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1. 发明申请

US20120128970A1 Magnetostrictive Film, Magnetostrictive Element, Torque Sensor, Force Sensor, Pressure Sensor, And Manufacturing Method Therefor 有权
标题翻译：磁致伸缩膜，磁致伸缩元件，扭矩传感器，力传感器，压力传感器及其制造方法
公开(公告)号：US20120128970A1
公开(公告)日：2012-05-24
申请号：US13388528
申请日：2010-07-30
申请人： Yoshitsugu Motoe , Koji Nakashima , Tomohito Ishikawa , Masaharu Sugiyama , Takanori Igarashi , Hiroyuki Wakiwaka , Akihiro Makino , Akihisa Inoue
发明人： Yoshitsugu Motoe , Koji Nakashima , Tomohito Ishikawa , Masaharu Sugiyama , Takanori Igarashi , Hiroyuki Wakiwaka , Akihiro Makino , Akihisa Inoue
IPC分类号： H01F1/01 , C23C4/10 , B32B3/00
CPC分类号： G01L3/102 , C22C33/003 , C22C45/02 , C23C4/06 , G01L3/103 , G01L3/105 , G01R33/18 , H01F10/131 , H01L41/125 , H01L41/20 , H01L41/47 , Y10T428/265
摘要： For providing a magnetostrictive film that can exhibit high magnetostrictive properties in the vicinity of zero magnetic field and their manufacturing methods, a magnetostrictive film thermal sprayed on an object under test includes a metallic glass film subjected to thermal processing at a temperature lower than the glass transition temperature and not lower than the Curie point, and shows a linearity between the magnetic field and the magnetostriction in at least a part of the magnetic field from −15 kA/m to +15 kA/m (both inclusive).
摘要翻译：为了提供在零磁场附近可表现出高的磁致伸缩特性的磁致伸缩薄膜及其制造方法，热喷涂在被测物体上的磁致伸缩薄膜包括在比玻璃化转变温度低的温度下进行热处理的金属玻璃薄膜温度并且不低于居里点，并且在从-15kA / m到+15kA / m（包括端值）的至少一部分磁场中显示出磁场和磁致伸缩之间的线性。

2. 发明授权

US09506824B2 Magnetostrictive film, magnetostrictive element, torque sensor, force sensor, pressure sensor, and manufacturing method therefor 有权
标题翻译：磁致伸缩膜，磁致伸缩元件，转矩传感器，力传感器，压力传感器及其制造方法
公开(公告)号：US09506824B2
公开(公告)日：2016-11-29
申请号：US13388528
申请日：2010-07-30
申请人： Yoshitsugu Motoe , Koji Nakashima , Tomohito Ishikawa , Masaharu Sugiyama , Takanori Igarashi , Hiroyuki Wakiwaka , Akihiro Makino , Akihisa Inoue
发明人： Yoshitsugu Motoe , Koji Nakashima , Tomohito Ishikawa , Masaharu Sugiyama , Takanori Igarashi , Hiroyuki Wakiwaka , Akihiro Makino , Akihisa Inoue
IPC分类号： B32B15/00 , G01L3/10 , C22C33/00 , C22C45/02 , C23C4/06 , G01R33/18 , H01F10/13 , H01L41/12 , H01L41/47 , H01L41/20
CPC分类号： G01L3/102 , C22C33/003 , C22C45/02 , C23C4/06 , G01L3/103 , G01L3/105 , G01R33/18 , H01F10/131 , H01L41/125 , H01L41/20 , H01L41/47 , Y10T428/265
摘要： For providing a magnetostrictive film that can exhibit high magnetostrictive properties in the vicinity of zero magnetic field and their manufacturing methods, a magnetostrictive film thermal sprayed on an object under test includes a metallic glass film subjected to thermal processing at a temperature lower than the glass transition temperature and not lower than the Curie point, and shows a linearity between the magnetic field and the magnetostriction in at least a part of the magnetic field from −15 kA/m to +15 kA/m (both inclusive).
摘要翻译：为了提供在零磁场附近可表现出高的磁致伸缩特性的磁致伸缩薄膜及其制造方法，热喷涂在被测物体上的磁致伸缩薄膜包括在比玻璃化转变温度低的温度下进行热处理的金属玻璃薄膜温度并且不低于居里点，并且在从-15kA / m到+15kA / m（包括端值）的至少一部分磁场中显示出磁场和磁致伸缩之间的线性。

3. 发明授权

US07906219B2 Metallic glass laminates, production methods and applications thereof 有权
标题翻译：金属玻璃层压板，其制造方法和用途
公开(公告)号：US07906219B2
公开(公告)日：2011-03-15
申请号：US10599293
申请日：2005-03-25
申请人： Masaki Ohara , Takanori Igarashi , Masaharu Sugiyama , Seiji Yamada , Kenichi Takahashi , Atsuo Mochizuki , Yoshitsugu Motoe , Akihisa Inoue , Hisamichi Kimura
发明人： Masaki Ohara , Takanori Igarashi , Masaharu Sugiyama , Seiji Yamada , Kenichi Takahashi , Atsuo Mochizuki , Yoshitsugu Motoe , Akihisa Inoue , Hisamichi Kimura
IPC分类号： B32B3/00 , B32B15/00 , B32B15/18 , C23C4/00 , C23C4/06 , C23C4/08
CPC分类号： C22C19/07 , B32B15/01 , C22C45/008 , C22F1/10 , C23C4/11 , C23C4/18 , C23C24/04 , C23C30/00 , Y10T428/12493 , Y10T428/12951 , Y10T428/12993 , Y10T428/1317 , Y10T428/24851 , Y10T428/24926 , Y10T428/249921 , Y10T428/249953
摘要： A metallic glass laminate of the present invention is characterized in that a metallic glass layer of amorphous phase is formed on the substrate surface, and there is no continuous pore (pinhole) through the metallic glass layer. The metallic glass laminate is preferably obtained by solidification and lamination of at least part of the metallic glass powder in the molten state or in the supercooled liquid state on the substrate surface. Because of the dense metallic glass layer of homogenous amorphous phase, the functionalities of metallic glass such as corrosion resistance and wear resistance can be satisfactorily provided. A thick and a large-area metallic glass layer can be formed. The metallic glass layer can also be formed into various shapes within the supercooled liquid temperature range. In addition, a metallic glass bulk can be obtained by removing the substrate. The metallic glass laminate and the metallic glass bulk are utilized for a fuel cell separator, a hydrogen separation membrane, a hydrogen sensor, a solder-corrosion resisting member, etc.
摘要翻译：本发明的金属玻璃层叠体的特征在于，在基板表面上形成非晶相的金属玻璃层，通过金属玻璃层不存在连续的孔（针孔）。金属玻璃层压体优选通过将熔融状态的金属玻璃粉末或基板表面上的过冷液态的至少一部分进行固化和层压而获得。由于均匀非晶相的致密金属玻璃层，可以令人满意地提供金属玻璃的功能，例如耐腐蚀性和耐磨性。可以形成厚的和大面积的金属玻璃层。金属玻璃层也可以在过冷液体温度范围内形成各种形状。此外，通过除去基板可以获得金属玻璃体。金属玻璃层压体和金属玻璃体用于燃料电池隔板，氢分离膜，氢传感器，耐焊锡腐蚀构件等。

4. 发明申请

US20080248222A1 Metallic Glass Laminates, Production Methods and Applications Thereof 有权
标题翻译：金属玻璃层压板，其生产方法及应用
公开(公告)号：US20080248222A1
公开(公告)日：2008-10-09
申请号：US10599293
申请日：2005-03-25
申请人： Masaki Ohara , Takanori Igarashi , Masaharu Sugiyama , Seiji Yamada , Kenichi Takahashi , Atsuo Mochizuki , Yoshitsugu Motoe , Akihisa Inoue , Hisamichi Kimura
发明人： Masaki Ohara , Takanori Igarashi , Masaharu Sugiyama , Seiji Yamada , Kenichi Takahashi , Atsuo Mochizuki , Yoshitsugu Motoe , Akihisa Inoue , Hisamichi Kimura
IPC分类号： B32B1/08 , B32B3/24 , B32B38/00 , B05D1/02 , B32B3/00
CPC分类号： C22C19/07 , B32B15/01 , C22C45/008 , C22F1/10 , C23C4/11 , C23C4/18 , C23C24/04 , C23C30/00 , Y10T428/12493 , Y10T428/12951 , Y10T428/12993 , Y10T428/1317 , Y10T428/24851 , Y10T428/24926 , Y10T428/249921 , Y10T428/249953
摘要： A metallic glass laminate of the present invention is characterized in that a metallic glass layer of amorphous phase is formed on the substrate surface, and there is no continuous pore (pinhole) through the metallic glass layer. The metallic glass laminate is preferably obtained by solidification and lamination of at least part of the metallic glass powder in the molten state or in the supercooled liquid state on the substrate surface. Because of the dense metallic glass layer of homogenous amorphous phase, the functionalities of metallic glass such as corrosion resistance and wear resistance can be satisfactorily provided. A thick and a large-area metallic glass layer can be formed. The metallic glass layer can also be formed into various shapes within the supercooled liquid temperature range. In addition, a metallic glass bulk can be obtained by removing the substrate. The metallic glass laminate and the metallic glass bulk are utilized for a fuel cell separator, a hydrogen separation membrane, a hydrogen sensor, a solder-corrosion resisting member, etc.
摘要翻译：本发明的金属玻璃层叠体的特征在于，在基板表面上形成非晶相的金属玻璃层，通过金属玻璃层不存在连续的孔（针孔）。金属玻璃层压体优选通过将熔融状态的金属玻璃粉末或基板表面上的过冷液态的至少一部分进行固化和层压而获得。由于均匀非晶相的致密金属玻璃层，可以令人满意地提供金属玻璃的功能，例如耐腐蚀性和耐磨性。可以形成厚的和大面积的金属玻璃层。金属玻璃层也可以在过冷液体温度范围内形成各种形状。此外，通过除去基板可以获得金属玻璃体。金属玻璃层压体和金属玻璃体用于燃料电池隔板，氢分离膜，氢传感器，耐焊锡腐蚀构件等。

5. 发明授权

US06280293B1 End face polishing apparatus and method for polishing end face of ferrule 有权
标题翻译：端面抛光装置及抛光套圈端面的方法
公开(公告)号：US06280293B1
公开(公告)日：2001-08-28
申请号：US09418979
申请日：1999-10-14
申请人： Kouji Minami , Mari Kato , Masaharu Sugiyama
发明人： Kouji Minami , Mari Kato , Masaharu Sugiyama
IPC分类号： B24B4900
CPC分类号： B24B49/16 , B24B19/226 , B24B41/067 , G02B6/3851
摘要： An end face polishing apparatus comprises a jig plate for supporting a workpiece, a polishing member for polishing an end face of the workpiece, and a movable lever connected to the jig plate. A pressurizing section presses the lever to bring the end face of the workpiece into pressure contact with the polishing member. The pressurizing section has a first spring member for biasing the lever in a first direction, a pressurizing head for biasing the lever in a second direction opposite to the first direction, a second spring member for biasing the pressurizing head in the second direction, and a pressure sensor disposed between the pressurizing head and the lever for detecting a pressure applied by the end face of the ferrule onto the polishing member when the lever is pressed by the pressurizing section. A pressurization control section controls the pressure applied by the end face of the workpiece onto the polishing member when the lever is pressed by the pressurizing section.
摘要翻译：端面抛光装置包括用于支撑工件的夹具板，用于抛光工件的端面的抛光构件和连接到夹具板的可动杆。加压部按压操作杆使工件的端面与抛光部件压力接触。所述加压部具有用于沿第一方向偏压所述杆的第一弹簧部件，用于沿与所述第一方向相反的第二方向偏压所述杠杆的加压头，用于沿所述第二方向偏压所述加压头的第二弹簧部件，压力传感器设置在加压头和杠杆之间，用于当杠杆被加压部分按压时，检测由套圈的端面施加到抛光构件上的压力。加压控制部，当通过加压部按压杆时，将由工件的端面施加的压力控制在研磨部件上。

6. 发明申请

US20070163995A1 PLASMA PROCESSING METHOD, APPARATUS AND STORAGE MEDIUM 审中-公开
标题翻译：等离子体处理方法，装置和存储介质
公开(公告)号：US20070163995A1
公开(公告)日：2007-07-19
申请号：US11567384
申请日：2006-12-06
申请人： Masaru SUGIMOTO , Noriyuki Kobayashi , Masaharu Sugiyama
发明人： Masaru SUGIMOTO , Noriyuki Kobayashi , Masaharu Sugiyama
IPC分类号： C23F1/00 , B44C1/22 , H01L21/302 , H01L21/306
CPC分类号： H01L21/31144 , H01J37/32082 , H01J2237/3347 , H01L21/31116 , H01L21/76816
摘要： In etching an insulating film such as an SiOC film or the like, in order to suppress a diameter of a hole or a width of a groove, a pre-processing is performed before performing the etching. In the pre-processing, a processing gas containing CF4 gas and CH3F gas is converted into a plasma, and an opening size of an opening portion of a resist mask is decreased by depositing deposits at a sidewall thereof by using the plasma. Further, in etching the SiOC film, a processing gas containing CF4 gas, CH3F gas, and N2 gas is converted into a plasma by supplying a processing gas atmosphere by using a first high frequency wave for generating the plasma, wherein the electric power divided by a surface area of a substrate becomes over 1500 W/70685.8 mm2 (a surface area of a 300 mm wafer), and then the SiOC film is etched.
摘要翻译：在蚀刻诸如SiOC膜等的绝缘膜时，为了抑制孔的直径或槽的宽度，在进行蚀刻之前进行预处理。在预处理中，含有CF 4气体和CH 3 F气体的处理气体被转换为等离子体，并且抗蚀剂掩模的开口部分的开口尺寸通过使用等离子体在其侧壁沉积沉积物而降低。此外，在蚀刻SiOC膜时，将含有CF 4气体，CH 3 F气体和N 2气体的处理气体转化为通过使用用于产生等离子体的第一高频波提供处理气体气氛的等离子体，其中被基板的表面积分割的电力超过1500W / 70685.8mm 2（表面积的300mm晶片），然后蚀刻SiOC膜。

7. 发明授权

US06830501B2 End face polishing device 失效
标题翻译：端面抛光装置
公开(公告)号：US06830501B2
公开(公告)日：2004-12-14
申请号：US10062752
申请日：2002-02-01
申请人： Kouji Minami , Hisayuki Hirayama , Kisaburo Yoshida , Masaharu Sugiyama
发明人： Kouji Minami , Hisayuki Hirayama , Kisaburo Yoshida , Masaharu Sugiyama
IPC分类号： B24B722
CPC分类号： G02B6/25 , B24B19/226 , B24B41/047 , G02B6/3863
摘要： An end face polishing device has a first revolution shaft mounted for undergoing revolving movement about a first axis, a rotational shaft mounted for undergoing rotation about a second axis eccentric from the first axis, and a second revolution shaft mounted for undergoing revolving movement about a third axis eccentric from the second axis. A polishing disc is connected to the second revolution shaft for revolving movement therewith.
摘要翻译：端面抛光装置具有安装成围绕第一轴线进行旋转运动的第一旋转轴，安装成围绕第一轴线偏心的第二轴线旋转的旋转轴和安装成围绕第三轴线旋转运动的第二旋转轴轴从第二轴偏心。抛光盘连接到第二旋转轴用于与其旋转运动。

8. 发明授权

US07488689B2 Plasma etching method 有权
标题翻译：等离子蚀刻法
公开(公告)号：US07488689B2
公开(公告)日：2009-02-10
申请号：US11290481
申请日：2005-12-01
申请人： Shinya Morikita , Masaharu Sugiyama , Atsushi Kawabata
发明人： Shinya Morikita , Masaharu Sugiyama , Atsushi Kawabata
IPC分类号： H01L21/302
CPC分类号： H01L21/67069 , C23F4/00 , H01J37/32935 , H01L21/32136 , H01L21/6831
摘要： In a vacuum processing chamber, an etching is performed on an object to be processed having at least a mask layer formed in a predetermined pattern and a Ti layer, as a layer to be etched, formed under the mask layer. During the etching, a first plasma processing is carried out to etch the Ti layer by using a plasma of an etching gas containing a fluorine compound at an inner pressure of the chamber of 4 Pa or less. Subsequently, a second plasma processing for dry cleaning is performed by using a plasma of a cleaning gas after the first plasma processing is completed. At this time, a deposit containing a Ti compound produced during the plasma processing is removed.
摘要翻译：在真空处理室中，对具有至少形成为规定图案的掩模层的被处理物和作为被蚀刻的层形成在掩模层下方的Ti层进行蚀刻。在蚀刻期间，通过使用在室内压为4Pa以下的含氟化合物的蚀刻气体的等离子体，进行第一等离子体处理来蚀刻Ti层。随后，在完成第一等离子体处理之后，通过使用清洁气体的等离子体进行干洗的第二等离子体处理。此时，除去包含在等离子体处理期间产生的Ti化合物的沉积物。

9. 发明申请

US20060118520A1 Plasma etching method 有权
公开(公告)号：US20060118520A1
公开(公告)日：2006-06-08
申请号：US11290481
申请日：2005-12-01
申请人： Shinya Morikita , Masaharu Sugiyama , Atsushi Kawabata
发明人： Shinya Morikita , Masaharu Sugiyama , Atsushi Kawabata
IPC分类号： C23F1/00 , B44C1/22 , H01L21/306
CPC分类号： H01L21/67069 , C23F4/00 , H01J37/32935 , H01L21/32136 , H01L21/6831
摘要： In a vacuum processing chamber, an etching is performed on an object to be processed having at least a mask layer formed in a predetermined pattern and a Ti layer, as a layer to be etched, formed under the mask layer. During the etching, a first plasma processing is carried out to etch the Ti layer by using a plasma of an etching gas containing a fluorine compound at an inner pressure of the chamber of 4 Pa or less. Subsequently, a second plasma processing for dry cleaning is performed by using a plasma of a cleaning gas after the first plasma processing is completed. At this time, a deposit containing a Ti compound produced during the plasma processing is removed.

10. 发明授权

US06302773B1 Polishing device, end face polishing apparatus having polishing device, and end face polishing method 失效
标题翻译：抛光装置，具有抛光装置的端面抛光装置和端面抛光方法
公开(公告)号：US06302773B1
公开(公告)日：2001-10-16
申请号：US09360774
申请日：1999-07-26
申请人： Mari Kato , Kouji Minami , Masaharu Sugiyama
发明人： Mari Kato , Kouji Minami , Masaharu Sugiyama
IPC分类号： B24B700
CPC分类号： B24B37/11 , B23Q3/15713 , B24B19/226 , B24B41/005
摘要： An end face polishing apparatus comprises a polishing board and a jig board for supporting workpieces. A polishing member is detachably arranged on the polishing board and has a polishing film for polishing end faces of the workpieces while the workpieces are supported by the jig board. A first holding device holdings unused polishing members each having a new polishing film preliminarily attached thereto. At least one second holding device holds used polishing members which have been removed from the polishing board. A polishing member exchanging device is mounted for linear movement in horizontal and vertical directions for exchanging a used polishing member arranged on the polishing board with an unused polishing member by seizing the used polishing member from the polishing board and conveying the used polishing member to the second holding device, and by taking an unused polishing member from the first holding device and placing the unused polishing member on the polishing board.
摘要翻译：端面抛光装置包括用于支撑工件的抛光板和夹具板。抛光构件可拆卸地布置在抛光板上，并且具有用于抛光工件的端面的抛光膜，同时工件由夹具板支撑。第一保持装置保持预先安装有新抛光膜的未使用的抛光构件。至少一个第二保持装置保持已经从抛光板移除的使用的抛光构件。抛光构件交换装置安装成在水平和垂直方向上线性运动，用于通过从抛光板上抓住所使用的抛光构件将布置在抛光板上的用过的抛光构件与未使用的抛光构件进行交换，并将所使用的抛光构件传送到第二并且通过从第一保持装置取出未使用的抛光构件并将未使用的抛光构件放置在抛光板上。

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