conductivity type drift region in the semiconductor layer in contact with the body region, a gate electrode opposed to the body region with a gate insulation film interposed between the electrode and the body region for forming a channel in the body region to cause electric current to flow between the drift region and the source region, and a barrier forming layer in contact with the drift region to form a junction barrier by the contact with the drift region, the junction barrier being lower than a diffusion potential of a body diode defined by a junction between the body region and the drift region.
    • SiC场效应晶体管包括:SiC半导体层; 以及包括半导体层中的第一导电型源极区域的MIS晶体管结构,与源极区域接触的半导体层中的第二导电类型体区域,与体区域接触的半导体层中的第一导电型漂移区域 与所述体区相对的栅极电极,其具有插入在所述电极和所述体区之间的栅极绝缘膜,用于在所述体区中形成沟道,以使所述电流在所述漂移区域和所述源极区域之间流动,以及阻挡层形成层 与漂移区接触以通过与漂移区的接触而形成结屏障,所述结屏障低于由身体区域和漂移区域之间的结点限定的体二极管的扩散电位。