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1. 发明申请

US20050214674A1 Positive-working photoimageable bottom antireflective coating 审中-公开
标题翻译：正面工作的可光成像底部抗反射涂层
公开(公告)号：US20050214674A1
公开(公告)日：2005-09-29
申请号：US10808884
申请日：2004-03-25
申请人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark Neisser , Tomohide Katayama , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
发明人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark Neisser , Tomohide Katayama , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
IPC分类号： G03F7/039 , G03F7/09 , G03F7/004
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

2. 发明申请

US20080090184A1 Positive -Working Photoimageable Bottom Antireflective Coating 有权
标题翻译：正面工作的Photoimageable底部防反射涂层
公开(公告)号：US20080090184A1
公开(公告)日：2008-04-17
申请号：US11877891
申请日：2007-10-24
申请人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark Neisser , Tomohide Katayama , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
发明人： Yu Sui , Hengpeng Wu , Wenbing Kang , Mark Neisser , Tomohide Katayama , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
IPC分类号： G03F7/20
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

3. 发明申请

US20080038666A1 Positive-Working Photoimageable Bottom Antireflective Coating 有权
标题翻译：正面照相底部防反射涂层
公开(公告)号：US20080038666A1
公开(公告)日：2008-02-14
申请号：US11876332
申请日：2007-10-22
申请人： Hengpeng Wu , Mark Neisser , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
发明人： Hengpeng Wu , Mark Neisser , Shuji Ding-Lee , Aritaka Hishida , Joseph Oberlander , Medhat Toukhy
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , G03F7/0392 , Y10S430/115 , Y10S438/952
摘要： The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
摘要翻译：本发明涉及能够在含水碱性显影剂中显影的正底部可光成像抗反射涂料组合物，其中抗反射涂料组合物包含含有至少一个具有发色团的重复单元的聚合物和一个具有羟基的重复单元， /或羧基，乙烯基醚封端的交联剂，以及任选的光酸产生剂和/或酸和/或热酸发生剂。本发明还涉及使用这种组合物的方法。

4. 发明申请

US20060199103A1 Process for producing an image using a first minimum bottom antireflective coating composition 审中-公开
标题翻译：使用第一最小底部抗反射涂料组合物制造图像的方法
公开(公告)号：US20060199103A1
公开(公告)日：2006-09-07
申请号：US11416240
申请日：2006-05-02
申请人： Mark Neisser , Joseph Oberlander , Medhat Toukhy , Raj Sakamuri , Shuji Ding-Lee
发明人： Mark Neisser , Joseph Oberlander , Medhat Toukhy , Raj Sakamuri , Shuji Ding-Lee
IPC分类号： G03F7/004
CPC分类号： G03F7/091 , G03F7/095 , Y10S430/151
摘要： Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of λ/2n wherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.
摘要翻译：公开了一种在衬底上形成图像的方法，包括以下步骤：（a）在衬底上涂覆第一层辐射敏感的抗反射组合物; （b）将第二层光致抗蚀剂组合物涂覆到抗反射组合物的第一层上; （c）将涂覆的基材从步骤（b）选择性暴露于光化辐射; 和（d）将来自步骤（c）的曝光的涂覆的基底显影以形成图像; 其中在步骤（c）中曝光光致抗蚀剂组合物和抗反射组合物; 在步骤（d）中使用单个显影剂开发两者; 其中步骤（a）的抗反射组合物是第一最小底部抗反射涂层（BARC）组合物，其固体含量高达约8％固体，并且涂覆的基底的最大涂层厚度为λ/ 2n，其中λ为步骤（c）的光化辐射的波长，n是BARC的折射率组成。

5. 发明申请

US20060063105A1 Negative-working photoimageable bottom antireflective coating 审中-公开
公开(公告)号：US20060063105A1
公开(公告)日：2006-03-23
申请号：US11260761
申请日：2005-10-27
申请人： Joseph Oberlander , Ralph Dammel , Shuji Ding-Lee , Mark Neisser , Medhat Toukhy
发明人： Joseph Oberlander , Ralph Dammel , Shuji Ding-Lee , Mark Neisser , Medhat Toukhy
IPC分类号： G03F7/004 , G03F7/00
CPC分类号： G03F7/095 , G03F7/0382 , G03F7/091
摘要： The present invention relates to novel negative-working, photoimageable, and aqueous developable antireflective coating compositions and their use in image processing by forming a thin layer of the novel antireflective coating composition between a reflective substrate and a photoresist coating. The negative bottom photoimageable antireflective coating composition is capable of being developed in an alkaline developer and is coated below a negative photoresist.

6. 发明申请

US20050234201A1 Process for making polyesters 有权
标题翻译：制作聚酯的方法
公开(公告)号：US20050234201A1
公开(公告)日：2005-10-20
申请号：US10817987
申请日：2004-04-05
申请人： Hengpeng Wu , Jianhui Shan , Shuji Ding-Lee , Zhong Xhiang , Eleazor Gonzalez , Mark Neisser
发明人： Hengpeng Wu , Jianhui Shan , Shuji Ding-Lee , Zhong Xhiang , Eleazor Gonzalez , Mark Neisser
IPC分类号： C08G63/12 , C08G63/46 , C08G63/50 , C08G63/81 , C08G63/91 , C08J7/04 , C08F20/00
CPC分类号： C08J7/047 , C08G63/46 , C08G63/916 , C08J2383/00 , C08J2467/00 , Y10T428/31504 , Y10T428/31786
摘要： The present invention relates to a process for making a polyester where a dianhydride is reacted with a diol. The resulting polyester can be further reacted with a compound selected from aromatic oxides, aliphatic oxides, alkylene carbonates, alcohols, and mixtures thereof.
摘要翻译：本发明涉及一种制备其中二酐与二醇反应的聚酯的方法。所得聚酯可以进一步与选自芳族氧化物，脂族氧化物，碳酸亚烷基酯，醇及其混合物的化合物反应。

7. 发明授权

US08835581B2 Neutral layer polymer composition for directed self assembly and processes thereof 有权
标题翻译：用于定向自组装的中性层聚合物组合物及其工艺
公开(公告)号：US08835581B2
公开(公告)日：2014-09-16
申请号：US13492125
申请日：2012-06-08
申请人： Hengpeng Wu , Orest Polishchuk , Yi Cao , SungEun Hong , Jian Yin , Guanyang Lin , Margareta Paunescu , Mark Neisser
发明人： Hengpeng Wu , Orest Polishchuk , Yi Cao , SungEun Hong , Jian Yin , Guanyang Lin , Margareta Paunescu , Mark Neisser
IPC分类号： C08F4/04 , C07C245/04
CPC分类号： C08F4/04 , C07C245/04 , C08F8/12 , C08F212/08 , C08F2800/20 , C08F2810/40 , G03F7/0002 , C08F220/14
摘要： The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): wherein R1 represents a C1-C20 substituted or unsubstituted alkyl group, w is a number from 1-8, X is oxygen (O) or nitrogen (N), and Rd is a reactive group. The invention also relates to a process for forming a pattern using the novel polymeric composition. The invention further relates to a process of making the novel polymer.
摘要翻译：本发明涉及包含具有两个或多个重复单元的新型聚合物和具有结构（1）的末端的新型聚合物组合物：其中R1表示C1-C20取代或未取代的烷基，w为1-8 ，X是氧（O）或氮（N），Rd是反应性基团。本发明还涉及使用新型聚合物组合物形成图案的方法。本发明还涉及制备该新型聚合物的方法。

8. 发明授权

US07666575B2 Antireflective coating compositions 有权
标题翻译：防反射涂料组合物
公开(公告)号：US07666575B2
公开(公告)日：2010-02-23
申请号：US11550459
申请日：2006-10-18
申请人： Woo-Kyu Kim , Hengpeng Wu , David Abdallah , Mark Neisser , PingHung Lu , Ruzhi Zhang , M. Dalil Rahman
发明人： Woo-Kyu Kim , Hengpeng Wu , David Abdallah , Mark Neisser , PingHung Lu , Ruzhi Zhang , M. Dalil Rahman
IPC分类号： G03F7/09 , G03F7/11 , G03F7/30
CPC分类号： G03F7/091 , Y10S438/952
摘要： The present invention relates to an antireflective coating composition comprising, (i) a thermal acid generator; (ii) a crosslinkable polymer comprising at least one aromatic group; and, (iii) a polymeric crosslinker comprising at least one unit of structure (6), where R11 to R13 is independently selected from H, (C1-C6) alkyl and aromatic group, R14 and R15 are independently (C1-C10) alkyl. The invention also relates to a process for imaging the antireflective coating composition of the present invention.
摘要翻译：本发明涉及一种抗反射涂料组合物，其包含：（i）热酸发生剂; （ii）包含至少一个芳族基团的可交联聚合物; 和（iii）包含至少一个结构单元（6）的聚合物交联剂，其中R 11至R 13独立地选自H，（C 1 -C 6）烷基和芳族基团，R 14和R 15独立地为（C 1 -C 10）烷基。本发明还涉及一种用于对本发明的抗反射涂料组合物进行成像的方法。

9. 发明申请

US20080096125A1 Antireflective Coating Compositions 有权
标题翻译：防反射涂料组合物
公开(公告)号：US20080096125A1
公开(公告)日：2008-04-24
申请号：US11550459
申请日：2006-10-18
申请人： Woo-Kyu Kim , Hengpeng Wu , David Abdallah , Mark Neisser , PingHung Lu , Ruzhi Zhang , M. Dalil Rahman
发明人： Woo-Kyu Kim , Hengpeng Wu , David Abdallah , Mark Neisser , PingHung Lu , Ruzhi Zhang , M. Dalil Rahman
IPC分类号： G03C1/00
CPC分类号： G03F7/091 , Y10S438/952
摘要： The present invention relates to an antireflective coating composition comprising, (i) a thermal acid generator; (ii) a crosslinkable polymer comprising at least one aromatic group; and, (iii) a polymeric crosslinker comprising at least one unit of structure (6), where R11 to R13 is independently selected from H, (C1-C6) alkyl and aromatic group, R14 and R15 are independently (C1-C10) alkyl. The invention also relates to a process for imaging the antireflective coating composition of the present invention.
摘要翻译：本发明涉及一种抗反射涂料组合物，其包含：（i）热酸发生剂; （ii）包含至少一个芳族基团的可交联聚合物; 和（iii）包含结构（6）的至少一个单元的聚合物交联剂，其中R 11至R 13独立地选自H，（C 1 -C 6） C 1 -C 6烷基和芳基，R 14和R 15独立地是（C 1 -C 6）烷基和芳基， C 1 -C 10烷基。本发明还涉及一种用于对本发明的抗反射涂料组合物进行成像的方法。

10. 发明授权

US09040659B2 Methods and materials for removing metals in block copolymers 有权
标题翻译：用于去除嵌段共聚物中金属的方法和材料
公开(公告)号：US09040659B2
公开(公告)日：2015-05-26
申请号：US14175203
申请日：2014-02-07
申请人： Jian Yin , Hengpeng Wu , Muthiah Thiyagarajan , SungEun Hong , Mark Neisser , Yi Cao
发明人： Jian Yin , Hengpeng Wu , Muthiah Thiyagarajan , SungEun Hong , Mark Neisser , Yi Cao
IPC分类号： C08G64/00 , B05D5/00 , B01D15/36 , B01J45/00 , C08J3/00 , B01J39/04 , B01J41/04 , B05D1/00 , B05D3/00 , C08F6/02
CPC分类号： B05D5/00 , B01D15/361 , B01J39/05 , B01J41/07 , B01J45/00 , B05D1/005 , B05D3/00 , C08F6/02 , C08J3/00 , C08L53/00
摘要： The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer.
摘要翻译：本发明涉及一种处理嵌段共聚物溶液的方法，其中该方法包括：在非水溶剂中提供包含嵌段共聚物的溶液; 并使用离子交换树脂处理该溶液以除去金属。本发明还涉及使用经处理的嵌段共聚物形成图案的方法。

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