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    • 2. 发明授权
    • Forskolin compounds
    • 福斯康林化合物
    • US4954642A
    • 1990-09-04
    • US361763
    • 1989-05-30
    • Tochiro TateeTakashi TakahiraKouwa YamashitaMasao SakuraiAkira ShiozawaKazuhisa Narita
    • Tochiro TateeTakashi TakahiraKouwa YamashitaMasao SakuraiAkira ShiozawaKazuhisa Narita
    • A61K31/35C07D311/92C07D405/12
    • C07D311/92
    • This invention relates to forskolin derivatives, their physiologically acceptable salts, and a process for producing these compounds. The forskolin derivative is represented by the general formula ##STR1## wherein; I. when R.sup.1 is hydrogen and R.sup.4 is vinyl, ethyl, or cyclopropyl,(1) either of R.sup.2 and R.sup.3 denotes a residue represented by the formula ##STR2## wherein each of R.sup.5 and R.sup.6 denotes hydrogen or lower alkyl or R.sup.5 and R.sup.6 combine with each other to form a lower alkylene chain which may or may not contain an oxygen or nitrogen atom and m is an integer of 1 to 5, and the other one of R.sup.2 and R.sup.3 denotes hydrogen or a residue represented by the formula CO(CH.sub.2).sub.n X, X being hydrogen or ##STR3## wherein, each of R.sup.7 and R.sup.8 denotes hydrogen or lower alkyl or R.sup.7 and R.sup.8 combine with each other to form a lower alkylene chain which may or may not contain an oxygen or nitrogen atom, and n being an integer of 1 to 5, or(2) R.sup.2 denotes hydrogen or --COCH.sub.2 CH.sub.2 CO.sub.2 H and R.sup.3 denotes hydrogen, --COCH.sub.3, --COCH.sub.2 CH.sub.2 CH.sub.2 CO.sub.2 H, or --COCH(OH)CH.sub.2 OH with the proviso that R.sup.3 is one of the last two residues when R.sup.2 is hydrogen, andII. whenR.sup.1 is a residue represented by a formula of CO(CH.sub.2).sub.p CO.sub.2 H and ##STR4## wherein, each of R.sup.9 and R.sup.10 denotes hydrogen or lower alkyl, p is an integer of 0 to 5, and q is an integer of 1 to 5,R.sup.2 denotes hydrogen , R.sup.3 denotes acetyl, and R.sup.4 denotes vinyl.
    • 本发明涉及毛喉素衍生物及其生理学上可接受的盐,以及这些化合物的制备方法。 毛喉素衍生物由通式表示,其中: 当R1是氢并且R4是乙烯基,乙基或环丙基时,(1)R2和R3中的任一个表示由下式表示的残基:其中R 5和R 6各自表示氢或低级烷基或R 5和R 6结合 彼此形成可以含有或不含有氧或氮原子并且m为1〜5的整数的低级亚烷基链,R2和R3中的另一个表示氢或由式CO(CH2)表示的残基 )n X,X为氢或者其中,R 7和R 8各自表示氢或低级烷基,或者R 7和R 8彼此结合形成可含有或不含有氧或氮原子的低级亚烷基链,n 为1〜5的整数,或(2)R2表示氢或-COCH2 CH2CO2H,R3表示氢,-COCH3,-COCH2CH2CH2CO2H或-COCH(OH)CH2OH,条件是R3为最后两个残基之一, R2是氢,II。 当R 1是由CO(CH 2)p CO 2 H和的式表示的残基时,R 9和R 10各自表示氢或低级烷基,p是0至5的整数,q是1至5的整数 ,R2表示氢,R3表示乙酰基,R4表示乙烯基。